US7561245B2 - Liquid crystal display device and method of fabricating the same - Google Patents

Liquid crystal display device and method of fabricating the same Download PDF

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Publication number
US7561245B2
US7561245B2 US10/864,858 US86485804A US7561245B2 US 7561245 B2 US7561245 B2 US 7561245B2 US 86485804 A US86485804 A US 86485804A US 7561245 B2 US7561245 B2 US 7561245B2
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Prior art keywords
substrate
column spacers
projection pattern
projections
liquid crystal
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US20050185130A1 (en
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Chang Ho Oh
Jeom Jae Kim
Hong Man Moon
Sung Hak Jo
Mon Soo Kang
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LG Display Co Ltd
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LG Display Co Ltd
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Priority claimed from KR1020040029431A external-priority patent/KR100672651B1/ko
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Assigned to LG.PHILIPS LCD CO., LTD. reassignment LG.PHILIPS LCD CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: JO, SUNG HAK, KANG, MON SOO, KIM, JEOM JAE, MOON, HONG MAN, OH, CHANG HO
Publication of US20050185130A1 publication Critical patent/US20050185130A1/en
Priority to US11/783,820 priority Critical patent/US7502090B2/en
Assigned to LG DISPLAY CO., LTD. reassignment LG DISPLAY CO., LTD. CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). Assignors: LG.PHILIPS LCD CO., LTD.
Priority to US12/457,620 priority patent/US8284373B2/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes

Definitions

  • the present invention relates to a display device and a method of fabricating a display device, and more particularly, to a liquid crystal display (LCD) device and a method of fabricating an LCD device.
  • LCD liquid crystal display
  • LCD devices have been used commonly because of their thin profile, light weight, and low power consumption.
  • LCD devices are used commonly as a substitute for cathode ray tube (CRT) devices.
  • LCD devices are used commonly in notebook computers, computer monitors, and televisions.
  • the LCD devices must be developed having high quality images, such as high resolution and high luminance with a large-sized screen, while still maintaining their light weight, thin profile, and low power consumption.
  • FIG. 1 is a schematic perspective view of an LCD device according to the related art.
  • an LCD device includes first and second substrates 1 and 2 , and a liquid crystal layer between the first and second substrates 1 and 2 formed by an injection method.
  • the first substrate 1 includes a plurality of gate lines 4 arranged along a first direction at fixed intervals, a plurality of data lines 5 arranged along a second direction perpendicular to the first direction at fixed intervals, a plurality of pixel electrodes 6 arranged in a matrix configuration within pixel regions P defined by crossing of the gate and data lines 4 and 5 , and a plurality of thin film transistors T enabled according to signals supplied to the gate lines 4 for transmitting signals from the data lines 5 to the pixel electrodes 6 .
  • the second substrate 2 includes a black matrix layer 7 that prevents light from portions of the first substrate 1 , except for the pixel regions P, an R/G/B color filter layer 8 for displaying colored light, and a common electrode 9 for producing images.
  • liquid crystal molecules of the liquid crystal layer 3 are driven by an electric field generated between the pixel electrode 6 and the common electrode 9 .
  • an alignment direction of the liquid crystal molecules of the liquid crystal layer 3 is controlled by the induced electric field thereto. Accordingly, light irradiated through the liquid crystal layer 3 may be controlled by the alignment direction of the liquid crystal molecules, thereby displaying images.
  • the LCD device of FIG. 1 is commonly referred to as a twised neumatic (TN) mode LCD device, which has disadvantageous characteristics, such as narrow viewing angles.
  • an in-plane switching (IPS) mode LCD device In order to overcome these problems of the TN mode LCD device, an in-plane switching (IPS) mode LCD device has been developed.
  • IPS mode LCD device a pixel electrode and a common electrode are formed in a pixel region in parallel to each other at a fixed interval therebetween. Accordingly, an electric field parallel to substrates is generated between the pixel electrode and the common electrode, thereby aligning liquid crystal molecules of a liquid crystal layer by the electric field parallel to the substrates.
