WO2008126526A1 - 感光性樹脂組成物および積層体 - Google Patents

感光性樹脂組成物および積層体 Download PDF

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Publication number
WO2008126526A1
WO2008126526A1 PCT/JP2008/054006 JP2008054006W WO2008126526A1 WO 2008126526 A1 WO2008126526 A1 WO 2008126526A1 JP 2008054006 W JP2008054006 W JP 2008054006W WO 2008126526 A1 WO2008126526 A1 WO 2008126526A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
mass
photosensitive resin
photosensitive
resist pattern
Prior art date
Application number
PCT/JP2008/054006
Other languages
English (en)
French (fr)
Inventor
Yosuke Hata
Original Assignee
Asahi Kasei E-Materials Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei E-Materials Corporation filed Critical Asahi Kasei E-Materials Corporation
Priority to US12/594,540 priority Critical patent/US8563223B2/en
Priority to KR1020097018908A priority patent/KR101128307B1/ko
Priority to JP2009508978A priority patent/JP4847582B2/ja
Priority to CN200880010895XA priority patent/CN101652715B/zh
Publication of WO2008126526A1 publication Critical patent/WO2008126526A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

　ドライフィルム作成時の相溶性が良好で、ｉ線、ｈ線両方の光源に対し同等の感度を示し、かつ解像度、及び密着性に優れ、アルカリ性水溶液によって現像し得る感光性樹脂組成物、該感光性樹脂組成物を用いた感光性樹脂積層体、該感光性樹脂積層体を用いて基板上へのレジストパターンの形成方法、及び該レジストパターンの用途を提供するために、（ａ）α，β－不飽和カルボキシル基含有単量体を共重合成分として含む、酸当量で１００～６００、重量平均分子量が５，０００～５００，０００の熱可塑性共重合体：２０～９０質量％、（ｂ）少なくとも一つの末端エチレン性不飽和基を有する付加重合性モノマー：５～７５質量％、（ｃ）トリアリールイミダゾリル二量体を含む光重合開始剤：０．０１～３０質量％、及び（ｄ）特定の一般式で示されるピラゾリン化合物：０．００１～１０質量％、を含有する感光性樹脂組成物を用いる。
PCT/JP2008/054006 2007-04-04 2008-03-06 感光性樹脂組成物および積層体 WO2008126526A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/594,540 US8563223B2 (en) 2007-04-04 2008-03-06 Photosensitive resin composition and laminate
KR1020097018908A KR101128307B1 (ko) 2007-04-04 2008-03-06 감광성 수지 조성물 및 적층체
JP2009508978A JP4847582B2 (ja) 2007-04-04 2008-03-06 感光性樹脂組成物および積層体
CN200880010895XA CN101652715B (zh) 2007-04-04 2008-03-06 感光性树脂组合物及层叠体

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007097916 2007-04-04
JP2007-097916 2007-04-04

Publications (1)

Publication Number Publication Date
WO2008126526A1 true WO2008126526A1 (ja) 2008-10-23

Family

ID=39863684

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054006 WO2008126526A1 (ja) 2007-04-04 2008-03-06 感光性樹脂組成物および積層体

Country Status (6)

