WO2006085681A1 - 感光性組成物除去液 - Google Patents
感光性組成物除去液 Download PDFInfo
- Publication number
- WO2006085681A1 WO2006085681A1 PCT/JP2006/302678 JP2006302678W WO2006085681A1 WO 2006085681 A1 WO2006085681 A1 WO 2006085681A1 JP 2006302678 W JP2006302678 W JP 2006302678W WO 2006085681 A1 WO2006085681 A1 WO 2006085681A1
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- WIPO (PCT)
- Prior art keywords
- photosensitive composition
- mass
- pigment
- esters
- cyclic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
- C09D9/005—Chemical paint or ink removers containing organic solvents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Definitions
- the present invention relates to a photosensitive composition remover.
- the present invention is particularly apparent in the process of forming a photosensitive composition film on a glass substrate or a semiconductor wafer.
- the photosensitive composition removing liquid of the present invention is a process for forming a photosensitive composition film on a substrate particularly in the production of color filters used in liquid crystals, organic ELs, and image sensors. It is useful for removing a photosensitive composition film containing an uncured pigment remaining in a part, or for removing a photosensitive composition containing an uncured pigment adhered to the surface of an apparatus member or an apparatus.
- the pigment dispersion method, dyeing method, printing method, electrodeposition method, etc. are used as the pattern formation method for RGB or resin black matrix in the production of color fills used in liquid crystal, organic EL, image sensors, etc. It is done.
- the pigment dispersion method is a method in which each color is patterned by photolithography using a photosensitive composition containing a pigment, and a stable colored film can be obtained. It is a suitable method.
- the coating method includes spin coating and slit coating. There are known methods such as wire bar coating, roll coating, dip coating, spray coating, or a combination thereof.
- the photosensitive composition When spin coating is performed, the photosensitive composition is usually used to remove the photosensitive composition adhering to the peripheral portion of the substrate after the photosensitive composition coating, the rising portion of the photosensitive composition film on the edge portion, and the back surface. A rinsing process with a material removal solution, so-called edge rinsing, knock rinsing is performed. Further, in spin coating, a photosensitive composition removing process using a photosensitive composition removing liquid is also performed in a process of removing the photosensitive composition scattered in the cup, that is, a so-called coupling.
- the photosensitive composition coating process in color filter production includes photosensitive composition coating using a slit coat method, coating using a wire bar, and roll coating overnight. Even in these methods, unnecessary photosensitive compositions attached to a part or all of the coating apparatus such as slit nozzles and wire bars are removed after application of the photosensitive composition. .
- a photosensitive composition containing a pigment used for color filter production that is,
- the color resist used for RGB formation and the black resist used for resin black matrix formation contain pigment components on the substrate and equipment. It tends to remain on the surface, and even a small amount of these may cause foreign matters, resulting in an increase in the defective rate of color filter manufacture, or a change in color purity or a decrease in contrast of the color filter.
- color fills used in color displays have a growing demand for larger screens, higher definition, and lower costs. Avoiding residual photosensitive composition components that affect performance and yield is becoming increasingly important.
- glycol ether, its ester, or a mixture thereof has been generally used as a photosensitive composition remover (see, for example, Japanese Patent Publication No. 4 1 4 9 9 3 8). When applied to the cleaning and removal of color resists, there was a problem that the resist removability was not sufficient, and a large amount of removal solution was required or removal residue was generated.
- the object of the present invention is to remove a photosensitive composition having excellent photosensitive composition removal performance. It is to provide a effluent.
- a photosensitive composition film containing a pigment remaining on the peripheral portion, edge portion or back surface portion of the substrate is used.
- the present invention provides a removal liquid effective for removal or removal of a photosensitive composition containing a pigment adhering to the surface of an apparatus member or instrument.
- At least one solvent selected from alkylene glycol monoalkyl ether carboxylic acid esters, alkoxy carboxylic acid esters, and alicyclic ketones is used as component 1
- chain amides At least one solvent selected from cyclic amides, sulfur-containing compounds and cyclic esters may be referred to as component 2
- aromatic hydrocarbons having 9 or more carbon atoms may be referred to as component 3.
