WO2007132737A1 - Procédé de production de verre sans alcali - Google Patents

Procédé de production de verre sans alcali Download PDF

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Publication number
WO2007132737A1
WO2007132737A1 PCT/JP2007/059683 JP2007059683W WO2007132737A1 WO 2007132737 A1 WO2007132737 A1 WO 2007132737A1 JP 2007059683 W JP2007059683 W JP 2007059683W WO 2007132737 A1 WO2007132737 A1 WO 2007132737A1
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WO
WIPO (PCT)
Prior art keywords
mass
glass
alkali
free glass
raw material
Prior art date
Application number
PCT/JP2007/059683
Other languages
English (en)
Japanese (ja)
Inventor
Mineko Yamamoto
Yasuo Hayashi
Hideki Kushitani
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Priority to JP2008515516A priority Critical patent/JP5212102B2/ja
Publication of WO2007132737A1 publication Critical patent/WO2007132737A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/004—Refining agents
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B3/00—Charging the melting furnaces
    • C03B3/02—Charging the melting furnaces combined with preheating, premelting or pretreating the glass-making ingredients, pellets or cullet
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/09—Materials and properties inorganic glass

Definitions

  • the present invention relates to a method for producing an alkali-free glass.
  • glass substrates for displays such as liquid crystal display devices are required to be substantially free of alkali metals
  • alkali-free glass is used as the glass substrate.
  • the glass substrate is required to have high chemical resistance and durability, to have few bubbles in the glass, and to have high uniformity and high flatness.
  • the alkali metal compound is not substantially contained in the glass raw material of the alkali-free glass, the glass raw material is hardly melted. For this reason, it is necessary to use silica sand having a small particle size as the main component of the glass raw material.
  • B 2 O As a raw material for B 2 O, it is cheap and available.
  • Orthoboric acid also called simply boric acid is used because of its ease.
  • orthoboric acid melted at the glass raw material inlet of the melting furnace and the alkaline earth metal compound are aggregated to easily cause lumps. Since orthoboric acid and alkaline earth metal compounds are components that promote the melting of silica sand, if lumps occur, the melting of the glass raw material in the melting furnace becomes non-uniform, and the composition of the molten glass is non-uniform. It becomes.
  • Patent Document 1 Japanese Patent Laid-Open No. 2003-40641
  • the present invention provides a production method capable of obtaining an alkali-free glass having high uniformity and flatness with less bubbles in the glass.
  • the method for producing an alkali-free glass of the present invention is the method for producing an alkali-free glass in which a glass raw material containing silica sand and a boron source is melted and molded. Of 100% by mass (BO equivalent), 10 ⁇ : LOO% by mass (BO equivalent)
  • a glass raw material having a composition that becomes an alkali-free glass having the following composition (1) in terms of oxide-based mass percentage is particularly preferable to use a glass raw material having a composition that results in an alkali-free glass having).
  • SiO 50 to 66% by mass
  • Al 2 O 10.5 to 22% by mass
  • B 2 O 5 to 12% by mass
  • MgO 0
  • SiO 50 to 61.5% by mass
  • A1 0 10.5 to 18% by mass
  • B 2 O 7 to 10% by mass
  • an alkali-free glass having high homogeneity and flatness with less bubbles in the glass can be obtained.
  • FIG. 1 is a schematic view showing a method for producing alkali-free glass in Examples.
  • FIG. 2 is a diagram showing measurement points of composition in a sample.
  • the alkali-free glass is produced by melting and forming a glass raw material containing silica sand and a boron source.
  • the alkali-free glass is manufactured as follows, for example.
  • aO, SrO, BaO), a clarifying agent, and the like are mixed at a ratio that makes the composition of the target alkali-free glass to prepare a glass raw material.
  • the glass raw material and, if necessary, cullet having the same composition as the target non-alkali glass composition are continuously charged into the melting furnace from the glass raw material inlet of the melting furnace, and 1500-1600 Melt at ° C to make molten glass.
  • the cullet is glass waste discharged in the process of manufacturing alkali-free glass.
  • the molten glass is formed to have a predetermined thickness by a known molding method such as a float method.
  • the average particle size D of silica sand is 15
  • the average particle size D of silica sand is 60 / z m
  • the silica sand is easily melted uniformly, so that an alkali-free glass with even more uniformity and flatness with fewer bubbles can be obtained.
  • Boron compounds as boron sources include orthoboric acid (HBO), metaboric acid (HBO), tetra
  • orthoboric acid In manufacturing, orthoboric acid is used because it is inexpensive and easily available.
  • boric anhydride is used as a boron source, 100% by mass of boron source (B 2 O conversion).
