WO2001026101A1 - Support d'enregistrement magnetique haute densite a motifs et procede de production correspondant - Google Patents

Support d'enregistrement magnetique haute densite a motifs et procede de production correspondant Download PDF

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Publication number
WO2001026101A1
WO2001026101A1 PCT/JP2000/006964 JP0006964W WO0126101A1 WO 2001026101 A1 WO2001026101 A1 WO 2001026101A1 JP 0006964 W JP0006964 W JP 0006964W WO 0126101 A1 WO0126101 A1 WO 0126101A1
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WO
WIPO (PCT)
Prior art keywords
patterned
thin film
magnetic
resist
media
Prior art date
Application number
PCT/JP2000/006964
Other languages
English (en)
Japanese (ja)
Inventor
Isao Nakatani
Original Assignee
Japan Science And Technology Corporation
Japan As Represented By Director General Of National Research Institute For Metals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Science And Technology Corporation, Japan As Represented By Director General Of National Research Institute For Metals filed Critical Japan Science And Technology Corporation
Publication of WO2001026101A1 publication Critical patent/WO2001026101A1/fr

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/656—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing Co
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers

Definitions

  • the invention of this application relates to a magnetic recording medium, and more particularly, to a magnetic recording medium called a patterned medium.
  • Patterned media is considered as a rigid magnetic disk for computers, and has a storage capacity per unit area several times larger than that of continuous thin-film media currently used. Needless to say, as a large-capacity storage device for a computer, it contributes to improving the performance of the computer, but because of its small size and light weight, it is useful as a storage device built into a portable computer. . It is also used as an ic-type rigid magnetic disk drive by inserting it into the body of a computer.In the video field, it replaces video tapes and DVDNs, and records and plays back high-definition TV images, and records, saves, and plays back digital images.
  • FIG. 3 a basic structure of a patterned medium in which ferromagnetic fine particles are regularly arranged at equal intervals along a track and one bit is recorded in each ferromagnetic fine particle is disclosed.
  • I have.
  • ⁇ ⁇ ⁇ Detailed technology on the shape, size, and arrangement of fine particles required for the bit to be stable and held for a long period of time is also disclosed. The technology lift-off method is applied.
  • a resist film (2) is coated on a glass substrate (2) as a base of a rigid magnetic disk by coating, and (b) A patterned mask (3) is formed by an electron beam exposure or an ultraviolet exposure and a development process.
  • a magnetic thin film ⁇ ⁇ serving as a magnetic recording bit is formed on the glass substrate ⁇ ⁇ on which the patterned mask 3 is formed by vacuum evaporation.
  • the J-patterned mask 3 is removed by dissolution with an organic solvent, the unnecessary magnetic thin film 5 is removed together with the patterned mask 3, and the magnetic material bit array attached to the glass substrate 1 Leave only 6. This process is called lift-off. In this way, an array of magnetic particles is formed.
  • a lubricating and durable protective layer ⁇ made of, for example, diamond-like carbon is formed thereon as necessary.
  • inlay method (damascene method), as shown in Fig. 5, magnetic particles are embedded in the substrate surface, and the substrate surface and the magnetic material bit array and the surface are flattened so as to be on the same plane.
  • Such a form of patterned media having a flat surface as a whole is an ideal structure from the viewpoint of magnetic head scanning.
  • step (c) reactive ion etching is performed in accordance with the patterned mask 3, and then, in step (d), the patterned mask 3 is removed and the resist film is removed to form a trench arrangement 4. ing.
  • a magnetic thin film ⁇ is formed as a step (e) by burying a magnetic substance in a trench array ⁇ , and in a step (f), the magnetic substance is flattened by chemical mechanical polishing.
  • the bit arrangement 6 is formed, and if necessary, the step (g) is covered with a surface lubrication layer.
  • this damascene method requires a chemical mechanical polishing (CMP) polishing step, which requires advanced technology for surface flattening, at the end of the manufacturing process ((e) ⁇ (f)).
  • CMP chemical mechanical polishing
  • Media productivity is compromised by its cumbersome and sophisticated chemical-mechanical polishing processes, driving up production costs.
  • the polishing agent was consumed, and at the same time, polishing wastewater containing heavy metals and polishing sludge were discharged. Therefore, a technology that does not require chemical mechanical polishing has been demanded.
  • the surface must not be polished by a chemical mechanical polishing method such as the damascene method. ⁇ To achieve a buried structure with a flat surface morphology only by dry processing, Realization of a new method was required. Disclosure of the invention