- the inventors of the present invention have made extensive studies to solve the above problems. As a result, it has been found that the use of a removing liquid having a specific composition improves the cleaning and removing properties of the pigment-containing photosensitive composition, and the present invention has been completed.
- the present invention includes, for example, the following matters.
- a photosensitive composition removing liquid comprising:
- a photosensitive composition removing liquid comprising:
- a photosensitive composition removing liquid comprising:
- a photosensitive composition removing liquid comprising:
- a photosensitive composition removing liquid comprising:
- a photosensitive composition removing liquid comprising:
- the aromatic hydrocarbon having 9 or more carbon atoms is an alkylbenzene having a boiling point of 1550 to 2500 ° C A photosensitive composition remover.
- At least one solvent selected from chain amides, cyclic amides, sulfur-containing compounds and cyclic esters is N, N-dimethylformamide, N, N-dimethylacetamide, N
- the alkylene glycol monoalkyl ether carboxylate ester is at least one selected from the group consisting of propylene glycol monomethyl ether acetate and 3-methoxybutyl acetate.
- the photosensitive composition removing liquid according to any one of [8].
- the photosensitive composition removing liquid of the present invention remains on the periphery, the edge, or the back of the substrate in the step of forming a photosensitive composition film on the substrate in the production of liquid crystals, organic EL, image sensors, and the like. It can be effectively used to remove the photosensitive composition film containing the pigment to be removed, or to remove the photosensitive composition containing the pigment adhered to the surface of the device member
- the photosensitive composition removing liquid of the present invention (hereinafter sometimes simply referred to as “removing liquid”) is used for the removal of a colored photosensitive composition containing a pigment.
- component 2 contains at least one kind of solvent (component 2) selected from the group of amides, sulfur-containing compounds and cyclic esters.
- the alkylene glycol monoalkyl ether carboxylic acid ester, alkoxy carboxylic acid ester, and alicyclic ketone (component 1) used in the present invention have high solubility of the resin component contained in the photosensitive composition.
- Component 1 suitably used as the main component of the photosensitive composition removing liquid include alkylene glycol monoalkyl ether carboxylic acid esters such as ethylene glycol monomethyl ether acetate and ethylene glycol.
- Jetylene glycol monomethyl ether acetate Jetylene glycol monoethyl ether acetate, Jetylene glycol monomethyl ether acetate — ⁇
- Propylene glycol 3-methyl monomethyl acetate Dipropylene glycol monomethyl ether 1-methylacetate, 3-methylbutylacetate, 3-methyl-3-acetylbutylacetate, etc. as alkoxy-powered sulfonic acid X-sters, 2-methylmethylacetate, 2- Ethyl xyacetate, 3-ethyl oxypropionate, 3-methoxyp methyl methyl pionate, 3-methyl ethyl oxypropionate, 3-methyl methyl propionate
- cycloaliphatic cannes examples include cyclohexanone, cyclohexanone, methylcyclohexanone, and the like. The present invention is not limited to these.
- propylene glycol monomethyl ether teracete, 3-methyl methyl propionate, ethyl 3-hydroxypropionate, cyclohexanone, and cyclopentanone are available for removal of photosensitive compositions. Ease and safety are preferred.
- the alkylene diol monoalkyl ester, tercarboxylic acid ester, alkoxy force sulfonic acid ester, and alicyclic cane contained in the removing solution of the present invention may be used alone or in combination of two or more.
- At least one solvent (component 2) selected from chain amides, cyclic amides, sulfur-containing compounds and cyclic esters that may be used in combination is the removal performance of the photosensitive composition removal solution, That is, it is effective in that the solubility of the resin component and the pigment removal performance are further improved.
- Specific examples include formamide, N-methylformamide, N, N-dimethylformamide, N-ethylformamide, N, N-jetylformamide, N, N for chain amides.
- Examples of the class include alpha-lactolactone, but the present invention is not limited thereto.
