WO2008146542A1 - モールド、その製造方法および転写微細パターンを有する基材の製造方法 - Google Patents

モールド、その製造方法および転写微細パターンを有する基材の製造方法 Download PDF

Info

Publication number
WO2008146542A1
WO2008146542A1 PCT/JP2008/056984 JP2008056984W WO2008146542A1 WO 2008146542 A1 WO2008146542 A1 WO 2008146542A1 JP 2008056984 W JP2008056984 W JP 2008056984W WO 2008146542 A1 WO2008146542 A1 WO 2008146542A1
Authority
WO
WIPO (PCT)
Prior art keywords
fine pattern
mold
transparent substrate
intermediate layer
production
Prior art date
Application number
PCT/JP2008/056984
Other languages
English (en)
French (fr)
Inventor
Kentaro Tsunozaki
Yasuhide Kawaguchi
Yoshihiko Sakane
Shuichi Shoji
Jun Mizuno
Shingo Kataza
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Priority to CN200880017133A priority Critical patent/CN101678572A/zh
Priority to EP08740087A priority patent/EP2172320A4/en
Publication of WO2008146542A1 publication Critical patent/WO2008146542A1/ja
Priority to US12/542,810 priority patent/US20090302507A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/005—Surface shaping of articles, e.g. embossing; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/40—Plastics, e.g. foam or rubber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Micromachines (AREA)

Abstract

　光透過性、離型性、機械的強度、寸法安定性、高精度な微細パターンを有し、微細パターンの変形が少ないモールド；モールドの微細パターンを寸法精度よく転写でき、転写微細パターンの変形が少ない転写微細パターンを有する基材の製造方法を提供する。 　中間層（Ｃ）１４が形成された表面に官能基（ｘ）に基づく化学結合を有し、含フッ素重合体（Ｉ）の線膨張係数との線膨張係数の差（絶対値）が３０ｐｐｍ／°C未満であり、熱変形温度が１００～３００°Cである透明基体（Ａ）１２、主鎖に含フッ素脂肪族環構造を有し、官能基（ｘ）と反応性の反応性基（ｙ）を有する含フッ素重合体（II）からなる中間層（Ｃ）１４、主鎖に含フッ素脂肪族環構造を有し、反応性基（ｙ）を実質的に有しない含フッ素重合体（Ｉ）からなり、表面に微細パターン１８を有する表面層（Ｂ）１６を有するモールド１０。
PCT/JP2008/056984 2007-05-24 2008-04-09 モールド、その製造方法および転写微細パターンを有する基材の製造方法 WO2008146542A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN200880017133A CN101678572A (zh) 2007-05-24 2008-04-09 模具、其制造方法及具有转印微细图案的基材的制造方法
EP08740087A EP2172320A4 (en) 2007-05-24 2008-04-09 MOLDING TOOL, METHOD FOR PRODUCING THE MOLDING TOOL AND METHOD FOR PRODUCING A SUBSTRATE WITH REPRODUCTION OF A FINE PATTERN
US12/542,810 US20090302507A1 (en) 2007-05-24 2009-08-18 Mold, process for its production, and process for producing base material having transferred micropattern

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007137699 2007-05-24
JP2007-137699 2007-05-24

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/542,810 Continuation US20090302507A1 (en) 2007-05-24 2009-08-18 Mold, process for its production, and process for producing base material having transferred micropattern

Publications (1)

Publication Number Publication Date
WO2008146542A1 true WO2008146542A1 (ja) 2008-12-04

Family

ID=40074813

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/056984 WO2008146542A1 (ja) 2007-05-24 2008-04-09 モールド、その製造方法および転写微細パターンを有する基材の製造方法

Country Status (7)

Country Link
US (1) US20090302507A1 (ja)
EP (1) EP2172320A4 (ja)
JP (1) JP2009001002A (ja)
KR (1) KR20100014832A (ja)
CN (1) CN101678572A (ja)
TW (1) TW200911498A (ja)
WO (1) WO2008146542A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101061555B1 (ko) 2009-08-25 2011-09-01 한국기계연구원 나노 임프린트용 템플릿 및 이의 제조 방법
WO2012108409A1 (ja) * 2011-02-10 2012-08-16 株式会社日立ハイテクノロジーズ 微細構造転写装置及び微細構造転写方法
JP2013001091A (ja) * 2011-06-21 2013-01-07 Konica Minolta Advanced Layers Inc 光学素子の製造方法

