WO2005040056A2 - Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice - Google Patents

Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice Download PDF

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Publication number
WO2005040056A2
WO2005040056A2 PCT/FR2004/050531 FR2004050531W WO2005040056A2 WO 2005040056 A2 WO2005040056 A2 WO 2005040056A2 FR 2004050531 W FR2004050531 W FR 2004050531W WO 2005040056 A2 WO2005040056 A2 WO 2005040056A2
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WO
WIPO (PCT)
Prior art keywords
layer
tio
glass
silicon
structure according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/FR2004/050531
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English (en)
French (fr)
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WO2005040056A3 (fr
Inventor
Laurent Labrousse
Nicolas Nadaud
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34400922&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2005040056(A2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority to BRPI0415700A priority Critical patent/BRPI0415700B1/pt
Priority to DE602004027751T priority patent/DE602004027751D1/de
Priority to MXPA06004355A priority patent/MXPA06004355A/es
Priority to US10/577,049 priority patent/US7884047B2/en
Priority to KR1020067007467A priority patent/KR101131157B1/ko
Priority to CN2004800388276A priority patent/CN1898172B/zh
Priority to EP04805774A priority patent/EP1678093B1/fr
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Priority to CA002543156A priority patent/CA2543156A1/fr
Priority to JP2006536149A priority patent/JP2007512154A/ja
Priority to AT04805774T priority patent/ATE471303T1/de
Priority to PL04805774T priority patent/PL1678093T3/pl
Priority to AU2004283938A priority patent/AU2004283938B2/en
Publication of WO2005040056A2 publication Critical patent/WO2005040056A2/fr
Publication of WO2005040056A3 publication Critical patent/WO2005040056A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3423—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings comprising a suboxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]

