WO2000029223A1 - Procede et dispositif pour enlever la couche de revetement d'ecrans d'impression - Google Patents
Procede et dispositif pour enlever la couche de revetement d'ecrans d'impression Download PDFInfo
- Publication number
- WO2000029223A1 WO2000029223A1 PCT/IB1998/001802 IB9801802W WO0029223A1 WO 2000029223 A1 WO2000029223 A1 WO 2000029223A1 IB 9801802 W IB9801802 W IB 9801802W WO 0029223 A1 WO0029223 A1 WO 0029223A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- stencil
- softening
- printing
- photoresist
- template
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F35/00—Cleaning arrangements or devices
- B41F35/003—Cleaning arrangements or devices for screen printers or parts thereof
- B41F35/004—Cleaning arrangements or devices for screen printers or parts thereof for cylindrical screens
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/006—Cleaning, washing, rinsing or reclaiming of printing formes other than intaglio formes
Definitions
- the present invention relates to a method and an apparatus for decoating printing stencils.
- Stencil or screen printing is a commercial branch that has been working under increasing cost pressure in recent years.
- stencils planographic or rotary printing stencils
- nickel are mainly used, which are extremely expensive.
- photoresist which has a corresponding pattern with regard to the desired print.
- the photoresist coating on the screen-like template thus defines the printing form to a certain extent. After variable but finite throughput times, the stencils have to be replaced because they are no longer able to work in the desired quality (eg high resolution) due to wear.
- Another object of the present invention was to provide an apparatus for performing an ecological stripping process.
- the photoresist layer which is rather slightly adherent in a slimy, softened form, is then mechanically removed from the stencil base using a high-pressure water jet.
- the softened photoresist layer is rinsed with water beforehand.
- the photoresist layer is hardened or cured again and can be removed and conveniently filtered off using the high-pressure water jet.
- the hardening or the re-hardening is not associated with a reconnection of the photoresist to the stencil substrate.
- the advantage of the method according to the invention is, in particular, that on the one hand it can be carried out in a tank filled with a softening agent, which does not have to be constantly replaced. Rather, the method is carried out in an essentially closed circuit, so that no extensive and permanent disposal effort with regard to the solvent has to be carried out, as in the prior art. Instead, the softening agent can be used again and again. On the other hand, it can flake off in solid form with the high-pressure water jet Photoresist film can be separated using a filter in the solvent tank and can be disposed of relatively easily.
- Figure 1 shows a side view of a softening system.
- This includes a double wall system (upper inner tub (6) and insulated lower tub (5)) as well as a heater (4) in the lower part of the system (5), a pump device (2) in the middle part of the system, level monitoring (3), a support tube (9) on which the template to be decoated is placed and a suction device (1) for the heatable softening liquid in the upper part of the system.
- Figure 2 shows the front view of a softening system, with a drive motor (7), an overflow (8), a filter basket (10), an adjustable cylinder support (11) and a template (12) which is to be stripped.
- Figure 3 shows a side view of a high-pressure system, comprising a system housing (1 '), a water tank (2') / a filter housing (3 '), a slide guide (4') and a rotatable support (5 ') above a tub for loading with a cylindrical printing template.
- FIG. 4 again shows the front view of a high-pressure system, comprising a drive motor (7 '), an adjustable water jet nozzle (8'), a high-pressure pump device (6 '), a rotatable support (5') above a trough for fitting with a cylindrical one Printing template (12).
- FIG. 5 shows a schematic side view of a high-pressure system, focused in relation to the nozzle setting of the high-pressure water jet (10 ') to the rotating printing stencil (12).
- the template (12) rests on a carrier tube (5 ') and the nozzle (8') is adjusted in such a way that the water jet strikes the pressure template (12) below the tube center axis.
- FIG. 6 shows a schematic plan view of a high-pressure system in relation to the nozzle setting of the high-pressure water jet (10 ') for the printing stencil (12) lying thereon. Appropriate adjustment of the nozzle (8 ') to the stencil surface axially prevents the stencil (12) from moving forward.
- the process according to the invention for decoating printing stencils comprises or consists of a) a softening step, the photoresist adhering to the printing stencil being weakened in a softening bath, i.e. its binding power to the printing stencil is loosened, and b) a hardening step, the printing stencil with the softened or partially detached photoresist located thereon being rinsed with water, so that the softened photoresist is hardened again but not reattached to the stencil, and finally c) a removal step, wherein the cured but essentially loosened photoresist is removed from the stencil by a high pressure water jet without the stencil surface being damaged.
- any chemical solvent or solvent mixture which softens the photoresist layer does not dissolve chemically, but only softens.
