JP5683262B2 - プラズマ発生器用の電極 - Google Patents
プラズマ発生器用の電極 Download PDFInfo
- Publication number
- JP5683262B2 JP5683262B2 JP2010504600A JP2010504600A JP5683262B2 JP 5683262 B2 JP5683262 B2 JP 5683262B2 JP 2010504600 A JP2010504600 A JP 2010504600A JP 2010504600 A JP2010504600 A JP 2010504600A JP 5683262 B2 JP5683262 B2 JP 5683262B2
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- JP
- Japan
- Prior art keywords
- electrode
- plasma
- sheet metal
- cut groove
- coaxial cable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2240/00—Testing
- H05H2240/10—Testing at atmospheric pressure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/30—Medical applications
- H05H2245/34—Skin treatments, e.g. disinfection or wound treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2277/00—Applications of particle accelerators
- H05H2277/10—Medical devices
- H05H2277/11—Radiotherapy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Description
2 切込み溝
3 部分電極
4 内部導体
5 同軸ケーブル
6 外部導体
7 ハウジング
8 ガス供給ライン
9 ガス放出ライン
Claims (3)
- マイクロ波による励起によって大気圧またはほぼ大気圧でプラズマを発生させるためのプラズマ発生器用の電極であって、
長手方向に延びて、前記マイクロ波の開路電圧の2分の1波長の長さを有する1つの切込み溝(2)を有するU字型に曲がった板金片(1)から成り、
前記切込み溝(2)は、閉じた切込み溝の両端を、前記板金片(1)内の対向する部位において有し、前記切込み溝(2)により分離された2つの部分電極(3)が形成され、該部分電極(3)の外縁は、前記長手方向に延びており、
そこでは電圧は同軸ケーブル(5)を通して、前記切込み溝(2)の両端近傍の前記部分電極(3)に供給され、
前記同軸ケーブル(5)の内部導体(4)は、T字に分岐して、前記板金片(1)の前記切込み溝(2)の両端近傍の一方の前記部分電極(3)の対向する外縁まで延び、
前記同軸ケーブル(5)の外部導体(6)は、前記板金片(1)の前記切込み溝(2)の両端近傍の他方の前記部分電極(3)の対向する外縁にそれぞれ接続されていることを特徴とする電極。 - 遮蔽ハウジング(7)によって囲まれていることを特徴とする請求項1記載の電極。
- 前記遮蔽ハウジング(7)が、プロセス・ガスを供給するための開口部と、前記プラズマによって活性化される前記プロセス・ガスを放出するための付加開口部とを備えていることを特徴とする請求項2記載の電極。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007020419A DE102007020419A1 (de) | 2007-04-27 | 2007-04-27 | Elektrode für Plasmaerzeuger |
DE102007020419.3 | 2007-04-27 | ||
PCT/EP2008/053507 WO2008131997A1 (de) | 2007-04-27 | 2008-03-25 | Elektrode für plasmaerzeuger |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010525534A JP2010525534A (ja) | 2010-07-22 |
JP5683262B2 true JP5683262B2 (ja) | 2015-03-11 |
Family
ID=39534997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010504600A Expired - Fee Related JP5683262B2 (ja) | 2007-04-27 | 2008-03-25 | プラズマ発生器用の電極 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8339047B2 (ja) |
EP (1) | EP2143306B1 (ja) |
JP (1) | JP5683262B2 (ja) |
KR (1) | KR101555385B1 (ja) |
AT (1) | ATE521217T1 (ja) |
DE (1) | DE102007020419A1 (ja) |
WO (1) | WO2008131997A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3042091B1 (fr) * | 2015-10-05 | 2017-10-27 | Sairem Soc Pour L'application Ind De La Rech En Electronique Et Micro Ondes | Dispositif elementaire d’application d’une energie micro-onde avec applicateur coaxial |
KR102190524B1 (ko) * | 2020-02-24 | 2020-12-14 | 이엠코어텍 주식회사 | 저전압 플라즈마 이오나이저 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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US3848196A (en) | 1973-11-08 | 1974-11-12 | Rca Corp | Broadband trapatt diode amplifier |
JPS6011417B2 (ja) * | 1979-10-23 | 1985-03-26 | 株式会社東芝 | ホロ−カソ−ド放電装置 |
JPS6087200U (ja) * | 1983-11-15 | 1985-06-15 | 新日本無線株式会社 | マイクロ波プラズマ発生装置 |