  • FIGS. 2 and 3 are flow charts of method for fabricating an LCD device according to the related art, wherein FIG. 2 shows a liquid crystal injection method and FIG. 3 shows a liquid crystal dispersion method.
  • the method for fabricating an LCD device is divided into three processes, including an array process, a cell process, and a module process.
  • the array process largely includes two steps of forming a TFT array having gate and data lines, a pixel electrode, and a thin film transistor on a first substrate, and forming a color filter array having a black matrix layer, a color filter layer, and a common electrode on a second substrate.
  • a plurality of LCD panels are formed on one large-sized glass substrate, and the TFT array and the color filter array are formed within each of the LCD panels. Then, the TFT substrate and the color filter substrate are moved to a cell process line.
  • an alignment material is coated on the TFT substrate and the color filter substrate, and an alignment process (i.e., rubbing process) S 10 is performed to the substrates to obtain a uniform alignment direction of liquid crystal molecules.
  • the alignment process S 10 is carried out in order of processes for cleaning before coating of an alignment layer, printing the alignment layer, baking the alignment layer, inspecting the alignment layer, and rubbing the alignment layer. Accordingly, the TFT substrate and the color filter substrate are respectively cleaned (S 20 ).
  • the seal pattern includes a liquid crystal injection inlet through which liquid crystal material is injected.
  • the ball spacers are formed of plastic balls or minute elastic particles.
  • the bonded TFT and color filter substrates are cut into individual LCD panel regions (S 60 ), thereby manufacturing the unit LCD panels each having a fixed size.
  • the liquid crystal material is injected to the LCD panel through the liquid crystal injection inlet, and the liquid crystal injection inlet is sealed (S 70 ), thereby forming a liquid crystal layer.
  • the LCD panel and a container having liquid crystal material therein are provided within a vacuum chamber. Accordingly, moisture and air bubbles in the liquid crystal material and the container are simultaneously removed, and an interior space of the LCD panel is maintained in a vacuum state. Then, the liquid crystal injection inlet of the LCD panel is dipped into the container having the liquid crystal material in the vacuum state, and the vacuum state inside the chamber is changed to an atmospheric pressure. Thus, the liquid crystal material is injected into the interior of the LCD panel through the liquid crystal injection inlet according to a pressure difference between the interior of the LCD panel and the vacuum chamber.
  • the injection method has the following disadvantages.
  • significant amounts of time are required for injecting the liquid crystal material between the two substrates, thereby lowering production yield.
  • significant amounts of time are required for injecting the liquid crystal material into large-sized spaces for large-sized LCD devices.
  • the liquid crystal dispersion method has been developed, in which two substrates are bonded to each other after dispersing liquid crystal material on any one of the two substrates.
  • the liquid crystal material is dispersed on any one of the two substrates.
  • ball spacers instead of the ball spacers, patterned spacers or column spacers are fixed to the substrate to maintain the cell gap between the two substrates. As shown in FIG.
  • a black matrix layer, a color filter layer, and an overcoat layer are formed on the color filter substrate. Then, a photosensitive resin is formed on the overcoat layer, and selectively removed to form the column spacer on the overcoat layer above the black matrix layer.
  • the column spacers may be formed in a photo process or an ink-jet process.
  • the liquid crystal material is dispersed on one of the two substrates (S 102 ), and a seal pattern is formed in the circumference of an LCD panel region on the other of the two substrates by a dispensing device (S 103 ). At this time, it is possible to perform dispersion of the liquid crystal and formation of the seal pattern on any one of the two substrates.
  • the TFT substrate and the color filter substrate are bonded to each other by pressure, and the seal patterned is hardened (S 105 ). Subsequently, the bonded substrates are cut into the respective LCD panels (S 106 ). In addition, an inspection process (S 107 ) for observing external appearances and tests for electric failures in the LCD panel are performed, so that the process of manufacturing the LCD device is completed.