  • the invention of this application relates to a high-density magnetic recording medium patterned media, in which a matrix thin film coated on a media substrate or a media substrate is formed with a concave trench array by etching.
  • a high-density magnetic recording medium is provided, in which a magnetic material is buried up to the height of the surface of the matrix thin film or the media substrate to form a magnetic bit array.
  • a patterned medium having an amorphous carbon thin film as a matrix thin film is provided, and a patterned medium in which the surface of a magnetic bit array is covered with a surface lubricating layer is provided by adding an additional configuration.
  • the invention of this application also relates to a method for manufacturing a high-density magnetic recording medium patterned medium, comprising the steps of: coating a media substrate with a matrix thin film; and etching the coated matrix according to a mask pattern to form a concave trench arrangement.
  • Forming a magnetic bit array by burying a magnetic material up to the surface height of a matrix thin film in a trench recess to provide a magnetic bit array.
  • a method for manufacturing patterned media including:
  • the invention of this application is a method for manufacturing a patterned medium of a high-density magnetic recording medium, wherein the medium substrate is patterned according to a mask pattern. Forming a concave trench array on the media substrate by touching, and forming a magnetic bit array by embedding a magnetic material in the trench recess up to the surface height of the media substrate.
  • a method for manufacturing a patterned medium of a high-density magnetic recording medium a step of coating a resist on a media substrate, a step of exposing and developing the coated resist to form a resist mask pattern, and a magnetic material.
  • a method for manufacturing a high-density magnetic recording medium patterned medium including steps.
  • the invention of this application solves the conventional problems by providing a patterned high-density magnetic recording medium having a flat surface form without protrusions or depressions and requiring no chemical mechanical polishing. It provides the structure of the media and its manufacturing method.
  • FIG. 1 is a schematic diagram of a process for producing an embedded structure without using a chemical mechanical polishing (CMP) process according to the present invention.
  • CMP chemical mechanical polishing
  • FIG. 2 is a schematic diagram of a process for producing patterned media according to the present invention.
  • FIG. 3 is a conceptual diagram of a patterned media type rigid magnetic disk.
  • FIG. 4 is a schematic diagram of a conventional patterned media manufacturing process by a lift-off method.
  • FIG. 5 is a schematic view of a conventional embedded structure fabrication process (damascene method) using a CMP process.
  • FIG. 1 of the attached drawings illustrates a process of a first method for manufacturing a patterned medium according to the present invention.
  • the magnetic material to be vapor-deposited is a substance that plays a role in memory in a recording medium, such as a Co-Cr alloy, a Co-Cr-Pt alloy, or the like.
  • the vacuum deposition process (d: step) of the active substance is performed after the reactive ion etching process (c: step) without being taken out to the atmosphere, in each of two connected vacuum vessels. Since it can be transported and carried out successively in chronological order, it is possible to avoid contamination of the target substance and at the same time it is excellent in the simplicity of the process.
  • the waste liquid of the organic solvent used at this time is filtered to remove the magnetic thin film residue which is separated and suspended, then purified by fractionation treatment, and can be reused any number of times.
  • the protective layer of the lubricating layer 7 is desirable from the viewpoint of protection of the magnetic bit arrangement, as in the case of the lift-off method.
  • the magnetic bit array (1) has a structure embedded in the matrix thin film (2), and the surface is compared with the matrix surface. A patterned media equivalent to the existing damascene structure can be obtained.
  • Carbon-based binary or multi-element alloy with various impurities added to carbon, such as silicon, nitrogen, hydrogen, germanium, selenium, tellurium, etc.
  • germanium element or multi-element alloy in which impurities such as silicon, carbon, nitrogen, hydrogen, selenium, and tellurium are added to germanium, and the components are adjusted so as to easily become amorphous.
  • a thin film of the following substances formed by sputtering, for example, is particularly preferable as the material of the matrix thin film.
  • Silicon-based binary or multi-element alloy in which impurities such as carbon, nitrogen, hydrogen, germanium, selenium, and tellurium are added to silicon and the components are adjusted so that they are likely to become amorphous.