- N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide and alpha pyrrolactone enhance the dissolution and removal of the photosensitive composition.
- Component 2 contained in the removal liquid of the present invention is independent. It may be a combination of two or more.
- the preferred ratio of component 1 and component 2 is 99 to 70% for component 1, and component 2 force S1 to 30%.
- Component 2 is contained in the photosensitive composition removing liquid of the present invention for the purpose of further improving the photosensitive composition removing performance of Component 1, but an anthraquinone pigment such as C I.
- an anthraquinone pigment such as C I.
- a red photosensitive composition containing pigments such as pigment tread 1 7 7 and diketopyrrole-pillar pigments such as C. I. pigment tread 2 5 4
- the removal liquid composition contains component 1 in a range of 99 to 80% and component 2 in a range of 1 to 20%. Within this range, the cleaning performance of the photosensitive composition removing liquid of the present invention with respect to the red photosensitive composition is high, and the red pigment is less likely to aggregate and settle, and is more preferable.
- Phthalocyanine-based applications such as CI Pigment Blue 15 5, 15 5: 1, 15 5: 4, 15: 6, CI Pigment Green 36, carbon black and other pigments
- the component 2 contained in the photosensitive composition of the present invention exhibits the effect of improving the removal performance with a content of 5% or more.
- the photosensitive composition removing liquid of the present invention is particularly effective when the component 1 is in the range of 95 to 70% and the component 2 is in the range of 5 to 30%. It is more preferable because aggregation and precipitation of the pigment hardly occur.
- the removing liquid of the present invention comprises at least one solvent (component 1) selected from alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters and alicyclic ketones, and chain amides, Selected from cyclic amides, sulfur-containing compounds and cyclic esters
- solvent component 1
- aromatic hydrocarbons having 9 or more carbon atoms component 3
- the aromatic hydrocarbon having 9 or more carbon atoms (component 3) contained in the present invention is preferably an aromatic hydrocarbon substituted with an alkyl group, and examples thereof include alkylbenzenes and alkylnaphthalenes. it can.
- the alkyl group may be linear or branched, or two or more groups may be linked to form a cyclic structure.
- the aromatic hydrocarbon has 9 or more carbon atoms, preferably 12 or less.
- component 3 examples include 1, 2, 3 — trimethylbenzene, 1, 2, 4 trimethylbenzene, 1, 3, 5_trimethylbenzene, 1-ethyl-2-methylbenzene, 1 —Ethyl _ 3 —Methylbenzene, 1 —Hetyl 4 _Methylbenzene, n-propylbenzene, cumene, n-butylbenzene, sec —butylbenzene, iso-butylbenzene, 1, 2, 2, 3, 4-tetramethyl Benzene, 1, 2, 3, 5—tetramethylbenzene, 1, 2, 4, 5—tetramethylbenzene, 1,2_dimethyl-3-ethylbenzene, 1,2-dimethyl-4-ethylbenzene, 1,3-Dimethyl-2-ethylbenzene, 1,3-Dimethyl-4_ethylbenzene, 1,3-Dimethyl-5-ethylbenzene, 1,4-Dimethyl
- aromatic hydrocarbons may be contained alone in the photosensitive composition removing solution, or may be contained as a combination of two or more.
- alkylbenzenes having a boiling point of 1550 to 2500 ° C have high removal performance for photosensitive compositions, particularly for photosensitive compositions containing pigments, and are suitable for removal of photosensitive compositions. It is preferable because of its dryness.
- alkylbenzenes are alkylbenzenes having 9 or 10 carbon atoms, and specific examples include 1,2,3-trimethylbenzene, 1,2,4—trimethylbenzene, 1, 3, 5 — Trimethylbenzene, 1 — ethyl _ 2 — methylbenzene, 1 — ethyl — 3 — methylbenzene, 1 — ethylyl 4 _ methylbenzene, n — propylbenzene, cumene, n — butylbenzene, sec Tylbenzene, iso —butylbenzene, 1, 2, 3, 4 —tetramethylbenzene, 1, 2, 3, 5, 5 —tetramethylbenzene, 1, 2, 4, 5 —tetramethylbenzene, 1, 2 — Dimethyl-3-ethyl benzene, 1,2-dimethyl-4-ethyl benzene, 1,3-dimethyl-2-ethyl, 1,
- the aromatic hydrocarbon may be prepared by any method, but a solvent naphtha having a high aromatic component ratio, for example, carbon number It is effective to use an alkylbenzene mixed solvent with 9 as the center.