JPS62115700A (ja) * | 1985-11-15 | 1987-05-27 | キヤノン株式会社 | 気相励起装置 |
JPH01109699A (ja) * | 1987-10-23 | 1989-04-26 | Japan Synthetic Rubber Co Ltd | プラズマ処理装置 |
DE3830430A1 (de) * | 1987-09-11 | 1989-03-23 | Japan Synthetic Rubber Co Ltd | Verfahren zur herstellung von ueberzuegen |
JPH0719674B2 (ja) * | 1992-06-24 | 1995-03-06 | 徳芳 佐藤 | マイクロ波放電反応装置の電極装置 |
US5537004A (en) * | 1993-03-06 | 1996-07-16 | Tokyo Electron Limited | Low frequency electron cyclotron resonance plasma processor |
US5838111A (en) * | 1996-02-27 | 1998-11-17 | Matsushita Electric Industrial Co., Ltd. | Plasma generator with antennas attached to top electrodes |
US6518703B1 (en) * | 1998-03-16 | 2003-02-11 | Matsushita Electrical Industrial Co., Ltd. | Electrodeless discharge energy supply apparatus and electrodeless discharge lamp device using surface wave transmission line |
US6350417B1 (en) * | 1998-11-05 | 2002-02-26 | Sharper Image Corporation | Electrode self-cleaning mechanism for electro-kinetic air transporter-conditioner devices |
JP2000299199A (ja) * | 1999-04-13 | 2000-10-24 | Plasma System Corp | プラズマ発生装置およびプラズマ処理装置 |
DE19955671B4 (de) * | 1999-11-19 | 2004-07-22 | Muegge Electronic Gmbh | Vorrichtung zur Erzeugung von Plasma |
US6576202B1 (en) * | 2000-04-21 | 2003-06-10 | Kin-Chung Ray Chiu | Highly efficient compact capacitance coupled plasma reactor/generator and method |
US6759808B2 (en) * | 2001-10-26 | 2004-07-06 | Board Of Trustees Of Michigan State University | Microwave stripline applicators |
AU2003303538A1 (en) | 2002-12-30 | 2004-07-29 | Northeastern University | Low power plasma generator |
DE10335523B4 (de) * | 2003-07-31 | 2009-04-30 | Koch, Berthold, Dr.-Ing. | Vorrichtung zur Plasmaerregung mit Mikrowellen |
JP4631046B2 (ja) * | 2004-10-01 | 2011-02-16 | 国立大学法人 東京大学 | マイクロ波励起プラズマ装置及びシステム |
JP4035568B2 (ja) * | 2004-11-29 | 2008-01-23 | 株式会社エーイーティー | 大気圧大面積プラズマ発生装置 |
US8216433B2 (en) * | 2006-03-07 | 2012-07-10 | University Of The Ryukyus | Plasma generator and method of generating plasma using the same |
JP4967784B2 (ja) * | 2007-04-25 | 2012-07-04 | 凸版印刷株式会社 | マイクロ波プラズマ発生装置 |
-
2007
- 2007-04-27 DE DE102007020419A patent/DE102007020419A1/de not_active Withdrawn
-
2008
- 2008-03-25 JP JP2010504600A patent/JP5683262B2/ja not_active Expired - Fee Related
- 2008-03-25 EP EP08718192A patent/EP2143306B1/de not_active Not-in-force
- 2008-03-25 US US12/451,139 patent/US8339047B2/en not_active Expired - Fee Related
- 2008-03-25 KR KR1020097022500A patent/KR101555385B1/ko not_active IP Right Cessation
- 2008-03-25 WO PCT/EP2008/053507 patent/WO2008131997A1/de active Application Filing
- 2008-03-25 AT AT08718192T patent/ATE521217T1/de active
Also Published As
Publication number | Publication date |
---|---|
ATE521217T1 (de) | 2011-09-15 |
EP2143306A1 (de) | 2010-01-13 |
JP2010525534A (ja) | 2010-07-22 |
US20100171425A1 (en) | 2010-07-08 |
DE102007020419A1 (de) | 2008-11-06 |
KR20100015978A (ko) | 2010-02-12 |
US8339047B2 (en) | 2012-12-25 |
WO2008131997A1 (de) | 2008-11-06 |
KR101555385B1 (ko) | 2015-09-23 |
EP2143306B1 (de) | 2011-08-17 |
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