  • Anhydrous boric acid is 20 to: 40% by mass, more preferably 40 to 100% by mass, more preferably LOO mass%.
  • orthoboric acid is preferable because it is inexpensive and easily available.
  • raw materials include Al 2 O, alkaline earth metal oxides (MgO, CaO, SrO, BaO), etc.
  • a fining agent etc., ZnO, SO, F, Cl, Sn are used to improve meltability, fining, and moldability.
  • O may be included.
  • the glass raw material is a powdery mixture in which the respective raw materials are mixed.
  • the composition of the glass raw material is such that it becomes an alkali-free glass having a target composition.
  • a composition that becomes an alkali-free glass having the composition (2) or (3) described later is preferred, which is preferably an alkali-free glass having the composition (1) described later. Synthesis is particularly preferred.
  • the alkali-free glass obtained by the production method of the present invention contains SiO derived from silica sand and B 2 O derived from a boron source in its composition.
  • Non-alkali glass is Na 0, K
  • composition (1) [0023]
  • the alkali-free glass has properties as a glass substrate for a display (thermal expansion coefficient 25 X 10- 7 ⁇ 60 X 10 " V ° O, chemical resistance, durability, and the like.), Suitable for forming into flat glass
  • non-alkali glass having the following composition (1) in terms of mass percentage on an acid oxide basis is preferred.
  • Composition (2) [0024]
  • Alkali-free glass has a strain point of 640 ° C or higher, a low thermal expansion coefficient, and low density.
  • Alkali-free glass having the following composition (2) in terms of mass percentage on an oxide basis is particularly preferred because it is excellent, easy to melt and form, and suitable for float forming.
  • BaO 0 to 2% by mass
  • MgO + CaO + SrO + BaO 9 to 18% by mass (2).
  • the meltability of the glass becomes good and the devitrification property becomes good.
  • Al 2 O suppresses the phase separation of alkali-free glass, lowers the thermal expansion coefficient, and raises the strain point. By making Al 2 O 15% by mass or more, the above effect is exhibited. 22 masses of Al O
  • B O suppresses white turbidity of alkali-free glass due to BHF and does not increase viscosity at high temperatures.
  • MgO suppresses an increase in the thermal expansion coefficient and density of the alkali-free glass and improves the meltability of the glass raw material.
  • MgO 8 mass% By making MgO 8 mass% or less, white turbidity due to BHF is suppressed, and phase separation of alkali-free glass is suppressed.
  • CaO improves the meltability of the glass raw material.
  • SrO suppresses the phase separation of the alkali-free glass and suppresses white turbidity of the alkali-free glass due to BHF.
  • BaO suppresses the phase separation of the alkali-free glass, improves the meltability, and improves the devitrification characteristics.
  • MgO + CaO + SrO + BaO 9% by mass or more the meltability of the glass becomes good.
  • MgO + CaO + SrO + BaO 18% by mass or less the density of alkali-free glass is lowered.
  • composition (2) ZnO, SO, F, C are used to improve the meltability, clarity, and moldability.
  • SnO may be contained in a total amount of 5% by mass or less. Also, a lot of man-hours are required for processing cullet.
  • composition (3) [0034]
  • alkali-free glass As alkali-free glass, it has excellent characteristics as a glass substrate for displays, is excellent in reduction resistance, homogeneity, and bubble suppression, and is suitable for molding by float method.
  • An alkali-free glass having the following composition (3) is particularly preferred.
  • Al 2 O suppresses the phase separation of alkali-free glass, increases the strain point, and increases the Young's modulus.
  • B 2 O reduces the density of alkali-free glass, improves BHF resistance, and improves meltability
  • the devitrification characteristics are improved and the thermal expansion coefficient is lowered.
  • the strain point of the alkali-free glass is increased, the Young's modulus is increased, and the acid resistance is good.
  • MgO reduces the density of alkali-free glass and improves the meltability without excessively reducing the strain point without increasing the thermal expansion coefficient.
  • MgO 2% By making MgO 2% by mass or more, the above effects are exhibited. By making MgO 5 mass% or less, phase separation of alkali-free glass is suppressed, and devitrification characteristics, acid resistance and BHF 'resistance are improved.
  • CaO improves the meltability without excessively lowering the strain point without increasing the thermal expansion coefficient without increasing the density of the alkali-free glass.
  • the CaO content is 14.5% by mass or less, the devitrification property of the alkali-free glass is improved, the thermal expansion coefficient is decreased, the density is decreased, and the acid resistance and alkali resistance are improved.
  • BaO suppresses the phase separation of the alkali-free glass, improves the devitrification properties, and improves the chemical resistance.
  • the density of the alkali-free glass is lowered, the thermal expansion coefficient is lowered, the Young's modulus is increased, the meltability is improved, and the BHF resistance is improved.
