WO2006035787A1 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- WO2006035787A1 WO2006035787A1 PCT/JP2005/017779 JP2005017779W WO2006035787A1 WO 2006035787 A1 WO2006035787 A1 WO 2006035787A1 JP 2005017779 W JP2005017779 W JP 2005017779W WO 2006035787 A1 WO2006035787 A1 WO 2006035787A1
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- WO
- WIPO (PCT)
- Prior art keywords
- pad
- power supply
- pad row
- supply line
- pads
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
Definitions
- the present invention relates to a semiconductor device, and relates to, for example, a layout of pads, power supply lines, and buffer circuits in a semiconductor chip.
- a semiconductor chip is provided with a pad (PAD) in order to input and output signals to and from the outside.
- PID pad
- a widely used pad layout is one in which pad rows are arranged along two opposite sides (or four sides) of a semiconductor chip.
- the length of the signal wiring that connects the pad array on the side adjacent to the memory cell array and the peripheral circuit increases. To do. As a result, there is a problem that the wiring resistance and the wiring capacitance increase and the signal is delayed.
- Patent Document 1 discloses an example of a node layout and a lead layout that can cope with a reduction in the size of a semiconductor chip, a multi-piny package, and a narrow pitch. Is disclosed. However, no consideration is given to the signal wiring length or the layout of the power supply lines and buffer circuits, and it is not always sufficient from the viewpoint of reducing signal delay and reducing the area occupied by the pattern in the external connection area. is not.
- Patent Document 1 JP-A-9 237800 Specification
- the present invention provides a semiconductor device that can reduce the signal delay by reducing the signal wiring length and reduce the pattern occupation area of the external connection region.
- the first power supply line extending in the first direction along one side of the semiconductor chip, and adjacent to the first power supply line and arranged in the first direction
- a second power line extending in the first direction so as to sandwich the first pad line between the first pad line and the first power line along the first pad line
- a first buffer circuit disposed between pads in the first pad row and operating with a voltage between the first and second power supply lines
- a second power supply line extending along the second pad line along the second pad line so as to sandwich the second pad line between the second power supply line and the second pad line
- a semiconductor device including a second buffer circuit disposed between the pads and operating with a voltage between the second and third power supply lines can be provided.
- a first power supply line extending in a first direction along one side of the semiconductor chip, and adjacent to the first power supply line and extending in the first direction.
- a first pad row arranged, and a second power supply line extending in the first direction so as to sandwich the first pad row between the first power supply line and the first pad row.
- the first buffer circuit, the second pad row arranged in the first direction adjacent to the second power supply line, and the second power supply line between the second power supply line and the second pad row.
- a third power supply line extending so as to sandwich the two pad rows, between the pad in the second pad row and the second power supply line, and the second power supply line Tsu is arranged between the pad third power supply line at node column, possible to provide a semiconductor device having a second buffer circuit to operate in the second, the voltage between the third power supply line.
- FIG. 1 is a plan view schematically illustrating a layout of a semiconductor memory chip for explaining a semiconductor device according to a first embodiment of the present invention.
- FIG. 2 is an enlarged plan view showing a portion surrounded by a broken line in FIG.
- FIG. 3 is a plan view for explaining the semiconductor device according to the first modification of the present invention and showing another layout example in which a portion surrounded by a broken line in FIG. 1 is enlarged.
- FIG. 4 is a plan view illustrating still another layout example in which a portion surrounded by a broken line in FIG. 1 is enlarged for explaining a semiconductor device according to a second modification of the present invention.
- FIG. 5 is an enlarged plan view showing a part surrounded by a broken line in FIG. 1, for illustrating a semiconductor device according to a second embodiment of the present invention.
- FIG. 6 is a plan view illustrating another layout example by enlarging a portion surrounded by a broken line in FIG. 1, for explaining a semiconductor device according to a third modification of the present invention.
- FIG. 7 is an enlarged plan view showing a portion surrounded by a broken line in FIG. 1, for illustrating a semiconductor device according to a third embodiment of the present invention.
- FIG. 8 is a plan view illustrating another example of layout by enlarging a portion surrounded by a broken line in FIG. 1, for illustrating a semiconductor device according to Modification 4 of the present invention.
- FIG. 9 is an enlarged plan view showing a portion surrounded by a broken line in FIG. 1, for illustrating a semiconductor device according to a fourth embodiment of the present invention.
