WO2003102254A1 - Procede de recuperation de metaux - Google Patents

Procede de recuperation de metaux Download PDF

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Publication number
WO2003102254A1
WO2003102254A1 PCT/JP2003/007085 JP0307085W WO03102254A1 WO 2003102254 A1 WO2003102254 A1 WO 2003102254A1 JP 0307085 W JP0307085 W JP 0307085W WO 03102254 A1 WO03102254 A1 WO 03102254A1
Authority
WO
WIPO (PCT)
Prior art keywords
tantalum
wastewater
niobium
compound
compounds
Prior art date
Application number
PCT/JP2003/007085
Other languages
English (en)
Japanese (ja)
Inventor
Norio Moriya
Hisashi Matsukawa
Original Assignee
Cabot Supermetals K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Supermetals K.K. filed Critical Cabot Supermetals K.K.
Priority to AU2003242042A priority Critical patent/AU2003242042A1/en
Publication of WO2003102254A1 publication Critical patent/WO2003102254A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/145—Ultrafiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/147—Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/16—Feed pretreatment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/44—Treatment or purification of solutions, e.g. obtained by leaching by chemical processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00—Obtaining refractory metals
    • C22B34/20—Obtaining niobium, tantalum or vanadium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
    • C22B7/006—Wet processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2311/00—Details relating to membrane separation process operations and control
    • B01D2311/04—Specific process operations in the feed stream; Feed pretreatment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/04—Oxidation reduction potential [ORP]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Definitions

