WO2008072403A1 - 非接触液シール装置及び方法 - Google Patents
非接触液シール装置及び方法 Download PDFInfo
- Publication number
- WO2008072403A1 WO2008072403A1 PCT/JP2007/068573 JP2007068573W WO2008072403A1 WO 2008072403 A1 WO2008072403 A1 WO 2008072403A1 JP 2007068573 W JP2007068573 W JP 2007068573W WO 2008072403 A1 WO2008072403 A1 WO 2008072403A1
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- WO
- WIPO (PCT)
- Prior art keywords
- jet
- workpiece
- contact
- contact liquid
- liquid sealing
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/004—Sealing devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0628—In vertical cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1509—Horizontally held PCB
Definitions
- the present invention relates to a liquid sealing apparatus and method for a wet processing apparatus that performs wet processing such as plating on an object such as a substrate of a printed circuit board.
- a printed circuit board used for an IC card or the like is nailed in order to establish electrical connection between mounted elements.
- a method for plating the printed circuit board a single-wafer method in which the substrate of the printed circuit board is cut and immersed in the plating solution, or a continuous type in which the strip-shaped flexible printed circuit board itself is continuously immersed in the plating solution. The method is used.
- the work is conveyed by the conveying means above the immersion tank filled with the treatment liquid, and then lowered into the immersion tank and immersed in the treatment liquid.
- the cake after the treatment is lifted from the dipping tank and conveyed to the next step.
- This method is used for single-wafer workpieces, but cannot be applied to continuous strip-like workpieces.
- a slit-shaped entrance / exit is provided on the opposite side wall of the immersion tank, and the workpiece is carried into and out of the immersion tank through this slit.
- This method can be used not only for single-wafer workpieces but also for strip-shaped workpieces.
- the liquid level of the treatment liquid in the immersion tank cannot be increased due to the large amount of the treatment liquid in the immersion tank flowing out of the slit. If the slit width is narrowed, the amount of outflow of the processing solution can be reduced. Simply reducing the slit width will cause the workpiece to contact the inner surface of the slit.
- the slit needs to have a certain width of about 10 mm.
- the liquid level in the immersion bath cannot be increased, it is difficult to process a wide workpiece, and the width of the workpiece that can be processed is about 200 mm at the maximum.
- a large amount of energy is required for the fluid equipment, such as a high-capacity spill return pump is required to maintain the level of the treatment liquid in the immersion tank.
- the position of the workpiece passing through the slit tends to become unstable.
- the outflow amount of the processing liquid from the slit can be reduced to some extent.
- the liquid level of the processing liquid in the immersion tank can be increased, and a wide workpiece can be processed.
- this method it is possible to process a workpiece having a width of up to about 600 mm.
- the work and the seal roll do not slip, the occurrence of scratches on the work by the seal roll can be suppressed, and since the work is positioned by the roll, it is possible to move the work stably.
- the surface of the seal roll that comes into contact with the workpiece deteriorates with time, maintenance of the roll can be performed. Is required.
- Patent Document 1 Japanese Utility Model Publication No. 59-17765
- Patent Document 2 JP-A-2-182895
- Patent Document 3 Japanese Patent Laid-Open No. 2002-275681
- Patent Document 4 Japanese Patent Laid-Open No. 2003-147582
- Patent Document 5 Japanese Utility Model Publication No. 61-155371
- the liquid level of the treatment liquid filled in the immersion tank can be increased, so even for a wide workpiece. It is possible to perform processing with the processing liquid.
- An object of the present invention is to immerse a single wafer or a strip-shaped workpiece into or out of a dip tank with the width direction being substantially vertical through a slit in the side wall of the dip tank filled with the treatment liquid. It is an object of the present invention to provide a non-contact liquid sealing device and method capable of sufficiently suppressing the outflow of the processing liquid from the tank without contact with the workpiece!
- the inventors of the present application have passed a single wafer or a strip-shaped workpiece through the opening of the immersion tank filled with liquid with the width direction being substantially vertical. In doing so, in the range corresponding to the opening of the immersion bath, the fluid position is stabilized by non-contacting the immersion bath by jetting a fluid jet from both sides of the workpiece toward the workpiece passing through the opening.
- the present inventors have found that the workpiece can be carried in and out and the outflow of the liquid from the immersion tank can be sufficiently suppressed or reduced, and the present invention has been completed.
- the above object is a non-contact liquid sealing device for a dipping tank in which an opening through which a single wafer or a strip-shaped workpiece passes is provided in a side wall in a state where the width direction is substantially vertical, and is filled with liquid.
- a jet ejecting part Arranged on one side of the opening, disposed on the other side of the opening, and a jet ejecting part for ejecting a jet of fluid from the one side toward the work passing through the opening,
- a non-contact liquid sealing device comprising a liquid sealing portion that seals outflow of the liquid from the other side of the opening.
- the liquid sealing portion is disposed on the other side of the opening, and is directed toward the workpiece passing through the opening.
- the other side force may also be a jet jet part that jets a jet of fluid.
- the gap between the parts may be narrower toward the bottom.
- the liquid sealing portion is disposed on the other side of the opening and contacts the surface of the other side of the workpiece. It may be a columnar member.
- the jet ejecting portion is provided on the work fluid side of the jet fluid conduit to which the fluid is supplied and the jet fluid conduit, You may make it have a jet nose which spouts the jet! /.
- the jet nozzle may be oriented in a direction inclined toward the immersion tank with respect to a direction perpendicular to the moving direction of the workpiece. It ’s good.
- the jet nozzle may be oriented in a direction perpendicular to the moving direction of the workpiece! /.
- the jet jet section may include a plurality of jet nozzles arranged in the vertical direction.
- the holes of the plurality of jet nozzles may be circular.
- the hole diameter of the plurality of jet nozzles may be larger as the hole of the jet nozzle below.
- the pitch of the holes of the plurality of jet nozzles arranged in the vertical direction may be denser toward the lower side! /.
- the width of the opening may become narrower downward.
- the above object is a non-contact liquid sealing method for a dipping tank in which an opening through which a single wafer or a strip-shaped workpiece passes is provided in the side wall in a state where the width direction is substantially vertical, and the liquid is filled.
- a jet of fluid is ejected from both sides of the workpiece toward the workpiece passing through the opening.
- the above object is a non-contact liquid sealing method for a dipping tank in which an opening through which a single wafer or a strip-shaped workpiece passes is provided in a side wall in a state where the width direction is substantially vertical, and the liquid is filled.
- a liquid seal portion that contacts the surface of the one side of the workpiece and seals outflow of the liquid from the one side of the opening, on one side of the opening, and the liquid
- a fluid jet is ejected from the other side of the opening toward the workpiece passing through the opening.
- the non-contact liquid sealing method is characterized in that the outflow of the liquid from the other side of the opening is sealed in a non-contact manner.
- the workpiece passes through the opening.
- the outflow of the liquid from the immersion tank can be sufficiently suppressed or reduced without contact with the workpiece. Therefore, according to the present invention, it is possible to prevent contact between the peripheral members and parts and the workpiece, and to reliably prevent occurrence of defects in the workpiece such as damage, deformation, and discoloration.
- the liquid level of the liquid filled in the immersion tank can be increased, and a wide work can be treated with the liquid S filled in the immersion tank.