- Shell Sol A (Trademark: Shell Chemical Co., Ltd., initial boiling point 1 60, dry point 1 8 2 ° C), Solvesso 1 0 0 (Trademark: manufactured by Exxon Chemical Co., Ltd., initial boiling point 1 6 4, dry point 1 76 ° C), Suzusol 1 0 0 0 (Trademark: Maruzen Petrochemical Co., Ltd., initial boiling point 1 6 1 ° C , Dry point 1 7 9 ° C), ibusol 10 0 (trademark)
- Component 3 is contained in addition to Component 1 and Component 2 of the photosensitive composition removing liquid of the present invention for the purpose of maintaining the dispersion of the pigment and further improving the removal performance of the photosensitive composition.
- the photosensitive composition removing liquid of the present invention contains component 1, component 2 and component 3, the preferred ratio of component 1, component 2 and component 3 is that component 1 is 98 to 40%, component 2 strength 1 ⁇ 30%, Component 3 is 30% or less. If component 3 is contained in an amount of 30% or less, it is possible to further enhance the removal performance of the pigment contained in the photosensitive composition without deteriorating the dissolution performance of the resin component contained in the photosensitive composition. Is preferred.
- the photosensitive composition removing liquid of the present invention containing Component 1, Component 2 and Component 3 is used as an anthraquinone pigment, for example, C. I. Pigment Tread 1 77 7, diketopyrrolopyrrole pigment, for example, C. I. Pigment Tread 2 5
- an anthraquinone pigment for example, C. I. Pigment Tread 1 77 7, diketopyrrolopyrrole pigment, for example, C. I. Pigment Tread 2 5
- the component 2 contained in the photosensitive composition removing solution of the present invention is 1% or more. If component 3 has a content of 30% or less, the effect of improving removal performance is exhibited.
- the removal liquid composition contains component 1 in the range of 99 to 50%, component 2 in the range of 1 to 20%, and component 3 in the range of 30% or less. More preferably. Within this range, the cleaning performance of the photosensitive composition removing solution of the present invention for the red photosensitive composition is high, and aggregation and sedimentation of the red pigment hardly occur.
- the photosensitive composition removing liquid of the present invention containing Component 1, Component 2 and Component 3 is used as a phthalocyanine pigment such as CI Pigment Blue 1 5, 15: 1, 15: 4, 15: 6, CI Pigment Green 36, for removing green, blue and black photosensitive compositions containing pigments such as carbon black
- a phthalocyanine pigment such as CI Pigment Blue 1 5, 15: 1, 15: 4, 15: 6, CI Pigment Green 36
- the removal effect is more improved when the content of the component 2 contained in the photosensitive composition of the present invention is 5% or more and the content of the component 3 is 30% or less. That is, when used for the removal of green, blue, and black photosensitive compositions, the present invention includes components 1 in a range of 95 to 40%, component 2 in a range of 5 to 30%, and component 3 in a range of 30% or less.
- the photosensitive composition remover is more preferable because it has a particularly high effect and hardly causes aggregation and precipitation of the pigment.
- the colored photosensitive composition to which the removing liquid of the present invention can be applied is a colored photosensitive composition containing a pigment, which is usually used in a color filter forming process for liquid crystals, organic EL, image sensors and the like.
- These colored photosensitive compositions are photosensitive compositions colored by containing a pigment, and generally contain a film-forming substance that can be developed with alkali, a photosensitive substance, and a pigment. .
- the film forming material contained in the colored photosensitive composition examples include acrylic resins, novolac resins, polyimide resins, and polyvinyl phenol resins. It can be suitably used for the removal of a colored photosensitive composition containing ril-based resin as a film-forming substance.