- An aqueous environment is preferably used, in particular because this meets the strict fire protection regulations in a simple manner.
- An acidic softening bath is very particularly preferably used to carry out the process according to the invention, the pH preferably being between 1 and 4, very particularly preferably around 3 and being able to be brought about by both organic and inorganic acids.
- an HC1 solution is preferably used and the hydrocarbons preferably comprise a mixture of glycols in water.
- the softening bath very particularly preferably contains a mixture of about 50-75% by weight of butylglycol, methylglycol and ethylenglycolmonoethylether (ethylglycol), about 2 to 20, preferably of about 5% by weight of HCl, and 10-25% by weight.
- ethylglycol methylglycol and ethylenglycolmonoethylether
- An optimal softening agent for carrying out the method according to the invention is a mixture with the brand name "Easy Stripp LP 237" from Prelit in CH-5608 Stetten.
- the softening bath containing a suitable softening agent has a temperature of between 40-100 ° C., preferably of 60-80 ° C., and very particularly preferably of about 70 ° C.
- Step a) i.e. the softening process is preferably carried out for about 5 to 40 minutes, preferably between 10 and 20 minutes.
- the printing stencil can remain static during the softening step, or else it can be kept in motion, for example in the case of rotating stencils in a rotational movement, so that the softening takes place uniformly.
- step c) water is preferably used at a temperature of 20 to 40 ° C.
- the photoresist layer hardened to such an extent that it can be removed by a high pressure water jet and the solid paint parts can be separated off by a suitable filter.
- the originally firm bond between said photoresist layer and the stencil substrate underneath is irreversibly weakened by the softening process a) and consequently is not brought back to the original state from before step a) by the curing step b).
- a mechanical and ecological means i.e. remove the unwanted photoresist layer with a water jet.
- the water jet pressure is preferably between 100-220 bar, preferably about 190 bar.
- the water used for the removal step c) can be used again and again for the implementation of step c), which results in a closed cycle.
- the circuit should have a pH of between about 8 to 12.
- a pH of about 10 is preferably set in order to achieve a degreasing effect or to reduce the surface tension to a minimum.
- the purpose of the alkaline environment is the optimal degreasing of the printing stencil in order to achieve optimal conditions for the re-application of a new photoresist on the stencil treated according to the invention.
- the preferred pH of about 9-10 is achieved, for example, by adding sodium hydroxide (NaOH) to the tank filling containing 150 liters of water.
- the native printing template obtained can then be rinsed again with water and dried over a warm air blower.
- the method according to the invention can in principle be carried out for all types of printing stencils. These include in particular the flat stencils and the rotary stencils, which have a cylindrical shape. In a very particularly preferred embodiment the inventive method for stripping cylindrical stencils, ie rotary stencils.
- the cylindrical template (12) preferably lies on a concentric, rotatable tube (5 '), for example made of rough PVC.
- a concentric, rotatable tube (5 ') for example made of rough PVC.
- the high-pressure water jet (10 ') from the high-pressure nozzle (8') onto the template surface (12) below (preferably about 10 mm) of the pipe center axis, on which the template rests. This ensures that the high-pressure water jet does not bounce off the stencil surface and does not form a water film on the pipe surface, but undermines and definitely detaches the photoresist layer.
- the tube on which the rotary template rests rotates preferably rotates at a speed of about 10 to 50, more preferably between 20 and 30 revolutions per minute, and on the other hand the water jet axis (3) (to the normal) is inclined about 3% sideways (see Figure 6) in order to prevent the stencil to be cleaned from moving forward.
- Another object of the present invention is an arrangement for stripping cylindrical printing stencils (rotary printing stencils), which a) a system for softening the photoresist layer, comprising an insulated double wall system (upper inner tub (6) and insulated lower tub (5)) equipped with a heater ( 4) in the lower part of the plant, as well as an inner tub in the upper part of the plant (6), a pump device (2) and a suction device (1) for the heated solvent liquid, the treatment template (12) resting on a tube (9), and b) a high-pressure system comprising an exposed, rotatable tube (5 '), preferably a PVC carrier tube with a rough surface , above a tub, for equipping with a cylindrical pressure stencil (12), an adjustable water jet nozzle (8 '), a high-pressure pump device (3') with a filter screen and a filter mat, a slide (4 ') and optionally a counter .
- a system for softening the photoresist layer comprising an insulated double wall system (upper inner tub
- a softening system according to Figures 1 and 2, a common rotation template (12) with a worn but still firmly bonded photoresist is introduced.
- a tank (5) which is filled with approximately 200 l of a softening agent.