  • the present invention relates to a method for insolubilizing and recovering a tantalum compound and a niobium compound having high solubility in water.
  • niobium which is an element of the same family as tantalum, is cheaper than tantalum, and the dielectric constant of niobium oxide is large.
  • the anode electrode is formed by sintering a tantalum powder and a niobium powder into a porous sintered body, and subjecting the porous sintered body to chemical oxidation.
  • the tantalum powder and niobium powder used as the anode electrode raw material are obtained by mixing raw material compounds such as tantalum salt and niobium salt with molten dilute salts such as KC1, NaCl, KF and eutectic salts thereof. After the reduction reaction is completed, the reaction melt is cooled, and the obtained agglomerates are washed to remove dilute salts and the like.
  • the agglomerates are washed sequentially with water, with an acid such as hydrofluoric acid, and with hydrogen peroxide and nitric acid.
  • an acid such as hydrofluoric acid
  • hydrogen peroxide and nitric acid hydrogen peroxide and nitric acid.
  • an object of the present invention is to provide a method for insolubilizing and recovering an evening compound and a niobium compound dissolved in water such as a washing liquid. Disclosure of the invention
  • the tantalum compound is adjusted by adjusting the pH and the oxidation-reduction potential E of an aqueous solution in which the compound and the compound are dissolved so as to satisfy the following formula (1). And / or a step of insolubilizing the niobium compound.
  • 11 is adjusted to 1 or less, and the oxidation-reduction potential E is adjusted to 40 OmV or less.
  • adjust the pH to 6.5-9.0.
  • the method further comprises a step of separating and recovering the insolubilized tantalum compound and / or niobium compound by membrane treatment.
  • the method for recovering a metal according to the present invention comprises a step of insolubilizing the tantalum compound and / or the niobium compound by adjusting the pH and the oxidation-reduction potential of the aqueous solution in which the tantalum compound and / or the niobium compound are dissolved.
  • the aqueous solution in which the tantalum compound and the z or niobium compound are dissolved is not particularly limited, but the wastewater generated in the step of manufacturing the tantalum powder by reducing the tantalum raw material compound in a dilute salt is exemplified.
  • recovering tantalum from coal First, a method for producing a tantalum powder by reducing a tantalum raw material compound in a dilute salt will be described.
  • tantalum raw material compounds include potassium fluoride salts such as K 2 TaF 7 and the like, chlorides such as nanta pentachloride and lower tantalum chloride, and halides such as iodide and bromide. These starting compounds are dissolved in a diluted salt composed of KCl, NaCl, KF and their eutectic salts heated to a temperature of about 800 to 900 and mixed with alkali metals such as sodium, magnesium, and calcium. It is fed together with earth metal and a reducing agent such as hydride to perform a reduction reaction.
  • the raw material and the reducing agent may be charged at once, or may be added in small amounts alternately, and there is no particular limitation.
  • the reduction reaction is usually performed with stirring.
  • the mixture of diluted salts and reaction products in the molten state, that is, the reaction melt is cooled,
  • the obtained agglomerates are washed to remove dilute salts and the like, and purified to obtain a tantalum powder.
  • the reduction reaction is the reaction represented by the above formula (2) and KC 1 is used as a diluting salt
  • the obtained agglomerate is the target product
  • it contains KC 1 as a dilute salt, KF and NaF as by-products, and small amounts of K 2 TaF 7 and Na as unreacted residues.
  • Tanyu In order to remove as much as possible other elements than possible, and to make the surface state of the tantalum powder as smooth as possible and to reduce the amount of impurities, it is usual to first wash with water, and then use an acid such as hydrofluoric acid. Perform cleaning. Then, cleaning with a hydrogen peroxide solution and nitric acid is performed.
  • the wastewater generated by washing with water contains only diluting salts (KC1) and by-products (KF and NaF), which are highly soluble in water, and mainly dissolves them. Therefore, tantalum or tantalum compounds dissolve in trace amounts of less than 1 O ppm.
  • wastewater generated by washing with an acid such as hydrofluoric acid has high solubility due to the reaction of fluorine in hydrofluoric acid with a part of tantalum and potassium derived from dilute salt.
  • second wastewater wastewater generated by washing with an acid such as hydrofluoric acid
  • 2 T a F 2 ⁇ 4 K 3 T A_ ⁇ 2 F 4 is generated, these melts, in a state in which tantalum is relatively large dissolved about 500 ppm in terms of metal.
  • third wastewater wastewater generated by washing with hydrogen peroxide and nitric acid
  • third wastewater wastewater generated by washing with hydrogen peroxide and nitric acid
  • About 1500 ppm of tantalum compound is dissolved.
  • a method for insolubilizing a tantalum compound in the third wastewater having a high solubility of tantalum among the first to third wastewaters will be described.
  • Equation (1) the unit of E is [mV].
  • any pH and redox potential Even at redox potential E, at least 95% or more of the tantalum compounds dissolved in the third wastewater can be insolubilized.
  • the third effluent is usually acidic with a pH of 1 or less, even if the pH is not increased by adding an alkaline aqueous solution, for example, when the pH is 1, the formula (1) ),
  • the redox potential E is set to less than 540 mV.
  • the redox potential E is also set to less than 57 OmV from the equation (1) to obtain the tantalum dissolved in the third wastewater. At least 95% or more of the compound can be easily insolubilized.
  • the pH is 1 or less
  • most of the dissolved tantalum compounds are easily insolubilized by adjusting the oxidation-reduction potential E to 40 OmV or less, and more preferably to 35 OmV or less. be able to.
  • various reducing agents such as iron (III) chloride, sodium sulfite (Na 2 S 3 ), and hydrogen chloride may be appropriately added.
  • the oxidation-reduction potential E of the third waste liquid can be reduced from around 60 OmV before adjustment to a desired value.
  • the third waste liquid By adjusting only the oxidation-reduction potential E so as to satisfy the expression (1) while keeping the third waste liquid in an acidic state, at least 95% of the dissolved tantalum compound can be obtained. % Or more can be easily insolubilized.However, by setting the third waste liquid to pH 6.5 to 9, the liquid becomes stable and insolubilization can be performed stably, and it is handled near the neutral region. Therefore, the pH is adjusted to 6.5 to 9.0 by appropriately adding an alkaline aqueous solution such as sodium hydroxide, and then the oxidation-reduction potential E is adjusted to satisfy the expression (1). Is also good. Instead of adding sodium hydroxide or the like, an alkaline waste liquid generated in another process may be used.
  • the pH when the pH is adjusted to 6.5 to 9.0, about 30 to 50% of the water-soluble tantalum compound in the third wastewater becomes insoluble.
  • the oxidation-reduction potential E is set to less than 18 OmV according to the equation (1).
  • the oxidation-reduction potential E is also obtained from the equation (1).