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101652680B1 (ko) * 2008-05-29 2016-08-31 아사히 가라스 가부시키가이샤 광경화성 조성물 및 표면에 미세 패턴을 갖는 성형체의 제조 방법
JP2010267357A (ja) * 2009-05-18 2010-11-25 Hitachi High-Technologies Corp パターンドメディアの製造方法及び製造装置
EP2439050B1 (en) * 2009-06-05 2016-11-02 Asahi Kasei Kabushiki Kaisha Transfer mold and method for producing transfer mold
JP5329661B2 (ja) * 2009-06-08 2013-10-30 ニッタ株式会社 インプリント用モールドおよびその製造方法
JPWO2011016549A1 (ja) * 2009-08-07 2013-01-17 綜研化学株式会社 インプリント用樹脂製モールドおよびその製造方法
JP2011194721A (ja) * 2010-03-19 2011-10-06 Waseda Univ 金型製造装置
JP5687857B2 (ja) 2010-07-29 2015-03-25 株式会社日立ハイテクノロジーズ ナノインプリント用樹脂スタンパ及びこれを使用したナノインプリント装置
JP5658001B2 (ja) * 2010-11-11 2015-01-21 旭化成イーマテリアルズ株式会社 樹脂モールド
JP2012143915A (ja) * 2011-01-10 2012-08-02 Scivax Kk インプリント用型
CN102303841A (zh) * 2011-07-11 2012-01-04 西安交通大学 一种微纳复合结构的微喷印与介电泳力压印成形方法
JP5772509B2 (ja) * 2011-10-27 2015-09-02 住友ベークライト株式会社 成形体の製造方法
EP2596936B1 (en) * 2011-11-24 2015-09-09 ABB Research Ltd. Mold and method for producing shaped articles from a UV-curable composition
JP2013136181A (ja) * 2011-12-28 2013-07-11 Hoya Corp インプリント用モールドブランクおよびインプリント用モールド
CN104122747A (zh) * 2014-08-08 2014-10-29 青岛理工大学 一种电渗驱动纳米压印装置及其工作方法
US10034519B2 (en) 2016-06-16 2018-07-31 Adidas Ag UV curable lattice microstructure for footwear
WO2018173930A1 (ja) * 2017-03-23 2018-09-27 Ａｇｃ株式会社 インプリント用硬化性組成物、レプリカモールドおよびその製造方法
US11122847B2 (en) 2017-04-24 2021-09-21 Nike, Inc. Article with UV radiation curable material adhered to textile and method of making the same
US20180304499A1 (en) 2017-04-24 2018-10-25 Nike, Inc. Transparent tooling for uv radiation curable rubber
US11136475B2 (en) 2017-04-24 2021-10-05 Nike, Inc. Articles and components with UV radiation curable elastomeric materials and methods of making the same
CN118283963A (zh) * 2023-07-03 2024-07-02 荣耀终端有限公司 结构件、结构件的制备方法和电子设备

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60240713A (ja) 1984-05-10 1985-11-29 イー・アイ・デユポン・ドウ・ヌムール・アンド・カンパニー 溶融加工しうるテトラフルオロエチレン共重合体とその製法
JPH04226177A (ja) 1990-06-01 1992-08-14 Asahi Glass Co Ltd コーティング用含フッ素重合体組成物およびその用途
JP2002539604A (ja) 1999-03-11 2002-11-19 ボード・オヴ・リージェンツ，ザ・ユニヴァーシティ・オヴ・テキサス・システム 段付き鋳張り捺印式リソグラフィー
JP2004504718A (ja) 2000-07-18 2004-02-12 ナノネックス　コーポレーション 流体圧力インプリント・リソグラフィ
JP2005515617A (ja) 2001-10-11 2005-05-26 ブルーワー サイエンス アイ エヌ シー． 非粘着性のモールドを使用する、パターン化された構造の複製
WO2006059580A1 (ja) 2004-11-30 2006-06-08 Asahi Glass Company, Limited モールド、および転写微細パターンを有する基材の製造方法
JP2006297639A (ja) * 2005-04-15 2006-11-02 Ricoh Co Ltd 光ディスク基板成形用スタンパ
JP2007137699A (ja) 2005-11-16 2007-06-07 Epson Imaging Devices Corp ガラス基板の切断方法
JP2007268831A (ja) * 2006-03-31 2007-10-18 Dainippon Printing Co Ltd モールド及びモールドの作製方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004006019A1 (en) * 2002-07-08 2004-01-15 Obducat Ab A method and a stamp for transferring a pattern to a substrate
US20050167894A1 (en) * 2002-10-08 2005-08-04 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
CN101427182B (zh) * 2004-04-27 2011-10-19 伊利诺伊大学评议会 用于软光刻法的复合构图设备

