WO2008129844A1 - プラズマエッチング装置 - Google Patents

プラズマエッチング装置 Download PDF

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Publication number
WO2008129844A1
WO2008129844A1 PCT/JP2008/000786 JP2008000786W WO2008129844A1 WO 2008129844 A1 WO2008129844 A1 WO 2008129844A1 JP 2008000786 W JP2008000786 W JP 2008000786W WO 2008129844 A1 WO2008129844 A1 WO 2008129844A1
Authority
WO
WIPO (PCT)
Prior art keywords
dielectric member
chamber
coil
etching apparatus
plasma etching
Prior art date
Application number
PCT/JP2008/000786
Other languages
English (en)
French (fr)
Inventor
Shogo Okita
Syouzou Watanabe
Hiroyuki Suzuki
Ryuuzou Houtin
Original Assignee
Panasonic Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corporation filed Critical Panasonic Corporation
Priority to JP2009510778A priority Critical patent/JP5108875B2/ja
Priority to US12/593,381 priority patent/US8303765B2/en
Publication of WO2008129844A1 publication Critical patent/WO2008129844A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Abstract

　プラズマエッチング装置は、減圧可能なチャンバー１、チャンバー１内で被処理物２を支持する載置部３、チャンバー１の上部開口を封止する誘電体部材５、誘電体部材５の外に設けられたコイル４を備える。コイル４は、誘導結合によりチャンバー１内にプラズマ６を発生させて被処理物２をエッチングする。誘電体部材５には、互いに不連続な凹部５ｃが設けられている。誘電体部材５の凹部５ｃ以外の部分は厚肉部５ｂとする。凹部５ｃの誘電体部材５の厚みは厚肉部５ｂよりも小さい。コイル４を構成する導体の分布密度に応じて凹部５ｃが配置されている。
PCT/JP2008/000786 2007-03-28 2008-03-28 プラズマエッチング装置 WO2008129844A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009510778A JP5108875B2 (ja) 2007-03-28 2008-03-28 プラズマエッチング装置
US12/593,381 US8303765B2 (en) 2007-03-28 2008-03-28 Plasma etching apparatus

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007-084070 2007-03-28
JP2007084070 2007-03-28
JP2007-084071 2007-03-28
JP2007084071 2007-03-28
JP2008051233 2008-02-29
JP2008-051233 2008-02-29

Publications (1)

Publication Number Publication Date
WO2008129844A1 true WO2008129844A1 (ja) 2008-10-30

Family

ID=39875376

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/000786 WO2008129844A1 (ja) 2007-03-28 2008-03-28 プラズマエッチング装置

Country Status (5)

Country Link
US (1) US8303765B2 (ja)
JP (2) JP5108875B2 (ja)
KR (1) KR20090125140A (ja)
TW (1) TW200845197A (ja)
WO (1) WO2008129844A1 (ja)

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CN102056391A (zh) * 2009-10-26 2011-05-11 应用材料股份有限公司 用于等离子体处理的rf馈电结构
JP2011124221A (ja) * 2009-10-26 2011-06-23 Applied Materials Inc 誘導結合プラズマ装置
JP2012038461A (ja) * 2010-08-04 2012-02-23 Tokyo Electron Ltd プラズマ処理装置
JP2012222063A (ja) * 2011-04-06 2012-11-12 Ulvac Japan Ltd プラズマ処理装置
JP2016082190A (ja) * 2014-10-22 2016-05-16 パナソニックＩｐマネジメント株式会社 プラズマ処理装置
JP2017045671A (ja) * 2015-08-28 2017-03-02 パナソニックＩｐマネジメント株式会社 プラズマ処理装置およびプラズマ処理方法
JP2018029119A (ja) * 2016-08-17 2018-02-22 サムコ株式会社 誘導結合型プラズマ処理装置
TWI758939B (zh) * 2020-11-06 2022-03-21 台灣積體電路製造股份有限公司 感應耦合電漿設備及其操作方法
JP7431296B2 (ja) 2017-10-09 2024-02-14 アプライド マテリアルズ インコーポレイテッド 誘導結合プラズマソースの改善

