WO2002063687A2 - Abschirmvorrichtung für integrierte schaltungen - Google Patents

Abschirmvorrichtung für integrierte schaltungen Download PDF

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Publication number
WO2002063687A2
WO2002063687A2 PCT/DE2002/000470 DE0200470W WO02063687A2 WO 2002063687 A2 WO2002063687 A2 WO 2002063687A2 DE 0200470 W DE0200470 W DE 0200470W WO 02063687 A2 WO02063687 A2 WO 02063687A2
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
silicon layer
conductor
shielding device
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2002/000470
Other languages
German (de)
English (en)
French (fr)
Other versions
WO2002063687A3 (de
Inventor
Christian AUMÜLLER
Marcus Janke
Peter Hofreiter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Priority to EP02714001A priority Critical patent/EP1358676B1/de
Priority to DE50212016T priority patent/DE50212016D1/de
Publication of WO2002063687A2 publication Critical patent/WO2002063687A2/de
Publication of WO2002063687A3 publication Critical patent/WO2002063687A3/de
Priority to US10/637,192 priority patent/US6919618B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/57Protection from inspection, reverse engineering or tampering
    • H01L23/573Protection from inspection, reverse engineering or tampering using passive means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Definitions

  • the present invention relates to a shielding device with which effective protection against attacks on an integrated circuit is achieved.
  • An active protective shield in which current-carrying conductor tracks and / or active components are used in order to shield an external attack on the circuit, is particularly effective. So far, the risk of analyzing the circuits from the back of the semiconductor chip, i. H. through the semiconductor substrate, neglected.
  • SOI substrate Silicon On Insulator
  • SOI substrate Silicon On Insulator
  • It consists largely of a bulk silicon layer in volume, on which, separated by a thin insulator layer from the bulk silicon layer, there is a thin, usually crystalline body silicon layer in which the semiconductor components are formed.
  • the object of the present invention is to provide effective protection against attacks on integrated circuits from the back of the substrate. This object is achieved with the shielding device for integrated circuits with the features of claim 1. Refinements result from the dependent claims.
  • the shielding device comprises means for optical and / or electrical shielding, which are arranged on the side of the integrated circuit facing the substrate in the semiconductor chip.
  • Preferred configurations use an SOI substrate in order to form the integrated circuit in the body silicon layer of the SOI substrate and to use the insulator layer of the SOI substrate as an optical shielding device from the bulk silicon layer.
  • electrical conductors in particular conductor tracks or conductor surfaces, to be provided as a shielding device in the bulk silicon layer of an SOI substrate, preferably in the vicinity of the insulator layer.
  • These conductors can be connected to the body silicon layer or to one or more components of the circuit present in the body silicon layer by means of one or more vias which are led through the insulation layer into the body silicon layer. In this way, active control of the conductors arranged in the bulk silicon layer can be realized.
  • This figure shows in cross section an SOI substrate with a conductor structure arranged according to the invention.
  • the SOI substrate Silicon On Insulator
  • a bulk silicon layer 1 which, as a silicon body, forms the component that makes up the essential volume of the substrate, a thin insulator layer 2 applied thereon or formed in the silicon body, and a likewise thin, preferably crystalline one body silicon layer 3, in which the semiconductor components of the integrated circuit are formed.
  • the thicknesses of the layers are not shown to scale, since it is only a matter of the basic arrangement of the layers in relation to one another.
  • Electrically conductive vias 4 are shown in the figure with vertical lines, which pass through the insulator layer 2 and electrically connect the body silicon layer 3 to the bulk silicon layer 1.
  • these plated-through holes 4 can be connected in any manner to components of a circuit integrated in the body silicon layer 3.
  • the plated-through holes 4 are electrically conductively connected to conductors 5, which are attached in the bulk silicon layer 1, preferably in the vicinity of the insulator layer 2.
  • These electrical conductors can be designed as conductor tracks, which can be structured in a grid-like or double-grid fashion, or as conductor surfaces or the like.
  • These conductors 5 can be produced in the manufacture of the substrate by implanting dopant into the semiconductor material of the bulk silicon layer 1. It is advantageous if the conductors 5 cover the largest possible area of the substrate surface.
  • the SOI substrate is mounted on a module carrier 6, which is, however, not essential for the invention.
  • an SOI substrate even in semiconductor circuits, for which no SOI substrate is normally provided, means that optical inspection using backside IR microscopy is no longer possible due to the different refractive indices of the semiconductor material and the isolator.
  • the insulator layer therefore forms a shielding device according to the invention.
  • electrical conductors can be provided as shielding components; in particular, these Conductor via vertical electrically conductive connections, e.g. B. the vias described, are actively controlled with components of the integrated circuit.
  • active backside shielding of the substrate can also be provided in the case of a conventional substrate without an insulation layer.
  • a protective shield acts like an active protective shield on the top of the IC chip.