Definitions

  • the present invention relates to substrates such as substrates made of glass, glass-ceramic material or plastics material which have been provided with a coating with photocatalytic property to give them a function called antifouling or self-cleaning.
  • substrates such as substrates made of glass, glass-ceramic material or plastics material which have been provided with a coating with photocatalytic property to give them a function called antifouling or self-cleaning.
  • An important application of these substrates relates to glazing, which can be very diverse applications, utility glazing glazing used in home appliances, windows for vehicles glazing for buildings. It also applies to mirror-type reflective glazing (mirror for homes or vehicle rearview mirror) and opacified glazing type lighter.
  • non-transparent substrates such as ceramic substrates or any other substrate that can be used in particular as an architectural material (metal, tiles, etc.). It applies preferably, whatever the nature of the substrate, to substantially flat or slightly curved substrates.
  • Photocatalytic coatings have already been studied, in particular those based on crystallized titanium oxide in anatase form. Their ability to degrade organic soils or micro-organisms under the effect of UV radiation is very interesting. They also often have a hydrophilic character, which allows the evacuation of mineral soils by water projection or, for the outer glazing, rain. This type of coating with antifouling, bactericidal and algicidal properties has already been described, in particular in the patent WO 97/10186, which describes several methods of obtaining it.
  • the layer with photocatalytic property undergoes, over time, a wear which is manifested by a loss of its activity, a loss of the optical qualities of the structure (appearance of a blur, a staining), or even by delamination of the layer.
  • the thickness of the layer with photocalytic property is decreased, the coloration likely to appear during a partial alteration of the latter will be less intense and the color variation will be less over time. However, this decrease in thickness will be to the detriment of the performance of the layer. It is therefore necessary to provide a mechanical and chemical protection of the layer, the thickness of the protective layer to be thin so that the layer with photocalytic property fully retains its function.
  • EP-A-0 820 967 discloses an anti-fog element comprising a transparent substrate, a transparent film of a photocatalyst formed on the transparent substrate, and a transparent porous mineral oxide film formed on the substrate. photocatalyst film and having a surface having a hydrophilic property. Also known from Japanese Patent JP 2002 047 032 is a process for manufacturing a photocatalytic membrane-coated substrate which comprises the steps of spreading nanoparticles of Ti0 with anatase crystalline structure and 5-10 nm using a spray gun, to be heated and sprayed cathodic a SiO 2 membrane covering the TiO 2 particles.
  • It first relates to a structure comprising a substrate carrying, on at least a portion of its surface, a layer with photocatalytic property, antifouling, based on titanium dioxide (TiO 2 ), characterized by the fact said layer having photocatalytic property is coated with a thin film with a silicon and oxygen content, with a covering power, which is non-porous, capable of providing mechanical and chemical protection of the underlying photocatalytic layer while maintaining the photocatalytic activity of Ti0 2 .
  • the conditions for the preparation of the titanium dioxide-based layer such as the nature and purity of the starting materials, the optional solvent, the heat treatment, etc. will have to be adapted in known manner to obtain the photocatalytic property, antifouling .
  • said thin film containing silicon and oxygen content is present in the form of a continuous film.
  • said thin film is advantageously in the form of a film conforming to the surface roughness of the underlying photocatalytic property layer.
  • the thin film containing silicon and oxygen content is in particular a layer of at least one silicon and oxygen compound selected from SiO 2 , SiOC, SiON,
  • the thin layer containing silicon and oxygen content is a layer of at least one silicon and oxygen compound with which at least one compound selected from A1 2 is associated. 0 3 and Zr0 2 , such a compound providing a chemical inertia and reinforcing the resistance to hydrolysis.
  • Al 2 0 3 a famous inert oxide that increases the chemical resistance of the whole.
  • the atomic ratio (Al and / or Zr) / Si is generally not greater than 1, the ratio Al / Si being advantageously between 0.03 and 0.5, in particular between 0.05 and 0.1, and the ratio Zr / Si, between 0.05 and 0.4.
  • the thin film containing silicon and oxygen content may have a thickness of at most 15 nm, in particular at most 10 nm, in particular at most 8 nm, preferably at most 5 nm or approximately 5 nm. nm, in particular from 2 to 3 nm. Said thin layer provides a lubricating effect and has a mechanical role. It improves the resistance to scratching and abrasion. This greater mechanical strength and better chemical resistance are however not obtained at the expense of a decrease in photocatalytic activity.
  • the titanium dioxide-based layer consists of TiO 2 alone or of TiO 2 doped with at least one dopant chosen in particular from N; pentavalent cations such as Nb, Ta, V; Fe; and Zr.
  • This TiO 2 -based layer may have been deposited by a sol-gel process, or by a pyrolysis process, in particular in the gas phase, or by cathodic sputtering, at room temperature, under vacuum, if necessary assisted by a magnetic field and / or or ion beam, using a metal target or Ti0 x with x ⁇ 2 and an oxidizing atmosphere, or using a TiO 2 target and an inert atmosphere, TiO 2 produced by sputtering cathodic may have subsequently been subjected to heat treatment in order to be in the crystallized state in a photocatalytically active form.
  • the thin film containing silicon and oxygen content has been deposited by cathode sputtering, at room temperature, under vacuum, where appropriate assisted by a magnetic field and / or an ion beam, using a doped Si target.
  • Al (8 atomic%) under Ar + 0 2 atmosphere at a pressure of 0.2 Pa.
  • the structure according to the present invention can comprise, immediately below the TiO 2 -based layer, an underlayer having a structure Crystallographic method which assisted crystallization by heteroepitaxial growth in the anatase form of the upper layer based on TiO 2 , in particular consisting of ATiO 3 , A denoting barium or strontium.