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EP2248578B1 (en) 2005-03-04 2012-06-06 President and Fellows of Harvard College Method for forming multiple emulsions
US20120211084A1 (en) 2009-09-02 2012-08-23 President And Fellows Of Harvard College Multiple emulsions created using jetting and other techniques
KR101246859B1 (ko) * 2011-01-10 2013-03-25 엘아이지에이디피 주식회사 플라즈마 처리장치
US8723423B2 (en) * 2011-01-25 2014-05-13 Advanced Energy Industries, Inc. Electrostatic remote plasma source
US9220162B2 (en) * 2011-03-09 2015-12-22 Samsung Electronics Co., Ltd. Plasma generating apparatus and plasma generating method
US9490106B2 (en) * 2011-04-28 2016-11-08 Lam Research Corporation Internal Faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer TCP coil
EP2729238A2 (en) 2011-07-06 2014-05-14 President and Fellows of Harvard College Multiple emulsions and techniques for the formation of multiple emulsions
US20130160949A1 (en) * 2011-12-21 2013-06-27 Hitachi High-Technologies Corporation Plasma processing apparatus
TW201405627A (zh) * 2012-07-20 2014-02-01 Applied Materials Inc 具有同軸ｒｆ饋送及同軸遮罩之對稱的感應性耦合電漿源
US10553398B2 (en) * 2013-09-06 2020-02-04 Applied Materials, Inc. Power deposition control in inductively coupled plasma (ICP) reactors
JP6135455B2 (ja) * 2013-10-25 2017-05-31 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
US9659797B1 (en) 2014-09-17 2017-05-23 Sandia Corporation Wafer scale oblique angle plasma etching
JP6406631B2 (ja) * 2014-10-22 2018-10-17 パナソニックＩｐマネジメント株式会社 プラズマ処理装置
US10475626B2 (en) 2015-03-17 2019-11-12 Applied Materials, Inc. Ion-ion plasma atomic layer etch process and reactor
JP2018095901A (ja) * 2016-12-09 2018-06-21 東京エレクトロン株式会社 基板処理装置
KR102060551B1 (ko) * 2017-08-16 2020-02-11 주식회사 엘지화학 회절 격자 도광판용 몰드 기재의 제조방법 및 회절 격자 도광판의 제조방법
KR102133279B1 (ko) * 2018-06-20 2020-07-13 주식회사 엘지화학 회절 격자 도광판용 몰드의 제조방법 및 회절 격자 도광판의 제조방법
KR102588284B1 (ko) * 2019-01-31 2023-10-11 제이에프이 스틸 가부시키가이샤 돌기가 있는 h형강 및 그의 제조 방법
JP7238613B2 (ja) * 2019-06-05 2023-03-14 日新電機株式会社 プラズマ処理装置
WO2020246523A1 (ja) * 2019-06-05 2020-12-10 日新電機株式会社 プラズマ処理装置
CN110491759A (zh) * 2019-08-21 2019-11-22 江苏鲁汶仪器有限公司 一种等离子体刻蚀系统
KR102453704B1 (ko) * 2022-04-07 2022-10-12 주식회사 세미노바 웨이퍼 pvd 공정용 프리 크린 장치

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JPH09246240A (ja) * 1996-03-04 1997-09-19 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法
JP2006186222A (ja) * 2004-12-28 2006-07-13 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2006216903A (ja) * 2005-02-07 2006-08-17 Hitachi High-Technologies Corp プラズマ処理装置

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JP4017274B2 (ja) 1999-01-07 2007-12-05 松下電器産業株式会社 プラズマ処理方法及び装置
JP4153654B2 (ja) * 2000-11-02 2008-09-24 松下電器産業株式会社 導電性付着物モニター、プラズマ処理装置、及びプラズマ処理方法
JP3723783B2 (ja) 2002-06-06 2005-12-07 東京エレクトロン株式会社 プラズマ処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09246240A (ja) * 1996-03-04 1997-09-19 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法
JP2006186222A (ja) * 2004-12-28 2006-07-13 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2006216903A (ja) * 2005-02-07 2006-08-17 Hitachi High-Technologies Corp プラズマ処理装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102056391A (zh) * 2009-10-26 2011-05-11 应用材料股份有限公司 用于等离子体处理的rf馈电结构
JP2011108643A (ja) * 2009-10-26 2011-06-02 Applied Materials Inc プラズマ処理のためのｒｆ給電構造
JP2011124221A (ja) * 2009-10-26 2011-06-23 Applied Materials Inc 誘導結合プラズマ装置
KR101455245B1 (ko) 2009-10-26 2014-10-27 어플라이드 머티어리얼스, 인코포레이티드 플라즈마 처리를 위한 ｒｆ 피드 구조물
JP2012038461A (ja) * 2010-08-04 2012-02-23 Tokyo Electron Ltd プラズマ処理装置
JP2012222063A (ja) * 2011-04-06 2012-11-12 Ulvac Japan Ltd プラズマ処理装置
JP2016082190A (ja) * 2014-10-22 2016-05-16 パナソニックＩｐマネジメント株式会社 プラズマ処理装置
JP2017045671A (ja) * 2015-08-28 2017-03-02 パナソニックＩｐマネジメント株式会社 プラズマ処理装置およびプラズマ処理方法
JP2018029119A (ja) * 2016-08-17 2018-02-22 サムコ株式会社 誘導結合型プラズマ処理装置
JP7431296B2 (ja) 2017-10-09 2024-02-14 アプライド マテリアルズ インコーポレイテッド 誘導結合プラズマソースの改善
TWI758939B (zh) * 2020-11-06 2022-03-21 台灣積體電路製造股份有限公司 感應耦合電漿設備及其操作方法

Also Published As

Publication number Publication date
JPWO2008129844A1 (ja) 2010-07-22
US20100096088A1 (en) 2010-04-22
JP2013012761A (ja) 2013-01-17
KR20090125140A (ko) 2009-12-03
TW200845197A (en) 2008-11-16
US8303765B2 (en) 2012-11-06
JP5108875B2 (ja) 2012-12-26
JP5467131B2 (ja) 2014-04-09

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