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Optical Integrated Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
PCT/DE2002/000470 2001-02-08 2002-02-08 Abschirmvorrichtung für integrierte schaltungen Ceased WO2002063687A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP02714001A EP1358676B1 (de) 2001-02-08 2002-02-08 Abschirmvorrichtung für integrierte schaltungen
DE50212016T DE50212016D1 (enExample) 2001-02-08 2002-02-08
US10/637,192 US6919618B2 (en) 2001-02-08 2003-08-08 Shielding device for integrated circuits

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10105725.3 2001-02-08
DE10105725A DE10105725B4 (de) 2001-02-08 2001-02-08 Halbleiterchip mit einem Substrat, einer integrierten Schaltung und einer Abschirmvorrichtung

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/637,192 Continuation US6919618B2 (en) 2001-02-08 2003-08-08 Shielding device for integrated circuits

Publications (2)

Publication Number Publication Date
WO2002063687A2 true WO2002063687A2 (de) 2002-08-15
WO2002063687A3 WO2002063687A3 (de) 2003-05-30

Family

ID=7673280

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2002/000470 Ceased WO2002063687A2 (de) 2001-02-08 2002-02-08 Abschirmvorrichtung für integrierte schaltungen

Country Status (5)

Country Link
US (1) US6919618B2 (enExample)
EP (1) EP1358676B1 (enExample)
AT (1) ATE391343T1 (enExample)
DE (2) DE10105725B4 (enExample)
WO (1) WO2002063687A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10337256A1 (de) * 2002-11-21 2004-06-09 Giesecke & Devrient Gmbh Integrierte Schaltkreisanordnung und Verfahren zur Herstellung derselben
FR2893183B1 (fr) * 2005-11-10 2008-01-25 Gemplus Sa Procede de protection d'un composant electronique contre les attaques par injection de faute
EP2232412B1 (en) * 2007-08-02 2019-03-06 Nxp B.V. Tamper-resistant semiconductor device and methods of manufacturing thereof
FR2950997B1 (fr) * 2009-10-05 2011-12-09 St Microelectronics Rousset Puce de circuit integre protegee contre des attaques laser
FR2951016B1 (fr) * 2009-10-05 2012-07-13 St Microelectronics Rousset Procede de protection d'une puce de circuit integre contre des attaques laser
EP2306518B1 (fr) * 2009-10-05 2014-12-31 STMicroelectronics (Rousset) SAS Méthode de protection d'une puce de circuit intégré contre une analyse par attaques laser
FR2980636B1 (fr) 2011-09-22 2016-01-08 St Microelectronics Rousset Protection d'un dispositif electronique contre une attaque laser en face arriere, et support semiconducteur correspondant
US9653410B1 (en) 2016-03-15 2017-05-16 Nxp Usa, Inc. Transistor with shield structure, packaged device, and method of manufacture
FR3051600B1 (fr) * 2016-05-20 2018-12-07 Commissariat A L'energie Atomique Et Aux Energies Alternatives Dispositif electronique a identification de type puf
US9741671B1 (en) 2016-11-10 2017-08-22 Nxp B.V. Semiconductor die with backside protection
US10593619B1 (en) 2018-08-28 2020-03-17 Nsp Usa, Inc. Transistor shield structure, packaged device, and method of manufacture

