JP2010525534A - プラズマ発生器用の電極 - Google Patents
プラズマ発生器用の電極 Download PDFInfo
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- JP2010525534A JP2010525534A JP2010504600A JP2010504600A JP2010525534A JP 2010525534 A JP2010525534 A JP 2010525534A JP 2010504600 A JP2010504600 A JP 2010504600A JP 2010504600 A JP2010504600 A JP 2010504600A JP 2010525534 A JP2010525534 A JP 2010525534A
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- electrode
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2240/00—Testing
- H05H2240/10—Testing at atmospheric pressure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/30—Medical applications
- H05H2245/34—Skin treatments, e.g. disinfection or wound treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2277/00—Applications of particle accelerators
- H05H2277/10—Medical devices
- H05H2277/11—Radiotherapy
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
【選択図】図2
Description
2 切込み溝
3 部分電極
4 内部導体
5 同軸ケーブル
6 外部導体
7 ハウジング
8 ガス供給ライン
9 ガス放出ライン
Claims (11)
- マイクロ波による励起によって大気圧またはほぼ大気圧でプラズマを発生させるためのプラズマ発生器用の電極であって、
少なくとも2つの部分電極(3)が形成されるように、長手方向に延びて、前記マイクロ波の開路電圧の4分の1波長の1倍または複数倍の長さを有する少なくとも1つの切込み溝(2)を有する板金片(1)から成り、そこでは電圧は閉じた切込み溝の端の部位の前記部分電極(3)に供給されることを特徴とする電極。 - 前記切込み溝(2)がその端部の一方で閉じられ、そして他端で開かれていることを特徴とする請求項1記載の電極。
- 前記切込み溝(2)が両側で閉じられていることを特徴とする請求項1記載の電極。
- U字形に曲がっていることを特徴とする請求項3記載の電極。
- 円形に曲がっていることを特徴とする請求項3記載の電極。
- 同軸ケーブル(5)を通して給電され、そこでは内部導体(4)が、おおよその整合が開路状態下で達成される前記切込み溝の片側の位置まで延びることを特徴とする請求項1又は2記載の電極。
- 同軸ケーブル(5)を通して給電され、そこでは内部導体(4)がТ字形に分岐して、前記2つの切込み溝の端の部位において両側で電極まで延びることを特徴とする請求項3〜5のいずれかに記載の電極。
- 遮蔽ハウジング(7)によって囲まれていることを特徴とする請求項1〜7のいずれかに記載の電極。
- 前記遮蔽ハウジング(7)が、プロセス・ガスを供給するための開口部と、前記プラズマによって活性化される前記プロセス・ガスを放出するための付加開口部とを備えていることを特徴とする請求項8記載の電極。
- 自励発振回路によって給電され、そこでは該電極自体が周波数決定要素であることを特徴とする請求項1〜9のいずれかに記載の電極。
- 発振回路に統合されていることを特徴とする請求項1〜10のいずれかに記載の電極。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007020419.3 | 2007-04-27 | ||
DE102007020419A DE102007020419A1 (de) | 2007-04-27 | 2007-04-27 | Elektrode für Plasmaerzeuger |
PCT/EP2008/053507 WO2008131997A1 (de) | 2007-04-27 | 2008-03-25 | Elektrode für plasmaerzeuger |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010525534A true JP2010525534A (ja) | 2010-07-22 |
JP5683262B2 JP5683262B2 (ja) | 2015-03-11 |
Family
ID=39534997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010504600A Expired - Fee Related JP5683262B2 (ja) | 2007-04-27 | 2008-03-25 | プラズマ発生器用の電極 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8339047B2 (ja) |
EP (1) | EP2143306B1 (ja) |
JP (1) | JP5683262B2 (ja) |
KR (1) | KR101555385B1 (ja) |
AT (1) | ATE521217T1 (ja) |
DE (1) | DE102007020419A1 (ja) |
WO (1) | WO2008131997A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3042091B1 (fr) * | 2015-10-05 | 2017-10-27 | Sairem Soc Pour L'application Ind De La Rech En Electronique Et Micro Ondes | Dispositif elementaire d’application d’une energie micro-onde avec applicateur coaxial |
KR102190524B1 (ko) * | 2020-02-24 | 2020-12-14 | 이엠코어텍 주식회사 | 저전압 플라즈마 이오나이저 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6087200U (ja) * | 1983-11-15 | 1985-06-15 | 新日本無線株式会社 | マイクロ波プラズマ発生装置 |
JPS62115700A (ja) * | 1985-11-15 | 1987-05-27 | キヤノン株式会社 | 気相励起装置 |
JPH01109699A (ja) * | 1987-10-23 | 1989-04-26 | Japan Synthetic Rubber Co Ltd | プラズマ処理装置 |
JPH0613198A (ja) * | 1992-06-24 | 1994-01-21 | Noriyoshi Sato | マイクロ波放電反応装置の電極装置 |
JP2000299199A (ja) * | 1999-04-13 | 2000-10-24 | Plasma System Corp | プラズマ発生装置およびプラズマ処理装置 |
JP2006107829A (ja) * | 2004-10-01 | 2006-04-20 | Univ Of Tokyo | マイクロ波励起プラズマ装置及びシステム |
