WO2009022724A1 - 感光性樹脂組成物及びその積層体 - Google Patents

感光性樹脂組成物及びその積層体 Download PDF

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Publication number
WO2009022724A1
WO2009022724A1 PCT/JP2008/064585 JP2008064585W WO2009022724A1 WO 2009022724 A1 WO2009022724 A1 WO 2009022724A1 JP 2008064585 W JP2008064585 W JP 2008064585W WO 2009022724 A1 WO2009022724 A1 WO 2009022724A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
mass
laminate
weight
Prior art date
Application number
PCT/JP2008/064585
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
Yukimasa Baba
Original Assignee
Asahi Kasei E-Materials Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei E-Materials Corporation filed Critical Asahi Kasei E-Materials Corporation
Priority to KR1020107002027A priority Critical patent/KR101167537B1/ko
Priority to JP2009528148A priority patent/JP5221543B2/ja
Priority to CN200880102779.0A priority patent/CN101779165B/zh
Publication of WO2009022724A1 publication Critical patent/WO2009022724A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
PCT/JP2008/064585 2007-08-15 2008-08-14 感光性樹脂組成物及びその積層体 WO2009022724A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020107002027A KR101167537B1 (ko) 2007-08-15 2008-08-14 감광성 수지 조성물 및 그 적층체
JP2009528148A JP5221543B2 (ja) 2007-08-15 2008-08-14 感光性樹脂組成物及びその積層体
CN200880102779.0A CN101779165B (zh) 2007-08-15 2008-08-14 感光性树脂组合物及其层压体

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007211622 2007-08-15
JP2007-211622 2007-08-15

Publications (1)

Publication Number Publication Date
WO2009022724A1 true WO2009022724A1 (ja) 2009-02-19

Family

ID=40350777

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/064585 WO2009022724A1 (ja) 2007-08-15 2008-08-14 感光性樹脂組成物及びその積層体

Country Status (5)

Country Link
JP (1) JP5221543B2 (zh)
KR (1) KR101167537B1 (zh)
CN (1) CN101779165B (zh)
TW (1) TWI380130B (zh)
WO (1) WO2009022724A1 (zh)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013068936A (ja) * 2011-09-06 2013-04-18 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法
JP2013117581A (ja) * 2011-12-01 2013-06-13 Asahi Kasei E-Materials Corp 感光性樹脂組成物
CN103282829A (zh) * 2010-12-24 2013-09-04 旭化成电子材料株式会社 感光性树脂组合物
JP2015135482A (ja) * 2013-12-20 2015-07-27 旭化成イーマテリアルズ株式会社 感光性エレメント、及びその製造方法
KR20180019678A (ko) 2015-08-25 2018-02-26 아사히 가세이 가부시키가이샤 감광성 수지 조성물
WO2018225748A1 (ja) * 2017-06-08 2018-12-13 Jsr株式会社 組成物、硬化膜の製造方法及び電子部品
KR20190105142A (ko) 2015-09-11 2019-09-11 아사히 가세이 가부시키가이샤 감광성 수지 조성물

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103064253B (zh) * 2012-12-05 2015-04-08 北京化工大学常州先进材料研究院 一种含有吖啶类氧化物的感光性组合物

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002323761A (ja) * 2001-04-26 2002-11-08 Asahi Kasei Corp 感光性樹脂積層体
JP2006208734A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成方法
JP2007101940A (ja) * 2005-10-05 2007-04-19 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及び積層体
WO2007129589A1 (ja) * 2006-05-09 2007-11-15 Asahi Kasei Emd Corporation 感光性樹脂組成物
JP2007304536A (ja) * 2006-04-13 2007-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JP2008020629A (ja) * 2006-07-12 2008-01-31 Fujifilm Corp パターン形成材料、並びに、パターン形成装置及びパターン形成方法
WO2008015983A1 (en) * 2006-08-03 2008-02-07 Asahi Kasei Emd Corporation Photosensitive resin composition and laminate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070269738A1 (en) * 2004-07-30 2007-11-22 Hitachi Chemical Company, Ltd. Photosensitive Film, Photosensitive Film Laminate and Photosensitive Film Roll

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002323761A (ja) * 2001-04-26 2002-11-08 Asahi Kasei Corp 感光性樹脂積層体
JP2006208734A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成方法
JP2007101940A (ja) * 2005-10-05 2007-04-19 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及び積層体
JP2007304536A (ja) * 2006-04-13 2007-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
WO2007129589A1 (ja) * 2006-05-09 2007-11-15 Asahi Kasei Emd Corporation 感光性樹脂組成物
JP2008020629A (ja) * 2006-07-12 2008-01-31 Fujifilm Corp パターン形成材料、並びに、パターン形成装置及びパターン形成方法
WO2008015983A1 (en) * 2006-08-03 2008-02-07 Asahi Kasei Emd Corporation Photosensitive resin composition and laminate

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103282829A (zh) * 2010-12-24 2013-09-04 旭化成电子材料株式会社 感光性树脂组合物
CN103282829B (zh) * 2010-12-24 2016-08-17 旭化成株式会社 感光性树脂组合物
JP2013068936A (ja) * 2011-09-06 2013-04-18 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法
JP2013117581A (ja) * 2011-12-01 2013-06-13 Asahi Kasei E-Materials Corp 感光性樹脂組成物
JP2015135482A (ja) * 2013-12-20 2015-07-27 旭化成イーマテリアルズ株式会社 感光性エレメント、及びその製造方法
KR20180019678A (ko) 2015-08-25 2018-02-26 아사히 가세이 가부시키가이샤 감광성 수지 조성물
KR20190105142A (ko) 2015-09-11 2019-09-11 아사히 가세이 가부시키가이샤 감광성 수지 조성물
KR20220127382A (ko) 2015-09-11 2022-09-19 아사히 가세이 가부시키가이샤 감광성 수지 조성물
WO2018225748A1 (ja) * 2017-06-08 2018-12-13 Jsr株式会社 組成物、硬化膜の製造方法及び電子部品

Also Published As

Publication number Publication date
TW200921275A (en) 2009-05-16
JP5221543B2 (ja) 2013-06-26
CN101779165A (zh) 2010-07-14
KR20100027240A (ko) 2010-03-10
KR101167537B1 (ko) 2012-07-20
JPWO2009022724A1 (ja) 2010-11-18
TWI380130B (en) 2012-12-21
CN101779165B (zh) 2014-09-24

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