WO2009078322A1 - 表面反射防止膜形成用組成物及びそれを用いたパターン形成方法 - Google Patents
表面反射防止膜形成用組成物及びそれを用いたパターン形成方法 Download PDFInfo
- Publication number
- WO2009078322A1 WO2009078322A1 PCT/JP2008/072432 JP2008072432W WO2009078322A1 WO 2009078322 A1 WO2009078322 A1 WO 2009078322A1 JP 2008072432 W JP2008072432 W JP 2008072432W WO 2009078322 A1 WO2009078322 A1 WO 2009078322A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- composition
- antireflective film
- top antireflective
- forming
- formation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008801199918A CN101849209B (zh) | 2007-12-14 | 2008-12-10 | 用于形成顶层抗反射膜的组合物以及使用该组合物的图案形成方法 |
EP08861766A EP2233977B1 (en) | 2007-12-14 | 2008-12-10 | Composition for formation of top antireflective film, and pattern formation method using the composition |
KR1020107015127A KR101486390B1 (ko) | 2007-12-14 | 2008-12-10 | 표면 반사 방지막 형성용 조성물 및 이를 사용한 패턴 형성 방법 |
US12/747,652 US8568955B2 (en) | 2007-12-14 | 2008-12-10 | Composition for formation of top antireflective film, and pattern formation method using the composition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-323198 | 2007-12-14 | ||
JP2007323198A JP4723557B2 (ja) | 2007-12-14 | 2007-12-14 | 表面反射防止膜形成用組成物及びそれを用いたパターン形成方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009078322A1 true WO2009078322A1 (ja) | 2009-06-25 |
Family
ID=40795438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/072432 WO2009078322A1 (ja) | 2007-12-14 | 2008-12-10 | 表面反射防止膜形成用組成物及びそれを用いたパターン形成方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8568955B2 (ja) |
EP (1) | EP2233977B1 (ja) |
JP (1) | JP4723557B2 (ja) |
KR (1) | KR101486390B1 (ja) |
CN (1) | CN101849209B (ja) |
MY (1) | MY148549A (ja) |
TW (1) | TWI447525B (ja) |
WO (1) | WO2009078322A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5697523B2 (ja) * | 2011-04-12 | 2015-04-08 | メルクパフォーマンスマテリアルズIp合同会社 | 上面反射防止膜形成用組成物およびそれを用いたパターン形成方法 |
US10416561B2 (en) * | 2016-04-22 | 2019-09-17 | AGC Inc. | Coating composition, and process for producing photoresist laminate |
WO2018012283A1 (ja) * | 2016-07-13 | 2018-01-18 | 旭硝子株式会社 | コーティング用組成物の製造方法およびフォトレジスト積層体の製造方法 |
CN114035405B (zh) * | 2022-01-07 | 2022-04-22 | 甘肃华隆芯材料科技有限公司 | 制备顶部抗反射膜的组合物、顶部抗反射膜和含氟组合物 |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0219847A (ja) | 1988-05-19 | 1990-01-23 | Basf Ag | ポジチブ及びネガチブ処理感放射線混合物及びレリーフパターンの作製方法 |
JPH0227660A (ja) | 1988-07-18 | 1990-01-30 | Sanyo Electric Co Ltd | 非水系二次電池 |
JPH02209977A (ja) | 1988-10-28 | 1990-08-21 | Internatl Business Mach Corp <Ibm> | 高感度ポジ型フオトレジスト組成物 |
JPH03206458A (ja) | 1989-03-14 | 1991-09-09 | Internatl Business Mach Corp <Ibm> | 化学的に増補されたフオトレジスト |
JPH04211258A (ja) | 1990-01-30 | 1992-08-03 | Wako Pure Chem Ind Ltd | 化学増幅型レジスト材料 |
JPH05249682A (ja) | 1991-06-18 | 1993-09-28 | Wako Pure Chem Ind Ltd | 新規なレジスト材料及びパタ−ン形成方法 |
JPH07181685A (ja) * | 1993-12-21 | 1995-07-21 | Shin Etsu Chem Co Ltd | 光反射性防止材料及びパターン形成方法 |
JPH07295210A (ja) | 1994-04-25 | 1995-11-10 | Shin Etsu Chem Co Ltd | 光反射性防止材料及びパターン形成方法 |
JPH0844066A (ja) * | 1994-08-01 | 1996-02-16 | Mitsubishi Chem Corp | 表面反射防止塗布組成物 |
JPH08305032A (ja) * | 1995-05-01 | 1996-11-22 | Hoechst Ind Kk | 反射防止コーティング用組成物 |
WO2001035167A1 (fr) * | 1999-11-10 | 2001-05-17 | Clariant International Ltd. | Composition pour revetement antireflet |
JP2003345026A (ja) * | 2002-05-24 | 2003-12-03 | Tokyo Ohka Kogyo Co Ltd | 反射防止膜形成用塗布液組成物およびこれを用いたホトレジスト積層体、並びにホトレジストパターンの形成方法 |