- FIG. 10 is an enlarged plan view showing a part surrounded by a broken line in FIG. 1, for illustrating a semiconductor device according to a fifth embodiment of the present invention.
- FIG. 11 is an enlarged plan view showing a part surrounded by a broken line in FIG. 1, for illustrating a semiconductor device according to a sixth embodiment of the present invention.
- FIG. 1 is a plan view schematically showing a layout of a semiconductor memory chip.
- the semiconductor memory chip 11 includes cell arrays 12-1, 12-2, a peripheral circuit 13, and an external connection region 14.
- the external connection region 14 is arranged in the vicinity of the peripheral circuit 13 along one side of the chip 11.
- the external connection region 14 includes first to third power supply lines 23, 22, 21, first and second pad rows 26, 25, and first pads extending in one direction along one side of the chip 11. 1, the second buffer circuit is arranged.
- a power supply voltage VCC (or power supply voltage V CCQ) is applied to the power supply lines 23 and 21, and a power supply voltage VSS is applied to the power supply line 22.
- the pad row 26 is The pad rows 25 are arranged between the power lines 22 and 21, and are arranged between the power lines 23 and 22.
- the pad row 26 is provided with a plurality of pads 26-1 to 26-7 (here, seven as an example).
- a noffer circuit is provided in an empty area between these pads 26-1 to 26-7 or in an area between the pads 26-1 to 26-7 and the power supply lines 23 and 22.
- the pad row 26 is used for data input, output or input / output.
- the pad row 25 is provided with a plurality of pads 25-1 to 25-6 (here, six as an example). In the empty area between these pads 25-1 to 25-6 or the area between the pads 25-1 to 25-6 and the power supply lines 22 and 21, a nother circuit is provided.
- the pad row 25 is used for control signal input, output or input / output.
- the pads 25-1 to 25-6 in the pad row 25 are shifted about 1Z2 pitch along the first direction with respect to the pads 26-1 to 26-7 in the pad row 26.
- the pads 26-1 to 26-7 and 25-1 to 25-6 in the pad rows 26 and 25 are arranged in a staggered manner.
- FIG. 2 is a diagram for explaining in detail an example of the pattern layout of the external connection region 14 (pad, power supply line, and buffer circuit), and shows an enlarged portion surrounded by a broken line 28 in FIG. It is a top view.
- buffer circuits are provided in the empty areas between the pads in the pad rows 26 and 25 and in the area between the pads and the power supply lines. In this example, connect an input buffer or output buffer to each pad! / Speak.
- the input buffer 32-1 is disposed between the pads 26-1 and 26-2 and operates with the voltage between the power supply lines 23 and 22.
- the input buffer 32-1 includes an NMOS transistor N3 and a PMOS transistor P3. The gates of these transistors N3 and P3 are connected to the pad 25-1, and the drains are connected to the peripheral circuit 13. The signal input to the node 25-1 is supplied to the peripheral circuit 13 through the input buffer 32-1.
- the pad 25-1 is used for inputting a control signal, for example, and the input control signal is supplied to the peripheral circuit 13 via the input buffer 32-1.
- the output buffer 31-1 is composed of a PMOS transistor P2 arranged between the pad 26-1 and the power supply line 23, and an NMOS transistor N2 arranged between the pad 26-1 and the power supply line 22. ing.
- the transistors P2 and N2 connect the pad 25-1 in the second direction (crossing the first direction). Are arranged so as to be sandwiched along the direction of
- the gates of the transistors P2 and N2 are connected to the peripheral circuit 13, and the drains are commonly connected to the pad 25-1.
- the input buffer 32-2 is disposed in a free space on the left side of the pad 25-1, and operates with a voltage between the power supply lines 21 and 22.
- the input buffer 32-2 includes an NMOS transistor N1 and a PMOS transistor P1.
- the gates of these transistors Nl and PI are connected to the pad 26-1, and the drains are commonly connected to the peripheral circuit 13.
- the signal input to the nod 26-1 is supplied to the peripheral circuit 13 via the input canoffer 32-2.
- the output buffer 31-2 includes a PMOS transistor P2 disposed between the pad 26-1 and the power supply line 23, and an NMOS transistor N2 disposed between the pad 26-1 and the power supply line 22. ing.
- the transistors P2 and N2 are arranged to face each other so as to sandwich the pad 26-1 along the second direction.
