WO2002042743A1 - Probe for scanning microscope produced by focused ion beam machining - Google Patents
Probe for scanning microscope produced by focused ion beam machining Download PDFInfo
- Publication number
- WO2002042743A1 WO2002042743A1 PCT/JP2001/008614 JP0108614W WO0242743A1 WO 2002042743 A1 WO2002042743 A1 WO 2002042743A1 JP 0108614 W JP0108614 W JP 0108614W WO 0242743 A1 WO0242743 A1 WO 0242743A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- probe
- nanotube
- ion beam
- cantilever
- scanning microscope
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
- G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
- G01Q10/06—Circuits or algorithms therefor
- G01Q10/065—Feedback mechanisms, i.e. wherein the signal for driving the probe is modified by a signal coming from the probe itself
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/04—Display or data processing devices
- G01Q30/06—Display or data processing devices for error compensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/08—Probe characteristics
- G01Q70/10—Shape or taper
- G01Q70/12—Nanotube tips
Definitions
- electron microscopes are devices that handle electron beams, they can irradiate electron beams, but they cannot diffuse or inject ions of other substances into the nanotubes used as the probe. It was difficult to improve the material of the probe itself.
- an object of the present invention is to find a device other than an electron microscope as a device for fixing a nanotube to a cantilever protrusion, and to fix and cut a nanotube probe, and to implant a nanotube probe by injection of other types of atoms.
- An object of the present invention is to provide a scanning microscope probe capable of improving the material.
- the invention of claim 1 is directed to a probe for a scanning microscope that obtains information on physical properties of a sample surface by a tip of a nanotube probe fixed to a cantilever, wherein an organic gas is decomposed by an ion beam in a focused ion beam device and generated.
- This is a probe for a scanning microscope using focused ion beam processing, characterized in that the nanotubes and the cantilever are fixed by deposits of the decomposed components.
- the present inventors have conducted intensive studies on an apparatus that can replace an electron microscope. As a result, the present inventors have conceived of using an ion beam instead of an electron beam.
- a focusing apparatus that can freely focus an ion beam to process an object. Focused Ion Beam, also referred to as FIB device).
- the decomposition deposit is formed from a carbon film.
- This carbon film is made of amorphous carbon and has conductivity when the film thickness is extremely thin. Therefore, by reducing the thickness of the carbon film, the nanotubes 12 and the cantilever 4 are brought into conduction by the carbon film.
- insulating deposits and semiconductor deposits are included. When hydrocarbon gases and organometallic gases are deposited in a semi-decomposed state, they tend to form insulating deposits, In some cases, various properties are likely to be produced from semiconductor deposits to insulating deposits depending on the crystallinity of the film.
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Carbon And Carbon Compounds (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01970309A EP1278056A4 (en) | 2000-11-26 | 2001-09-28 | PROBE FOR A SCANNING MICROSCOPE MADE BY MACHINING WITH FOCUSED ION BEAM |
US10/182,330 US6759653B2 (en) | 2000-11-26 | 2001-09-28 | Probe for scanning microscope produced by focused ion beam machining |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-403560 | 2000-11-26 | ||