  • Germanium binary or multi-element alloys in which impurities such as silicon, carbon, nitrogen, hydrogen, selenium, and perulum are added to germanium, and the components are adjusted to be easily amorphous.
  • a thin film of the following substances formed by sputtering is particularly preferable.
  • Silicon-based binary or multi-element alloy in which impurities such as carbon, nitrogen, hydrogen, germanium, selenium, and perul are added to silicon and the components are adjusted so that they are likely to become amorphous.
  • Germanium element or multi-element alloy in which impurities such as silicon, carbon, nitrogen, hydrogen, selenium, and perulum are added to germanium and the components are adjusted to be easily amorphous.
  • a thin film of the following substances formed by sputtering is particularly preferable.
  • Germanium binary or multi-element alloys in which impurities such as silicon, carbon, nitrogen, hydrogen, selenium, and tellurium are added to germanium, and the components are adjusted to be easily amorphous.
  • the manufacturing method described with reference to FIG. 1 is a method of transferring a bit pattern to a rematrix by reactive ion etching (d). Since the etching reaction stops automatically due to the nature, there is an advantage that it is not necessary to control the depth of the reactive ion etching. However, it is considered that the matrix thin film 8 must be interposed in advance.
  • FIG. 2 illustrates a process of a second method for manufacturing patterned media.
  • the starting form is, for example, a form in which a resist is applied to a glass substrate ⁇ as a substrate of a rigid magnetic disk and a resist film 2 is covered.
  • the material of the glass substrate is a rigid magnetic disk substrate
  • a borosilicate glass generally used as a substrate may be used, and a substrate may be aluminum, an aluminum alloy, amorphous carbon, silicon single crystal, or the like.
  • a magnetic material is deposited by a method having a strong directivity, such as vacuum evaporation, ion beam sputtering, or long throw sputtering, with a small amount of retraction, and a magnetic thin film ⁇ ⁇ covering the entire surface is formed.
  • the magnetic material to be deposited is a substance that plays a role in memory in the recording medium, such as a Co—Cr alloy, a Co—Cr—Pt alloy, and a Co—Fe alloy.
  • the thickness of the deposited film was measured using a
  • the vacuum deposition process (d) of the magnetic material is generally performed after the reactive ion etching process (c) without removing it to the atmosphere. Since it can be conveyed through each of the vacuum chambers that have been set and can be performed successively in time series, it is possible to avoid contamination of the target substance and at the same time, it is excellent in the simplicity of the process.
  • the surface lubrication layer ⁇ may be formed by, for example, a sputtering method, as in the prior art.
  • the bit array ⁇ of the magnetic material is embedded in the substrate, and the surface is compared with the substrate surface.
  • a patterned medium having a smooth flat surface can be manufactured.
  • the manufacturing method described here is simpler than the manufacturing method described with reference to FIG. 1 because it does not require the interposition of the matrix layer ⁇ , but the reactive ion etching process (c) In this regard, it is important to control the etching depth to be uniform and appropriate over a large area of the entire disk.
  • This oxygen gas reactive ion etching process also eliminated the organic resist mask and reduced its thickness to about 250 nm.
  • (e) process immersing it in isoaluminum acetate and irradiating ultrasonic waves to dissolve and remove the patterned mask 3 as a resist mask, and at the same time, remove the Co-Cr alloy adhering to it.
  • the magnetic thin film 5 was also removed. In this way, a magnetic bit array ⁇ buried in the amorphous carbon matrix and irradiated with a flat surface was produced.
  • an amorphous carbon layer having a thickness of about 20 nm was formed on the surface of the magnetic bits by sputtering.
  • Step 1 A barium borosilicate glass (coming 7059 glass, the same name as in Example 1) was directly coated on one surface of a substrate ⁇ with an electron beam resist film having a thickness of 570 nm by spin coating.
  • the resist film 2 used here is the same as that used in Example 1
  • Step 2 The shape of the patterned mask 3 produced by the electron beam lithography is the same as that used in Example 1. Are identical.
  • step (c) using the patterned mask 3 as a mask, reactive ion etching of the glass substrate ⁇ is performed using CF4-C12 mixed plasma, and the mask pattern is transferred to the glass substrate ⁇ to form a trench arrangement. 4 was prepared. The depth of the trench was reduced to 150 nm as in the first embodiment. The shape of the torch was trapezoidal in cross section, and the slope angle was about 75 degrees.
  • the subsequent steps (d), (e), and (f) were the same as in Example 1.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