- one side of the opening of the immersion tank filled with liquid is brought into contact with the surface on one side of the work, and the liquid flows out from one side of the opening.
- a sheet or strip-shaped workpiece passes through the opening with the liquid sealing portion to be sealed and the width direction being substantially vertical, the other side of the opening toward the workpiece passing through the opening Since the jet of fluid is ejected from the liquid, the outflow of liquid from the immersion tank is further suppressed or reduced while reliably preventing the occurrence of work defects such as scratches and discoloration on the other side of the work.
- FIG. 1 is a schematic view (No. 1) showing the structure of a wet processing apparatus including a non-contact liquid sealing apparatus according to a first embodiment of the present invention.
- FIG. 2 is a schematic diagram (No. 2) showing the structure of a wet processing apparatus provided with the non-contact liquid sealing apparatus according to the first embodiment of the present invention.
- FIG. 3 is a schematic view (No. 3) showing the structure of a wet processing apparatus including a non-contact liquid sealing apparatus according to the first embodiment of the present invention.
- FIG. 4 is a schematic view (No. 1) showing the structure of the non-contact liquid sealing device according to the first embodiment of the present invention.
- FIG. 5 is a schematic diagram (No. 2) showing the structure of the non-contact liquid sealing device according to the first embodiment of the present invention.
- FIG. 6 is a schematic view showing the structure of a non-contact liquid sealing device according to a second embodiment of the present invention.
- FIG. 7 is a schematic view showing the structure of a non-contact liquid sealing device according to a third embodiment of the present invention.
- FIG. 8 is a cross-sectional view showing the structure of a non-contact liquid sealing device according to a fourth embodiment of the present invention.
- FIG. 9 is a cross-sectional view showing the structure of a non-contact liquid sealing device according to a fifth embodiment of the present invention.
- FIG. 10 is a cross-sectional view showing the structure of the non-contact liquid sealing device according to the sixth embodiment of the present embodiment.
- FIG. 11 is a schematic diagram showing another example of a single-sided roll in the non-contact liquid sealing apparatus according to the sixth embodiment of the present embodiment.
- FIG. 12 is a plan view showing the structure of a continuous wet processing apparatus according to the seventh embodiment of the present invention.
- FIG. 13 is a plan view showing the structure of a continuous wet processing apparatus according to the eighth embodiment of the present invention.
- FIG. 14 is a cross-sectional view showing another example of the structure of the non-contact liquid sealing device according to the present invention.
- FIGS. 1 to 3 are schematic views showing the structure of a wet processing apparatus equipped with the non-contact liquid sealing apparatus according to the present embodiment
- FIGS. 4 and 5 are schematic views showing the structure of the non-contact liquid seal apparatus according to the present embodiment.
- FIG. 1 to 3 are schematic views showing the structure of a wet processing apparatus equipped with the non-contact liquid sealing apparatus according to the present embodiment
- FIGS. 4 and 5 are schematic views showing the structure of the non-contact liquid seal apparatus according to the present embodiment.
- FIG. 1 to 3 are schematic views showing the structure of a wet processing apparatus equipped with the non-contact liquid sealing apparatus according to the present embodiment
- FIGS. 4 and 5 are schematic views showing the structure of the non-contact liquid seal apparatus according to the present embodiment.
- FIGS. 1 is a plan view showing the structure of a wet processing apparatus equipped with a non-contact liquid sealing apparatus according to the present embodiment
- FIG. 2 is a cross-sectional view of FIG.
- the immersion tank 10 is filled with a treatment liquid for performing a predetermined treatment on the single-wafer workpiece 12.
- the treatment liquid is supplied to the immersion tank 10 via the pump 16 from the treatment liquid storage tank 14 in which the treatment liquid is stored.
- slits 20 for carrying in and out the single-wafer workpiece 12 are provided in a substantially vertical direction.
- the workpiece 12 is carried into the immersion tank 10 from the slit 20 on one side wall 18 with the width direction being substantially vertical.
- the workpiece 12 carried into the immersion tank 10 is carried out of the immersion tank 10 from the slit 20 of the other side wall 18 with the width direction being substantially vertical as it is.
- a non-contact liquid sealing device 22 is provided on the opposite side wall 18 of the immersion tank 10 provided with the slit 20.
- the non-contact liquid sealing device 22 has a pair of jetting jet parts 24 that jet the jets of the processing liquid evenly from both sides of the work 12 toward the work 12.
- the pair of jet squirting portions 24 includes slits 20 on the outer surfaces of the end portions of the side walls 18 on both sides of the slit 20. It arrange
- the treatment liquid ejected from the pair of jet ejection parts 24 is supplied from the treatment liquid storage tank 14 through a pump 16, a flow rate adjusting valve 26, and a flow rate indicator and controller (FIC) 28. It is like this.
- a tray 30 for collecting the treatment liquid flowing out from the slit 20 and the treatment liquid ejected from the non-contact liquid sealing device 22 is provided below the carry-in and carry-out side walls 18 of the immersion tank 10.
- the processing liquid collected in the receiving tray 30 is collected in the processing liquid storage tank 14.
- a wet processing apparatus including the non-contact liquid sealing apparatus 22 is configured.
- the workpiece 12 is, for example, a printed wiring board, a base material used for the printed wiring board, or the like.
- the thickness of the workpiece 12 is, for example, in the range of 3 to 200 111, specifically, 38 m for mainstream, then 25 m for many, 50 m for special applications, 100 m, and the like.
- the shape of the workpiece 12 is not limited to a single wafer, but may be a belt-like shape such as a continuous strip unwound from a roll.
- the immersion tank 10 is, for example, a plating tank filled with a plating solution as a processing solution.
- the immersion tank 10 may be a pretreatment tank, a post-treatment tank, a washing tank, or the like that is not limited to the plating tank.
- the treatment performed in the dipping bath 10 can be selected from a treatment solution suitable for the treatment, such as the power of the plating treatment, etching treatment, degreasing treatment, fouling treatment, and washing treatment.
- the width of 20 is, for example, substantially constant in the vertical direction.
- the treatment liquid is appropriately supplied from the treatment liquid storage tank 14 via the pump 16 to the immersion tank 10, and the liquid level of the reaction liquid in the immersion tank 10 is obtained.
- the height of is kept substantially constant.
- the non-contact liquid sealing device 22 according to the present embodiment is mainly characterized by having a pair of jetting jetting parts 24 that jet the jets of the processing liquid evenly from both sides of the work 12 toward the work 12.
- the non-contact liquid sealing device 22 according to the present embodiment will be described in detail with reference to FIGS. Fig. 4 is a cross-sectional view along CC 'in Figs. 2 and 3, and Fig. 5 (a) is A plan view, FIG. 5 (b) is a side view of the work side of the jet ejection part 24.
- FIG. Fig. 4 is a cross-sectional view along CC 'in Figs. 2 and 3
- Fig. 5 (a) is A plan view
- FIG. 5 (b) is a side view of the work side of the jet ejection part 24.
- FIG 4 shows the structure of the non-contact liquid sealing device 22 provided on the side wall 18 on the carry-out side of the workpiece 12 in the immersion tank 10, but the side wall 18 on the carry-in side of the work 12 in the immersion tank 10 is shown.
- the provided non-contact liquid sealing device 22 has the same structure.
- a pair of jet ejection portions 24 are arranged on the outer surfaces of the end portions of the side walls 18 on both sides of the slit 20 so as to face each other through the cake 12 passing through the slit 20.
