WO2008131997A1 - Elektrode für plasmaerzeuger - Google Patents
Elektrode für plasmaerzeuger Download PDFInfo
- Publication number
- WO2008131997A1 WO2008131997A1 PCT/EP2008/053507 EP2008053507W WO2008131997A1 WO 2008131997 A1 WO2008131997 A1 WO 2008131997A1 EP 2008053507 W EP2008053507 W EP 2008053507W WO 2008131997 A1 WO2008131997 A1 WO 2008131997A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrode
- slot
- electrode according
- plasma
- closed
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2240/00—Testing
- H05H2240/10—Testing at atmospheric pressure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/30—Medical applications
- H05H2245/34—Skin treatments, e.g. disinfection or wound treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2277/00—Applications of particle accelerators
- H05H2277/10—Medical devices
- H05H2277/11—Radiotherapy
Definitions
- the invention relates to an electrode for a plasma generator for generating plasmas at atmospheric pressure or atmospheric pressures by excitation with microwaves.
- Plasmas are used in many sedimentation, etching and layering processes.
- vacuum-operated plasma reactors Apart from the costs associated with vacuum-operated plasma reactors, the use of vacuum is often prohibitive in this area, so the use of plasma at atmospheric pressure is a prerequisite. Treatment of vacuum-sensitive materials such as certain polymers or delicate foods is also possible with low temperature plasmas at atmospheric or near-atmospheric pressure. For the plasma generator power supplies must be kept at high power, the high power is only needed for ignition.
- the invention has for its object to provide an electrode for a plasma generator, which ignites safely especially in the near-atmospheric pressure range at low power and is able to generate a plasma with sufficiently high density, so that a penetrating gas flow is activated with high efficiency.
- the electrode consists of a metal strip, in the longitudinal direction of at least one slot is introduced with a length which is one or more times a quarter of the wavelength of the open circuit voltage of the microwave, so that form at least two partial electrodes, the voltage supply to the sub-electrodes in the region of or closed slot ends takes place.
- the electrode according to the invention taking into account the excitation frequency during idling, there is a geometrical point of high field strength at which the plasma ignites.
- the field distribution in the electrode structure changes as a result of the plasma impedance, and the plasma migrates to another location or widens within the electrode slot and spreads out in a larger volume.
- the structure of the electrode exploits frequency-dependent, resonant properties of the structure and generates at a defined location a high electric field strength, at which the ignition of the plasma is made possible.
- the strong field typically results from at least two electrodes that are physically close to each other. If electric power in the form of microwaves is introduced into the structure at a suitable point, a high alternating potential difference arises at the end of the slot. Due to the short distance between the opposing electrodes, the resulting field strength is very high. At the point of the highest electric field, the ignition of a plasma at atmospheric pressure or at atmospheric pressure is possible with sufficiently high feed power. After ignition, only a fraction of the required ignition power is required to operate.
- the frequency of the feed-in power depends on the physical dimensions of the electrode. In particular, the length of the slot has a significant influence on the frequency and is approximately the multiple of the quarter wavelength.
- the feed takes place in the case of a unilaterally open slot, for example by a coaxial line, wherein the Inner conductor is guided on one side of the slot to the point in which there is approximately in idle adjustment.
- the electrode is in this case U-shaped or bent circular.
- the feed takes place in the latter case, for example, by a coaxial line, wherein the inner conductor branches T-shaped and is guided on both sides in the region of the two slot ends to the electrode.
- the electrode is expediently surrounded by a shielding housing in which there is an opening for feeding and a further opening for removing the process gases activated by the plasma.
- the openings should be of such size that the radiation of microwave energy remains within the permissible range.
- the electrode is preferably powered by a free-running oscillator circuit, the electrode itself being the frequency-determining element.
- the oscillator circuit can be constructed integrated with the electrode.
- the electrode may be preferred for medical treatment purposes, but especially for the treatment of human skin be used for modifying the surface energy of workpieces or for plasma-chemical deposition of layers.
- Fig. 2 shows an example of a closed design of an electrode of a resonator
- Fig. 3 embedded the resonator of FIG. 2 in a housing.
- Fig. 1 shows an example of a resonator of a plasma generator.
- a slot 2 is introduced in a metal strip 1, which serves as an electrode.
- the slot 2 separates the sheet metal strip 1 into two sub-electrodes 3, which generate a high electric field strength during operation with a high-frequency voltage which is conducted via the inner conductor 4 of a coaxial line 5 to the sheet metal strip 1.