JP2004037887A (ja) | 2002-07-04 | 2004-02-05 | Clariant (Japan) Kk | 反射防止コーティング用組成物およびパターン形成方法 |
JP2005157259A (ja) | 2003-10-28 | 2005-06-16 | Tokyo Ohka Kogyo Co Ltd | レジスト上層膜形成材料、およびこれを用いたレジストパターン形成方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001281874A (ja) * | 2000-03-31 | 2001-10-10 | Tokyo Ohka Kogyo Co Ltd | リソグラフィー用反射防止膜形成用組成物およびこれを用いたレジスト積層体 |
JP2008129080A (ja) * | 2006-11-16 | 2008-06-05 | Az Electronic Materials Kk | 上面反射防止膜用組成物、およびそれを用いたパターン形成方法 |
JP5077569B2 (ja) * | 2007-09-25 | 2012-11-21 | 信越化学工業株式会社 | パターン形成方法 |
WO2009066768A1 (ja) * | 2007-11-22 | 2009-05-28 | Az Electronic Materials(Japan)K.K | 表面反射防止膜用組成物およびパターン形成方法 |
-
2007
- 2007-12-14 JP JP2007323198A patent/JP4723557B2/ja active Active
-
2008
- 2008-12-10 MY MYPI2010002446A patent/MY148549A/en unknown
- 2008-12-10 WO PCT/JP2008/072432 patent/WO2009078322A1/ja active Application Filing
- 2008-12-10 EP EP08861766A patent/EP2233977B1/en not_active Not-in-force
- 2008-12-10 KR KR1020107015127A patent/KR101486390B1/ko active IP Right Grant
- 2008-12-10 CN CN2008801199918A patent/CN101849209B/zh active Active
- 2008-12-10 US US12/747,652 patent/US8568955B2/en not_active Expired - Fee Related
- 2008-12-12 TW TW097148488A patent/TWI447525B/zh active
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0219847A (ja) | 1988-05-19 | 1990-01-23 | Basf Ag | ポジチブ及びネガチブ処理感放射線混合物及びレリーフパターンの作製方法 |
JPH0227660A (ja) | 1988-07-18 | 1990-01-30 | Sanyo Electric Co Ltd | 非水系二次電池 |
JPH02209977A (ja) | 1988-10-28 | 1990-08-21 | Internatl Business Mach Corp <Ibm> | 高感度ポジ型フオトレジスト組成物 |
JPH03206458A (ja) | 1989-03-14 | 1991-09-09 | Internatl Business Mach Corp <Ibm> | 化学的に増補されたフオトレジスト |
JPH04211258A (ja) | 1990-01-30 | 1992-08-03 | Wako Pure Chem Ind Ltd | 化学増幅型レジスト材料 |
JPH05249682A (ja) | 1991-06-18 | 1993-09-28 | Wako Pure Chem Ind Ltd | 新規なレジスト材料及びパタ−ン形成方法 |
JPH07181685A (ja) * | 1993-12-21 | 1995-07-21 | Shin Etsu Chem Co Ltd | 光反射性防止材料及びパターン形成方法 |
JPH07295210A (ja) | 1994-04-25 | 1995-11-10 | Shin Etsu Chem Co Ltd | 光反射性防止材料及びパターン形成方法 |
JPH0844066A (ja) * | 1994-08-01 | 1996-02-16 | Mitsubishi Chem Corp | 表面反射防止塗布組成物 |
JPH08305032A (ja) * | 1995-05-01 | 1996-11-22 | Hoechst Ind Kk | 反射防止コーティング用組成物 |
WO2001035167A1 (fr) * | 1999-11-10 | 2001-05-17 | Clariant International Ltd. | Composition pour revetement antireflet |
JP2003345026A (ja) * | 2002-05-24 | 2003-12-03 | Tokyo Ohka Kogyo Co Ltd | 反射防止膜形成用塗布液組成物およびこれを用いたホトレジスト積層体、並びにホトレジストパターンの形成方法 |
JP2004037887A (ja) | 2002-07-04 | 2004-02-05 | Clariant (Japan) Kk | 反射防止コーティング用組成物およびパターン形成方法 |
JP2005157259A (ja) | 2003-10-28 | 2005-06-16 | Tokyo Ohka Kogyo Co Ltd | レジスト上層膜形成材料、およびこれを用いたレジストパターン形成方法 |
Non-Patent Citations (2)
Title |
---|
H. ITO; C.G. WILLSON, POLYM. ENG. SCI., vol. 23, 1983, pages 1012 |
See also references of EP2233977A4 |
Also Published As
Publication number | Publication date |
---|---|
MY148549A (en) | 2013-04-30 |
JP2009145658A (ja) | 2009-07-02 |
US8568955B2 (en) | 2013-10-29 |
KR20100099265A (ko) | 2010-09-10 |
JP4723557B2 (ja) | 2011-07-13 |
KR101486390B1 (ko) | 2015-01-26 |
CN101849209B (zh) | 2012-11-28 |
US20100286318A1 (en) | 2010-11-11 |
EP2233977A8 (en) | 2010-11-03 |
EP2233977A4 (en) | 2010-12-29 |
EP2233977A1 (en) | 2010-09-29 |
CN101849209A (zh) | 2010-09-29 |
EP2233977B1 (en) | 2012-07-11 |
TW200937128A (en) | 2009-09-01 |
TWI447525B (zh) | 2014-08-01 |
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