USD868993S1 - Electrode plate for a plasma processing apparatus - Google Patents

Electrode plate for a plasma processing apparatus Download PDF

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Publication number
USD868993S1
USD868993S1 US29/635,287 US201829635287F USD868993S US D868993 S1 USD868993 S1 US D868993S1 US 201829635287 F US201829635287 F US 201829635287F US D868993 S USD868993 S US D868993S
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United States
Prior art keywords
processing apparatus
plasma processing
electrode plate
view
elevational view
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US29/635,287
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English (en)
Inventor
Masakazu Isozaki
Masahito Mori
Kenetsu Yokogawa
Takao Arase
Takahisa Hashimoto
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Assigned to HITACHI HIGH-TECHNOLOGIES CORPORATION reassignment HITACHI HIGH-TECHNOLOGIES CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: YOKOGAWA, KENETSU, ARASE, TAKAO, HASHIMOTO, TAKAHISA, ISOZAKI, MASAKAZU, MORI, MASAHITO
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Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION CHANGE OF NAME AND ADDRESS Assignors: HITACHI HIGH-TECHNOLOGIES CORPORATION
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US29/635,287 2017-08-31 2018-01-30 Electrode plate for a plasma processing apparatus Active USD868993S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-018889 2017-08-31
JPD2017-18889F JP1598996S (cs) 2017-08-31 2017-08-31

Publications (1)

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USD868993S1 true USD868993S1 (en) 2019-12-03

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US (1) USD868993S1 (cs)
JP (1) JP1598996S (cs)
TW (1) TWD193613S (cs)

Cited By (24)

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Publication number Priority date Publication date Assignee Title
USD939699S1 (en) * 2019-11-29 2021-12-28 Quanta Computer Inc. Wireless stethoscope
USD950738S1 (en) * 2019-10-18 2022-05-03 Masimo Corporation Electrode pad
USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD958401S1 (en) * 2020-05-27 2022-07-19 Hitachi High-Tech Corporation Ion shield plate for plasma processing device
USD962206S1 (en) * 2020-01-09 2022-08-30 Space Exploration Technologies Corp. Antenna apparatus
USD962908S1 (en) * 2020-07-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD962906S1 (en) * 2020-01-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD963623S1 (en) * 2020-01-09 2022-09-13 Space Exploration Technologies Corp. Antenna apparatus
USD965789S1 (en) 2020-05-11 2022-10-04 Masimo Corporation Blood pressure monitor
USD967433S1 (en) 2019-08-16 2022-10-18 Masimo Corporation Patient monitor
USD971192S1 (en) * 2019-06-03 2022-11-29 Space Exploration Technologies Corp. Antenna apparatus
TWD222303S (zh) 2021-05-04 2022-12-01 南韓商吉佳藍科技股份有限公司 花灑頭支撐件
USD971900S1 (en) * 2019-06-03 2022-12-06 Space Exploration Technologies Corp. Antenna apparatus
USD976242S1 (en) * 2019-06-03 2023-01-24 Space Exploration Technologies Corp. Antenna apparatus
USD979516S1 (en) 2020-05-11 2023-02-28 Masimo Corporation Connector
US11637437B2 (en) 2019-04-17 2023-04-25 Masimo Corporation Charging station for physiological monitoring device
USD985498S1 (en) 2019-08-16 2023-05-09 Masimo Corporation Connector
USD986228S1 (en) * 2020-01-09 2023-05-16 Space Exploration Technologies Corp. Antenna apparatus
USD998817S1 (en) * 2021-02-26 2023-09-12 AnuCell Biosystems Limited Assembly of bioreactor components
USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus
USD1008986S1 (en) * 2021-04-26 2023-12-26 Hitachi High-Tech Corporation Ion shield plate for plasma processing apparatus
USD1037462S1 (en) 2019-08-16 2024-07-30 Masimo Corporation Holder for a patient monitor
USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
USD1085029S1 (en) * 2022-07-19 2025-07-22 Applied Materials, Inc. Gas distribution plate

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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US20040179323A1 (en) * 2003-03-11 2004-09-16 Alon Litman Electrostatic chuck for wafer metrology and inspection equipment
US20040218339A1 (en) * 2003-01-29 2004-11-04 Kyocera Corporation Electrostatic chuck
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD553104S1 (en) * 2004-04-21 2007-10-16 Tokyo Electron Limited Absorption board for an electric chuck used in semiconductor manufacture
USD587339S1 (en) * 2008-01-31 2009-02-24 Hansgrohe Ag Showerhead
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
US8206506B2 (en) * 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD672050S1 (en) * 2012-01-13 2012-12-04 Samsung Electronics Co., Ltd. Disk for a medical testing machine
JP1545406S (cs) 2015-06-16 2016-03-14
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD790039S1 (en) * 2016-04-08 2017-06-20 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD789888S1 (en) * 2016-01-08 2017-06-20 Asm Ip Holding B.V. Electrode plate for semiconductor manufacturing apparatus
USD790489S1 (en) * 2015-07-08 2017-06-27 Ebara Corporation Vacuum contact pad
USD793572S1 (en) * 2015-06-10 2017-08-01 Tokyo Electron Limited Electrode plate for plasma processing apparatus
USD793526S1 (en) * 2016-04-08 2017-08-01 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber

Patent Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
US20040218339A1 (en) * 2003-01-29 2004-11-04 Kyocera Corporation Electrostatic chuck
US20040179323A1 (en) * 2003-03-11 2004-09-16 Alon Litman Electrostatic chuck for wafer metrology and inspection equipment
USD553104S1 (en) * 2004-04-21 2007-10-16 Tokyo Electron Limited Absorption board for an electric chuck used in semiconductor manufacture
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD587339S1 (en) * 2008-01-31 2009-02-24 Hansgrohe Ag Showerhead
US8206506B2 (en) * 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD672050S1 (en) * 2012-01-13 2012-12-04 Samsung Electronics Co., Ltd. Disk for a medical testing machine
USD793572S1 (en) * 2015-06-10 2017-08-01 Tokyo Electron Limited Electrode plate for plasma processing apparatus
JP1545406S (cs) 2015-06-16 2016-03-14
USD790489S1 (en) * 2015-07-08 2017-06-27 Ebara Corporation Vacuum contact pad
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD789888S1 (en) * 2016-01-08 2017-06-20 Asm Ip Holding B.V. Electrode plate for semiconductor manufacturing apparatus
USD790039S1 (en) * 2016-04-08 2017-06-20 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD793526S1 (en) * 2016-04-08 2017-08-01 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
Bialetti Moka Express Espresso Gasket & Filter Replacements. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: https://www.surlatable.com/product/PRO-449611/Bialetti+Moka+Express+Espresso+Gasket+and+Filter+Replacements. *
Isozaki et al., Design U.S. Appl. No. 29/635,292, filed Jan. 30, 2018.
Isozaki et al., Design U.S. Appl. No. 29/635,296, filed Jan. 30, 2018.
Okuda et al., Design U.S. Appl. No. 29/635,289, filed Jan. 30, 2018.
Silicon Part. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: http://www.daewonspic.com/english/si_en.jsp. *

Cited By (33)

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US12433524B2 (en) 2019-04-17 2025-10-07 Masimo Corporation Electrocardiogram device
US12390140B2 (en) 2019-04-17 2025-08-19 Masimo Corporation Blood pressure cuff
US12178581B2 (en) 2019-04-17 2024-12-31 Masimo Corporation Patient monitoring systems, devices, and methods
US11986305B2 (en) 2019-04-17 2024-05-21 Masimo Corporation Liquid inhibiting air intake for blood pressure monitor
US11701043B2 (en) 2019-04-17 2023-07-18 Masimo Corporation Blood pressure monitor attachment assembly
US11678829B2 (en) 2019-04-17 2023-06-20 Masimo Corporation Physiological monitoring device attachment assembly
US11637437B2 (en) 2019-04-17 2023-04-25 Masimo Corporation Charging station for physiological monitoring device
USD971900S1 (en) * 2019-06-03 2022-12-06 Space Exploration Technologies Corp. Antenna apparatus
USD1012070S1 (en) 2019-06-03 2024-01-23 Space Exploration Technologies Corp. Antenna apparatus
USD976242S1 (en) * 2019-06-03 2023-01-24 Space Exploration Technologies Corp. Antenna apparatus
USD971192S1 (en) * 2019-06-03 2022-11-29 Space Exploration Technologies Corp. Antenna apparatus
USD985498S1 (en) 2019-08-16 2023-05-09 Masimo Corporation Connector
USD967433S1 (en) 2019-08-16 2022-10-18 Masimo Corporation Patient monitor
USD1066672S1 (en) 2019-08-16 2025-03-11 Masimo Corporation Patient monitor and holder
USD1037462S1 (en) 2019-08-16 2024-07-30 Masimo Corporation Holder for a patient monitor
USD950738S1 (en) * 2019-10-18 2022-05-03 Masimo Corporation Electrode pad
USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD939699S1 (en) * 2019-11-29 2021-12-28 Quanta Computer Inc. Wireless stethoscope
USD962206S1 (en) * 2020-01-09 2022-08-30 Space Exploration Technologies Corp. Antenna apparatus
USD986228S1 (en) * 2020-01-09 2023-05-16 Space Exploration Technologies Corp. Antenna apparatus
USD963623S1 (en) * 2020-01-09 2022-09-13 Space Exploration Technologies Corp. Antenna apparatus
USD962906S1 (en) * 2020-01-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD1060680S1 (en) 2020-05-11 2025-02-04 Masimo Corporation Blood pressure monitor
USD965789S1 (en) 2020-05-11 2022-10-04 Masimo Corporation Blood pressure monitor
USD979516S1 (en) 2020-05-11 2023-02-28 Masimo Corporation Connector
USD958401S1 (en) * 2020-05-27 2022-07-19 Hitachi High-Tech Corporation Ion shield plate for plasma processing device
USD962908S1 (en) * 2020-07-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD998817S1 (en) * 2021-02-26 2023-09-12 AnuCell Biosystems Limited Assembly of bioreactor components
USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus
USD1008986S1 (en) * 2021-04-26 2023-12-26 Hitachi High-Tech Corporation Ion shield plate for plasma processing apparatus
TWD222303S (zh) 2021-05-04 2022-12-01 南韓商吉佳藍科技股份有限公司 花灑頭支撐件
USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
USD1085029S1 (en) * 2022-07-19 2025-07-22 Applied Materials, Inc. Gas distribution plate

Also Published As

Publication number Publication date
JP1598996S (cs) 2018-03-05
TWD193613S (zh) 2018-10-21

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