WO1997025278A1 - Procede de traitement de l'eau de rinçage issue de la fabrication de semi-conducteurs - Google Patents

Procede de traitement de l'eau de rinçage issue de la fabrication de semi-conducteurs Download PDF

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Publication number
WO1997025278A1
WO1997025278A1 PCT/CH1996/000442 CH9600442W WO9725278A1 WO 1997025278 A1 WO1997025278 A1 WO 1997025278A1 CH 9600442 W CH9600442 W CH 9600442W WO 9725278 A1 WO9725278 A1 WO 9725278A1
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WO
WIPO (PCT)
Prior art keywords
pyrolysate
water
pore volume
rinsing water
pore radius
Prior art date
Application number
PCT/CH1996/000442
Other languages
German (de)
English (en)
Inventor
Philippe Rychen
Thomas Kleiber
Dominique Gensbittel
Original Assignee
Christ Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Christ Ag filed Critical Christ Ag
Priority to EP96940974A priority Critical patent/EP0876298B1/fr
Priority to US09/066,314 priority patent/US6123851A/en
Priority to DE59607144T priority patent/DE59607144D1/de
Priority to JP9524703A priority patent/JPH11506700A/ja
Priority to CA002231198A priority patent/CA2231198C/fr
Priority to AT96940974T priority patent/ATE202327T1/de
Publication of WO1997025278A1 publication Critical patent/WO1997025278A1/fr
Priority to NO19981323A priority patent/NO314993B1/no

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/285—Treatment of water, waste water, or sewage by sorption using synthetic organic sorbents