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179310A (en) * 1978-07-03 1979-12-18 National Semiconductor Corporation Laser trim protection process
US5306942A (en) * 1989-10-11 1994-04-26 Nippondenso Co., Ltd. Semiconductor device having a shield which is maintained at a reference potential
JP3003188B2 (ja) * 1990-09-10 2000-01-24 ソニー株式会社 半導体メモリ及びその製造方法
US5825042A (en) * 1993-06-18 1998-10-20 Space Electronics, Inc. Radiation shielding of plastic integrated circuits
KR100294026B1 (ko) * 1993-06-24 2001-09-17 야마자끼 순페이 전기광학장치
US5567967A (en) * 1993-06-28 1996-10-22 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having a crystallized island semiconductor layer
US5525531A (en) 1995-06-05 1996-06-11 International Business Machines Corporation SOI DRAM with field-shield isolation
US5986331A (en) * 1996-05-30 1999-11-16 Philips Electronics North America Corp. Microwave monolithic integrated circuit with coplaner waveguide having silicon-on-insulator composite substrate
US5742082A (en) * 1996-11-22 1998-04-21 Motorola, Inc. Stable FET with shielding region in the substrate
ATE254803T1 (de) * 1997-09-19 2003-12-15 Fraunhofer Ges Forschung Verdrahtungsverfahren für halbleiter-bauelemente zur verhinderung von produktpiraterie und produktmanipulation, durch das verfahren hergestelltes halbleiter-bauelement und verwendung des halbleiter-bauelements in einer chipkarte
US6066860A (en) * 1997-12-25 2000-05-23 Seiko Epson Corporation Substrate for electro-optical apparatus, electro-optical apparatus, method for driving electro-optical apparatus, electronic device and projection display device
JP3583633B2 (ja) * 1998-12-21 2004-11-04 シャープ株式会社 半導体装置の製造方法
KR100294640B1 (ko) * 1998-12-24 2001-08-07 박종섭 부동 몸체 효과를 제거한 실리콘 이중막 소자 및 그 제조방법
WO2000067319A1 (de) * 1999-05-03 2000-11-09 Infineon Technologies Ag Verfahren und vorrichtung zur sicherung eines mehrdimensional aufgebauten chipstapels
DE19940759B4 (de) * 1999-08-27 2004-04-15 Infineon Technologies Ag Schaltungsanordnung und Verfahren zu deren Herstellung
DE10003112C1 (de) * 2000-01-13 2001-07-26 Infineon Technologies Ag Chip mit allseitigem Schutz sensitiver Schaltungsteile vor Zugriff durch Nichtberechtigte durch Abschirmanordnungen (Shields) unter Verwendung eines Hilfschips
JP3604002B2 (ja) * 2000-06-02 2004-12-22 シャープ株式会社 半導体装置
JP2002353424A (ja) * 2001-03-23 2002-12-06 Seiko Epson Corp 基板装置の製造方法及び基板装置、電気光学装置の製造方法及び電気光学装置、並びに電子機器

Also Published As

Publication number Publication date
DE10105725A1 (de) 2002-09-05
US20040124524A1 (en) 2004-07-01
WO2002063687A3 (de) 2003-05-30
DE50212016D1 (enExample) 2008-05-15
DE10105725B4 (de) 2008-11-13
EP1358676A2 (de) 2003-11-05
US6919618B2 (en) 2005-07-19
ATE391343T1 (de) 2008-04-15
EP1358676B1 (de) 2008-04-02

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