WO2008126492A1 - 電界効果型トランジスタ及び電界効果型トランジスタの製造方法 - Google Patents
電界効果型トランジスタ及び電界効果型トランジスタの製造方法 Download PDFInfo
- Publication number
- WO2008126492A1 WO2008126492A1 PCT/JP2008/053459 JP2008053459W WO2008126492A1 WO 2008126492 A1 WO2008126492 A1 WO 2008126492A1 JP 2008053459 W JP2008053459 W JP 2008053459W WO 2008126492 A1 WO2008126492 A1 WO 2008126492A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- field
- effect transistor
- producing
- crystalline oxide
- indium
- Prior art date
Links
- 230000005669 field effect Effects 0.000 title abstract 5
- 229910052738 indium Inorganic materials 0.000 abstract 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 abstract 2
- 108091006149 Electron carriers Proteins 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66969—Multistep manufacturing processes of devices having semiconductor bodies not comprising group 14 or group 13/15 materials
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009508960A JP5466940B2 (ja) | 2007-04-05 | 2008-02-28 | 電界効果型トランジスタ及び電界効果型トランジスタの製造方法 |
US12/594,432 US8530891B2 (en) | 2007-04-05 | 2008-02-28 | Field-effect transistor, and process for producing field-effect transistor |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-099695 | 2007-04-05 | ||
JP2007099695 | 2007-04-05 | ||
JP2007-111320 | 2007-04-20 | ||
JP2007111320 | 2007-04-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008126492A1 true WO2008126492A1 (ja) | 2008-10-23 |
Family
ID=39863648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/053459 WO2008126492A1 (ja) | 2007-04-05 | 2008-02-28 | 電界効果型トランジスタ及び電界効果型トランジスタの製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8530891B2 (ja) |
JP (1) | JP5466940B2 (ja) |
TW (1) | TWI427795B (ja) |
WO (1) | WO2008126492A1 (ja) |
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US20100117071A1 (en) | 2010-05-13 |
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US8530891B2 (en) | 2013-09-10 |
TW200908333A (en) | 2009-02-16 |
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