- the slot 2 is typically ⁇ / 4 long. In a real running design for a supply voltage with a frequency of 2 GHz, this resulted in a slot 2 of 37.5 mm. Its width was 0.1 mm.
- the inner conductor 4 of the coaxial line 5 is guided in the region of the slot end to the outside edge of the metal strip 1, to a point at the resonance is generated with an oscillator.
- the outer conductor 6 of the coaxial line 5 is guided on the opposite side of the metal strip 1 at its outer edge.
- Fig. 2 shows an electrode of a U-shaped bent sheet metal strip 1 with a slot 2.
- the slot 2 is in this case ⁇ / 2 long.
- the inner conductor 4 of the coaxial line 5 is branched in a T-shape and guided on the two opposite sides of the sheet metal strip 1 in the region of the slot end.
- the outer conductor 6 is connected to the opposite sides of the sheet metal strip 1.
- the highest field strength arises in the middle of the slot 2, that is to say at the front edge of the metal strip 1. After ignition of the plasma at this point, the plasma expands at least over the entire area of the front edge of the sheet metal strip 1.
- Fig. 3 shows schematically the structure of a completed by a housing 7 resonator.
- the housing 7 (shown here in the quasi-open state) has a reflective effect and thus prevents electromagnetic radiation to the outside.
- a gas feed line 8 is provided in the rear housing wall and a slot-shaped gas outlet 9 is provided in the front wall.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT08718192T ATE521217T1 (de) | 2007-04-27 | 2008-03-25 | Elektrode für plasmaerzeuger |
JP2010504600A JP5683262B2 (ja) | 2007-04-27 | 2008-03-25 | プラズマ発生器用の電極 |
US12/451,139 US8339047B2 (en) | 2007-04-27 | 2008-03-25 | Electrode for a plasma generator |
EP08718192A EP2143306B1 (de) | 2007-04-27 | 2008-03-25 | Elektrode für plasmaerzeuger |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007020419.3 | 2007-04-27 | ||
DE102007020419A DE102007020419A1 (de) | 2007-04-27 | 2007-04-27 | Elektrode für Plasmaerzeuger |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008131997A1 true WO2008131997A1 (de) | 2008-11-06 |
Family
ID=39534997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2008/053507 WO2008131997A1 (de) | 2007-04-27 | 2008-03-25 | Elektrode für plasmaerzeuger |
Country Status (7)
Country | Link |
---|---|
US (1) | US8339047B2 (de) |
EP (1) | EP2143306B1 (de) |
JP (1) | JP5683262B2 (de) |
KR (1) | KR101555385B1 (de) |
AT (1) | ATE521217T1 (de) |
DE (1) | DE102007020419A1 (de) |
WO (1) | WO2008131997A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3042091B1 (fr) * | 2015-10-05 | 2017-10-27 | Sairem Soc Pour L'application Ind De La Rech En Electronique Et Micro Ondes | Dispositif elementaire d’application d’une energie micro-onde avec applicateur coaxial |
KR102190524B1 (ko) * | 2020-02-24 | 2020-12-14 | 이엠코어텍 주식회사 | 저전압 플라즈마 이오나이저 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3848196A (en) * | 1973-11-08 | 1974-11-12 | Rca Corp | Broadband trapatt diode amplifier |
WO2003039214A1 (en) * | 2001-10-26 | 2003-05-08 | Michigan State University | Improved microwave stripline applicators |
WO2004062326A2 (en) * | 2002-12-30 | 2004-07-22 | Northeastern University | Low power plasma generator |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6011417B2 (ja) * | 1979-10-23 | 1985-03-26 | 株式会社東芝 | ホロ−カソ−ド放電装置 |
JPS6087200U (ja) * | 1983-11-15 | 1985-06-15 | 新日本無線株式会社 | マイクロ波プラズマ発生装置 |
