WO2009037923A1 - 反応ノズル、気相加水分解処理装置および気相加水分解処理方法 - Google Patents
反応ノズル、気相加水分解処理装置および気相加水分解処理方法 Download PDFInfo
- Publication number
- WO2009037923A1 WO2009037923A1 PCT/JP2008/063912 JP2008063912W WO2009037923A1 WO 2009037923 A1 WO2009037923 A1 WO 2009037923A1 JP 2008063912 W JP2008063912 W JP 2008063912W WO 2009037923 A1 WO2009037923 A1 WO 2009037923A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nozzle
- vapor
- fluid
- phase hydrolysis
- spouting
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
- F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
- F23G7/04—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste liquors, e.g. sulfite liquors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23D—BURNERS
- F23D11/00—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space
- F23D11/10—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space the spraying being induced by a gaseous medium, e.g. water vapour
- F23D11/108—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space the spraying being induced by a gaseous medium, e.g. water vapour medium and fuel intersecting downstream of the burner outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00119—Heat exchange inside a feeding nozzle or nozzle reactor
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Inorganic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
- Nozzles (AREA)
- Silicon Compounds (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
2種類の流体を反応させつつ、反応により生ずる固体成分により閉塞されにくいノズルを提供する。液状の第1の流体を噴出する第1のノズル10と、第1のノズルの外側に第1のノズルと同心円状に配置され、第1の流体を微細化する第1の気体を噴出する第2のノズル20と、第1のノズルおよび第2のノズルより下流側で、かつ、第1の流体および第1の気体の流れの外側に開口部を有し、第1の流体と反応する第2の流体を噴出する第3のノズル30とを備える反応ノズル1とする。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200880107964.9A CN101801524B (zh) | 2007-09-20 | 2008-08-01 | 反应喷嘴、气相水解处理装置和气相水解处理方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007243652A JP5457627B2 (ja) | 2007-09-20 | 2007-09-20 | 反応ノズル、気相加水分解処理装置および気相加水分解処理方法 |
JP2007-243652 | 2007-09-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009037923A1 true WO2009037923A1 (ja) | 2009-03-26 |
Family
ID=40467747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/063912 WO2009037923A1 (ja) | 2007-09-20 | 2008-08-01 | 反応ノズル、気相加水分解処理装置および気相加水分解処理方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5457627B2 (ja) |
CN (1) | CN101801524B (ja) |
WO (1) | WO2009037923A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101941707A (zh) * | 2010-03-11 | 2011-01-12 | 赤峰盛森硅业科技发展有限公司 | 小分子烷烃燃烧制备气相二氧化硅的方法与装置 |
WO2018153463A1 (de) | 2017-02-23 | 2018-08-30 | Wacker Chemie Ag | Verfahren und vorrichtung zur hydrolyse einer verbindung |
US10068679B2 (en) * | 2013-07-04 | 2018-09-04 | Konica Minolta, Inc. | Scintillator panel and production method thereof |
Families Citing this family (17)
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JP5440766B2 (ja) | 2009-07-29 | 2014-03-12 | 日立工機株式会社 | インパクト工具 |
WO2012092520A1 (en) * | 2010-12-29 | 2012-07-05 | Ivanhoe Energy Inc. | Improved reactor feed nozzles |
CN102042603B (zh) * | 2010-12-31 | 2012-06-06 | 中国航天科技集团公司第六研究院第十一研究所 | 可调节高效废酸组合燃烧器 |
US8593634B1 (en) * | 2012-06-15 | 2013-11-26 | Larry Y Igarashi | Custom cosmetic blending machine |
JP2015521102A (ja) * | 2012-05-10 | 2015-07-27 | ザ ユニバーシティ オブ コネチカット | 触媒膜を作成する方法及び装置 |