- Each of the pair of jet jet parts 24 is provided with a jet fluid pipe 32 that is a flow path of the processing liquid jetted as a jet, and a plurality of jet nozzles 36 through which the processing liquid in the jet fluid pipe 32 jets as jets. And a jet nozzle plate 34.
- the jet fluid conduit 32 is, for example, a rectangular tube.
- the same processing liquid as the processing liquid filled in the immersion tank 10 is supplied from the processing liquid storage tank 14 to the jet fluid pipe 32 via a pipe.
- the treatment liquid may be supplied to the jet fluid line 32 at a single point (see FIG. 5B), or the treatment liquid may be supplied from a plurality of points.
- the jet fluid line 32 is divided into a plurality of chambers, for example, upper and lower two stages, upper middle and lower three stages, and the processing liquid is supplied to each divided chamber. Gore.
- the flow rate of the processing liquid supplied to the jet fluid pipe 32 is detected by the FIC 28. Based on the flow rate detection result, the FIC 28 controls the flow rate adjustment valve 26 so that the flow rates of the processing liquid ejected from the pair of jet ejection portions 24 facing each other through the workpiece 12 are equalized.
- the jet nozzle plate 34 is provided on the work 12 side of the jet fluid conduit 32. Jet nozzle plate
- the protrusion 34 has a projecting portion 38 projecting toward the workpiece 12 along the vertical direction of the jet fluid pipe 32.
- the surface of the protrusion 38 that faces the workpiece 12 is a flat surface that is substantially parallel to the moving direction of the workpiece 12.
- the side surface of the protrusion 38 on the immersion tank 10 side is a surface substantially parallel to the side wall 18 of the immersion tank 10.
- the side surface of the protrusion 38 opposite to the immersion tank 10 is an inclined surface.
- the surfaces on both sides of the protrusion 38 of the jet nozzle plate 34 are substantially parallel to the moving direction of the workpiece 12.
- the plurality of jet nozzles 36 are arranged in a range corresponding to the slit 20 of the immersion bath 10 in the jet nozzle plate 3
- the four protruding portions 38 are arranged in the vertical direction and are connected to the jet fluid conduit 32.
- the holes of the plurality of jet nozzles 36 have, for example, a substantially constant pin in the vertical direction.
- the protrusions 38 are arranged in a line on a plane that faces the workpiece 12 of the protrusion 38.
- the holes of the plurality of jet nozzles 36 have, for example, circular shapes with the same diameter.
- the diameter of the hole of the jet nozzle 36 is, for example, about 0.5 to 3 mm, specifically, for example, about 2 mm.
- each jet nozzle 36 faces a direction inclined toward the immersion tank 10 with respect to a direction perpendicular to the moving direction of the workpiece 12.
- Each of the jet nozzles 36 facing in the inclined direction in this manner is directed toward the workpiece 12 in a substantially horizontal direction in the direction inclined toward the immersion tank 10 with respect to the direction perpendicular to the moving direction of the workpiece 12.
- the processing liquid supplied from 32 is ejected as a jet.
- a jet slit 40 sandwiched between the faces of the protrusions 38 facing the work 12 is formed.
- the width of the jet slit 40 is substantially constant in the vertical direction narrower than the width of the slit 20 of the immersion bath 10, and is, for example, about !! to 3 mm.
- the thickness of the jet slit 40, that is, the length in the moving direction of the workpiece 12 of the surface of the protruding portion 38 facing the workpiece 12 is, for example, about 3 mm.
- a throat portion 42 wider than the jet slit 40 is formed between the jet nozzle plates 34 of the pair of jet jet portions 24 on the immersion tank 10 side of the jet slit 40.
- a throat portion 44 wider than the jet slit 40 is formed on the opposite side of the immersion slit 10 of the jet slit 40.
- the throat portion 42 on the immersion tank 10 side has a substantially constant width that is narrower than the width of the slit 20 of the immersion tank 10.
- the width of the throat portion 44 on the opposite side of the immersion bath 10 increases as it moves away from the jet slit 40 side, and is about the same width as the throat portion 42 on the immersion bath 10 side.
- the length of the workpiece 12 in the moving direction is longer in the throat portion 44 on the opposite side of the immersion bath 10 than in the throat portion 42 on the immersion bath 10 side.
- the throat portion 44 Is configured.
- a plurality of jet nozzles 36 on both sides of the work 12 are also jetted uniformly from both sides of the work 12 toward the work 12.
- the immersion tank 10 filled with the treatment liquid is loaded with the workpiece 12 force S and the slit 20 of the side wall 18 on the carry-in side with the width direction being substantially vertical, and the width direction is substantially vertical as it is with the carry-out side. It is carried out from the slit 20 of the side wall 18 of the slab.
- the moving speed of the workpiece 12 is, for example, a relatively slow speed in the range of about 0.1 lm to about 30 m / min, and is usually about 0.;! To 2 m / min.
- the treatment liquid is supplied to the jet fluid pipe 32, and the jet nozzle plate
- a jet of the treatment liquid is ejected from 34 jet nozzles 36.
- the flow rate of the processing liquid supplied to the jet fluid pipe 32 is controlled by the FIC 28 so that the flow rate of the processing liquid ejected from the jet nozzles 36 of the pair of jet nozzle plates 34 facing each other through the work 12 is uniform.
- the In this way, the jets of the processing liquid are ejected from both sides of the work 12 evenly toward the work 12 from the jet nozzles 36 of the pair of jet nozzle plates 34 opposed via the work 12.
- the velocity component of the jet in a direction substantially perpendicular to the workpiece 12 is expressed as the inertia force of the jet.
- the work 12 is caused to flow from the jet nozzle 36 of the pair of jet nozzle plates 34 toward the work 12 by the treatment liquid jetted evenly from both sides of the work 12, so that the work 12 has the slit 20 inside the immersion tank 10 and the jet nozzle. It is stably carried in and out of the immersion bath 10 without touching the plate 34.
- the non-contact liquid sealing device 22 According to the non-contact liquid sealing device 22 according to the present embodiment, contact between the slit 20 of the immersion tank 10 and peripheral members such as the jet nozzle plate 34, parts, and the workpiece 12 is prevented, and the loss is reduced. It is possible to reliably prevent the occurrence of defects in the work 12 such as scratches, deformations, and discoloration.
- the jet slit 40 is non-contacted by the jet of the processing liquid that is uniformly jetted from both sides of the work 12 toward the work 12 in the jet slit 40. It is possible to sufficiently seal or reduce the outflow of the processing solution from the immersion bath 10 with a force S. Therefore, it is possible to increase the liquid level of the processing liquid filled in the dipping tank 10 and to process the wide workpiece 12 with the processing liquid. According to this embodiment, for example, a wide workpiece 12 having a width of about 1000 mm can be treated with the treatment liquid in the immersion tank 10.
- the non-contact liquid sealing device 22 does not need to use moving parts such as rollers and bearings for the jet part 24 for jetting the processing liquid jet, and therefore can easily perform maintenance management. Can do.
- the outflow of the processing liquid from the immersion tank 10 can be sufficiently suppressed or reduced, so that energy saving, resource saving and energy saving can be reduced. Space can be planned.
- a single-wafer or strip-shaped workpiece such as a printed circuit board or flexible printed circuit board is carried in and out in a horizontal direction into a dipping tank such as a mating tank with a substantially vertical cross section.