  • the thickness of this sub-layer is not critical; it may for example be between 10 nm and 100 nm.
  • the substrate is constituted for example by a plate, flat or with curved or curved faces, monolithic or laminated glass, glass-ceramic material or a hard thermoplastic material, such as polycarbonate, or glass or glass-ceramic fibers, said plates or said fibers having, if appropriate, received at least one other functional layer, before the application of the layer to TiO 2 base or an assistance layer for crystallization by heteroepitaxial growth of the latter. (In the case of more than one layer, one can also speak of stacking or layers). The applications of the plates have been mentioned above.
  • the one or more other functional layers are chosen from the optically functional layers, the thermal control layers, the conductive layers, and, in the case where the substrate is made of glass or glass-ceramic material, the layers which are a barrier to the migration of alkalis of glass or glass-ceramic material.
  • the optical functional layers include anti-reflective layers, light radiation filtration, coloration, diffusing, etc .. There may be mentioned layers of Si0 2, Si 3 N 4, Ti0 2, Sn0 2, ZnO.
  • the thermal control layers are in particular the solar control layers, or the so-called low-emissive layers.
  • the conductive layers include heating layers, antenna or anti-static, among these layers, we can count the son networks.
  • at least one functional barrier layer to the alkali migration of the glass or glass-ceramic material may be disposed below the photocatalytic layer or below the photocatalytic layer. support layer for the crystallization thereof, if such an underlayer is provided.
  • the other functional layers optical function, thermal control, conductive layers when present are located above the barrier layer or layers. The alkali migration is likely to result from the application of temperatures exceeding 600 ° C.
  • Such alkaline barrier layers during subsequent heat treatments are known, and there may be mentioned layers of SiO 2 , SiO 2 , SiO x N y , Si 3 N, of thickness for example of at least 5 or 10 nm, in many cases of at least 50 nm, as described in PCT International Application WO 02/24971.
  • substrates made of glass or glass-ceramic material in particular of the plate type, having received a barrier layer to the migration of alkali from glass or glass-ceramic material, and then a mono-, bi- or tri-layer with optical functionality.
  • the present invention also relates to a method of manufacturing a structure as defined above, characterized in that it is deposited on a substrate of glass or glass-ceramic material or hard plastic material of polycarbonate type, plate type, or glass fiber or glass-ceramic, a TiO 2 optionally doped layer that is subjected to a heat treatment to confer a photocatalytic property in case it is not provided by the conditions used for its deposition, and then deposited on said layer with photocatalytic property a thin layer containing silicon and oxygen as defined above.
  • the deposition of a TiO 2 layer and that of the silicon and oxygen-containing thin film at room temperature is successively carried out by vacuum cathode sputtering, if appropriate.
  • argon oxygen + inert gas
  • the conditions of a deposition of a silicon-oxygen layer which is not porous are known to those skilled in the art, being notably low pressure and high power conditions (Thornton diagram).
  • Thinton diagram low pressure and high power conditions
  • annealing or quenching can then be performed after the deposition of the TiO 2 layer and the thin layer based on silicon which covers it at a temperature between 250 ° C and 550 ° C, preferably between 350 ° C and 500 ° C for annealing, and at a temperature of at least 600 ° C for quenching.
  • At least one barrier layer to the migration of alkali and that before the application of the TiO 2 layer or the undercoat associated with the latter, at least one functional layer chosen from among the optically functional layers, the thermal control layers and the conductive layers, the functional layers being advantageously deposited by cathodic sputtering, under vacuum, where appropriate assisted by a field. magnetic and / or ion beam.
  • the present invention also relates to a single or multiple glazing, in particular for the automobile or the building, comprising on at least one face, a structure according to the invention, as defined above, said face being in particular that oriented towards the outside, but can also be the one facing inwards.
  • glazings which do not have the structure of the present invention may comprise at least one other functional layer.
  • Such glazings find their application as "self-cleaning" glazing, in particular anti-fog, anti-condensation and anti-fouling, including glazing for building-type double-glazing, windshield-type vehicle glazing, rear window , automobile side windows, rearview mirror, glazing for train, plane, boat, utility glazing as aquarium glass, showcase, greenhouse, interior furnishing, street furniture (bus shelter, advertising panel ...), mirror, screen display system of the computer type, television, telephone, electrically controllable glazing such as electrochromic glazing, liquid crystal, electroluminescent, photovoltaic glazing.
  • Examples 1a and 1b (of the Invention): Glass / SiQ 2 Stack: Al / Ti0 2 / Si0 2 : Al
  • an Al-doped SiO 2 sublayer 150 nm thick On a glass plate with a thickness of 4 mm, the following successive layers were deposited: an Al-doped SiO 2 sublayer 150 nm thick; a TiO 2 layer of 100 nm thick (Example 1a) or 20 nm thick (Example 1b); and an over-layer of Al doped Si0 2 having a thickness of 2 nm.
  • the Si0 2 : Al underlayer is deposited from an Si.Al target (8 at% aluminum) with a power of 2000W, with the following gas flow rates: 15 sccm Ar and 15 sccm 0 2 and under a pressure of 2 x 10 ⁇ 3 mbar.
  • the TiO 2 layer is deposited from a target Ti0 x with a power of 2000W, with the following gas flow rates: 200 sccm Ar and 2 sccm 0 2 and under a pressure of 23 ⁇ 10 -3 mbar.
  • Si0 2 : Al is deposited from a target Si: Al (8 at% Al) with a power of 1000W, with the following gas flows: 15 sccm Ar and 15 sccm 0 2 and under a pressure of 2 ⁇ 10 -6 3 mbar.
  • Example 1a The same stack was produced as in Example 1a, except that instead of the SiO 2 : Al overcoat, an overlay of Si 3 N: Al was deposited with a thickness of 2 nm from of a Si target: Al (8 at% Al) with a power of 1000W, with the following gas flow: 1 sccm Ar sccm and 12 sccm N 2 and under a pressure of 2 x 10 ⁇ 3 mbar.