- the said softening bath has a temperature of approximately 70 ° C. and contains a mixture of approximately 35% by weight butyl glycol, 20% by weight methyl glycol, 15% by weight ethylene glycol monoethyl ether, and 5% by weight HC1 and 25 % By weight of water.
- the rotary template (12) is put on a plastic tube (9), dips into the bath (6) on one side and is softened by slow but permanent rotation in the bath for about 20 minutes.
- the template with the softened photoresist layer is then removed from the softening system and by rinsing once with water (25 ° C) cleaned so that the soft photoresist layer hardens again.
- the pretreated rotary template is placed in a high-pressure system according to FIGS. 3 and 4, again on a rotating plastic tube (5 ') and, depending on the length of the template, for about 20 minutes with a high-pressure water jet (of approximately 25 ° C) sprayed.
- the high pressure rinse water has a pH of 10.
- the photoresist layer on the stencil flakes off in this way and is removed in the course of this method step c).
- the impact point (see FIG. 5) of the high-pressure water jet (10') (from the nozzle (8 ')) on the template surface (12) preferably about 10 mm below the pipe center axis on which the template rests. This ensures that the high-pressure water jet does not bounce off the stencil surface and does not form a water film on the pipe surface, but undermines and definitely detaches the photoresist layer.
- the photoresist layer is rinsed in the form of fragments of lacquer into the pouring basin of the high-pressure system, where it is filtered out in the lower part. After about 20 minutes, the high-pressure removal step is complete and the completely clean template can be removed from the plastic tube.
- the template thus obtained is thus in its native state, i.e. preserved completely intact and freed from the photoresist layer. It can now be reused by applying a new photoresist for a new run in a printing process.
Landscapes
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/IB1998/001802 WO2000029223A1 (fr) | 1998-11-13 | 1998-11-13 | Procede et dispositif pour enlever la couche de revetement d'ecrans d'impression |
AU96415/98A AU9641598A (en) | 1998-11-13 | 1998-11-13 | Method and device for removing the coating from printing screens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/IB1998/001802 WO2000029223A1 (fr) | 1998-11-13 | 1998-11-13 | Procede et dispositif pour enlever la couche de revetement d'ecrans d'impression |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000029223A1 true WO2000029223A1 (fr) | 2000-05-25 |
Family
ID=11004775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB1998/001802 WO2000029223A1 (fr) | 1998-11-13 | 1998-11-13 | Procede et dispositif pour enlever la couche de revetement d'ecrans d'impression |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU9641598A (fr) |
WO (1) | WO2000029223A1 (fr) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3534591A1 (de) * | 1984-11-08 | 1986-05-15 | Erik Bekkestua Brynildsen | Verfahren und vorrichtung zum reinigen von siebdrucksieben von druckfarbe und druckschablone |
DE8805955U1 (de) * | 1988-05-03 | 1988-12-01 | Typofot AG, Wohlen | Siebdruckform in einer verschließbaren Kabine |
EP0391491A1 (fr) * | 1989-04-07 | 1990-10-10 | Stork X-Cel B.V. | Procédé et dispositif pour enlever le matériau formant le dessin d'un pochoir sérigraphique |
DE4229668A1 (de) * | 1992-09-04 | 1994-03-10 | Werner Vidoni | Verfahren und Maschine zur Reinigung von Drucksieben |
-
1998
- 1998-11-13 WO PCT/IB1998/001802 patent/WO2000029223A1/fr active Application Filing
- 1998-11-13 AU AU96415/98A patent/AU9641598A/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3534591A1 (de) * | 1984-11-08 | 1986-05-15 | Erik Bekkestua Brynildsen | Verfahren und vorrichtung zum reinigen von siebdrucksieben von druckfarbe und druckschablone |
DE8805955U1 (de) * | 1988-05-03 | 1988-12-01 | Typofot AG, Wohlen | Siebdruckform in einer verschließbaren Kabine |
EP0391491A1 (fr) * | 1989-04-07 | 1990-10-10 | Stork X-Cel B.V. | Procédé et dispositif pour enlever le matériau formant le dessin d'un pochoir sérigraphique |
DE4229668A1 (de) * | 1992-09-04 | 1994-03-10 | Werner Vidoni | Verfahren und Maschine zur Reinigung von Drucksieben |
Non-Patent Citations (1)
Title |
---|
DECK W: "BIO-REINIGER IM SIEBDRUCK", DEUTSCHER DRUCKER, vol. 25, no. 27, 7 September 1989 (1989-09-07), pages 22 - 24, XP000068371, ISSN: 0012-1096 * |
Also Published As
Publication number | Publication date |
---|---|
AU9641598A (en) | 2000-06-05 |
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