- the acrylic resin used as a film-forming substance is a polymer or copolymer having an alkali-soluble molecular weight of about 1,000 to 500,000 and containing a carboxyl group. Copolymers with ethylenically unsaturated monomers and other ethylenically unsaturated monomers are preferably used.
- the photosensitive material contained in the colored photosensitive composition is acrylic.
- the resin is used as a film-forming substance, hexarylbiimidazole compounds, triazine compounds, aminoacetophenone compounds, combinations of sensitizing dyes and organoboron salts compounds, thianocene compounds, oxadiazole compounds, etc. Can be mentioned.
- any pigment that is usually used in the production of color filters can be used without any problem.
- Organic, inorganic pigments such as black, yellow, red, blue, and green These can be used alone or as a mixture.
- Specific examples of the pigment include carbon black, acetylene black, lamp black, carbon nanotube, graphite, iron black, iron oxide black pigment, anilin black, cyanine bra, ink, titanium black, C.I. Yellow 2 0, 2 4 8 3, 8 6, 9 3, 1 0 9, 1 1 0, 1 1
- the colored photosensitive composition may further contain an ethylenically unsaturated monomer in addition to the above-mentioned film-forming substance, photosensitive substance and pigment.
- An ethylenically unsaturated monomer is a compound that polymerizes with radicals generated from a photopolymerization initiator upon irradiation with actinic rays.
- the colored photosensitive composition to which the removing liquid of the present invention is applied includes the above components
- organic solvents, pigment dispersants, adhesion improvers, leveling agents, development improvers, antioxidants, thermal polymerization inhibitors, and the like may be appropriately blended.
- the photosensitive composition removing liquid of the present invention can be applied to the removal of a colored photosensitive composition that has been applied to or adhered to an object to be cleaned, and particularly for the removal of a colored photosensitive composition before the photosensitive. It can be used suitably.
- the colored photosensitive composition may be in a state where a solvent is contained, or may be in a state after the solvent is volatilized.
- a method for removing the colored photosensitive composition a method of removing the cleaning liquid by spraying the cleaning liquid from a nozzle or the like in a rod shape, droplet shape or mist shape on the object to be cleaned, which has been coated or adhered, Examples thereof include a method of immersing an object to be cleaned, to which a colored photosensitive composition is attached, in the removal solution of the invention.
- the removing liquid of the present invention is an unnecessary uncured material that adheres to the peripheral portion, the edge portion, or the back surface portion of the substrate in the coating process of the colored photosensitive composition for producing a color filter used in a liquid crystal, organic EL, image sensor or the like. It can be suitably used for the removal of the above-mentioned colored photosensitive composition or the unnecessary uncured colored photosensitive composition adhering to a part or all of the coating apparatus.
- the removing liquid of the present invention is used to remove uncured colored photosensitive composition from the periphery, edge, or back surface of a substrate when a colored photosensitive composition is applied onto a substrate by a spin coating method, so-called edge rinse. Further, it can be suitably used as a rinse agent for the back rinse, and also for so-called coupling, in which the colored photosensitive composition scattered in the cup during spin coating is washed away.
- a method of applying a colored photosensitive composition on a substrate may be a slip coating method, a wire-barco coating method, or a roll.
- the coating method is known, when removing uncured colored photosensitive composition adhering to the surface of the applicator, such as slit nozzles, wire bars, and printing plates, The removal liquid of the present invention is preferably used.
- Another embodiment of the present invention is a plate from which the uncured photosensitive composition has been removed by the above method using the above-mentioned removal liquid, or a liquid crystal, an organic EL, and an organic EL.
- the detergency was evaluated in the following three stages by visual observation of the dissolution state of the photosensitive coloring composition after immersion in the removal solution for 3 minutes.
- the acrylic copolymer thus obtained had a solid content concentration of 22.1% by mass, an acid value of 9 2 mg KO HZ g, and a polystyrene-equivalent weight average molecular weight of 2 2, 0 measured by GPC. 0 0.