- the gates of the transistors P2 and N2 are connected to the peripheral circuit 13, and the drains are connected to the pad 26-1 in common! RU
- the pad 26-1 is for data input / output, for example, and the input data is supplied to the peripheral circuit 13 via the input buffer 32-2, and the data transferred from the peripheral circuit 13 is received. It is output from the pad 26-1 via the output buffer 31-2.
- the input buffer 32-3 is arranged in a free space on the right side of the pad 25-1, and operates with the voltage between the power supply lines 21 and 22.
- the input buffer 32-3 includes an NMOS transistor N4 and a PMOS transistor P4. The gates of these transistors N4 and P4 are connected to the node 26-2, and the drains are commonly connected to the peripheral circuit 13. The signal input to the pad 26-2 is supplied to the peripheral circuit 13 through the input buffer 32-3.
- the output buffer 31-2 includes a PMOS transistor P5 disposed between the pad 26-2 and the power supply line 23, and an NMOS transistor N5 disposed between the pad 26-2 and the power supply line 22. ing.
- the transistors P5 and N5 are arranged to face each other so as to sandwich the pad 26-2 along the second direction.
- the gates of the transistors P5 and N5 are connected to the peripheral circuit 13, and the drains are commonly connected to the pad 26-2.
- the pad 26-2 is for data input / output, for example.
- the input data is supplied to the peripheral circuit 13 through the input buffer 32-3, and the data transferred from the peripheral circuit 13 is received.
- the signal is output from the pad 26-2 through the output buffer 31-3.
- the gates of the transistors N2, N4, N6, P2, P4, and P6 can be independently controlled by separately applying a voltage.
- the node rows 26 and 25 are provided in the vicinity of the peripheral circuit 13 and are provided in two stages in the same direction. 25, the wiring lengths Ll and L2 between the pad in 25 and the peripheral circuit section 13 can be shortened. Therefore, it is possible to reduce the signal delay by reducing the wiring resistance and the wiring capacitance, which is advantageous for increasing the speed.
- many of the signals used in the circuit at the first stage of input have relatively unstable voltages, so potential instability associated with increased wiring length can be alleviated and reliability can be improved.
- the source regions of the transistors Nl and N2 and the source regions of the transistors N4 and N5 are shared by the two transistors and are connected in common to the power supply line 22, the area in the second direction can be further reduced. This is advantageous for miniaturization.
- the PMOS transistors P2 and P5 and the N MOS transistors N2 and N5 constituting the output buffers 31-1 and 31-2 are arranged along the second direction so as to sandwich the nodes 26-1 and 26-2. They are placed opposite to each other. Therefore, the distance between the transistors! ⁇ , P5 and the transistors N2, N5 can be earned. Therefore, switching of a parasitic thyristor composed of parasitic PNP and NPN bipolar transistors can be prevented, so-called latch-up can be prevented, and the reliability can be improved.
- the P MOS transistors Pl, P3, P4 and NMOS transistors Nl, N3, N4 constituting the input buffer 32-1 to 32-3 are placed in the empty areas of the nodes 251, 26-1, 26-2. They are arranged facing each other along two directions. Therefore, the distance between the transistors P3 and P4 and the transistors Nl, N3, and N4 can be earned in the above-mentioned empty area. Therefore, it is advantageous in that the latch-up can be similarly prevented and the reliability can be improved. In addition, since the free space can be used, the area in the first direction can be reduced.
- the power supply voltage VCCQ is the same voltage (eg, 3.3V for both VCC and VCCQ).
- the power supply voltage for the IZO pad the power supply voltage for the IZO pad.
- the voltage VCC Q may be used separately from the power supply voltage VCC because the voltage is unstable and the voltage is unstable due to external noise.
- the voltages VCC and VCCQ are different (for example, the voltage VCC is about 3.3V and the voltage VCCQ is about 1.8V), they may be used to distinguish the voltage values.
- FIG. 3 is a plan view schematically illustrating a portion surrounded by a broken line 28 in FIG. 1, for explaining the semiconductor device according to the first modification.
- This modification is an example in which the polarities of the transistors N1 to N5 and P1 to P5 constituting the input / output buffer are reversed as compared with the semiconductor device according to the first embodiment.
- a power supply voltage VSS is applied to the power supply lines 21 and 23, and a power supply voltage VCC or a power supply voltage VCCQ is applied to the power supply line 22.