JPS62115700A (ja) * | 1985-11-15 | 1987-05-27 | キヤノン株式会社 | 気相励起装置 |
DE3830430A1 (de) * | 1987-09-11 | 1989-03-23 | Japan Synthetic Rubber Co Ltd | Verfahren zur herstellung von ueberzuegen |
JPH01109699A (ja) * | 1987-10-23 | 1989-04-26 | Japan Synthetic Rubber Co Ltd | プラズマ処理装置 |
JPH0719674B2 (ja) * | 1992-06-24 | 1995-03-06 | 徳芳 佐藤 | マイクロ波放電反応装置の電極装置 |
US5537004A (en) * | 1993-03-06 | 1996-07-16 | Tokyo Electron Limited | Low frequency electron cyclotron resonance plasma processor |
US5838111A (en) * | 1996-02-27 | 1998-11-17 | Matsushita Electric Industrial Co., Ltd. | Plasma generator with antennas attached to top electrodes |
WO1999048135A1 (fr) * | 1998-03-16 | 1999-09-23 | Matsushita Electric Industrial Co., Ltd. | Appareil d'alimentation en energie de decharge sans electrodes et lampe a decharge sans electrodes |
US6350417B1 (en) * | 1998-11-05 | 2002-02-26 | Sharper Image Corporation | Electrode self-cleaning mechanism for electro-kinetic air transporter-conditioner devices |
JP2000299199A (ja) * | 1999-04-13 | 2000-10-24 | Plasma System Corp | プラズマ発生装置およびプラズマ処理装置 |
DE19955671B4 (de) * | 1999-11-19 | 2004-07-22 | Muegge Electronic Gmbh | Vorrichtung zur Erzeugung von Plasma |
US6576202B1 (en) * | 2000-04-21 | 2003-06-10 | Kin-Chung Ray Chiu | Highly efficient compact capacitance coupled plasma reactor/generator and method |
DE10335523B4 (de) * | 2003-07-31 | 2009-04-30 | Koch, Berthold, Dr.-Ing. | Vorrichtung zur Plasmaerregung mit Mikrowellen |
JP4631046B2 (ja) * | 2004-10-01 | 2011-02-16 | 国立大学法人 東京大学 | マイクロ波励起プラズマ装置及びシステム |
JP4035568B2 (ja) * | 2004-11-29 | 2008-01-23 | 株式会社エーイーティー | 大気圧大面積プラズマ発生装置 |
JP5239021B2 (ja) * | 2006-03-07 | 2013-07-17 | 国立大学法人 琉球大学 | プラズマ発生装置及びそれを用いたプラズマ生成方法 |
JP4967784B2 (ja) * | 2007-04-25 | 2012-07-04 | 凸版印刷株式会社 | マイクロ波プラズマ発生装置 |
-
2007
- 2007-04-27 DE DE102007020419A patent/DE102007020419A1/de not_active Withdrawn
-
2008
- 2008-03-25 AT AT08718192T patent/ATE521217T1/de active
- 2008-03-25 JP JP2010504600A patent/JP5683262B2/ja not_active Expired - Fee Related
- 2008-03-25 WO PCT/EP2008/053507 patent/WO2008131997A1/de active Application Filing
- 2008-03-25 US US12/451,139 patent/US8339047B2/en not_active Expired - Fee Related
- 2008-03-25 EP EP08718192A patent/EP2143306B1/de not_active Not-in-force
- 2008-03-25 KR KR1020097022500A patent/KR101555385B1/ko not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3848196A (en) * | 1973-11-08 | 1974-11-12 | Rca Corp | Broadband trapatt diode amplifier |
WO2003039214A1 (en) * | 2001-10-26 | 2003-05-08 | Michigan State University | Improved microwave stripline applicators |
WO2004062326A2 (en) * | 2002-12-30 | 2004-07-22 | Northeastern University | Low power plasma generator |
Non-Patent Citations (1)
Title |
---|
JAEHO KIM ET AL: "2.45 GHz microwave-excited atmospheric pressure air microplasmas based on microstrip technology", APPLIED PHYSICS LETTERS AIP USA, vol. 86, no. 19, 9 May 2005 (2005-05-09), pages 191504 - 1, XP012065308, ISSN: 0003-6951 * |
Also Published As
Publication number | Publication date |
---|---|
EP2143306B1 (de) | 2011-08-17 |
US20100171425A1 (en) | 2010-07-08 |
JP2010525534A (ja) | 2010-07-22 |
KR20100015978A (ko) | 2010-02-12 |
DE102007020419A1 (de) | 2008-11-06 |
US8339047B2 (en) | 2012-12-25 |
KR101555385B1 (ko) | 2015-09-23 |
JP5683262B2 (ja) | 2015-03-11 |
ATE521217T1 (de) | 2011-09-15 |
EP2143306A1 (de) | 2010-01-13 |
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