- Photosensitive Coloring Composition A Preparation of Black Photosensitive Coloring Composition
- Acrylic copolymer obtained in Preparation Example 1 30.0 parts by mass (solid content 6.6 parts by mass), EGA 5 0 parts by mass, Florene DOPA-3 3 (Trademark: Dispersant solid content concentration 30% by mass) 3. 3.3 parts by mass, Special B lack 4 (Degussa Carbon Black) 6.6 parts by mass
- After mixing the parts they were left for 1 kg. Further, after stirring for 1 hour, the mixture was passed through a three-roll mill (Model R III-1 RM-2 manufactured by Kodaira Manufacturing Co., Ltd.) four times.
- a black colored composition having a solid content concentration of 18.0% by mass was obtained.
- the black colored composition thus obtained was further added to 100 parts by mass of dipentose erythritol hexaacrylate, 4.4 parts by mass, 2 — (4-methoxyphenyl) 1, 4, 6 — Bis (trichloromethyl) 1 s-triazine 2.2 parts by mass and 5 parts by mass of EGA 25 were added and stirred sufficiently to obtain photosensitive coloring composition A.
- Photosensitive Coloring Composition B Preparation of Green Photosensitive Coloring Composition
- Acrylic copolymer obtained in Preparation Example 1 3 parts by mass (solid content 6.6 parts by mass), EGA 5. 0 parts by mass, Florene DOPA-3 3 (Trademark: Dispersing agent solid content concentration 30 mass%) manufactured by Kyoeisha Chemical Co., Ltd. 3. 3 parts by mass, 6.6 parts by mass of Pigment Green 3 6 I left it. Further, after stirring for 1 hour, it was passed through a three-roll mill (Model R III-1 RM-2 manufactured by Kodaira Seisakusho Co., Ltd.) four times. To adjust the concentration by adding EGA to the obtained green ink As a result, a green coloring composition having a solid content concentration of 18.0% by mass was obtained.
- the green colored composition thus obtained was further added to 100 parts by mass of dipentaerythritol hexaacrylate, 4.4 parts by mass, 4,4′-bis (N, N-jetylamino) benzophenone 0 7 parts by weight, 2, 2 'bis (o-black mouth phenyl) — 4, 4', 5, 5 '— tetraphenyl _ 1, 2' — bimidazol 2.3 parts by weight, tri Methylolpropane trispropionate 3.8 parts by mass and 2 parts by mass of EGA 4 were added and stirred sufficiently to obtain a photosensitive coloring composition B.
- Photosensitive Coloring Composition C Preparation of Red Photosensitive Coloring Composition
- Acrylic copolymer obtained in Preparation Example 1 30.0 parts by mass (solid content 6.6 parts by mass), EGA 5 0 parts by weight, Floren DOPA-3 3 (Trademark: Dispersant solid content concentration 30% by mass, manufactured by Kyoeisha Chemical Co., Ltd.) 3. 3 parts by weight, 6.6 parts by weight of Pigment ed 1 7 7 , Left 1mm. Further, after stirring for 1 hour, it was passed through a three-roll mill (model R III-1 RM-2 manufactured by Kodaira Manufacturing Co., Ltd.) four times.
- a red coloring composition having a solid content concentration of 18.0% by mass was obtained.
- dipentaaldehyde thritol hexacrylate — 4.4 parts by weight, Irgacure 3 69 (manufactured by Ciba Specialty Chemicals) 3.0 parts by weight, 3.8 parts by weight of dimethylolpropane trisitol port pioneto and 2 parts by weight of EGA 4 were added and stirred sufficiently to obtain photosensitive coloring composition C.
- the present invention comprises a photosensitive material containing a pigment remaining on the periphery, edge or back surface of the substrate.