JP2000403560A JP2002162337A (ja) | 2000-11-26 | 2000-11-26 | 集束イオンビーム加工による走査型顕微鏡用プローブ |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002042743A1 true WO2002042743A1 (en) | 2002-05-30 |
Family
ID=18867659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2001/008614 WO2002042743A1 (en) | 2000-11-26 | 2001-09-28 | Probe for scanning microscope produced by focused ion beam machining |
Country Status (6)
Country | Link |
---|---|
US (1) | US6759653B2 (ja) |
EP (1) | EP1278056A4 (ja) |
JP (1) | JP2002162337A (ja) |
KR (1) | KR100501506B1 (ja) |
CN (1) | CN1250958C (ja) |
WO (1) | WO2002042743A1 (ja) |
Families Citing this family (38)
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DE10084816T1 (de) * | 1999-07-15 | 2002-10-31 | Fei Co | Mikrobearbeitete Mikrosondenspitze |
JP3797276B2 (ja) * | 2002-05-31 | 2006-07-12 | 株式会社日立製作所 | 磁性ナノチューブ |
JP2004093352A (ja) * | 2002-08-30 | 2004-03-25 | Seiko Instruments Inc | 極微小多探針プローブの製造方法及び表面特性解析装置 |
US7082683B2 (en) * | 2003-04-24 | 2006-08-01 | Korea Institute Of Machinery & Materials | Method for attaching rod-shaped nano structure to probe holder |
US20050017173A1 (en) * | 2003-07-15 | 2005-01-27 | Nalin Kumar | Individually addressable nanoelectrode array |
KR100793122B1 (ko) * | 2003-08-11 | 2008-01-10 | 도쿠리쓰교세이호징 가가쿠 기주쓰 신코 기코 | 투명 기판을 이용한 프로브 현미경용의 프로브, 그 제조방법 및 프로브 현미경 장치 |
WO2005024390A1 (ja) * | 2003-09-03 | 2005-03-17 | Hitachi Kenki Fine Tech Co., Ltd | プローブの製造方法、プローブおよび走査型プローブ顕微鏡 |
KR100679619B1 (ko) * | 2004-07-29 | 2007-02-06 | 한국표준과학연구원 | 이온빔을 이용한 spm 나노니들 탐침과 cd-spm나노니들 탐침의 제조 방법 및 그러한 방법에 의해제조되는 spm 나노니들 탐침과 cd-spm 나노니들탐침 |
WO2006011714A1 (en) | 2004-07-29 | 2006-02-02 | Korea Research Institute Of Standards And Science | A method for fabricating spm and cd-spm nanoneedle probe using ion beam and spm and cd-spm nanoneedle probe thereby |
US7628972B2 (en) * | 2004-10-01 | 2009-12-08 | Eloret Corporation | Nanostructure devices and fabrication method |
JP2006125846A (ja) * | 2004-10-26 | 2006-05-18 | Olympus Corp | カンチレバー |
JP2006221981A (ja) * | 2005-02-10 | 2006-08-24 | Sii Nanotechnology Inc | 加工用プローブ及び加工装置並びに加工用プローブの製造方法 |
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JP2009509124A (ja) * | 2005-06-16 | 2009-03-05 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | 大型のパラレルの免疫ベースのアレルギー試験および蛍光のエバネセント場励起のためのデバイス |
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KR100697323B1 (ko) * | 2005-08-19 | 2007-03-20 | 한국기계연구원 | 나노 팁 및 이의 제조방법 |
KR101159074B1 (ko) * | 2006-01-14 | 2012-06-25 | 삼성전자주식회사 | 도전성 탄소나노튜브 팁, 이를 구비한 스캐닝 프로브마이크로스코프의 탐침 및 상기 도전성 탄소나노튜브 팁의제조 방법 |
JP4806762B2 (ja) * | 2006-03-03 | 2011-11-02 | 国立大学法人 名古屋工業大学 | Spmカンチレバー |
US20080011058A1 (en) * | 2006-03-20 | 2008-01-17 | The Regents Of The University Of California | Piezoresistive cantilever based nanoflow and viscosity sensor for microchannels |
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KR100761059B1 (ko) * | 2006-09-29 | 2007-09-21 | 파크시스템스 주식회사 | 오버행 샘플 측정이 가능한 주사 탐침 현미경 |
JP4528324B2 (ja) * | 2007-01-11 | 2010-08-18 | 本田技研工業株式会社 | 熱輸送流体およびその製造方法 |
US7601650B2 (en) * | 2007-01-30 | 2009-10-13 | Carbon Design Innovations, Inc. | Carbon nanotube device and process for manufacturing same |
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US20100218801A1 (en) * | 2008-07-08 | 2010-09-02 | Chien-Min Sung | Graphene and Hexagonal Boron Nitride Planes and Associated Methods |
KR100996227B1 (ko) * | 2008-08-01 | 2010-11-23 | 한국표준과학연구원 | 에스피엠 나노탐침 및 그 제조방법 |