- the transistors N1 to N5 and P1 to P5 are provided at opposite positions in the second direction as compared with the semiconductor device according to the first embodiment.
- the sources of the PMOS transistors P1 to P5 are commonly connected to the power supply line 22 (VCC or VCCQ).
- the polarity of the transistors N1 to N5 and P1 to P5 constituting the input / output buffer and the polarity of the power supply voltage applied to the power supply lines 21, 22, 23 can be changed as necessary.
- FIG. 9 is a plan view schematically illustrating a portion surrounded by a broken line 28 in FIG. 1, for illustrating a semiconductor device according to Modification 2;
- a power supply voltage VCC is applied to the power supply line 21
- a power supply voltage VSS is applied to the power supply line 22
- a power supply voltage VCCQ is applied to the power supply line 23.
- the output buffer 31-1 is arranged in an empty area between the pads 26-1 and 26-2.
- Output buffer 31-2 is located in the free space between the left side of pads 25-1.
- Outgoing buffer 31-3 is located in the free space between the right side of nodes 25-1.
- no input buffer is arranged.
- the same effect as in the first embodiment is obtained. Furthermore, the power supply voltage VCC is applied to the power supply line 21, the power supply voltage VSS is applied to the power supply line 22, and the power supply voltage VCCQ is applied to the power supply line 23 !.
- the power supply voltage applied to the power supply lines 21, 22, and 23 can be distinguished and applied, and the influence of the power supply voltage VCCQ, which has a relatively large voltage fluctuation, on the periphery can be minimized. This is advantageous in that the reliability can be improved.
- FIG. 5 is a plan view schematically illustrating a part of the external connection region 14 for explaining the semiconductor device according to the second embodiment. Further, in the description of the semiconductor device according to this embodiment, the detailed connection relationship of the transistors constituting the output buffer 31 and the input buffer 32 is not shown.
- OS transistors Nl, ⁇ 3, ⁇ 5, ⁇ 7 are provided.
- OS transistors ⁇ 2, ⁇ 4, ⁇ 6, ⁇ 8 are provided.
- any one pad in the pad rows 25 and 26 is not provided with a pitch shifted along the first direction.
- the sources of the NMOS transistors ⁇ 1 to ⁇ 6 are commonly connected to the power supply line 22. That Other configurations and the like are the same as those in the first embodiment.
- the source of the NMOS transistors N1 to N6 is connected to the power supply line 22 in common. Therefore, the area in the second direction can be reduced.
- FIG. 5 is a plan view schematically illustrating a part of the external connection region 14 for explaining the semiconductor device according to the second modification.
- This modification is an example in which the polarities of the transistors N1 to N8 and P1 to P8 constituting the input / output buffer are opposite to those of the semiconductor device according to the second embodiment.
- a power supply voltage VSS is applied to the power supply lines 21 and 23, and a power supply voltage VCC or a power supply voltage VCCQ is applied to the power supply line 22.
- the sources of the PMOS transistors P1 to P8 are connected to the power supply line 22 in common.
- Other configurations are the same as those of the second embodiment.
- FIG. 7 is a plan view schematically illustrating a part of the external connection region 14 for explaining the semiconductor device according to the third embodiment.
- Other configurations are the same as those in the first embodiment.
- the same effect as in the first embodiment is obtained. Further, the PMOS transistors ⁇ 1 to ⁇ 8 and the NMOS transistors ⁇ 1 to ⁇ 8 are arranged to face each other along the first direction so as to sandwich the pads 25-1 and 26-1.
- FIG. 8 is a plan view schematically illustrating a part of the external connection region 14 for explaining the semiconductor device according to the fourth modification.
- This modification is an example in which the polarities of the transistors ⁇ 1 to ⁇ 8 and ⁇ 1 to ⁇ 8 constituting the input and output buffers are opposite to those of the semiconductor device according to the third embodiment.
- the power supply voltage VSS is applied to the power supply lines 21 and 23, and the power supply voltage VCC or the power supply voltage VCCQ is applied to the power supply line 22.
- Other configurations are the same as those in the third embodiment.
- the power supply voltage VSS is applied to the power supply lines 21 and 23, and the power supply voltage VCC or the power supply voltage VCCQ is applied to the power supply line 22!
- the power supply voltage applied to the power supply lines 21, 22, and 23 and the polarity of the transistor can be changed as necessary.