  • MgO + CaO + SrO + BaO 16 mass% or more the meltability of the glass becomes good.
  • MgO + CaO + SrO + BaO 29.5% by mass or less the density and thermal expansion coefficient of Al-free glass are reduced.
  • composition (3) ZnO, SO, F, C are used to improve the meltability, clarity, and moldability.
  • SnO may be contained in a total amount of 5% by mass or less. Also, a lot of man-hours are required for processing cullet.
  • hydroboric acid as a boron source is 10 to L00 mass% (BO conversion) of 100 mass% (BO conversion) of the boron source.
  • orthoboric acid is used as a boron source.
  • silica sand having a small particle size aggregates and is obtained as a result.
  • Al force Bubbles increase in re-glass, and homogeneity and flatness decrease.
  • the inventors of the present invention have found that agglomeration of silica sand is caused by the water contained in the glass raw material, and in order to suppress the agglomeration of the silica sand, the water contained in the glass raw material should be reduced, that is, water in the molecule. It has been found that the amount of orthoboric acid containing a large amount of molecules can be reduced and the amount of boric anhydride can be increased. [0046] Further, in the conventional manufacturing method, when the glass raw material contains an alkaline earth metal compound, the orthoboric acid melted at the glass raw material inlet of the melting furnace and the alkaline earth metal compound aggregate. As a result, the resulting alkali-free glass has more bubbles, and the homogeneity and flatness are reduced.
  • the inventors of the present invention lost one water molecule from orthoboric acid heated at the glass raw material inlet to become metaboric acid, and the metaboric acid and the alkaline earth metal compound liquidized at 150 ° C or higher aggregated.
  • boric anhydride in which water molecules are further lost from metaboric acid, may be used.
  • Oxygen-based mass percentage display SiO: 60% by mass, Al 2 O: 17% by mass, B 2 O: 8 quality
  • the boron source is orthoboric acid and BO equivalent.
  • Hydroboric acid was mixed in the ratio shown in Table 1.
  • a glass raw material 12 having an amount of 250 g after vitrification is converted into a bottomed cylindrical crucible made of platinum rhodium having a height of 9 Omm and an outer diameter of 70 mm.
  • the glass raw material 12 was melted by heating at a corresponding temperature for 1 hour.
  • FIG. 1 (b) After cooling the molten glass together with the crucible 14, as shown in FIG. 1 (b), a sample 18 having a center part force of the alkali-free glass 16 in the crucible 14 of 24 mm in length, 35 mm in width, and 1 mm in thickness was cut out.
  • the maximum force of SiO (mass%) also subtracts the minimum value of SiO (mass%).
  • a boron source containing 10% by mass (in terms of BO) or more can be used. It can be seen that the homogeneity of Lucari glass is improved.
  • SiO 57% by mass
  • Al 2 O 12% by mass
  • B 2 O 9 quality
  • C1 is 0.7 mass% in terms of concentration and SO is in terms of concentration with respect to 100 mass% of the glass mother composition raw material.
  • SiO 60% by mass
  • Al 2 O 19% by mass
  • B 2 O 9 quality
  • C1 is 0.7 mass% in terms of concentration and SO is 0.5 in terms of concentration with respect to 100 mass% of the glass mother composition raw material.
  • SiO 60% by mass
  • Al 2 O 17% by mass
  • B 2 O 8 quality
  • C1 is 0.7 mass% in terms of concentration and SO is 0.5 in terms of concentration with respect to 100 mass% of the glass mother composition raw material.
  • the boron source is orthoboric acid and anhydrous boron in terms of B 2 O.
  • SiO 60% by mass
  • Al 2 O 17% by mass
  • B 2 O 8 quality
  • Elemental compounds and other raw materials are adjusted to make a glass mother composition raw material, and as a fining agent, C1 is 0.7% by weight in terms of concentration and SO is a concentration with respect to 100% by weight of the glass mother composition raw material.
  • the surface roughness of the center portion (about 6.6 m 2 ) in the width direction on the lower surface of the alkali-free glass was measured with a surface roughness shape measuring instrument (Surfcom 1400D, manufactured by Tokyo Seimitsu Co., Ltd.).
  • the bottom surface is a surface that is in contact with the molten Sn in the float bath when the molten glass is formed by the float process, and the width direction is a direction orthogonal to the traveling direction of the strip-like non-alkali glass.
  • the measurement conditions were based on JIS B0601-1982, cut-off type: 2RC (phase compensation), cut-off wavelength: 0.8 to 8. Omm, and least square linear correction.
  • boric anhydride was added to 10% by mass (BO conversion) or less of 100% by mass (BO conversion) of the boron source.
  • the alkali-free glass obtained by the production method of the present invention has high uniformity and flatness with less bubbles in the glass. It also has excellent chemical resistance and durability because it contains B 2 O.
  • the alkali-free glass is useful as a glass substrate for a display such as a liquid crystal display device.
  • a display such as a liquid crystal display device.

