WO2010023853A3 - 薄膜付きガラス基板の製造方法 - Google Patents

薄膜付きガラス基板の製造方法 Download PDF

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Publication number
WO2010023853A3
WO2010023853A3 PCT/JP2009/004014 JP2009004014W WO2010023853A3 WO 2010023853 A3 WO2010023853 A3 WO 2010023853A3 JP 2009004014 W JP2009004014 W JP 2009004014W WO 2010023853 A3 WO2010023853 A3 WO 2010023853A3
Authority
WO
WIPO (PCT)
Prior art keywords
glass substrate
thin film
manufacturing
primary face
plastic deformation
Prior art date
Application number
PCT/JP2009/004014
Other languages
English (en)
French (fr)
Other versions
WO2010023853A2 (ja
Inventor
岸本暁
田部昌志
今村努
Original Assignee
日本電気硝子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気硝子株式会社 filed Critical 日本電気硝子株式会社
Priority to US13/061,187 priority Critical patent/US20110154861A1/en
Priority to CN2009801342022A priority patent/CN102137820A/zh
Publication of WO2010023853A2 publication Critical patent/WO2010023853A2/ja
Publication of WO2010023853A3 publication Critical patent/WO2010023853A3/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/02—Re-forming glass sheets
    • C03B23/023—Re-forming glass sheets by bending
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/02—Re-forming glass sheets
    • C03B23/023—Re-forming glass sheets by bending
    • C03B23/025—Re-forming glass sheets by bending by gravity
    • C03B23/0252—Re-forming glass sheets by bending by gravity by gravity only, e.g. sagging
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection

Abstract

　反りの少ない薄膜付きガラス基板を容易に製造することができる薄膜付きガラス基板の製造方法を提供する。　薄膜形成後の最終状態においてガラス基板１０の主面１０ａが平坦となるように、ガラス基板１０を塑性変形させることによりガラス基板１０の主面１０ａを湾曲した形状とする変形工程と、塑性変形させたガラス基板１０の主面１０ａ上に薄膜１１を形成する薄膜形成工程とを行う。
PCT/JP2009/004014 2008-09-01 2009-08-21 薄膜付きガラス基板の製造方法 WO2010023853A2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US13/061,187 US20110154861A1 (en) 2008-09-01 2009-08-21 Manufacturing method for glass substrate with thin film
CN2009801342022A CN102137820A (zh) 2008-09-01 2009-08-21 带有薄膜的玻璃基板的制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008-223752 2008-09-01
JP2008223752A JP5304112B2 (ja) 2008-09-01 2008-09-01 薄膜付きガラス基板の製造方法

Publications (2)

Publication Number Publication Date
WO2010023853A2 WO2010023853A2 (ja) 2010-03-04
WO2010023853A3 true WO2010023853A3 (ja) 2010-04-08

Family

ID=41722053

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2009/004014 WO2010023853A2 (ja) 2008-09-01 2009-08-21 薄膜付きガラス基板の製造方法

Country Status (6)

Country Link
US (1) US20110154861A1 (ja)
JP (1) JP5304112B2 (ja)
KR (1) KR101614179B1 (ja)
CN (1) CN102137820A (ja)
TW (1) TWI432386B (ja)
WO (1) WO2010023853A2 (ja)