- the moving speed of the workpiece is relatively slow.
- the moving speed of the workpiece is, for example, in the range of about 0.1 lm to 30 m / min, and is usually 0.1 to 2 m / min.
- the workpiece moving speed is slow, unlike the case of moving the workpiece at a high speed of, for example, 30 Om / min, fluid lubrication due to the moving speed of the workpiece cannot be expected much.
- the present invention by jetting a jet of the processing liquid to the workpiece, the position of the workpiece is stabilized by this fluid action, and the workpiece can be carried in and out without contact.
- a non-contact liquid sealing device is provided on the side wall provided with the slit of the immersion tank, and a non-contact is achieved by stabilizing the position of the workpiece by ejecting a jet.
- the outflow of the processing solution from the immersion tank is suppressed or reduced.
- the spilled liquid is prevented from scattering or the processing liquid adhering to the workpiece.
- a configuration is known in which fluid is blown against the effluent from the slit and the workpiece from a position away from the slit of the immersion tank.
- the shape and dimensions of the non-contact liquid sealing device 22 are based on the analysis of the inertial and viscous forces of the fluid around the jet slit 40 based on fluid engineering, the fluid pressure distribution analysis by the finite element method, and the streamline simulation. It is desirable to set appropriately according to the above.
- Specific examples of the shape and dimensions of the non-contact liquid sealing device 22 include the distance between a pair of jet nozzle plates 34 facing each other across the workpiece 12, the thickness of the jet slit 40, and the length and shape of the throat portions 42 and 44. The shape, hole diameter, number, etc. of the jet nozzle 36.
- the single-wafer or strip-shaped workpiece 12 is immersed in the immersion tank 10 with the width direction being substantially vertical through the slit 20 of the immersion tank 10 filled with the treatment liquid.
- the jets of the processing liquid are ejected from both sides of the workpiece 12 toward the workpiece 12 from the plurality of jet nozzles 36 on both sides of the workpiece 12 in the jet slit 40.
- the outflow of the processing solution from 10 can be sufficiently suppressed or reduced without contact with the workpiece 12.
- FIG. 6 (a) is a plan view of a jet jet part in the non-contact liquid sealing device according to the present embodiment
- FIG. 6 (b) is a side view of the jet side of the jet jet part.
- the non-contact liquid according to the first embodiment Constituent elements similar to those of the sealing device are denoted by the same reference numerals, and description thereof is omitted or simplified.
- the basic configuration of the non-contact liquid sealing apparatus according to this embodiment is the same as that of the non-contact liquid sealing apparatus according to the first embodiment.
- the plurality of jet nozzles 36 arranged in the vertical direction on the protruding portion 38 of the jet nozzle plate 34, the holes of the jet nozzles 36 arranged below are as follows. Its main feature is that it has a long oval shape in the vertical direction.
- the liquid pressure of the treatment liquid filled in the immersion tank 10 increases from the liquid surface to the lower part. For this reason, the liquid pressure of the treatment liquid flowing out of the immersion tank 10 becomes higher in the lower part of the immersion tank 10. Therefore, it is preferable that the action of suppressing the outflow of the treatment liquid from the immersion bath 10 is strengthened as the lower side of the immersion bath 10.
- the plurality of jet nozzles arranged in the upper and lower directions on the protrusions 38 of the jet nozzle plate 34 are arranged below.
- Nozzle No. 36 The hole is longer and longer in the vertical direction!
- the flow rate of the processing liquid ejected as a jet can be increased as the jet nozzles 36 disposed below are provided. it can. Therefore, according to the present embodiment, the action of suppressing the outflow of the treatment liquid from the immersion tank 10 can be strengthened toward the lower part of the immersion tank 10, and the outflow of the treatment liquid from the immersion tank 10 can be further sufficiently suppressed or reduced. Can be reduced.
- the configuration in which the flow rate of the processing liquid ejected as a jet is increased as the jet nozzle 36 disposed below is not limited to the above configuration.
- the hole diameter of the jet nozzle 36 disposed below may be increased.
- the pitch of the holes of the plurality of jet nozzles 36 arranged in the vertical direction may be made denser toward the lower side.
- the number of rows of holes in the jet nozzles 36 arranged in the vertical direction may be changed according to the height, and the number of rows of holes in the jet nozzle 36 may be increased downward.
- the jet fluid pipe 32 is divided into a plurality of chambers in the vertical direction, the processing liquid ejected from the jet nozzle 36 is supplied to each of the plurality of chambers, and the flow rate of the processing liquid supplied to the lower chamber is increased. Also good.
- FIG. 7 (a) is a plan view of a jet ejection part in the non-contact liquid sealing apparatus according to the present embodiment
- FIG. 7 (b) is a side view of the jet side of the jet ejection part. Note that the same components as those of the non-contact liquid sealing apparatus according to the first and second embodiments are denoted by the same reference numerals, and description thereof is omitted or simplified.
- the basic configuration of the non-contact liquid sealing apparatus according to this embodiment is the same as that of the non-contact liquid sealing apparatus according to the first embodiment.
- the non-contact liquid sealing device according to the present embodiment is mainly characterized in that a slit-like jet nozzle 46 is provided in the jet nozzle plate 34 instead of the plurality of jet nozzles 36 having a circular hole.
- the jet nozzle plate 34 is provided with a slit-like jet nozzle 46 in the vertical direction.
- the width of the slit-like jet nozzle 46 becomes wider, for example, downward.
- the width of the slit-like jet nozzle 46 may be substantially constant in the vertical direction.
- the width of the slit-shaped jet nozzle 46 is, for example, about 0.;! To lmm.
- the slit-shaped jet nozzle 46 is connected to the jet fluid line 32.
- the slit-like jet nozzles 46 of the pair of jet nozzle plates 34 facing each other through the workpiece 12 are equally jetted from both sides of the workpiece 12 toward the workpiece 12, like the plurality of jet nozzles 36. Erupt.
- slit-like jet nozzles 46 may be provided instead of the plurality of jet nozzles 36 having circular holes.
- FIG. 8 is a sectional view showing the structure of the non-contact liquid sealing device according to the present embodiment. Note that the same components as those of the non-contact liquid sealing apparatus according to the first to third embodiments are denoted by the same reference numerals, and description thereof is omitted or simplified.
- the basic configuration of the non-contact liquid sealing apparatus according to the present embodiment is the same as that of the non-contact liquid sealing apparatus according to the first embodiment.
- the non-contact liquid sealing device according to this embodiment is directed to a direction inclined toward the immersion tank 10 with respect to a direction perpendicular to the moving direction of the work 12! Multiple jets facing in a direction substantially perpendicular to the moving direction
- the main feature is that the nozzle 48 is provided in the jet nozzle plate 34.
- the jet nozzle plate 34 provided on the work 12 side of the jet fluid pipe 32 has a surface facing the work 12 in the moving direction of the work 12. It has a substantially parallel flat portion 50.
- the surfaces on both sides of the flat portion 50 of the jet nozzle plate 34 are inclined surfaces.
- the plurality of jet nozzles 48 are arranged in the vertical direction on the immersion tank 10 side of the flat portion 50 in a range corresponding to the slit 20 of the immersion tank 10, and are connected to the jet fluid pipe 32. Yes.