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2006800001648A CN101044435B (zh) | 2005-02-09 | 2006-02-09 | 感光性组合物除去液 |
| EP06713819A EP1847876A4 (en) | 2005-02-09 | 2006-02-09 | REMOVAL SOLUTION OF PHOTOSENSITIVE PREPARATION |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005032732 | 2005-02-09 | ||
| JP2005-032732 | 2005-02-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2006085681A1 true WO2006085681A1 (ja) | 2006-08-17 |
| WO2006085681A9 WO2006085681A9 (ja) | 2006-09-28 |
Family
ID=36793236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2006/302678 Ceased WO2006085681A1 (ja) | 2005-02-09 | 2006-02-09 | 感光性組成物除去液 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7510815B2 (enExample) |
| EP (1) | EP1847876A4 (enExample) |
| JP (1) | JP4698435B2 (enExample) |
| KR (1) | KR100825865B1 (enExample) |
| CN (1) | CN101044435B (enExample) |
| TW (1) | TW200641560A (enExample) |
| WO (1) | WO2006085681A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015074777A (ja) * | 2013-10-11 | 2015-04-20 | Jx日鉱日石エネルギー株式会社 | 洗浄液組成物 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI276929B (en) * | 2003-12-16 | 2007-03-21 | Showa Denko Kk | Photosensitive composition remover |
| WO2008072193A2 (en) * | 2006-12-15 | 2008-06-19 | Liquid Colours (Pty) Ltd | Security composition |
| CN102093918B (zh) * | 2009-12-11 | 2014-07-09 | 济南开发区星火科学技术研究院 | 一种汽油辛烷值改进剂及制备方法 |
| CN105143984B (zh) * | 2013-03-07 | 2017-09-05 | 株式会社Lg化学 | 用于去除光阻剂的剥离剂组合物及使用其剥离光阻剂的方法 |
| KR102414295B1 (ko) * | 2016-01-22 | 2022-06-30 | 주식회사 이엔에프테크놀로지 | 포토레지스트 제거용 박리액 조성물 |
| KR102465602B1 (ko) * | 2018-08-31 | 2022-11-11 | 주식회사 이엔에프테크놀로지 | 신너 조성물 |
| CN116171404A (zh) * | 2020-08-11 | 2023-05-26 | 株式会社力森诺科 | 溶剂组合物 |
| CN118382688A (zh) * | 2021-11-23 | 2024-07-23 | 才将科技股份有限公司 | 一种清洗粘结层的组合物及其应用 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07128867A (ja) * | 1993-06-28 | 1995-05-19 | Tokyo Ohka Kogyo Co Ltd | レジスト洗浄除去用溶剤及びそれを使用する電子部品製造用基材の製造方法 |
| JPH07160008A (ja) * | 1993-12-06 | 1995-06-23 | Tokyo Ohka Kogyo Co Ltd | レジスト形成用塗布物あるいはレジストの洗浄除去用溶剤及びそれを使用する電子部品製造用基材の製造方法 |
| JPH1144960A (ja) * | 1997-06-24 | 1999-02-16 | Kurarianto Japan Kk | リソグラフィー用洗浄剤 |
| JP2000164671A (ja) * | 1998-11-27 | 2000-06-16 | Tokyo Electron Ltd | 基板処理装置 |
| JP2000204302A (ja) * | 1998-11-13 | 2000-07-25 | Masao Umemoto | 塗料剥離剤 |
| JP2002501105A (ja) * | 1998-01-21 | 2002-01-15 | ロデイア・シミ | ペイント剥離組成物 |
| JP2002341130A (ja) * | 2001-05-21 | 2002-11-27 | Dainippon Printing Co Ltd | 樹脂膜除去装置およびその方法 |
| JP2003167114A (ja) * | 2001-11-30 | 2003-06-13 | Toshiba Corp | 平面表示装置の製造方法 |
| JP2005128529A (ja) * | 2003-10-20 | 2005-05-19 | Dongjin Semichem Co Ltd | フォトレジスト除去用シンナー組成物 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1033464C (zh) * | 1994-09-14 | 1996-12-04 | 山东大学 | 去胶剂组合物 |