  • E to 6 OmV When the content is less than 90%, at least 95% or more of the dissolved tantalum compound can be easily insolubilized.
  • the solution can be dissolved in the third wastewater It can insolubilize at least 95% or more of the unraveled tantalum compound, and reduce the solubility of tantalum in the third wastewater to about 10 ppm or less.
  • the form of the tantalum compound formed by insolubilization is not clear, it can be assumed that it is a tantalum pentoxide or a hydroxide that dissolves only a trace amount in water.
  • most of the insolubilized tantalum compound is present in the third wastewater as suspended matter having a particle size of about 0.3 to 10 / m. Therefore, it is appropriately separated and collected.
  • the method of separating and recovering such tantalum compounds may be sedimentation separation using thickener, foam separation using a surfactant, or centrifugation.However, according to membrane treatment, the separation efficiency should be close to 100%. Is preferred.
  • the membrane used here can be appropriately selected, but is preferably a Teflon (registered trademark) -based or polyethylene-based membrane having excellent chemical resistance and a pore diameter of 0.03 m or less.
  • a Teflon (registered trademark) -based or polyethylene-based membrane having excellent chemical resistance and a pore diameter of 0.03 m or less.
  • a hollow fiber membrane product name: UMF-212WFA, pore size: 0.03 m
  • tantalum has a large specific gravity, and its compound also has a large sedimentation property. Therefore, such membrane treatment and sedimentation separation may be used in combination. By using both membrane treatment and sedimentation separation, the load on the membrane can be reduced, and the frequency of washing and replacing the membrane can be reduced.
  • the tantalum compound dissolved in the washing liquid such as the third wastewater can be easily insolubilized and recovered, and these can be effectively reused. It is possible to improve the productivity of a process for manufacturing or using a hologram.
  • the method of recovering metal is to reduce the tantalum raw material compound in dilute salt to insolubilize and recover the tantalum compound in the third wastewater generated when manufacturing tantalum powder.
  • the method can be suitably applied to the case where the niobium raw material compound is reduced in a dilute salt to insolubilize the niobium compound in the third wastewater generated when producing niobium powder.
  • the niobium raw material compounds K 2 N b F 6, K 2 N b F 7 potassium fluoride salt such as, niobium pentachloride, chloride such as lower niobium chloride, and halides such as iodide, odor products .
  • a niobium fluoride such as potassium fluoroniobate can be used as the niobium raw material compound.
  • tantalum powder is used as an aqueous solution to be insolubilized in such a recovery method. It is not limited to wastewater for producing niobium or niobium powder, and may be any aqueous solution in which a tantalum compound and / or a diobium compound is dissolved. As described above, according to such a metal recovery method, the pH and the oxidation-reduction potential E of the aqueous solution in which the nantalum compound and Z or the niobium compound are dissolved are determined so that these have the relationship of the formula (1).
  • the tantalum raw material compound was charged together with a reducing agent into a diluted salt heated to about 870 and in a molten state, and a reduction reaction was performed.
  • the tantalum raw material compound K 2 TaF 7 was used, KF was used as a diluting salt, and Na was used as a reducing agent.
  • the reaction melt in a molten state was cooled, and the obtained agglomerates were first washed with water.
  • the wastewater obtained here is designated as the first wastewater. Then, it was washed with 3% hydrofluoric acid.
  • the wastewater obtained here is the second wastewater. Further, the substrate was washed with 1.5% hydrogen peroxide and 9% nitric acid.
  • the wastewater obtained here is the third wastewater.
  • the first wastewater was analyzed by ICP, the first wastewater contained 610 ppm of tantalum and Z or a tantalum compound in terms of metal, of which 10 t less than pm.
  • a 20% Na ⁇ H aqueous solution (A) was added to this third wastewater as a pH adjusting solution to adjust the pH from below 1.0 to 7.5, and as a redox potential adjusting solution.
  • the redox potential was adjusted from 600 mV to 1 O OmV by adding a 30 % NaHS03 aqueous solution (B).
  • a 30 % NaHS03 aqueous solution (B) As a result, dissolved tantalum and / or tantalum compounds were precipitated, and dissolved tantalum and / or tantalum compounds were reduced to less than 10 ppm.
  • the first wastewater, the second wastewater whose pH was adjusted as described above, and the third wastewater whose pH and oxidation-reduction potential were adjusted were mixed, and were collected by membrane treatment.
  • the membrane used here was a hollow fiber membrane (product name: UMF-20 12WFA, pore size 0.03 mm) manufactured by Mitsubishi Rayon Co., Ltd. It was used in the form of a hollow fiber membrane unit.
  • the first wastewater and the second wastewater were treated in the same manner as in Example 1.
  • the third wastewater was treated in the same manner as in Example 1 except that the pH and the oxidation-reduction potential of the third wastewater were set to the values shown in Table 1.
  • the first wastewater, the second wastewater, and the third wastewater are mixed in the same manner as in the first embodiment.
  • the first wastewater and the second wastewater were treated in the same manner as in Example 1.
  • the third wastewater was treated in the same manner as in Example 1 except that the pH and the oxidation-reduction potential of the third wastewater were set to the values shown in Table 1.
  • the first wastewater, the second wastewater, and the third wastewater are mixed in the same manner as in the first embodiment.
  • the first wastewater and the second wastewater were treated in the same manner as in Example 1.
  • the pH and the oxidation-reduction potential of the third wastewater are shown in Tables 2 and 3, without adding the pH-adjustment liquid to the third wastewater, and adding only the oxidation-reduction potential adjustment liquid while appropriately changing the amount. Except for the values, the third wastewater was treated in the same manner as in Example 1.
  • the first wastewater, the second wastewater, and the third wastewater are mixed in the same manner as in the first embodiment.
  • the first wastewater and the second wastewater were treated in the same manner as in Example 1.
  • the first wastewater, the second wastewater, and the third wastewater are mixed in the same manner as in the first embodiment.
  • the first wastewater and the second wastewater were treated in the same manner as in Example 1.
  • the first wastewater, the second wastewater, and the third wastewater were mixed in the same manner as in the example, and collected by membrane treatment.
  • a tantalum compound and a niobium compound having high solubility in water can be insolubilized only by changing the oxidation-reduction potential under an arbitrary pH, and can be recovered at a high rate.
  • these compounds which have often been discarded, can be reused, and the productivity of processes that produce or use tantalum or niobium can be improved.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Hydrology & Water Resources (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Removal Of Specific Substances (AREA)