- the holes of the plurality of jet nozzles 48 are arranged in a line on a plane facing the fork 12 of the flat portion 50, for example, at a substantially constant pitch in the vertical direction.
- the holes of the plurality of jet nozzles 48 are, for example, circular with the same diameter.
- Each jet nozzle 48 is oriented in a direction substantially perpendicular to the moving direction of the workpiece 12.
- Each jet nozzle 48 ejects the processing liquid supplied from the jet fluid pipe 32 as a jet toward the workpiece 12 substantially horizontally in a direction substantially perpendicular to the moving direction of the workpiece 12.
- a throat part 42 whose width increases toward the immersion tank 10 side is formed on the immersion tank 10 side of the jet slit 40.
- a throat portion 44 whose width increases toward the opposite side of the immersion tank 10 is formed on the opposite side of the jet slit 40 from the immersion tank 10. The length of the workpiece 12 in the moving direction is longer in the throat part 44 on the immersion tank 10 side than in the throat part 44 on the opposite side to the immersion tank 10.
- the throat ⁇ , the jet slit 40, the throat portion 44, and the slit 20 in the immersion tank 10 are within a range corresponding to the slit 20. Is configured.
- the jets of the processing liquid are ejected from the plurality of jet nozzles 48 on both sides of the workpiece 12 evenly from both sides of the workpiece 12 toward the workpiece.
- the shape, pitch, and number of rows of the holes are changed, or the jet fluid pipe 32 is divided into a plurality of chambers, and the plurality of chambers are divided. You can also supply the processing liquid spouted from Nozure 48!
- FIG. 9 is a cross-sectional view showing the structure of the non-contact liquid sealing device according to the present embodiment.
- the same components as those of the non-contact liquid sealing apparatus according to the first to fourth embodiments are denoted by the same reference numerals, and the description thereof is omitted or simplified.
- the basic configuration of the non-contact liquid sealing apparatus according to the present embodiment is the same as that of the non-contact liquid sealing apparatus according to the first embodiment.
- the non-contact liquid sealing device according to the present embodiment is directed to the direction inclined to the immersion tank 10 with respect to the direction perpendicular to the moving direction of the workpiece 12.
- the main feature is that the jet nozzle plate 34 is provided with a plurality of jet nozzles 48 oriented in a direction substantially perpendicular to the moving direction of the workpiece 12.
- the jet nozzle plate 34 provided on the work 12 side of the jet fluid pipe 32 has a surface facing the work 12 in the moving direction of the work 12. It has a flat part 50 that is substantially parallel!
- the surface of the jet nozzle plate 34 on the immersion tank 10 side of the flat part 50 is farther away from the position of the work 12 than the face of the flat part 50 facing the work 12, and is substantially parallel to the moving direction of the work 12. Yes.
- the surface of the jet nozzle plate 34 on the opposite side of the immersion tank 10 in the flat part 50 is an inclined surface.
- the jet nozzle plate 34 includes a plurality of jet nozzles 36 provided on the immersion tank 10 side of the flat part 50 and a plurality of jet nozzles 36 provided at positions farther from the immersion tank 10 than the jet nozzle 36 of the flat part 50. It has a jet nozzle 48!
- the plurality of jet nozzles 36 are arranged in the vertical direction on the immersion tank 10 side of the flat portion 50 of the jet nozzle plate 34 in the range corresponding to the slit 20 of the immersion tank 10, and the jet fluid conduit Connected to 32.
- the holes of the plurality of jet nozzles 36 are formed, for example, in the vertical direction with a substantially constant pitch. Are arranged in a row at the corner facing the core 12.
- the holes of the plurality of jet nozzles 36 are, for example, circular with the same diameter.
- Each jet nozzle 36 is directed in a direction inclined toward the immersion tank 10 with respect to a direction perpendicular to the moving direction of the workpiece 12.
- Each jet nozzle 36 is directed toward the workpiece 12 in a direction substantially inclined in the direction inclined toward the immersion tank 10 with respect to the direction perpendicular to the moving direction of the workpiece 12, and the jet fluid pipe 3
- the processing liquid supplied from 2 is ejected as a jet.
- the plurality of jet nozzles 48 are flat in the range corresponding to the slits 20 of the immersion tank 10.
- the holes of the plurality of jet nozzles 48 are arranged in a line on a plane facing the fork 12 of the flat portion 50, for example, at a substantially constant pitch in the vertical direction.
- the holes of the plurality of jet nozzles 48 are, for example, circular with the same diameter.
- Each jet nozzle 48 faces in a direction substantially perpendicular to the moving direction of the workpiece 12.
- Each jet nozzle 48 ejects the processing liquid supplied from the jet fluid pipe 32 as a jet toward the workpiece 12 substantially horizontally in a direction substantially perpendicular to the moving direction of the workpiece 12.
- a throat portion 42 having a substantially constant width is formed between the jet nozzle plates 34 of the pair of jet jet portions 24 on the immersion tank 10 side of the jet slit 40.
- a throat portion 44 whose width increases toward the opposite side of the immersion tank 10 is formed on the opposite side of the jet slit 40 from the immersion tank 10.
- the throat ⁇ , the jet slit 40, the throat portion 44, and the slit 20 in the immersion tank 10 are within a range corresponding to the slit 20. Is configured.
- the treatment liquid jets are ejected from both sides of the workpiece 12 evenly from the plurality of jet nozzles 36 toward the workpiece 12 in the inclined direction on both sides of the workpiece 12!
- a plurality of jet nozzles 48 are provided on the jet nozzle plate 34! /!
- the jet nozzles 36 and 48 may be changed by changing the hole shape, pitch, number of rows, or by dividing the jet fluid pipe 32 into a plurality of chambers.
- the processing liquid ejected from the jet nozzles 36 and 48 may be supplied to each chamber.
- FIG. 10 is a cross-sectional view showing the structure of the non-contact liquid sealing apparatus according to this embodiment
- FIG. 11 is a schematic view showing another example of the seal roll in the non-contact liquid sealing apparatus according to this embodiment. Note that the same components as those of the non-contact liquid sealing apparatus according to the first to fifth embodiments are denoted by the same reference numerals, and description thereof is omitted or simplified.
- a pair of jets and jets are provided so as to face the outer surfaces of the end portions of the side walls 18 on both sides of the slit 20 via the workpiece 12 passing through the slit 20. 24 were arranged.
- the workpiece 12 comes into contact with the inner surface of the slit 20 of the immersion tank 10 and the jet nozzle plate 34 by jets of the processing liquid ejected evenly from both sides of the workpiece 12 from the pair of jet ejection portions 24 toward the workpiece 12. It is carried in and out of the immersion tank 10 with stability.
- both surfaces of the workpiece 12 are subjected to the mesh treatment.
- defects such as scratches, misalignments, scratches, discoloration, and the like.
- one surface of the workpiece 12 is a processing surface that should be subjected to processing such as a texture processing
- the other surface is a non-processing surface that does not need to be processed or that does not perform processing.
- liquid sealing means that contacts the non-processing surface of the workpiece 12 is provided on the non-processing surface side of the workpiece 12 in the slit 20. What is necessary is just to arrange.
- the non-contact liquid sealing device is a double-side non-contact type that performs liquid sealing while realizing a non-contact state on both surfaces of the work 12, whereas this embodiment
- the non-contact liquid sealing device according to is a one-side non-contact type that performs liquid sealing while realizing a non-contact state on one side of the work 12.