L'invention concerne un support d'enregistrement magnétique haute densité à motifs caractérisé en ce que la configuration de tranchées évidées est formée par gravure dans une couche mince matricielle recouvrant un substrat de support ou dans le substrat de support, et en ce que les évidements pratiqués dans la configuration de tranchées sont remplis d'un matériau magnétique jusqu'à la hauteur de la surface de la couche mince matricielle ou de la surface du substrat de support de manière à former la configuration de bits magnétiques. L'invention concerne également un procédé de fabrication rationalisé dudit support à motifs, excellent du point de vue de la productivité, dont la construction est rationalisée, et dont la charge environnementale est peu importante.
PCT/JP2000/006964 1999-10-05 2000-10-05 Support d'enregistrement magnetique haute densite a motifs et procede de production correspondant WO2001026101A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28494699A JP2001110050A (ja) 1999-10-05 1999-10-05 高密度磁気記録媒体パターンドメディアとその製造方法
JP11/284946 1999-10-05

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG102013A1 (en) * 2001-11-09 2004-02-27 Inst Data Storage Manufacturing method for high-density magnetic data storage media
US7741229B2 (en) 2004-12-13 2010-06-22 Tdk Corporation Method for manufacturing magnetic recording medium

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JP2003118240A (ja) 2001-10-18 2003-04-23 Fuji Photo Film Co Ltd 感熱記録材料
KR100466740B1 (ko) * 2002-09-23 2005-01-15 강신일 패턴드 미디어 제조방법
KR20040034407A (ko) 2002-10-15 2004-04-28 후지 샤신 필름 가부시기가이샤 전자선 묘화방법, 고밀도 기록을 위한 원반형상 담체 및자기디스크매체
JP4109085B2 (ja) 2002-11-06 2008-06-25 富士フイルム株式会社 電子ビーム描画方法
CN100399514C (zh) * 2003-01-07 2008-07-02 日立麦克赛尔株式会社 压印方法和压印装置及磁记录媒体的制造方法和制造装置
JP4348253B2 (ja) 2003-08-20 2009-10-21 富士フイルム株式会社 導電性パターン材料及び導電性パターンの形成方法
JP4128509B2 (ja) 2003-09-26 2008-07-30 Ｔｄｋ株式会社 情報記録媒体製造方法
JP2005190624A (ja) 2003-12-26 2005-07-14 Fujitsu Ltd パターンドメディア、その製造方法及びその評価方法
JP4775806B2 (ja) * 2004-02-10 2011-09-21 Ｔｄｋ株式会社 磁気記録媒体の製造方法
EP1612838A3 (fr) 2004-06-30 2006-08-16 Fuji Photo Film Co., Ltd Méthode de lithographie par faisceau d'électrons
JP2006017782A (ja) 2004-06-30 2006-01-19 Fuji Photo Film Co Ltd 電子ビーム描画方法
JP4008933B2 (ja) 2005-05-16 2007-11-14 株式会社東芝 磁気記録媒体およびその製造方法ならびに磁気記録装置
KR100688861B1 (ko) 2005-06-13 2007-03-02 삼성전기주식회사 자기저장소자의 제조방법
JP4533809B2 (ja) * 2005-06-28 2010-09-01 株式会社東芝 ディスクリートトラック媒体用基板の製造方法およびディスクリートトラック媒体の製造方法
JP4675722B2 (ja) * 2005-09-02 2011-04-27 株式会社東芝 磁気記録媒体
JP2008077795A (ja) 2006-09-22 2008-04-03 Fujitsu Ltd パターンドメディアのクロック抽出方法、パターンドメディアのクロック抽出回路及びパターンドメディア
JP2008084395A (ja) 2006-09-26 2008-04-10 Fujitsu Ltd パターンドメディアのクロック抽出方法及び回路
JP4843825B2 (ja) * 2007-09-21 2011-12-21 昭和電工株式会社 磁気記録媒体の製造方法及び磁気記録再生装置
JP4990817B2 (ja) 2008-02-29 2012-08-01 株式会社日立製作所 パターン媒体を用いたハードディスク記録装置の製造方法
JP2009245559A (ja) 2008-03-31 2009-10-22 Fujifilm Corp 磁気転写用マスター担体及び磁気記録媒体
JP2010027157A (ja) * 2008-07-22 2010-02-04 Ulvac Japan Ltd 磁気記録媒体製造装置
JP2010134977A (ja) * 2008-12-02 2010-06-17 Toshiba Storage Device Corp 磁気記録媒体及び磁気記憶装置

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG102013A1 (en) * 2001-11-09 2004-02-27 Inst Data Storage Manufacturing method for high-density magnetic data storage media
US6719841B2 (en) 2001-11-09 2004-04-13 Data Storage Institute Manufacturing method for high-density magnetic data storage media
US7741229B2 (en) 2004-12-13 2010-06-22 Tdk Corporation Method for manufacturing magnetic recording medium

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