Abstract

L'invention concerne un procédé permettant de récupérer des composés à base de tantale et des composés à base de niobium dissous dans l'eau, tels que des détergents liquides, consistant à les rendre insolubles et à les récupérer. Le procédé consiste à réguler une solution aqueuse contenant des composés à base de tantale et/ou des composés à base de niobium dissous dans la solution afin d'obtenir un pH et un potentiel d'oxydoréduction satisfaisant la formule E<60X(10-pH) pour rendre les composés à base de tantale et/ou les composés à base de niobium insolubles. Les composés à base de tantale et/ou de niobium sont ensuite récupérés par traitement sur membrane. Ainsi, les composés métalliques peuvent être récupérés plus efficacement. Ce procédé est destiné à être utilisé tout particulièrement dans le traitement des eaux usées générées dans la production d'une poudre de tantale ou d'une poudre de niobium par réduction d'un composé à base de tantale brut et/ou d'un composé à base de niobium brut dans un sel diluant.
PCT/JP2003/007085 2002-06-04 2003-06-04 Procede de recuperation de metaux WO2003102254A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003242042A AU2003242042A1 (en) 2002-06-04 2003-06-04 Method of metal recovery

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002162769 2002-06-04
JP2002-162769 2002-06-04
JP2002-321166 2002-11-05
JP2002321166A JP4245899B2 (ja) 2002-06-04 2002-11-05 金属の回収方法

Publications (1)

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WO2003102254A1 true WO2003102254A1 (fr) 2003-12-11

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PCT/JP2003/007085 WO2003102254A1 (fr) 2002-06-04 2003-06-04 Procede de recuperation de metaux

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CN (1) CN100471968C (fr)
AU (1) AU2003242042A1 (fr)
WO (1) WO2003102254A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111099706A (zh) * 2019-12-12 2020-05-05 贵州振华电子信息产业技术研究有限公司 一种含酸性废液中钽的回收处理方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103194604B (zh) * 2012-01-06 2014-09-17 深圳市格林美高新技术股份有限公司 废旧钽电容器中回收钽、银、锰的方法
KR102314988B1 (ko) * 2014-12-26 2021-10-21 솔브레인 주식회사 용매 정제용 그래핀 멤브레인 필름과 그 제조방법 및 이를 이용한 용매 정제 시스템

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990002823A1 (fr) * 1988-09-06 1990-03-22 Institut National De Recherche Chimique Appliquee PROCEDE PERFECTIONNE D'OBTENTION DE COMPOSES DE Ta ET(OU) Nb EXEMPTS D'IMPURETES A PARTIR DE MATERIAUX CONTENANT CES METAUX
JP2001163621A (ja) * 1999-12-13 2001-06-19 Tokuyama Corp ニオブ及び／又はタンタルの晶析方法および該方法を用いる酸化物の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19847012A1 (de) * 1998-10-13 2000-04-20 Starck H C Gmbh Co Kg Niobpulver und Verfahren zu dessen Herstellung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990002823A1 (fr) * 1988-09-06 1990-03-22 Institut National De Recherche Chimique Appliquee PROCEDE PERFECTIONNE D'OBTENTION DE COMPOSES DE Ta ET(OU) Nb EXEMPTS D'IMPURETES A PARTIR DE MATERIAUX CONTENANT CES METAUX
JP2001163621A (ja) * 1999-12-13 2001-06-19 Tokuyama Corp ニオブ及び／又はタンタルの晶析方法および該方法を用いる酸化物の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111099706A (zh) * 2019-12-12 2020-05-05 贵州振华电子信息产业技术研究有限公司 一种含酸性废液中钽的回收处理方法

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JP4245899B2 (ja) 2009-04-02
CN1659294A (zh) 2005-08-24
CN100471968C (zh) 2009-03-25
AU2003242042A1 (en) 2003-12-19
JP2004060047A (ja) 2004-02-26

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