- the processing surface of the workpiece 12 of the slit 20 is provided.
- the non-processing surface 12b side of the work 12 of the slit 20 is provided as a liquid sealing means that contacts the non-processing surface of the work 12
- a seal roll 82 is arranged.
- FIG. 10 shows the structure of the non-contact liquid sealing device 78 according to the present embodiment provided on the side wall 18 on the carry-in side of the work 12 of the immersion tank 10.
- the non-contact liquid sealing device 78 provided on the side wall 18 on the carry-out side of the work 12 of the immersion tank 10 has a similar structure.
- a jet ejection portion 24 similar to the non-contact liquid sealing device according to the first embodiment is disposed on the processing surface 12a side of the workpiece 12 of the slit 20, a jet ejection portion 24 similar to the non-contact liquid sealing device according to the first embodiment is disposed on the processing surface 12a side of the workpiece 12 of the slit 20, a jet ejection portion 24 similar to the non-contact liquid sealing device according to the first embodiment is disposed on the processing surface 12a side of the workpiece 12 of the slit 20, a jet ejection portion 24 similar to the non-contact liquid sealing device according to the first embodiment is disposed on the processing surface 12a side of the workpiece 12 of the slit 20, a jet ejection portion 24 similar to the non-contact liquid sealing device according to the first embodiment is disposed on the processing surface 12a side of the workpiece 12 of the slit 20, a jet ejection portion 24 similar to the non-contact liquid sealing device according to the first embodiment is disposed on the processing surface 12a side of the workpiece 12 of the
- the side wall on the immersion tank 10 side of the jet squirting part 24 also serves as the side wall of the immersion tank 10! /, Shown as! /, Shown as 1 / S, for example, as shown in FIG.
- the side wall of the jet squirting part 24 and the side wall of the immersion tank 10 may be further fixed as iJi solid.
- a seal tank 80 opened on the workpiece 12 side is provided on the outer surface of the side wall 18 of the slit 20 on the non-processing surface 12b side of the workpiece 12.
- a cylindrical or cylindrical seal roll 82 is accommodated in the seal tank 80 so as to be rotatable about the central axis thereof.
- the seal roll 82 is a hollow pipe-shaped rigid body made of a resin such as polychlorinated bur and Teflon (registered trademark).
- the outer peripheral surface of the seal roll 82 may be a smooth surface, and a plurality of grooves along the axial direction of the seal roll 82 are provided over the entire outer peripheral surface. May be. Further, the seal roll 82 may have a stepped shape having a large-diameter portion with a thicker diameter near the upper end and the lower end.
- a weight (not shown) is provided on the bottom inside the seal roll 82 in order to stabilize the posture of the seal roll 82.
- the sheet roll 82 is provided with a recess at the lower end and the central portion of the upper end.
- a convex portion provided at the bottom of the seal tank 80 is fitted in the concave portion at the lower end.
- a convex portion provided at the upper portion of the seal tank 80 is fitted in the concave portion at the upper end.
- An appropriate gap is provided as an allowance for the fitting between the recess and the protrusion.
- the seal roll 82 is accommodated in the seal tank 80 so that there is an appropriate gap for play, and the seal roll 82 rotates while preventing the seal roll 82 from overturning. You can make it freely!
- the non-contact liquid sealing device 78 includes the jet ejection portion 24 disposed on the processing surface 12a side of the workpiece 12 of the slit 20, and the non-processing surface 12b side of the workpiece 12 of the slit 20.
- the main feature is that it has a seal roll 82 disposed on the surface.
- the jet fluid pipe is the same as in the first embodiment.
- the treatment liquid is supplied to 32, and a jet of treatment liquid is ejected from the plurality of jet nozzles 36 of the jet nozzle plate 34.
- the jet of the processing liquid is jetted from the jet nozzle 36 of the jet nozzle plate 34 toward the processing surface 12a of the workpiece 12 in the jet jet section 24.
- the seal tank 80 that stores the seal roll 82 disposed on the non-processing surface 12b side of the workpiece 12 of the slit 20 is filled with the processing liquid in the immersion tank 10 through the slit 20. .
- the seal roll 82 is automatically pressed against the non-processing surface 12b of the workpiece 12 by the liquid pressure of the processing liquid, and is pressed against the side wall of the sealing tank 80 facing the side wall 18 of the immersion tank 10.
- the seal roll 82 force comes into close contact with the non-processed surface 12 b of the work 12 and also comes into close contact with the side wall of the seal tank 80.
- the seal roll 82 in close contact with the non-processed surface 12b of the work 12 Rotate as the 12 moves.
- the force that the seal roll 82 is pressed against the work 12 and the force that the work 12 is pushed by the treatment liquid that is jetted from the jet jet part 24 are jetted from the jet jet part 24 so as to be balanced.
- the flow rate of the processing liquid is controlled so that the processing surface 12a of the workpiece 12 does not come into contact with peripheral members and parts such as the jet nozzle plate 34.
- each jet nozzle 36 of the jet jet portion 24 is appropriately set so that the processing liquid is jetted toward the contact portion of the seal roll 82 with the workpiece 12.
- each jet nozzle 36 faces a direction inclined toward the immersion tank 10 with respect to a direction perpendicular to the moving direction of the workpiece 12! /
- the direction in which each jet nozzle 36 is inclined toward the immersion tank 10 is set so that the processing liquid is jetted from each jet nozzle 36 toward the contact portion of the seal roll 82 with the workpiece 12.
- the jet flow is ejected from the jet ejection portion 24 on the processing surface 12a side of the workpiece 12 of the slit 20, thereby
- the outflow of the processing liquid from the slit 20 is suppressed or reduced while maintaining a non-contact state with peripheral members and parts such as the jet nozzle plate 34.
- the outflow of the processing liquid from the slit 20 is reduced or suppressed by the seal roll 82 that contacts the non-processing surface 12b of the workpiece 12.
- the processing surface 12a of the workpiece 12 is processed.
- the occurrence of defects such as scratches and discoloration can be reliably prevented, and the outflow of the processing liquid from the slit 20 of the immersion tank 10 can be further suppressed or reduced.
- the force S and the seal roll 82 are rotated by a motor such as a geared motor, which is described in the case where the seal roll 82 in close contact with the non-processed surface 12b of the work 12 rotates as the work 12 moves.
- the seal roll 82 may function not only as a liquid sealing means but also as a conveying means for conveying the workpiece 12.
- FIG. 11 shows a configuration in which the seal roll 82 is rotated by the geared motor 84.
- the seal roll 82 is rotatably supported by bearings 86a and 86b provided on the upper side and the lower side, respectively.
- the seal roll 82 may be configured to rotate by the geared motor 84 so that the seal roll 82 functions not only as a liquid seal means but also as a transport means.
- the present embodiment is also applied to the work S in which one surface of the workpiece 12 is the processing surface 12a and the other surface is the non-processing surface 12b, and the force S and both surfaces are processing surfaces.
- a non-contact liquid sealing device according to the form can be used.
- FIG. 12 is a plan view showing the structure of the continuous wet processing apparatus according to this embodiment.
- the same components as those of the non-contact liquid sealing device according to the first to sixth embodiments are denoted by the same reference numerals, and the description thereof is omitted or simplified.
- the scope of application of the control device is not limited to this.