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)

Abstract

La présente invention concerne un procédé de production grâce auquel on peut obtenir un verre sans alcali réduit en termes d'inclusion de bulle et hautement homogène et plat. Le procédé de production de verre sans alcali comprend la fusion de matériaux de verre brut comprenant du sable de silice et une source de bore et la formation d'un bain, la source de bore étant une source comprenant de 10 à 100 % en masse d'anhydride borique (en termes de B2O3) sur la base de la source de bore (en termes de B2O3).
PCT/JP2007/059683 2006-05-12 2007-05-10 Procédé de production de verre sans alcali WO2007132737A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008515516A JP5212102B2 (ja) 2006-05-12 2007-05-10 無アルカリガラスの製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-133690 2006-05-12
JP2006133690 2006-05-12

Publications (1)

Publication Number Publication Date
WO2007132737A1 true WO2007132737A1 (fr) 2007-11-22

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PCT/JP2007/059683 WO2007132737A1 (fr) 2006-05-12 2007-05-10 Procédé de production de verre sans alcali

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JP (1) JP5212102B2 (fr)
KR (1) KR101022682B1 (fr)
CN (1) CN101443283A (fr)
TW (1) TW200800829A (fr)
WO (1) WO2007132737A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103274596A (zh) * 2013-06-07 2013-09-04 中国建筑材料科学研究总院 一种制备无碱玻璃基板的方法
JP2014088306A (ja) * 2012-10-02 2014-05-15 Avanstrate Inc ガラス基板の製造方法および製造装置
WO2024111439A1 (fr) * 2022-11-25 2024-05-30 日本電気硝子株式会社 Procédé de production de verre et appareil de production de verre