- FIG. 9 is a plan view schematically illustrating a part of the external connection region 14 for explaining the semiconductor device according to the fourth embodiment.
- the pad row 26 is positioned more than the one of the pads 25-1 to 25-3 in the pad row 25.
- the pad rows 25 and 26 are arranged in a so-called staggered pattern.
- the sources of the NMOS transistors N1 to N8 are connected to the power supply line 22 in common.
- Other structures are the same as those of the third embodiment.
- the polarities of the transistors N 1 to N 8 and P 1 to P 8 constituting the input / output buffer of the semiconductor device according to this embodiment and the polarity of the power supply voltage applied to the power supply lines 21, 22, and 23 are opposite to each other.
- it can be provided according to the above-described modified example.
- FIG. 9 is a plan view schematically illustrating a part of the external connection region 14 for explaining the semiconductor device according to the fourth modification.
- This modification is an example in which the output counter 31 and the input buffer 32 are provided in the pad row 25 along the second direction, and in the node row 26 along the first direction. is there.
- the PMOS transistors Pl and P3 and the NMOS transistors Nl and N3 constituting the output buffers 31-1 and 31-2 in the pad row 25 are arranged so as to sandwich the nodes 25-1 and 25-2. Opposed along the second direction.
- the PMOS transistors P2 and P4 and the NMOS transistors N2 and N4 that constitute the input buffers 32-1 and 32-2 in the pad row 25 are opposed to each other along the second direction so as to sandwich the nodes 25-1 and 25-2. Has been.
- the PMOS transistors P5 and P7 and the NMOS transistors N5 and N7 constituting the output buffers 31-3 and 31-4 in the pad row 26 are arranged along the first direction so as to sandwich the nodes 26-1 and 26-2. Are opposed to each other. Configure the input buffers 32-3 and 32-4 in the nod string 26 The PMOS transistors P6 and P8 and the NMOS transistors N6 and N8 are arranged to face each other along the first direction so as to sandwich the nodes 26-1 and 262. Other configurations are the same as in the fourth embodiment.
- the output buffer 31 and the input buffer 32 are provided along the second direction in the pad row 25, and are provided along the first direction in the pad row 26.
- the arrangement of the transistors P1 to P8 and N1 to N8 constituting the output buffer 31 and the input buffer 32 can be changed as necessary.
- FIG. 11 is a plan view schematically illustrating a part of the external connection region 14 for explaining the semiconductor device according to the fifth embodiment.
- transistors N1 and P3, and transistors N2 and P4, which have different polarities along the first direction, are arranged adjacent to each other. Further, a distance (space) W1 is provided in the first direction between the sources of the transistors Nl and N2 arranged adjacent to each other and the sources of the transistors PI and P2.
- the distance W1 is, for example, about 100 m.
- Transistors P2 and N5 having different polarities rC along the second direction, and transistors N2 and P5 are arranged adjacent to each other. Furthermore, a distance W2 is set in the second direction between the sources of the adjacent transistors P2 and P5 and the sources of the transistors N2 and N5.
- a distance W1 is provided in the first direction between the sources of the transistors Nl and N2 arranged adjacent to each other and the sources of the transistors PI and P2.
- the distance W1 is provided between the sources of different polarity transistors, and switching of the parasitic thyristor composed of the parasitic PNP and NPN bipolar transistors can be prevented, so that the latch-up can be prevented and the reliability can be improved. This is advantageous.
- a distance W2 is provided in the second direction between the sources of the transistors P2 and P5 arranged adjacent to each other and the sources of the transistors N2 and N5.
- latch-up can be prevented and reliability can be improved by the same operation as described above.
- transistors having different polarities along the first and second directions can be arranged adjacent to each other, so that the PMOS transistor or the NMOS transistor is arranged as needed while preventing latch-up. it can.
- each of the above embodiments and each of the above modifications includes various inventions, and various inventions can be extracted by appropriately combining a plurality of disclosed constituent elements. For example, even if some constituent elements are deleted from all the constituent elements shown in each embodiment and each modification, at least one of the problems described in the column of problems to be solved by the invention can be solved. If at least one of the effects described in the “Effect” column is obtained, a configuration in which this constituent requirement is deleted can be extracted as an invention.