Definitions

  • the invention relates to a method for removing hydrophilic organic contaminants from rinsing water in semiconductor production by means of adsorption.
  • Typical semiconductor rinse waters contain inorganic and organic substances, such as, for example, fluoride, chloride, nitrate, sulfate, phosphate and ammonium ions, hydrogen peroxide, isopropanol, acetone, N-methylpyrrolidone, tetramethylammonium hydroxide, methanol, ethanol, butanol , Acetic acid, dimethyl sulfoxide, propylene glycol methyl ether acetate and the like.
  • inorganic and organic substances such as, for example, fluoride, chloride, nitrate, sulfate, phosphate and ammonium ions, hydrogen peroxide, isopropanol, acetone, N-methylpyrrolidone, tetramethylammonium hydroxide, methanol, ethanol, butanol , Acetic acid, dimethyl sulfoxide, propylene glycol methyl ether acetate and the like.
  • the main components usually consist of isopropanol, acetone, N-methylpyrrolidone, hydrofluoric acid, Hydrochloric acid, sulfuric acid, phosphoric acid, hydrogen peroxide, ammonia, ammonium fluoride, tetramethylammonium hydroxide and the like.
  • the rinsing water can typically have an electrical conductivity of approximately 10 to 2000 ⁇ S / cm and a TOC value of approximately 0.1 to 20 ppm.
  • the pH is generally between about 2 and 9, mostly below 7.
  • ion exchange processes Today, ion exchange processes, reverse osmosis processes, adsorption on activated carbon, biological processes and ultrafiltration are used to process the rinsing water.
  • free mineral acids and organic acids are routinely removed via weakly or strongly basic anion exchange resins.
  • reverse osmosis systems some of which are already present in the make-up water purification of the ultrapure water systems, together with the ion exchange stages present are generally readily able to remove both inorganic and organic acids, bases and salts to a sufficient extent.
  • Hydrogen peroxide and hydrophilic organic compounds such as isopropanol, acetone, N-methylpyrrolidone, methanol, ethanol, butanol, dimethyl sulfoxide and the like, however, are usually only separated to about 50-70% even in reverse osmosis stages, which in view of the required TOC Values of less than 5 ppb are far from sufficient. Additional treatment with activated carbon can the concentrations of these compounds are in principle further reduced; A satisfactory separation is often difficult or impossible to achieve even in this way.
  • EP-A-0285321 it was also proposed to use pyrolysates of crosslinked polymers as adsorbents for the separation of bacterial endotoxins (lipopolysaccharides), which may be present as pyrogens in tap water or in purified water, for example as a result of storage.
  • Suitable crosslinked polymers are, for example, styrene-divinylbenzene copolymers which, if necessary, can be sulfonated or chloromethylated and then aminated to form an ion exchange resin. nen.
  • this method can also be used in water treatment processes in which high-purity water is produced and stored by bringing the stored water into contact with the pyrolysate before a subsequent filtration step.
  • tap water is used for the production of ultrapure water and the adsorption step only serves to separate any pyrogens that may be present from the stored high-purity water.
  • pyrolyzates of macroreticular sulfonated vinylaromatic polymers are able to adsorb the hydrophilic organic impurities and hydrogen peroxide present in the rinsing water of the semiconductor production much better than activated carbon, despite their more hydrophobic surface.
  • impurities adsorbed on the pyrolysates mentioned are much better desorbable than adsorbed on active carbon.
  • the invention therefore relates to an adsorption process for removing hydrophilic organic impurities which are miscible with water at 15 ° C. in amounts of at least 10% by weight and / or hydrogen peroxide from rinsing water from semiconductor production, which is characterized by this that the rinse water is passed through a bed of a pyrolyzate of a macroreticular sulfonated vinyl aromatic polymer having a carbon content of at least 85% by weight and a carbon / hydrogen atomic ratio of 1.5: 1 to 20: 1. It has been shown that the process according to the invention not only achieves significantly better removal rates, but usually also the adsorption capacity of the pyrolysate is significantly higher than that of a conventional activated carbon.
  • hydrophilic organic impurity denotes non-ionic organic compounds which can be present in rinsing water from semiconductor production and are miscible with water at 15 ° C. in amounts of at least 10% by weight, in particular non-ionic organic compounds which are liquid at 20 ° C., such as the isopropanol, acetone, N-methylpyrrolidone, methanol, ethanol, butanol, acetic acid, dimethyl sulfoxide and propylene glycol ether acetate, in particular isopropanol, acetone and, used in semiconductor production N-methylpyrrolidone.
  • the term "vinyl aromatic polymer” in the context of the present invention denotes polymers obtained by polymerizing a vinyl aromatic monomer.
  • microreticular is to be understood in the context of the present invention in such a way that the polymers in question to a large extent have pores with a pore radius of at least 25 nm.
  • the pyrolysates which can be used according to the invention expediently have a carbon content of at least 85% by weight and a carbon / hydrogen atomic ratio of 1.5: 1 to 20: 1, preferably 2: 1 to 10: 1.
  • Both homopolymers and copolymers of monoethylenically unsaturated monomers such as styrene, vinyltoluene, ethylvinylbenzene, vinylxylene and vinylpyridine, and polyethylenically unsaturated monomers, such as divinylbenzene, trivinylbenzene, divinyltoluene and divinylpyridine, are suitable as starting polymers.
  • copolymers of a monoethylenically and a polyethylenically unsaturated polymer are preferred.
  • Styrene-divinylbenzene copolymers are particularly preferred, in particular those obtained by polymerizing 75-90 parts by weight of styrene with 25-10 parts by weight of divinylbenzene.
  • the polymerization can be carried out by known methods, for example as described in US-A-4040990 and US-A-4839331 ben, take place.
  • a preferred method is suspension polymerization disclosed in US-A-4224415.
  • the sulfonation of the polymers can also be carried out in a known manner, for example using concentrated sulfuric acid, oleum, sulfur trioxide or chlorosulfonic acid at elevated temperature. Suitable conditions are e.g. known from US-A-2366007, US-A-2500149, US-A-4224415 and US-A-4839331.
  • the pyrolysis of the sulfonated polymers by heating the polymers to a temperature of about 300-1200 ° C, preferably about 400-800 ° C, in an inert gas atmosphere (eg nitrogen, helium, neon and / or argon) for about 0.3 to 2 hours.
  • an activating gas such as carbon dioxide, oxygen or water vapor can be added to the inert gas or an aftertreatment can be carried out by heating to about 300-1200 ° C in an activating gas.
  • Pyrolysates that have not been treated with an activating gas generally show better adsorption capacity for hydrophilic organic contaminants.
  • micropores are formed in addition to the pores present in the polymer, which are largely retained in the pyrolysis.
  • micropores with a pore radius of more than 25 nm, mesopores with a pore radius of 1 to 25 nm and micropores with a pore radius of less than 1 nm can be distinguished in the pyrolysate, the adsorption presumably predominantly in the Micropores take place, while the mesopores and macropores facilitate transport to the micropores.
  • such pyrolysates are preferably used, the macro pores having a specific pore volume of at least about 0, 1 mL / g, preferably at least about 0.13 ml / g (for example 0,20- 0,25 ml / g), and mesopores with a specific pore volume of at least about 0.1 ml / g, in particular at least about 0.12 ml / g (for example 0.13-0.20 ml / g).
  • pyrolysates are generally preferred which have micropores with a specific pore volume of at least about 0.1 ml / g, particularly preferably at least about 0.2 ml / g (for example 0.2-0.4 ml / g).
  • the pore volumes mentioned correspond in each case to the values obtained from the nitrogen adsorption isotherms on a Micromeritics 2400 porosimeter.
  • the pore volumes mentioned are not critical, and pyrolysates with smaller pore volumes are in principle also suitable.
  • pyrolysates the mg at room temperature (24 C C) and a relative humidity of 94% at least 200, examples game as 200-400 mg, preferably 200- 300 mg of water per g of pyrolysate are able to adsorb, are generally more suitable than those which are able to adsorb less than 200 mg of water per g of pyrolysate.
  • two pyrolysates can therefore preferably be used, one of which is capable of adsorbing at least 200 mg of water and the other less than 200 mg of water per g of pyrolysate.
  • the process can be carried out in such a way that the rinsing water is passed either through a bed of a mixture of the two pyrolysates or one after the other, in any order, through a bed of these two pyrolysates.
  • the pyrolysates are chemically, thermally and physically very stable. They generally have a specific surface area of about 100-2000 m 2 / g, mostly about 500-1200 m 2 / g, and can be, for example, in the form of approximately spherical particles with an average grain size of, for example, about 0.2 to 1.5 mm, preferably about 0.3 to 1.0 mm, can be used.
  • Suitable pyrolysates are commercially available, for example, under the names Ambersorb 348F, Ambersorb 572, Ambersorb 575, Ambersorb 563 and Ambersorb 564 (Rohm and Haas, Philadelphia, USA), all of which are suitable for adsorbing hydrophilic organic contaminants and hydrogen peroxide.
  • Ambersorb 563 and / or 564 and for the adsorption of Hydrogen peroxide Ambersorb 572 and / or 575 can be used.
  • the process according to the invention can be carried out by the methods customary for adsorption processes, the pyrolysate bed preferably being arranged in an adsorption filter or a column which can be operated in the upflow or downflow process.
  • a bed height of at least about 30 cm, for example about 60-150 cm, is recommended.
  • the bed height can be increased; In this case, however, it is generally more advantageous to connect two or more pyrolysate beds in series.
  • a weakly basic anion exchanger can preferably be connected downstream of the pyrolysate bed.
  • Hot water is preferably first passed through the bed and the further treatment is carried out at room temperature.
  • the supply of rinsing water can be interrupted and the pyrolysate can be regenerated and reused in the normal flow or countercurrent process.
  • the regeneration can preferably be carried out by passing water vapor through the pyrolysate at a temperature of about 100 to 250 ° C. Generally, less than about 12 bed vouchers are sufficient Lumens of steam (measured as condensate) in order to remove the adsorbed impurities as far as possible.
  • the flow rates can be, for example, about 5-40 bed volumes of rinsing water per hour during operation and about 0.1-2.0 bed volumes of water vapor (measured as condensate) per hour during regeneration.
  • two or three pyrolysate beds can preferably be provided, one or two of which are in operation while a bed is being regenerated.
  • A Amberlite XAD 16 (Rohm and Haas) and
  • B the activated carbon Carbon BD (Chemviron) and, according to the invention,
  • D) Ambersorb 563 Rahm and Haas
  • the TOC removal rates as% adsorption based on the TOC values in the feed are shown graphically in FIG. 1 against the bed volumes of water supplied. As the results show, significantly higher TOC removal rates are achieved with the pyrolysates used according to the invention, and they also have higher absorption capacities.