JP2006156100A (ja) * | 2004-11-29 | 2006-06-15 | Aet Inc | 大気圧大面積プラズマ発生装置 |
WO2007105411A1 (ja) * | 2006-03-07 | 2007-09-20 | University Of The Ryukyus | プラズマ発生装置及びそれを用いたプラズマ生成方法 |
JP2008276946A (ja) * | 2007-04-25 | 2008-11-13 | Toppan Printing Co Ltd | マイクロ波プラズマ発生装置 |
Family Cites Families (12)
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US3848196A (en) * | 1973-11-08 | 1974-11-12 | Rca Corp | Broadband trapatt diode amplifier |
JPS6011417B2 (ja) * | 1979-10-23 | 1985-03-26 | 株式会社東芝 | ホロ−カソ−ド放電装置 |
DE3830430A1 (de) * | 1987-09-11 | 1989-03-23 | Japan Synthetic Rubber Co Ltd | Verfahren zur herstellung von ueberzuegen |
US5537004A (en) * | 1993-03-06 | 1996-07-16 | Tokyo Electron Limited | Low frequency electron cyclotron resonance plasma processor |
US5838111A (en) * | 1996-02-27 | 1998-11-17 | Matsushita Electric Industrial Co., Ltd. | Plasma generator with antennas attached to top electrodes |
CN1258380A (zh) * | 1998-03-16 | 2000-06-28 | 松下电器产业株式会社 | 无电极放电能量供给装置和无电极放电灯装置 |
US6350417B1 (en) * | 1998-11-05 | 2002-02-26 | Sharper Image Corporation | Electrode self-cleaning mechanism for electro-kinetic air transporter-conditioner devices |
DE19955671B4 (de) * | 1999-11-19 | 2004-07-22 | Muegge Electronic Gmbh | Vorrichtung zur Erzeugung von Plasma |
US6576202B1 (en) * | 2000-04-21 | 2003-06-10 | Kin-Chung Ray Chiu | Highly efficient compact capacitance coupled plasma reactor/generator and method |
WO2003039214A1 (en) * | 2001-10-26 | 2003-05-08 | Michigan State University | Improved microwave stripline applicators |
WO2004062326A2 (en) * | 2002-12-30 | 2004-07-22 | Northeastern University | Low power plasma generator |
DE10335523B4 (de) * | 2003-07-31 | 2009-04-30 | Koch, Berthold, Dr.-Ing. | Vorrichtung zur Plasmaerregung mit Mikrowellen |
-
2007
- 2007-04-27 DE DE102007020419A patent/DE102007020419A1/de not_active Withdrawn
-
2008
- 2008-03-25 US US12/451,139 patent/US8339047B2/en not_active Expired - Fee Related
- 2008-03-25 EP EP08718192A patent/EP2143306B1/de not_active Not-in-force
- 2008-03-25 KR KR1020097022500A patent/KR101555385B1/ko not_active IP Right Cessation
- 2008-03-25 AT AT08718192T patent/ATE521217T1/de active
- 2008-03-25 JP JP2010504600A patent/JP5683262B2/ja not_active Expired - Fee Related
- 2008-03-25 WO PCT/EP2008/053507 patent/WO2008131997A1/de active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6087200U (ja) * | 1983-11-15 | 1985-06-15 | 新日本無線株式会社 | マイクロ波プラズマ発生装置 |
JPS62115700A (ja) * | 1985-11-15 | 1987-05-27 | キヤノン株式会社 | 気相励起装置 |
JPH01109699A (ja) * | 1987-10-23 | 1989-04-26 | Japan Synthetic Rubber Co Ltd | プラズマ処理装置 |
JPH0613198A (ja) * | 1992-06-24 | 1994-01-21 | Noriyoshi Sato | マイクロ波放電反応装置の電極装置 |
JP2000299199A (ja) * | 1999-04-13 | 2000-10-24 | Plasma System Corp | プラズマ発生装置およびプラズマ処理装置 |
JP2006107829A (ja) * | 2004-10-01 | 2006-04-20 | Univ Of Tokyo | マイクロ波励起プラズマ装置及びシステム |
JP2006156100A (ja) * | 2004-11-29 | 2006-06-15 | Aet Inc | 大気圧大面積プラズマ発生装置 |
WO2007105411A1 (ja) * | 2006-03-07 | 2007-09-20 | University Of The Ryukyus | プラズマ発生装置及びそれを用いたプラズマ生成方法 |
JP2008276946A (ja) * | 2007-04-25 | 2008-11-13 | Toppan Printing Co Ltd | マイクロ波プラズマ発生装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20100015978A (ko) | 2010-02-12 |
ATE521217T1 (de) | 2011-09-15 |
WO2008131997A1 (de) | 2008-11-06 |
US20100171425A1 (en) | 2010-07-08 |
EP2143306A1 (de) | 2010-01-13 |
JP5683262B2 (ja) | 2015-03-11 |
US8339047B2 (en) | 2012-12-25 |
EP2143306B1 (de) | 2011-08-17 |
DE102007020419A1 (de) | 2008-11-06 |
KR101555385B1 (ko) | 2015-09-23 |
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