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JP2011230944A (ja) * 2010-04-26 2011-11-17 Nippon Electric Glass Co Ltd 光学フィルム及びその製造方法
JP5234201B2 (ja) * 2011-03-23 2013-07-10 株式会社ニコン 撮像ユニットおよび撮像装置
KR102149213B1 (ko) 2012-08-31 2020-08-31 코닝 인코포레이티드 강화된 얇은 유리-중합체 라미네이트
JP6378884B2 (ja) * 2014-01-24 2018-08-22 株式会社アルバック 成膜方法
CN113725235A (zh) * 2015-01-14 2021-11-30 康宁股份有限公司 玻璃基板和包括所述玻璃基板的显示设备
CN107428583B (zh) 2015-03-20 2020-05-29 肖特玻璃科技(苏州)有限公司 成形玻璃制品和用于生产这种成形玻璃制品的方法
TWI673240B (zh) * 2016-01-28 2019-10-01 積創科技股份有限公司 具有弧面結構之玻璃及其製造方法
KR102233720B1 (ko) 2016-03-17 2021-03-30 코닝 인코포레이티드 굽힘 가능한 전자 소자 모듈들, 물품들 및 이를 형성하는 본딩 방법들
TWI655160B (zh) * 2016-05-19 2019-04-01 美商蘋果公司 非對稱化學強化
US10899660B2 (en) 2016-05-19 2021-01-26 Apple Inc. Asymmetric chemical strengthening
CN106565111A (zh) * 2016-10-27 2017-04-19 广东星弛光电科技有限公司 一种3d玻璃视窗防护屏的复合印刷制备工艺
US11286201B2 (en) * 2017-01-31 2022-03-29 AGC Inc. Cover glass and glass laminate
TWI770110B (zh) 2017-03-30 2022-07-11 日商日本碍子股份有限公司 暫時固定基板及電子元件的暫時固定方法
TW201837009A (zh) 2017-03-30 2018-10-16 日商日本碍子股份有限公司 暫時固定基板及電子元件的模塑方法
JP2020203801A (ja) * 2017-09-01 2020-12-24 Ａｇｃ株式会社 膜付きガラス基板の製造方法、膜付きガラス基板、および膜の除去方法
US11639307B2 (en) 2018-07-13 2023-05-02 Apple Inc. Patterned asymmetric chemical strengthening
US11447416B2 (en) 2018-12-20 2022-09-20 Apple Inc. Strengthened covers for electronic devices
CN113544819B (zh) * 2019-03-22 2024-01-05 日本碍子株式会社 预固定基板、复合基板以及电子元件的剥离方法
CN114716139A (zh) * 2022-04-19 2022-07-08 安徽精卓光显技术有限责任公司 玻璃盖板的制备方法及玻璃盖板、屏幕及电子设备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1180928A (ja) * 1997-09-01 1999-03-26 Ricoh Co Ltd 薄膜形成方法および装置
JP2006528932A (ja) * 2003-05-19 2006-12-28 サン−ゴバン グラス フランス 複数の支持体上でのガラス要素の重力式曲げ
JP2007193132A (ja) * 2006-01-19 2007-08-02 Seiko Epson Corp 光学部品の製造方法
JP2007334087A (ja) * 2006-06-16 2007-12-27 Epson Toyocom Corp 光学部品の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
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GB1309333A (en) * 1970-01-19 1973-03-07 Glaverbel Process for bending glass
US20060087739A1 (en) * 2004-10-21 2006-04-27 Jds Uniphase Corporation Low net stress multilayer thin film optical filter
JP2007241018A (ja) * 2006-03-10 2007-09-20 Epson Toyocom Corp 全反射ミラー

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1180928A (ja) * 1997-09-01 1999-03-26 Ricoh Co Ltd 薄膜形成方法および装置
JP2006528932A (ja) * 2003-05-19 2006-12-28 サン−ゴバン グラス フランス 複数の支持体上でのガラス要素の重力式曲げ
JP2007193132A (ja) * 2006-01-19 2007-08-02 Seiko Epson Corp 光学部品の製造方法
JP2007334087A (ja) * 2006-06-16 2007-12-27 Epson Toyocom Corp 光学部品の製造方法

Also Published As

Publication number Publication date
JP2010058989A (ja) 2010-03-18
TW201022168A (en) 2010-06-16
US20110154861A1 (en) 2011-06-30
KR101614179B1 (ko) 2016-04-20
KR20110073425A (ko) 2011-06-29
TWI432386B (zh) 2014-04-01
CN102137820A (zh) 2011-07-27
WO2010023853A2 (ja) 2010-03-04
JP5304112B2 (ja) 2013-10-02

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