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- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/510,748 US7550838B2 (en) | 2004-09-28 | 2006-08-28 | Semiconductor device |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004-282759 | 2004-09-28 | ||
| JP2004282759A JP2006100436A (ja) | 2004-09-28 | 2004-09-28 | 半導体装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US11/510,748 Continuation US7550838B2 (en) | 2004-09-28 | 2006-08-28 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2006035787A1 true WO2006035787A1 (ja) | 2006-04-06 |
Family
ID=36118933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/017779 Ceased WO2006035787A1 (ja) | 2004-09-28 | 2005-09-27 | 半導体装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7550838B2 (ja) |
| JP (1) | JP2006100436A (ja) |
| WO (1) | WO2006035787A1 (ja) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4465343B2 (ja) * | 2006-12-05 | 2010-05-19 | Okiセミコンダクタ株式会社 | 半導体記憶装置 |
| US8184414B2 (en) * | 2008-07-30 | 2012-05-22 | Qualcomm Incorporated | Method and apparatus for forming I/O clusters in integrated circuits |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6070742A (ja) * | 1983-09-27 | 1985-04-22 | Toshiba Corp | マスタ・スライス型半導体装置 |
| JPS63310134A (ja) * | 1987-06-12 | 1988-12-19 | Fujitsu Ltd | 半導体集積回路装置 |
| JPH03125430A (ja) * | 1989-10-11 | 1991-05-28 | Mitsubishi Electric Corp | 集積回路装置の製造方法 |
| JP2001223337A (ja) * | 2000-12-28 | 2001-08-17 | Rohm Co Ltd | 半導体集積回路装置 |
| JP2002270779A (ja) * | 2001-03-14 | 2002-09-20 | Kawasaki Microelectronics Kk | 半導体装置 |
| JP2003163267A (ja) * | 2001-11-29 | 2003-06-06 | Mitsubishi Electric Corp | 半導体装置 |
| JP2004193601A (ja) * | 2002-11-29 | 2004-07-08 | Toshiba Corp | 半導体集積回路装置及びそれを用いた電子カード |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6273656A (ja) * | 1985-09-26 | 1987-04-04 | Toshiba Corp | 半導体装置 |
| JPH08195083A (ja) * | 1995-01-17 | 1996-07-30 | Toshiba Microelectron Corp | 半導体記憶装置 |
| JPH09237800A (ja) | 1996-02-29 | 1997-09-09 | Toshiba Corp | 半導体装置 |
| JPH09321214A (ja) * | 1996-05-30 | 1997-12-12 | Mitsubishi Electric Corp | 半導体装置 |
| US6441313B1 (en) * | 1999-11-23 | 2002-08-27 | Sun Microsystems, Inc. | Printed circuit board employing lossy power distribution network to reduce power plane resonances |
| CN100442516C (zh) * | 2002-11-29 | 2008-12-10 | 株式会社东芝 | 半导体集成电路装置及使用它的电子卡 |
| JP2005093575A (ja) * | 2003-09-16 | 2005-04-07 | Nec Electronics Corp | 半導体集積回路装置と配線レイアウト方法 |
-
2004
- 2004-09-28 JP JP2004282759A patent/JP2006100436A/ja active Pending
-
2005
- 2005-09-27 WO PCT/JP2005/017779 patent/WO2006035787A1/ja not_active Ceased
-
2006
- 2006-08-28 US US11/510,748 patent/US7550838B2/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6070742A (ja) * | 1983-09-27 | 1985-04-22 | Toshiba Corp | マスタ・スライス型半導体装置 |
| JPS63310134A (ja) * | 1987-06-12 | 1988-12-19 | Fujitsu Ltd | 半導体集積回路装置 |
| JPH03125430A (ja) * | 1989-10-11 | 1991-05-28 | Mitsubishi Electric Corp | 集積回路装置の製造方法 |
| JP2001223337A (ja) * | 2000-12-28 | 2001-08-17 | Rohm Co Ltd | 半導体集積回路装置 |
| JP2002270779A (ja) * | 2001-03-14 | 2002-09-20 | Kawasaki Microelectronics Kk | 半導体装置 |
| JP2003163267A (ja) * | 2001-11-29 | 2003-06-06 | Mitsubishi Electric Corp | 半導体装置 |
| JP2004193601A (ja) * | 2002-11-29 | 2004-07-08 | Toshiba Corp | 半導体集積回路装置及びそれを用いた電子カード |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006100436A (ja) | 2006-04-13 |
| US20060289897A1 (en) | 2006-12-28 |
| US7550838B2 (en) | 2009-06-23 |
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