- the non-contact liquid sealing apparatus according to the present invention continuously wet-processes a strip-shaped workpiece using a plurality of immersion tanks, such as the continuous wet processing apparatus described in Patent Document 4 by the present applicant. It can also be used as a liquid seal device in a continuous wet processing apparatus.
- the continuous wet processing apparatus according to the present embodiment uses the non-contact liquid sealing apparatus according to the present invention, for example, the non-contact liquid sealing apparatus according to the first embodiment as the liquid sealing apparatus.
- the continuous wet processing apparatus includes a plating processing unit 52 where plating processing is performed, and a work unwinding unit that continuously feeds the strip-shaped workpiece 12 to be plated to the staking processing unit 52. 54 and a workpiece take-up unit 56 for continuously collecting the workpiece 12 plated in the plating unit 52! /.
- the work unwinding section 54 is provided with an uncoiler 58 for feeding the strip-shaped work 12 wound in a coil shape in the longitudinal direction with its width direction being substantially vertical and introducing it into the plating processing section 52. .
- an accumulator device 60 is provided that keeps the tension of the workpiece 12 fed from the uncoiler 58 constant.
- the accumulator device 60 is provided with rollers 60a, 60b, 60c, and 60d for regulating the position of the work 12 from the side of the work 12 and for folding the work 12 back.
- the plating section 52 has a plurality of plating tanks 62a, 62b, 62c, 62d filled with a plating solution.
- the contact tanks 62a, 62b, 62c, 62d are provided with the non-contact liquid sealing device 22 according to the first embodiment on the opposite side walls, respectively.
- the work 12 is moved so that the width direction of the work 12 is substantially vertical so that the work 12 can be carried in the holding tanks 62a, 62b, 62c, 62d.
- the work 12 carried by the plating tanks 62a, 62b, 62c, 62di is transported out of the mating tanks 62a, 62b, 62c, 62d via the non-contact liquid sealing device 22 on the other side wall. It has become.
- the non-contact liquid sealing device 22 of the plating tank 62b changes the direction of the work 12 that has also been carried out, and the non-contact liquid sealing device is supplied to the plating tank 62c.
- a U-turn section 64 is provided for carrying in via 22.
- the U-turn section 64 includes rollers 64a and 64b for changing the direction of the workpiece 12.
- a power feed roll unit 66 for feeding power to the work 12 is provided in the vicinity of the non-contact liquid sealing device 22 on the work carry-in side and work carry-out side of each mating tank 62a, 62b, 62c, 62d.
- the power supply roll unit 66 is arranged so as to sandwich the work 12 and includes power supply rolls 66a, 66b, and 66c that contact the work 12 and supply power.
- a pretreatment tank 68 for removing dirt, etc. of the work 12 fed from the work unwinding part 54 is provided.
- the non-contact liquid sealing device 22 according to the first embodiment may be provided for the pretreatment tank 68 filled in the night.
- a cleaning chamber 70 for shower-cleaning the plated workpiece 12 is provided in the vicinity of the non-contact liquid sealing device 22 on the workpiece carry-out side of the plating tank 62d.
- a drying chamber 72 for drying hot air on the workpiece 12 cleaned in the cleaning chamber is provided in the vicinity of the cleaning chamber 70.
- a workpiece winding unit 56 for winding and collecting the workpiece 12 dried in the drying chamber 72 is arranged!
- the work take-up unit 56 is provided with a recoiler 74 that takes up and collects the work 12 fed by the plating processing unit 52 and sent in a substantially vertical width direction. Between the recoiler 74 and the drying chamber 72 of the tacking processing unit 52, a driving device 76 for sending the workpiece 12 to the recoiler 74 at a predetermined speed is provided.
- the driving device 76 includes rollers 76a, 76b, and 76c for folding the workpiece 12 and changing the moving direction of the workpiece 12.
- the non-contact liquid sealing device 22 may be provided for the plating tanks 62a, 62b, 62c, 62d, and the pretreatment tank 68 in the continuous wet processing apparatus.
- non-contact liquid sealing device 22 according to the first embodiment is provided as the liquid sealing device in the continuous wet processing apparatus, but according to the first embodiment.
- any of the non-contact liquid sealing devices 22 and 78 according to the second to sixth embodiments may be provided.
- FIG. 13 is a plan view showing the structure of the continuous wet processing apparatus according to the present embodiment.
- the same components as those of the non-contact liquid sealing apparatus according to the first to sixth embodiments and the continuous wet processing apparatus according to the seventh embodiment are denoted by the same reference numerals, and the description thereof is omitted or simplified.
- the workpiece 12 whose one surface is the processing surface 12a and whose other surface is the non-processing surface 12b is the processing target.
- the basic configuration of the continuous wet processing apparatus according to this embodiment is almost the same as the configuration of the continuous wet processing apparatus according to the seventh embodiment, but the non-contact liquid sealing apparatus 78 according to the sixth embodiment is used as the liquid sealing apparatus. This is different from the continuous wet processing apparatus according to the seventh embodiment in that each member is arranged to avoid contact with the processing surface 12a of the work 12 as much as possible.
- the work 12 is wound around the uncoiler 58 in a coil shape with the processing surface 12a inside.
- rollers 60a and 60d for regulating the position of the workpiece 12 from the side of the workpiece 12, and the rollers 60b and 60c for turning back the workpiece 12, only the roller 60b is The other roller 60a, 60c, 60d is in contact with the non-processing surface 12b of the workpiece 12 while being in contact with the processing surface 12a.
- each power supply roll section 66 In each power supply roll section 66, one power supply roller 66a arranged on the processing surface 12a side of the work 12 and two power supply rolls 66b and 66c arranged on the non-processing surface 12b side of the work 12 Work 12 is sandwiched. In each power supply roll section 66, one power supply roll 66a is in contact with the processing surface 12a of the work 12, whereas two power supply rolls 66b and 66c are connected to the non-processing surface 12b of the work 12. Talk to me.
- the non-contact liquid sealing device 78 according to the sixth embodiment is provided on the opposite side wall, respectively, and the non-contact liquid sealing device on one side wall is provided. 78 Then, the work 12 is moved so as to be loaded into the mating tanks 62a, 62b, 62c, 62d with the width direction being substantially vertical. Plating tanks 62a, 62b, 62c, 62di are loaded work pieces 12 (as is, they are carried out of the mating tanks 62a, 62b, 62c, 62d via the non-contact liquid sealing device 78 on the other side wall. It has become.
- each non-contact liquid sealing device 78 as in the case shown in Fig. 10, the jet ejection portion 24 is disposed on the processing surface 12a side of the workpiece 12, and the seal roll 82 is disposed on the non-processing surface 12b side of the workpiece 12. Is placed.
- the pretreatment tank 68 may also be provided with the non-contact liquid sealing device 78 according to the sixth embodiment, similarly to the plating tanks 62a, 62b, 62c, 62d.
- both the rollers 64a and 64b for changing the direction of the workpiece 12 are in contact with the non-processed surface 12b of the workpiece 12.
- rollers 76a and 76b for turning back the workpiece 12 and the workpiece.
- rollers 76c for changing the moving direction of 12 only the roller 76a is in contact with the processing surface 12a of the workpiece 12, and the other rollers 76b and 76c are in contact with the non-processing surface 12b of the workpiece 12.