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Catalysts (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
PCT/FR2004/050531 2003-10-23 2004-10-22 Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice Ceased WO2005040056A2 (fr)

Priority Applications (12)

Application Number Priority Date Filing Date Title
AU2004283938A AU2004283938B2 (en) 2003-10-23 2004-10-22 Substrate, in particular glass substrate, supporting a photocatalytic layer coated with a protective thin layer
CA002543156A CA2543156A1 (fr) 2003-10-23 2004-10-22 Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice
MXPA06004355A MXPA06004355A (es) 2003-10-23 2004-10-22 Sustrato, en particular sustrato de vidrio, que porta una capa fotocatalitica cubierta con una capa delgada protectora.
US10/577,049 US7884047B2 (en) 2003-10-23 2004-10-22 Substrate, in particular glass substrate, supporting a photocatalytic layer coated with a protective thin layer
KR1020067007467A KR101131157B1 (ko) 2003-10-23 2004-10-22 보호용 박층으로 코팅되어 있는 광촉매 층을 지지하는기판, 특히 유리 기판
CN2004800388276A CN1898172B (zh) 2003-10-23 2004-10-22 带有被保护薄层覆盖的具有光催化性能层的基材,特别是玻璃基材
EP04805774A EP1678093B1 (fr) 2003-10-23 2004-10-22 Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d une couche mince protectrice
BRPI0415700A BRPI0415700B1 (pt) 2003-10-23 2004-10-22 estrutura compreendendo um substrato que porta, sobre pelo menos uma parte de sua superfície, uma camada com propriedade fotocatalítica, processo de fabricação de uma tal estrutura e vidraça simples ou múltipla em particular para veículos a motor ou construções
AT04805774T ATE471303T1 (de) 2003-10-23 2004-10-22 Substrat, insbesondere glassubstrat, das eine mit einer dünnen schutzschicht beschichtete photokatalytische schicht trägt
DE602004027751T DE602004027751D1 (de) 2003-10-23 2004-10-22 Substrat, insbesondere glassubstrat, das eine mit einer dünnen schutzschicht beschichtete photokatalytische schicht trägt
JP2006536149A JP2007512154A (ja) 2003-10-23 2004-10-22 保護薄層で被覆された光触媒層を備えた基材、特にガラス基材
PL04805774T PL1678093T3 (pl) 2003-10-23 2004-10-22 Podłoże, zwłaszcza podłoże szklane, utrzymujące warstwę o właściwościach fotokatalitycznych powleczoną cienką warstwą ochronną