CN106345622B (zh) * | 2016-11-22 | 2018-07-06 | 镇江市和云工业废水处置有限公司 | 一种废液焚烧系统喷液喷头 |
CN108126644B (zh) * | 2018-01-19 | 2023-08-29 | 德山化工(浙江)有限公司 | 氯硅烷液体中和处理装置及处理方法 |
KR101906495B1 (ko) * | 2018-03-21 | 2018-10-10 | (주)청도이엔피 | 미세먼지 조대화 장치 및 이를 이용하여 미세먼지를 제거하는 방법 |
CN108190898B (zh) * | 2018-03-27 | 2019-07-23 | 乐山师范学院 | 一种制备二氧化硅的反应器 |
CN108644600A (zh) * | 2018-05-18 | 2018-10-12 | 东莞安默琳机械制造技术有限公司 | 微量润滑喷嘴 |
JP7024646B2 (ja) * | 2018-07-24 | 2022-02-24 | 日本製鉄株式会社 | 超音波処理装置及びファインバブルの供給方法 |
JP6533859B1 (ja) * | 2018-10-29 | 2019-06-19 | 株式会社アサカ理研 | 炭酸リチウムの製造装置 |
JP7190338B2 (ja) * | 2018-11-21 | 2022-12-15 | 太平洋セメント株式会社 | 無機酸化物粒子の製造方法 |
DE102019209898A1 (de) * | 2019-07-04 | 2021-01-07 | Schmid Silicon Technology Gmbh | Vorrichtung und Verfahren zur Bildung von flüssigem Silizium |
KR102352239B1 (ko) * | 2020-05-07 | 2022-01-18 | 주식회사 나노브릭 | 시인성을 높이는 인쇄 장치 및 인쇄 방법과 이를 이용하여 인쇄된 인쇄물 |
CN113181852B (zh) * | 2021-05-25 | 2023-03-24 | 湖北理工学院 | 利用微反应器制备微粉化药物的方法及设备 |
CN113457869B (zh) * | 2021-09-01 | 2021-11-16 | 苏州好博医疗器械股份有限公司 | 一种蒸汽喷射设备的喷头保护装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05294634A (ja) * | 1991-08-28 | 1993-11-09 | United Technol Corp <Utc> | 酸化鉄粒子の製造方式及び製造装置 |
JPH06226085A (ja) * | 1993-02-03 | 1994-08-16 | Asahi Glass Co Ltd | 酸化物微粒子の製造装置および製造方法 |
JPH07101722A (ja) * | 1993-10-05 | 1995-04-18 | Ube Ind Ltd | 高純度マグネシア微粉末の製造方法 |
JP2005218937A (ja) * | 2004-02-04 | 2005-08-18 | Hosokawa Funtai Gijutsu Kenkyusho:Kk | 微粒子製造方法及び微粒子製造装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3480083B2 (ja) * | 1994-10-11 | 2003-12-15 | 信越化学工業株式会社 | 微細シリカの製造方法 |
DE19725955C1 (de) * | 1997-06-19 | 1999-01-21 | Heraeus Quarzglas | Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeignete Vorrichtung |
-
2007
- 2007-09-20 JP JP2007243652A patent/JP5457627B2/ja not_active Expired - Fee Related
-
2008
- 2008-08-01 CN CN200880107964.9A patent/CN101801524B/zh not_active Expired - Fee Related
- 2008-08-01 WO PCT/JP2008/063912 patent/WO2009037923A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05294634A (ja) * | 1991-08-28 | 1993-11-09 | United Technol Corp <Utc> | 酸化鉄粒子の製造方式及び製造装置 |
JPH06226085A (ja) * | 1993-02-03 | 1994-08-16 | Asahi Glass Co Ltd | 酸化物微粒子の製造装置および製造方法 |
JPH07101722A (ja) * | 1993-10-05 | 1995-04-18 | Ube Ind Ltd | 高純度マグネシア微粉末の製造方法 |
JP2005218937A (ja) * | 2004-02-04 | 2005-08-18 | Hosokawa Funtai Gijutsu Kenkyusho:Kk | 微粒子製造方法及び微粒子製造装置 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101941707A (zh) * | 2010-03-11 | 2011-01-12 | 赤峰盛森硅业科技发展有限公司 | 小分子烷烃燃烧制备气相二氧化硅的方法与装置 |
US10068679B2 (en) * | 2013-07-04 | 2018-09-04 | Konica Minolta, Inc. | Scintillator panel and production method thereof |
WO2018153463A1 (de) | 2017-02-23 | 2018-08-30 | Wacker Chemie Ag | Verfahren und vorrichtung zur hydrolyse einer verbindung |
KR20190122733A (ko) * | 2017-02-23 | 2019-10-30 | 와커 헤미 아게 | 화합물의 가수분해를 위한 장치 및 방법 |
US10730033B2 (en) | 2017-02-23 | 2020-08-04 | Wacker Chemie Ag | Method and device for the hydrolysis of a compound |
KR102268957B1 (ko) | 2017-02-23 | 2021-06-28 | 와커 헤미 아게 | 화합물의 가수분해를 위한 장치 및 방법 |
Also Published As
Publication number | Publication date |
---|---|
CN101801524B (zh) | 2014-04-16 |
CN101801524A (zh) | 2010-08-11 |
JP5457627B2 (ja) | 2014-04-02 |
JP2009072688A (ja) | 2009-04-09 |
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