  • the column spacer is formed on the color filter substrate, and the liquid crystal material is dispersed on the TFT substrate, then the two substrates are bonded to each other, thereby forming the LCD panel. Accordingly, the column spacer is fixed on the predetermined portion of the color filter substrate. In addition, the column spacer having a predetermined height is in contact with the predetermined portion of the TFT substrate corresponding to the gate or data line.
  • the column spacer of the LCD device according to the liquid crystal dispersion method causes the following problems to the LCD panel.
  • the column spacers are formed on the color filter substrate corresponding to the gate or data line. Accordingly, the column spacers are formed at the same height to be corresponding to the line region having the same width (gate or data line).
  • the columns spacers having the same height are formed on the color filter substrate opposite to the TFT substrate, and the two substrates are bonded to each other. Since the supportive force of the column spacers is weak, the LCD panel may suffer from problems due to gravity.
  • the LCD panel when the LCD device is at a high temperature, the LCD panel may have a protruding portion because the liquid crystal material has large thermal expansion characteristics.
  • the LCD panel When the LCD panel is placed in a vertical direction, the liquid crystal molecules of the LCD panel migrate to the lower-corner direction, thereby causing a gathering of liquid crystal molecules to the predetermined portion on the LCD panel due to the effects of gravity.
  • FIG. 4 is a cross sectional view of bonded TFT and color filter substrates having column spacers according to the related art.
  • a plurality of column spacers 20 are formed on a black matrix layer (not shown) of a color filter substrate 2 at fixed intervals, wherein each of the column spacers 20 is formed at a height “h.”
  • the color filter substrate 2 having the column spacers 20 thereon is bonded to a TFT substrate 1 . Accordingly, the height “h” of the column spacer 20 decreases to a height “h′” due to pressure created during the bonding process.
  • the column spacers 20 are formed on the portions corresponding to the line regions having the same width. Furthermore, since the column spacers 20 are patterned, the column spacers 20 may each have slightly different heights, whereby it is impossible to obtain uniformity of gravity on the entire regions of the LCD panel. As compared with ball spacers, each having a spherical end, the column spacer has a larger contact area with the substrate, thereby generating significant frictional forces between the column spacer 20 and the substrate. Accordingly, if a screen of the LCD device having the column spacers 20 is touched, spots will be generated on the screen and will remain for a long time.
  • FIG. 5A is a plan view of an LCD device according to the related art
  • FIG. 5B is a cross sectional view along I-I′ of FIG. 5A according to the related art.
  • FIG. 5A if an LCD panel 10 is continuously touched with a finger along a predetermined direction, the upper substrate 2 of the LCD panel is shifted at a predetermined interval along the touch direction, as shown in FIG. 5B .
  • the cylindrical column spacers are in contact with the lower and upper substrates 1 and 2 , they cause significant frictional forces between the column spacers and the two opposing substrates.
  • the liquid crystal molecules between the column spacers are not restored to their original states, thereby generating spots on the screen.
  • the LCD panel when the LCD panel is touched with the finger along the predetermined direction, as shown in FIG. 5B , the liquid crystal molecules gather within the region around the touched portion, whereby the region around the touched portion protrudes.
  • the cell gap “h 1 ” corresponding to the protruding portion is higher than the cell gap “h 2 ” of the remaining portions, thereby causing light leakage.
  • the touched portion since the touched portion has no liquid crystal molecules, blurred portions appear on the screen in a black state, thereby deteriorating luminance of the LCD panel 10 .
  • the ball spacers are formed on the substrate in a large amount, but the column spacers are selectively formed on the predetermined regions of the LCD panel. Accordingly, when the LCD panel is pressed at a predetermined portion having no column spacers, the substrates bend and form a hollow state due to low restoring speed of the substrates, thereby generating spots on the screen of the LCD panel.