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60240713A (ja) 1984-05-10 1985-11-29 イー・アイ・デユポン・ドウ・ヌムール・アンド・カンパニー 溶融加工しうるテトラフルオロエチレン共重合体とその製法
JPH04226177A (ja) 1990-06-01 1992-08-14 Asahi Glass Co Ltd コーティング用含フッ素重合体組成物およびその用途
JP2002539604A (ja) 1999-03-11 2002-11-19 ボード・オヴ・リージェンツ，ザ・ユニヴァーシティ・オヴ・テキサス・システム 段付き鋳張り捺印式リソグラフィー
JP2004504718A (ja) 2000-07-18 2004-02-12 ナノネックス　コーポレーション 流体圧力インプリント・リソグラフィ
JP2005515617A (ja) 2001-10-11 2005-05-26 ブルーワー サイエンス アイ エヌ シー． 非粘着性のモールドを使用する、パターン化された構造の複製
WO2006059580A1 (ja) 2004-11-30 2006-06-08 Asahi Glass Company, Limited モールド、および転写微細パターンを有する基材の製造方法
JP2006297639A (ja) * 2005-04-15 2006-11-02 Ricoh Co Ltd 光ディスク基板成形用スタンパ
JP2007137699A (ja) 2005-11-16 2007-06-07 Epson Imaging Devices Corp ガラス基板の切断方法
JP2007268831A (ja) * 2006-03-31 2007-10-18 Dainippon Printing Co Ltd モールド及びモールドの作製方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2172320A4

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101061555B1 (ko) 2009-08-25 2011-09-01 한국기계연구원 나노 임프린트용 템플릿 및 이의 제조 방법
WO2012108409A1 (ja) * 2011-02-10 2012-08-16 株式会社日立ハイテクノロジーズ 微細構造転写装置及び微細構造転写方法
JP2012169313A (ja) * 2011-02-10 2012-09-06 Hitachi High-Technologies Corp 微細構造転写装置及び微細構造転写方法
US8770965B2 (en) 2011-02-10 2014-07-08 Hitachi High-Technologies Corporation Device and method for transferring micro structure
JP2013001091A (ja) * 2011-06-21 2013-01-07 Konica Minolta Advanced Layers Inc 光学素子の製造方法

Also Published As

Publication number Publication date
CN101678572A (zh) 2010-03-24
TW200911498A (en) 2009-03-16
EP2172320A1 (en) 2010-04-07
JP2009001002A (ja) 2009-01-08
US20090302507A1 (en) 2009-12-10
KR20100014832A (ko) 2010-02-11
EP2172320A4 (en) 2011-07-06

Similar Documents

Publication Publication Date Title
WO2008146542A1 (ja) モールド、その製造方法および転写微細パターンを有する基材の製造方法
WO2008102487A1 (ja) 凹凸パターン形成シートおよびその製造方法
TW200628399A (en) Mold and process for production of substrates having transferred micropatterns thereon
CN104379529B (zh) 玻璃陶瓷制品及制造方法
MY139728A (en) Stamp, method of its fabrication and use of it
WO2009041551A1 (ja) マスクブランク、及びインプリント用モールドの製造方法
ATE524837T1 (de) Verfahren zur herstellung eines lichtemittierenden bauelements
TW200712017A (en) Method for manufacturing optical glass element
WO2010023853A3 (ja) 薄膜付きガラス基板の製造方法
WO2008116335A3 (en) Method of producing a wafer scale package
DE602008001879D1 (de) Verfahren zur herstellung leitfähiger folien sowie in diesem verfahren hergestellte artikel
WO2008087837A1 (ja) ガラス基板成形用金型、ガラス基板の製造方法、情報記録媒体用ガラス基板の製造方法及び情報記録媒体の製造方法
TW200745228A (en) Method for producing product having stain-proofing layer and product having stain-proofing layer
ATE556433T1 (de) Herstellungsverfahren einer verbundstruktur mit einer stabilen oxidbindungsschicht
SG151235A1 (en) Glass substrate for magnetic disc and manufacturing method thereof
CN104650376A (zh) 一种以耐高温聚合物薄膜为基底的菲涅尔透镜制作方法
TW200625302A (en) Replication of a high-density relief structure
WO2003086958A3 (de) Verfahren zur herstellung eines erzeugnisses mit einer strukturierten oberfläche
US20130241090A1 (en) Method of manufacturing an optical element
WO2008146696A1 (ja) 二軸延伸熱可塑性樹脂フィルムの製造方法及び光学フィルム用ベースフィルム
WO2008075270A3 (en) A lens structure and manufacturing method, and the manufacture of shaped polymer articles
KR100993395B1 (ko) 광결정이 형성된 합성수지판 제조 방법 및 그 방법으로 제조된 합성수지판
TW200613108A (en) Method of manufacturing cured film applied to in-mold decoration injection molding
TW200717872A (en) LED wafer with light extracting layer and method for its manufacture
CN114311633A (zh) 一种纹理膜片的内凹贴合手机盖制备方法

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880017133.2

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08740087

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2008740087

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1020097017576

Country of ref document: KR

NENP Non-entry into the national phase

Ref country code: DE