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JP5920342B2 (ja) * 2011-05-25 2016-05-18 旭硝子株式会社 造粒体およびその製造方法、溶融ガラスの製造方法、ならびにガラス物品の製造方法
TWI671273B (zh) * 2014-10-23 2019-09-11 日商Ａｇｃ股份有限公司 無鹼玻璃
CN109476567B (zh) * 2016-07-27 2022-08-09 科慕埃弗西有限公司 用于生产卤化烯烃的方法
CN107010833A (zh) * 2017-04-06 2017-08-04 蚌埠玻璃工业设计研究院 一种薄膜太阳能电池玻璃基板的制备方法
CN111863157B (zh) * 2020-07-31 2021-10-15 广州博依特智能信息科技有限公司 一种玻璃生产过程的原料质量确定方法

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JPH09156953A (ja) * 1995-12-11 1997-06-17 Nippon Electric Glass Co Ltd 無アルカリガラス基板
JPH1072237A (ja) * 1996-06-03 1998-03-17 Asahi Glass Co Ltd 無アルカリガラスおよび液晶ディスプレイパネル
JPH11180727A (ja) * 1997-12-22 1999-07-06 Central Glass Co Ltd 表示装置用基板ガラス組成物
JPH11180726A (ja) * 1997-03-28 1999-07-06 Asahi Glass Co Ltd プラズマディスプレイパネル用基板および低融点ガラス組成物
JP2000143280A (ja) * 1998-11-09 2000-05-23 Central Glass Co Ltd ソーダ石灰シリカ系ガラス

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JP3993301B2 (ja) * 1997-12-16 2007-10-17 株式会社住田光学ガラス 長残光および輝尽発光を呈する酸化物ガラス
JP4151143B2 (ja) * 1998-02-13 2008-09-17 旭硝子株式会社 電極被覆用低融点ガラス粉末およびプラズマディスプレイ装置
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JP4400362B2 (ja) * 2003-08-08 2010-01-20 日本電気硝子株式会社 外部電極蛍光ランプ用外套容器

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Publication number Priority date Publication date Assignee Title
JPH09156953A (ja) * 1995-12-11 1997-06-17 Nippon Electric Glass Co Ltd 無アルカリガラス基板
JPH1072237A (ja) * 1996-06-03 1998-03-17 Asahi Glass Co Ltd 無アルカリガラスおよび液晶ディスプレイパネル
JPH11180726A (ja) * 1997-03-28 1999-07-06 Asahi Glass Co Ltd プラズマディスプレイパネル用基板および低融点ガラス組成物
JPH11180727A (ja) * 1997-12-22 1999-07-06 Central Glass Co Ltd 表示装置用基板ガラス組成物
JP2000143280A (ja) * 1998-11-09 2000-05-23 Central Glass Co Ltd ソーダ石灰シリカ系ガラス

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014088306A (ja) * 2012-10-02 2014-05-15 Avanstrate Inc ガラス基板の製造方法および製造装置
CN103274596A (zh) * 2013-06-07 2013-09-04 中国建筑材料科学研究总院 一种制备无碱玻璃基板的方法
CN103274596B (zh) * 2013-06-07 2016-06-08 中国建筑材料科学研究总院 一种制备无碱玻璃基板的方法
WO2024111439A1 (fr) * 2022-11-25 2024-05-30 日本電気硝子株式会社 Procédé de production de verre et appareil de production de verre

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Publication number Publication date
JPWO2007132737A1 (ja) 2009-09-24
JP5212102B2 (ja) 2013-06-19
CN101443283A (zh) 2009-05-27
KR101022682B1 (ko) 2011-03-22
KR20080085075A (ko) 2008-09-22
TWI348460B (fr) 2011-09-11
TW200800829A (en) 2008-01-01

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