Country Link
US (1) US8563223B2 (ja)
JP (1) JP4847582B2 (ja)
KR (1) KR101128307B1 (ja)
CN (1) CN101652715B (ja)
TW (1) TWI392967B (ja)
WO (1) WO2008126526A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009116632A1 (ja) * 2008-03-21 2009-09-24 旭化成イーマテリアルズ株式会社 感光性樹脂組成物、感光性樹脂積層体、レジストパターン形成方法、並びにプリント配線板、リードフレーム、半導体パッケージ及び凹凸基板の製造方法
JP2010197831A (ja) * 2009-02-26 2010-09-09 Hitachi Chem Co Ltd 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2011150137A (ja) * 2010-01-21 2011-08-04 Asahi Kasei E-Materials Corp 光重合性樹脂組成物、光重合性樹脂積層体、レジストパターンの形成方法、並びに回路基板、リードフレーム及び半導体パッケージの製造方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY179988A (en) * 2010-12-24 2020-11-19 Asahi Kasei E Mat Corporation Photosensitive resin composition
KR102281035B1 (ko) * 2012-11-20 2021-07-22 쇼와덴코머티리얼즈가부시끼가이샤 감광성 수지 조성물, 감광성 엘리먼트, 레지스터 패턴의 형성 방법 및 프린트 배선판의 제조 방법
JP6207943B2 (ja) * 2013-09-19 2017-10-04 旭化成株式会社 感光性樹脂組成物及び感光性樹脂積層体
KR102582577B1 (ko) * 2014-05-23 2023-09-25 가부시끼가이샤 레조낙 레지스트 패턴의 형성 방법, 프린트 배선판의 제조 방법, 투영 노광용 감광성 수지 조성물 및 감광성 엘리먼트
CN115524922A (zh) * 2017-03-29 2022-12-27 旭化成株式会社 感光性树脂组合物
KR102570709B1 (ko) * 2017-11-06 2023-08-24 아사히 가세이 가부시키가이샤 감광성 수지 적층체 및 레지스트 패턴의 제조 방법
MY193800A (en) * 2018-01-18 2022-10-27 Asahi Chemical Ind Photosensitive resin laminate and method for manufacturing same
US20210318612A1 (en) * 2021-06-24 2021-10-14 Intel Corporation Composite dry film resist for photolithography

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005325030A (ja) * 2004-05-12 2005-11-24 Nippon Kagaku Kogyosho:Kk 蛍光材料
JP2006241086A (ja) * 2005-03-04 2006-09-14 Nippon Kagaku Kogyosho:Kk 新規な光線吸収材料
WO2006126480A1 (ja) * 2005-05-23 2006-11-30 Hitachi Chemical Company, Ltd. 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
WO2007010614A1 (ja) * 2005-07-22 2007-01-25 Asahi Kasei Emd Corporation 感光性樹脂組成物及び積層体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4009700A1 (de) * 1990-03-27 1991-10-02 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP4395384B2 (ja) 2004-01-28 2010-01-06 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及び積層体
JP4223470B2 (ja) 2004-12-03 2009-02-12 株式会社半導体エネルギー研究所 ピッチｘの決定方法、半導体装置の作製方法
JP2007004138A (ja) 2005-05-23 2007-01-11 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005325030A (ja) * 2004-05-12 2005-11-24 Nippon Kagaku Kogyosho:Kk 蛍光材料
JP2006241086A (ja) * 2005-03-04 2006-09-14 Nippon Kagaku Kogyosho:Kk 新規な光線吸収材料
WO2006126480A1 (ja) * 2005-05-23 2006-11-30 Hitachi Chemical Company, Ltd. 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
WO2007010614A1 (ja) * 2005-07-22 2007-01-25 Asahi Kasei Emd Corporation 感光性樹脂組成物及び積層体

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009116632A1 (ja) * 2008-03-21 2009-09-24 旭化成イーマテリアルズ株式会社 感光性樹脂組成物、感光性樹脂積層体、レジストパターン形成方法、並びにプリント配線板、リードフレーム、半導体パッケージ及び凹凸基板の製造方法
US8361697B2 (en) 2008-03-21 2013-01-29 Asahi Kasei E-Materials Corporation Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board
CN103076718B (zh) * 2008-03-21 2015-01-21 旭化成电子材料株式会社 感光性树脂组合物、感光性树脂层压体、抗蚀图案形成方法、以及印刷线路板、引线框、半导体封装体和凹凸基板的制造方法
JP2010197831A (ja) * 2009-02-26 2010-09-09 Hitachi Chem Co Ltd 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2011150137A (ja) * 2010-01-21 2011-08-04 Asahi Kasei E-Materials Corp 光重合性樹脂組成物、光重合性樹脂積層体、レジストパターンの形成方法、並びに回路基板、リードフレーム及び半導体パッケージの製造方法

Also Published As

Publication number Publication date
JPWO2008126526A1 (ja) 2010-07-22
JP4847582B2 (ja) 2011-12-28
KR20100009535A (ko) 2010-01-27
CN101652715B (zh) 2012-05-02
US20100119977A1 (en) 2010-05-13
TW200903159A (en) 2009-01-16
KR101128307B1 (ko) 2012-04-12
TWI392967B (zh) 2013-04-11
US8563223B2 (en) 2013-10-22
CN101652715A (zh) 2010-02-17

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