  • the present invention is directed to an LCD device and a method of fabricating an LCD device that substantially obviates one or more problems due to limitations and disadvantages of the related art.
  • An object of the present invention is to provide an LCD device that prevents formation of hollow portions within a LCD panel.
  • Another object of the present invention is to provide a method of fabricating an LCD device that prevents formation of hollow portions within a LCD panel.
  • a liquid crystal display (LCD) device includes a first substrate having a plurality of column spacers fixed thereto, a second substrate facing the first substrate, and having a plurality of projections at portions corresponding to the column spacers, the projections contacting the column spacers, and a liquid crystal layer between the first and second substrates.
  • a liquid crystal display (LCD) device in another aspect, includes a first substrate having a plurality of first and second column spacers fixed thereto, a second substrate facing the first substrate, and having a plurality of projections at portions corresponding to the first column spacers, each of the projections contacting one of the first column spacers, and a liquid crystal layer between the first and second substrates.
  • LCD liquid crystal display
  • a liquid crystal display (LCD) device in another aspect, includes first and second substrates facing each other, a plurality of first and second column spacers on the first substrate, gate and data lines crossing each other on the second substrate to define a plurality of pixel regions, a thin film transistor including a semiconductor layer and source and drain electrodes disposed at each crossing region of the gate and data lines; a passivation layer on the second substrate, the passivation layer having a contact hole including the drain electrode, a plurality of pixel electrodes each within one of the pixel regions on the passivation layer electrically connected to the drain electrode of the thin film transistor, a plurality of projections on the passivation layer each corresponding to and contacting one of the first column spacers, and a liquid crystal layer between the first and second substrates.
  • LCD liquid crystal display
  • a liquid crystal display (LCD) device in another aspect, includes first and second substrates facing each other, a plurality of first and second column spacers on the first substrate, gate and data lines crossing each other on the second substrate to define a plurality of pixel regions, a common line parallel to the gate line, the common line having a plurality of common electrodes extending therefrom in parallel to the data line, a thin film transistor at each crossing region of the gate and data lines, the thin film transistor including a semiconductor layer and source and drain electrodes, a passivation layer on the second substrate having a contact hole including the drain electrode, a plurality of pixel electrodes on the passivation layer, each connected to the drain electrode of the thin film transistor, and each spaced parallel to the common electrodes at a fixed interval within the pixel regions, a plurality of projections on the passivation layer each corresponding to and contacting one of the first column spacers, and a liquid crystal layer between the first and second substrates.
  • LCD liquid crystal display
  • a liquid crystal display (LCD) device in another aspect, includes first and second substrates facing each other, a plurality of first and second column spacers on the first substrate, a plurality of gate lines and corresponding plurality of gate electrodes on the second substrate, a gate insulating layer on an entire surface of the second substrate including the gate line and the gate electrode, a semiconductor layer and a first projection pattern on the gate insulating layer corresponding to each of the gate electrodes and the first column spacers, a plurality of data lines perpendicular to the gate lines to define a plurality of pixel regions, source and drain electrodes at both sides of the semiconductor layer, a second projection pattern on the first projection pattern, a passivation layer on the second substrate having a contact hole including the drain electrode, a plurality of pixel electrodes on the passivation layer, each connected to the drain electrode of the thin film transistor and each within one of the pixel regions, and a liquid crystal layer between the first and second substrates.