| KR100234532B1 (ko) * | 1996-09-21 | 1999-12-15 | 윤종용 | 반도체 제조공정의 포토레지스트 세정용 시너 조성물 및 그를 이용한 반도체장치의 제조방법 |
| JP2001194806A (ja) * | 1999-10-25 | 2001-07-19 | Toray Ind Inc | レジスト剥離方法 |
| KR100483846B1 (ko) * | 2002-10-15 | 2005-04-19 | 삼성전자주식회사 | 신너 조성물 및 이를 사용한 포토레지스트의 스트립핑 방법 |
| TWI276929B (en) * | 2003-12-16 | 2007-03-21 | Showa Denko Kk | Photosensitive composition remover |
| KR101142868B1 (ko) * | 2004-05-25 | 2012-05-10 | 주식회사 동진쎄미켐 | 포토레지스트 제거용 씬너 조성물 |
-
2006
- 2006-01-16 TW TW095101628A patent/TW200641560A/zh not_active IP Right Cessation
- 2006-02-09 KR KR1020067018245A patent/KR100825865B1/ko not_active Expired - Fee Related
- 2006-02-09 US US10/592,119 patent/US7510815B2/en active Active
- 2006-02-09 WO PCT/JP2006/302678 patent/WO2006085681A1/ja not_active Ceased
- 2006-02-09 EP EP06713819A patent/EP1847876A4/en not_active Withdrawn
- 2006-02-09 CN CN2006800001648A patent/CN101044435B/zh not_active Expired - Fee Related
- 2006-02-09 JP JP2006031922A patent/JP4698435B2/ja not_active Expired - Fee Related
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07128867A (ja) * | 1993-06-28 | 1995-05-19 | Tokyo Ohka Kogyo Co Ltd | レジスト洗浄除去用溶剤及びそれを使用する電子部品製造用基材の製造方法 |
| JPH07160008A (ja) * | 1993-12-06 | 1995-06-23 | Tokyo Ohka Kogyo Co Ltd | レジスト形成用塗布物あるいはレジストの洗浄除去用溶剤及びそれを使用する電子部品製造用基材の製造方法 |
| JPH1144960A (ja) * | 1997-06-24 | 1999-02-16 | Kurarianto Japan Kk | リソグラフィー用洗浄剤 |
| JP2002501105A (ja) * | 1998-01-21 | 2002-01-15 | ロデイア・シミ | ペイント剥離組成物 |
| JP2000204302A (ja) * | 1998-11-13 | 2000-07-25 | Masao Umemoto | 塗料剥離剤 |
| JP2000164671A (ja) * | 1998-11-27 | 2000-06-16 | Tokyo Electron Ltd | 基板処理装置 |
| JP2002341130A (ja) * | 2001-05-21 | 2002-11-27 | Dainippon Printing Co Ltd | 樹脂膜除去装置およびその方法 |
| JP2003167114A (ja) * | 2001-11-30 | 2003-06-13 | Toshiba Corp | 平面表示装置の製造方法 |
| JP2005128529A (ja) * | 2003-10-20 | 2005-05-19 | Dongjin Semichem Co Ltd | フォトレジスト除去用シンナー組成物 |
Non-Patent Citations (1)
| Title |
|---|
| See also references of EP1847876A4 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015074777A (ja) * | 2013-10-11 | 2015-04-20 | Jx日鉱日石エネルギー株式会社 | 洗浄液組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4698435B2 (ja) | 2011-06-08 |
| EP1847876A1 (en) | 2007-10-24 |
| JP2006251785A (ja) | 2006-09-21 |
| TWI346260B (enExample) | 2011-08-01 |
| TW200641560A (en) | 2006-12-01 |
| WO2006085681A9 (ja) | 2006-09-28 |
| KR20070088271A (ko) | 2007-08-29 |
| EP1847876A4 (en) | 2011-10-26 |
| CN101044435B (zh) | 2010-09-08 |
| CN101044435A (zh) | 2007-09-26 |
| US20070196775A1 (en) | 2007-08-23 |
| US7510815B2 (en) | 2009-03-31 |
| KR100825865B1 (ko) | 2008-04-28 |
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