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0350730 2003-10-23
FR0350730A FR2861386B1 (fr) 2003-10-23 2003-10-23 Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice.

Publications (2)

Publication Number Publication Date
WO2005040056A2 true WO2005040056A2 (fr) 2005-05-06
WO2005040056A3 WO2005040056A3 (fr) 2005-06-30

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PCT/FR2004/050531 Ceased WO2005040056A2 (fr) 2003-10-23 2004-10-22 Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice

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JP2009512573A (ja) * 2005-10-21 2009-03-26 サン−ゴバン グラス フランス 防汚性材料及びその製造方法
JP2009514770A (ja) * 2005-11-08 2009-04-09 サン−ゴバン グラス フランス 熱的性質を有する多層コーティングを備えた基板
WO2010100345A2 (fr) 2009-03-02 2010-09-10 Alex Hr Roustaei Systeme intelligent de production d'énergie solaire a haut rendement en chambres multiples de capture muni de cellules photovoltaiques a base des nano particules
US9738967B2 (en) 2006-07-12 2017-08-22 Cardinal Cg Company Sputtering apparatus including target mounting and control
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FR2892408A1 (fr) * 2005-10-21 2007-04-27 Saint Gobain Utilisation d'un substrat anti-salissures
JP2009512573A (ja) * 2005-10-21 2009-03-26 サン−ゴバン グラス フランス 防汚性材料及びその製造方法
US7955687B2 (en) 2005-10-21 2011-06-07 Saint-Gobain Glass France Antifouling material and production method thereof
JP2009514770A (ja) * 2005-11-08 2009-04-09 サン−ゴバン グラス フランス 熱的性質を有する多層コーティングを備えた基板
US9738967B2 (en) 2006-07-12 2017-08-22 Cardinal Cg Company Sputtering apparatus including target mounting and control
WO2008123553A1 (ja) * 2007-04-04 2008-10-16 Asahi Glass Company, Limited 防汚性物品およびこれを用いる合わせガラス
WO2010100345A2 (fr) 2009-03-02 2010-09-10 Alex Hr Roustaei Systeme intelligent de production d'énergie solaire a haut rendement en chambres multiples de capture muni de cellules photovoltaiques a base des nano particules
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
US11325859B2 (en) 2016-11-17 2022-05-10 Cardinal Cg Company Static-dissipative coating technology

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CN1898172A (zh) 2007-01-17
FR2861386A1 (fr) 2005-04-29
EP1678093A2 (fr) 2006-07-12
AU2004283938B2 (en) 2010-07-15
ZA200604042B (en) 2007-03-28
FR2861386B1 (fr) 2006-02-17
CA2543156A1 (fr) 2005-05-06
BRPI0415700A (pt) 2006-12-19
DE602004027751D1 (de) 2010-07-29
ES2347440T3 (es) 2010-10-29
PT1678093E (pt) 2010-09-22
PL1678093T3 (pl) 2010-11-30
WO2005040056A3 (fr) 2005-06-30
ATE471303T1 (de) 2010-07-15
KR101131157B1 (ko) 2012-03-28
US7884047B2 (en) 2011-02-08
CN1898172B (zh) 2012-03-21
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BRPI0415700B1 (pt) 2016-01-19
AU2004283938A1 (en) 2005-05-06
MXPA06004355A (es) 2006-06-14
EP1678093B1 (fr) 2010-06-16
US20070148064A1 (en) 2007-06-28

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