Abstract

Les impuretés organiques hydrophiles et le peroxyde d'hydrogène présents dans les eaux de rinçage issues de la fabrication de semi-conducteurs sont éliminés par adsorption sur un pyrolysat d'un polymère vinylaromatique sulfoné macroréticulaire ayant une teneur en carbone d'au moins 85 % en poids et présentant un rapport atomique carbone/hydrogène compris entre 1,5:1 et 20:1. Comparativement aux charbons actifs classiques, ces pyrolysats présentent, en dépit de leur surface hydrophobe, un pouvoir d'adsorption élevé à l'égard de ces impuretés et permettent d'en éliminer des quantités nettement plus importantes.
PCT/CH1996/000442 1996-01-04 1996-12-17 Procede de traitement de l'eau de rinçage issue de la fabrication de semi-conducteurs WO1997025278A1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
EP96940974A EP0876298B1 (fr) 1996-01-04 1996-12-17 Procede de traitement de l'eau de rin age issue de la fabrication de semi-conducteurs
US09/066,314 US6123851A (en) 1996-01-04 1996-12-17 Process for treating semiconductor fabrication reclaim
DE59607144T DE59607144D1 (de) 1996-01-04 1996-12-17 Verfahren zur aufbereitung von spülwasser aus der halbleiterfertigung
JP9524703A JPH11506700A (ja) 1996-01-04 1996-12-17 半導体製造過程で生じる洗浄排水の処理方法
CA002231198A CA2231198C (fr) 1996-01-04 1996-12-17 Procede de traitement de l'eau de rincage issue de la fabrication de semi-conducteurs
AT96940974T ATE202327T1 (de) 1996-01-04 1996-12-17 Verfahren zur aufbereitung von spülwasser aus der halbleiterfertigung
NO19981323A NO314993B1 (no) 1996-01-04 1998-03-24 Fremgangsmåte for rensing av spylevann anvendt ved halvlederfremstilling