US20110108854A1 (en) * | 2009-11-10 | 2011-05-12 | Chien-Min Sung | Substantially lattice matched semiconductor materials and associated methods |
US20110163298A1 (en) * | 2010-01-04 | 2011-07-07 | Chien-Min Sung | Graphene and Hexagonal Boron Nitride Devices |
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CN102269772A (zh) * | 2010-06-04 | 2011-12-07 | 中芯国际集成电路制造(上海)有限公司 | 一种纳米微粒浮栅透射电子显微镜观测样品制备方法 |
CN101966977A (zh) * | 2010-08-20 | 2011-02-09 | 中国科学院物理研究所 | 一种用于微纳材料的尺寸缩减方法及电极制作方法 |
TWI673498B (zh) * | 2017-04-19 | 2019-10-01 | 東南科技大學 | 顯微加工頭之結構 |
CN108931667A (zh) * | 2017-05-24 | 2018-12-04 | 中国科学院宁波材料技术与工程研究所 | 兼具电学和磁学信号获取功能的扫描显微镜探针及其制备方法 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998015668A1 (fr) * | 1996-10-07 | 1998-04-16 | Hitachi, Ltd. | Procede de production d'un corps stratifie et corps stratifie |
JPH11326348A (ja) * | 1998-05-13 | 1999-11-26 | Nikon Corp | プローブ |
WO2000033052A1 (en) * | 1998-12-03 | 2000-06-08 | Daiken Chemical Co., Ltd. | Electronic device surface signal control probe and method of manufacturing the probe |
JP2000268741A (ja) * | 1999-03-18 | 2000-09-29 | Japan Science & Technology Corp | 炭素原子クラスターイオン生成装置及び炭素原子クラスターイオンの生成方法 |
JP2000340098A (ja) * | 1999-05-26 | 2000-12-08 | Nec Corp | 電界放出型冷陰極とその製造方法および平面ディスプレイの製造方法 |
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JP2000516708A (ja) * | 1996-08-08 | 2000-12-12 | ウィリアム・マーシュ・ライス・ユニバーシティ | ナノチューブ組立体から作製された巨視的操作可能なナノ規模の装置 |
WO1999005506A1 (en) * | 1997-07-22 | 1999-02-04 | Hitachi, Ltd. | Method and apparatus for preparing samples |
JP3766682B2 (ja) * | 1999-05-16 | 2006-04-12 | 喜萬 中山 | ナノチューブプローブ |
JP4688400B2 (ja) * | 2001-12-04 | 2011-05-25 | エスアイアイ・ナノテクノロジー株式会社 | 走査型プローブ顕微鏡用探針 |
-
2000
- 2000-11-26 JP JP2000403560A patent/JP2002162337A/ja active Pending
-
2001
- 2001-09-28 US US10/182,330 patent/US6759653B2/en not_active Expired - Fee Related
- 2001-09-28 CN CNB018041051A patent/CN1250958C/zh not_active Expired - Fee Related
- 2001-09-28 KR KR10-2002-7009162A patent/KR100501506B1/ko not_active IP Right Cessation
- 2001-09-28 WO PCT/JP2001/008614 patent/WO2002042743A1/ja not_active Application Discontinuation
- 2001-09-28 EP EP01970309A patent/EP1278056A4/en not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998015668A1 (fr) * | 1996-10-07 | 1998-04-16 | Hitachi, Ltd. | Procede de production d'un corps stratifie et corps stratifie |
JPH11326348A (ja) * | 1998-05-13 | 1999-11-26 | Nikon Corp | プローブ |
WO2000033052A1 (en) * | 1998-12-03 | 2000-06-08 | Daiken Chemical Co., Ltd. | Electronic device surface signal control probe and method of manufacturing the probe |
JP2000268741A (ja) * | 1999-03-18 | 2000-09-29 | Japan Science & Technology Corp | 炭素原子クラスターイオン生成装置及び炭素原子クラスターイオンの生成方法 |
JP2000340098A (ja) * | 1999-05-26 | 2000-12-08 | Nec Corp | 電界放出型冷陰極とその製造方法および平面ディスプレイの製造方法 |
Non-Patent Citations (2)
Title |
---|
See also references of EP1278056A4 * |
YOSHIKAZU NAKAYAMA ET AL.: "Microprocess for fabricating carbon-nanotube probes of a scanning probe microscope", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, US, AMERICAN VACUUM SOCIETY, vol. 18, no. 2, March 2000 (2000-03-01) - April 2000 (2000-04-01), pages 661 - 664, XP002906349 * |
Also Published As
Publication number | Publication date |
---|---|
EP1278056A1 (en) | 2003-01-22 |
KR20020067612A (ko) | 2002-08-22 |
EP1278056A4 (en) | 2005-07-27 |
CN1250958C (zh) | 2006-04-12 |
US6759653B2 (en) | 2004-07-06 |
US20030029996A1 (en) | 2003-02-13 |
JP2002162337A (ja) | 2002-06-07 |
KR100501506B1 (ko) | 2005-07-18 |
CN1397012A (zh) | 2003-02-12 |
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