- the workpiece 12 is wound and collected with the processing surface 12a facing inward.
- the non-contact according to the sixth embodiment is performed on the workpiece 12 in which one surface is the processing surface 12a and the other surface is the non-processing surface 12b.
- the liquid seal device 78 is used as a liquid seal device, and each member is arranged so as to avoid contact with the processing surface 12a of the workpiece 12 as much as possible.
- the number of rollers in contact with the non-processing surface 12b of the workpiece 12 is larger than the number of rollers in contact with the processing surface 12a of the workpiece 12.
- the number of power supply rolls in contact with the non-processing surface 12b of the work 12 is larger than the number of power supply rolls 66a in contact with the processing surface 12a of the work 12.
- the roller does not come into contact with the processing surface 12a of the workpiece 12.
- the number of rollers that contact the non-processing surface 12b of the workpiece 12 is larger than the number of rollers that contact the processing surface 12a of the workpiece 12.
- the processing surface 12a of the workpiece 12 is continuously wet.
- the force S it is possible to surely prevent the occurrence of defects such as scratches and discoloration due to contact with members in the processing apparatus, and to further suppress or reduce the outflow of the processing liquid from the slit 20 of the immersion bath 10.
- the force described in the case where a jet of the same processing liquid as the processing liquid filled in the immersion tank 10 is jetted from the jet nozzles 36, 46, 48 is jetted from the jet nozzles 36, 46, 48.
- the liquid jet 36, 46, 48, etc. may eject a liquid such as a treatment liquid or water different from the treatment liquid filled in the immersion tank 10.
- the fluid ejected from the jet nozzles 36, 46, 48 may be ejected from the jet nozzles 36, 46, 48, such as air, which is not limited to liquid.
- a gas such as a nitrogen gas that does not alter the work and the plating applied to the work may be ejected.
- a gas-liquid mixed fluid in which a gas and a liquid are mixed may be ejected from a jet nose, nozzle 36, 46, or 48 force. In the case of jetting gas with jet nose, nozzle 36, 46, 48 force, the outflow amount of liquid can be reduced compared with the case of jetting liquid.
- the width of the force jet slit 40 described in the case where the width of the jet slit 40 is substantially constant in the vertical direction may not be substantially constant.
- the width of the jet slit 40 may be narrowed downward.
- the fountain fluid pipe 32 is a rectangular tube.
- the jet fluid line 32 may be a round tube.
- a plurality of jet nozzles 36 may be provided directly in the round tubular jet fluid line 32.
- the jet nozzle 36 and the direction of movement of the workpiece 12 are substantially perpendicular to the direction inclined to the immersion tank 10 with respect to the direction perpendicular to the direction of movement of the workpiece 12.
- Direction The direction in which the force jet nozzle is directed in the case where either or both of the jet nozzles 48 facing in the direction is provided in the jet nozzle plate 34 is not limited to these.
- the jet nozzle plate 34 may be provided with a jet nozzle directed in a direction inclined to the opposite side of the immersion tank 10 with respect to a direction perpendicular to the moving direction of the workpiece 12. Further, these jet nozzles having different directions may be provided on the jet nozzle plate 34 in an appropriate combination.
- the width of the slit 20 of the immersion bath 10 may not be substantially constant in the vertical direction.
- the width of the slit 20 may be narrowed downward.
- the liquid sealing means for sealing is not limited to this.
- a liquid sealing means instead of the seal roll 82, for example, a plate-like or bar-like member made of sponge or rubber along the slit 20 on the side of the slit 20 is used as the non-processed surface of the workpiece 12. It may be provided in contact with 12b.
- a seal roll fixed so as not to rotate may be provided.
- the non-contact liquid sealing apparatus and method according to the present invention immerses a single wafer or a strip-shaped work in a state where the width direction is substantially vertical through a slit in a side wall of the immersion tank filled with the treatment liquid. This is extremely useful for reducing the outflow of the processing liquid from the immersion tank while preventing the occurrence of a workpiece defect during loading and unloading.
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Abstract
Description
Claims
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JP2008549217A JPWO2008072403A1 (ja) | 2006-12-14 | 2007-09-25 | 非接触液シール装置及び方法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013001945A (ja) * | 2011-06-15 | 2013-01-07 | Marunaka Kogyo Kk | 表面処理装置における薄板状被処理物の水平搬送装置、及びこの水平搬送装置のクランプ |
EP2854490A1 (en) * | 2013-09-25 | 2015-04-01 | ATOTECH Deutschland GmbH | Method and apparatus for a wet-chemical or electrochemical treatment |
KR20180071567A (ko) * | 2016-12-20 | 2018-06-28 | 주식회사 포스코 | 수평셀 도금장치 및 처리 장치 |
JP2019206729A (ja) * | 2018-05-28 | 2019-12-05 | 三菱電機株式会社 | 半導体装置の製造装置および半導体装置の製造方法 |
WO2022166996A1 (zh) * | 2021-02-05 | 2022-08-11 | 太原科技大学 | 在电极集流体上电沉积活性材料微粒的方法及装置 |
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- 2007-09-25 KR KR1020097012138A patent/KR20090101174A/ko not_active Application Discontinuation
- 2007-09-25 WO PCT/JP2007/068573 patent/WO2008072403A1/ja active Application Filing
- 2007-10-02 TW TW096136922A patent/TW200831719A/zh unknown
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JPS5118231A (en) * | 1974-08-07 | 1976-02-13 | Nippon Kokan Kk | Sutoritsupuno hyomenshorisochi |
JPS61155371U (ja) * | 1985-03-15 | 1986-09-26 | ||
JPH01156494A (ja) * | 1987-12-15 | 1989-06-20 | Nippon Mining Co Ltd | 電気メッキ方法及び装置 |
JPH11343597A (ja) * | 1998-05-29 | 1999-12-14 | Heelios:Kk | 外気遮断方法及びその装置並びに表面処理装置 |
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Cited By (7)
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JP2013001945A (ja) * | 2011-06-15 | 2013-01-07 | Marunaka Kogyo Kk | 表面処理装置における薄板状被処理物の水平搬送装置、及びこの水平搬送装置のクランプ |
EP2854490A1 (en) * | 2013-09-25 | 2015-04-01 | ATOTECH Deutschland GmbH | Method and apparatus for a wet-chemical or electrochemical treatment |
WO2015044013A1 (en) * | 2013-09-25 | 2015-04-02 | Atotech Deutschland Gmbh | Method and apparatus for a wet-chemical or electrochemical treatment |
KR20180071567A (ko) * | 2016-12-20 | 2018-06-28 | 주식회사 포스코 | 수평셀 도금장치 및 처리 장치 |
KR101886782B1 (ko) * | 2016-12-20 | 2018-08-08 | 주식회사 포스코 | 수평셀 도금장치 및 처리 장치 |
JP2019206729A (ja) * | 2018-05-28 | 2019-12-05 | 三菱電機株式会社 | 半導体装置の製造装置および半導体装置の製造方法 |
WO2022166996A1 (zh) * | 2021-02-05 | 2022-08-11 | 太原科技大学 | 在电极集流体上电沉积活性材料微粒的方法及装置 |
Also Published As
Publication number | Publication date |
---|---|
TW200831719A (en) | 2008-08-01 |
JPWO2008072403A1 (ja) | 2010-03-25 |
KR20090101174A (ko) | 2009-09-24 |
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