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH10/96 1996-01-04
CH1096 1996-01-04

Publications (1)

Publication Number Publication Date
WO1997025278A1 true WO1997025278A1 (fr) 1997-07-17

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Application Number Title Priority Date Filing Date
PCT/CH1996/000442 WO1997025278A1 (fr) 1996-01-04 1996-12-17 Procede de traitement de l'eau de rinçage issue de la fabrication de semi-conducteurs

Country Status (12)

Country Link
US (1) US6123851A (fr)
EP (1) EP0876298B1 (fr)
JP (1) JPH11506700A (fr)
KR (1) KR100421519B1 (fr)
CN (1) CN1120130C (fr)
AT (1) ATE202327T1 (fr)
CA (1) CA2231198C (fr)
DE (1) DE59607144D1 (fr)
MY (1) MY116594A (fr)
NO (1) NO314993B1 (fr)
TW (1) TW371295B (fr)
WO (1) WO1997025278A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329013B2 (ja) * 2001-04-12 2013-10-30 旭硝子株式会社 強度の高いテトラフルオロエチレン重合体の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2366007A (en) * 1942-08-11 1944-12-26 Gen Electric Production of synthetic polymeric compositions comprising sulphonated polymerizates of poly-vinyl aryl compounds and treatment of liquid media therewith
US2500149A (en) * 1947-02-21 1950-03-14 Dow Chemical Co Sulfonation of copolymers of monovinyl-and polyvinyl-aromatic compounds
NL241315A (fr) * 1958-07-18
US4040990A (en) * 1975-02-18 1977-08-09 Rohm And Haas Company Partially pyrolyzed macroporous polymer particles having multimodal pore distribution with macropores ranging from 50-100,000 angstroms
US4064043A (en) * 1975-02-18 1977-12-20 Rohm And Haas Company Liquid phase adsorption using partially pyrolyzed polymer particles
JPS62197308A (ja) * 1986-01-31 1987-09-01 Japan Organo Co Ltd 合成樹脂の炭化方法
US4883596A (en) * 1987-03-31 1989-11-28 Tokyo Organic Chemical Industries, Ltd. Carbonaceous adsorbent for removal of pyrogen and method of producing pure water using same
US4839331A (en) * 1988-01-29 1989-06-13 Rohm And Haas Company Carbonaceous adsorbents from pyrolyzed polysulfonated polymers
US5460792A (en) * 1992-12-23 1995-10-24 Rohm And Haas Company Removal and destruction of halogenated organic and hydrocarbon compounds with porous carbonaceous materials
AU6054694A (en) * 1993-05-03 1994-11-10 Rohm And Haas Company Sequestration of hydrophobic organic materials in sediment

Non-Patent Citations (1)

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Title
No relevant documents disclosed *

Also Published As

Publication number Publication date
CN1200712A (zh) 1998-12-02
NO981323D0 (no) 1998-03-24
JPH11506700A (ja) 1999-06-15
KR100421519B1 (ko) 2004-04-17
KR19990063887A (ko) 1999-07-26
EP0876298B1 (fr) 2001-06-20
TW371295B (en) 1999-10-01
NO981323L (no) 1998-03-24
MY116594A (en) 2004-02-28
CA2231198C (fr) 2002-11-12
CA2231198A1 (fr) 1997-07-17
CN1120130C (zh) 2003-09-03
NO314993B1 (no) 2003-06-23
EP0876298A1 (fr) 1998-11-11
ATE202327T1 (de) 2001-07-15
US6123851A (en) 2000-09-26
DE59607144D1 (de) 2001-07-26

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