  • LCD liquid crystal display
  • a liquid crystal display (LCD) device in another aspect, includes first and second substrates facing each other, a plurality of first and second column spacers on the first substrate, a plurality of gate lines and gate electrodes on the second substrate, a common line having a plurality of common electrodes each parallel to the gate lines, a gate insulating layer on an entire surface of the second substrate including the gate lines and the common line, a semiconductor layer and a first projection pattern on the gate insulating layer corresponding to each of the gate electrodes and each of the first column spacers, a plurality of data lines perpendicular to the gate lines to define a plurality of pixel regions, source and drain electrodes at both sides of the semiconductor layer, a second projection pattern on the first projection pattern, a passivation layer on the second substrate having a contact hole including the drain electrode, a plurality of pixel electrodes each connected to the drain electrode of the thin film transistor, and each spaced parallel to the common electrodes at a fixed interval within one of the pixel regions, and a
  • a liquid crystal display (LCD) device in another aspect, includes first and second substrates facing each other and having a plurality of pixel regions, a plurality of projections on the second substrate each corresponding to one of the pixel regions, first and second column spacers on the first substrate, each formed within two different ones of the pixel regions at every three pixel regions, each of the first column spacers overlapped by one of the projections, and each of the second column spacers not overlapped by the projections, and a liquid crystal layer between the first and second substrates.
  • LCD liquid crystal display
  • a liquid crystal display (LCD) device in another aspect, includes first and second substrates facing each other, a plurality of gate lines and gate electrodes on the second substrate, a gate insulating layer on an entire surface of the second substrate including the gate line and the gate electrode, a semiconductor layer and a first projection pattern on the gate insulating layer corresponding to each of the gate electrodes and a predetermined portion of each of the gate lines, a plurality of data lines perpendicular to the gate lines to define a plurality of pixel regions, source and drain electrodes at both sides of the semiconductor layer, a second projection pattern on the first projection pattern, a passivation layer on the second substrate having a contact hole including the drain electrode, a plurality of pixel electrodes on the passivation layer, each within one of the pixel regions and each connected to the drain electrode, first and second column spacers on the first substrate, each formed within two different ones of the pixel regions at every three pixel regions, each of the first column spacers overlapped by one of the projections, and each
  • a method of fabricating a liquid crystal display (LCD) device includes forming a plurality of column spacers on a first substrate, forming at least one projection on a second substrate corresponding to one of the column spacers, dispensing a liquid crystal material onto one of the first and second substrates, patterning a seal pattern on one of the first and second substrates, and bonding the first and second substrates together such that the one of the column spacers and the projection contact each other.
  • LCD liquid crystal display
  • a method of fabricating a liquid crystal display (LCD) device includes forming a plurality of first and second column spacers on a first substrate, forming at least one projection on a second substrate corresponding to one of the first column spacers, dispensing a liquid crystal material onto one of the first and second substrates, forming a seal pattern on one of the first and second substrates, and bonding the first and second substrates together such that the one of the first column spacers and the projection contact each other.
  • LCD liquid crystal display
  • a method of manufacturing a liquid crystal display (LCD) device includes forming a plurality of first and second column spacers on a first substrate, forming a plurality of gate lines and gate electrodes on a second substrate, forming a gate insulating layer on an entire surface of the second substrate including the gate lines and the gate electrodes, forming a semiconductor layer on the gate insulating layer above the gate electrode, forming a plurality of data lines on the second substrate perpendicular to the gate lines to define a plurality of pixel regions and source and drain electrodes at both sides of the semiconductor layer, forming a passivation layer on the second substrate having a contact hole including the drain electrode, forming a plurality of pixel electrodes on the passivation layer, each connected to the drain electrode, forming at least one projection on the second substrate corresponding to one of the first column spacers, dispensing a liquid crystal material onto one of the first and second substrates, forming a seal pattern on one of the first and second substrates, and bonding
  • a method of manufacturing a liquid crystal display (LCD) device includes forming a plurality of first and second column spacers on a first substrate, forming a plurality of gate lines and gate electrodes on a second substrate, forming a gate insulating layer on an entire surface of the second substrate including the gate lines and the gate electrodes, forming a semiconductor layer and a first projection pattern on the gate insulating layer corresponding to the gate electrodes and the first column spacers, forming a plurality of data lines on the second substrate perpendicular to the gate lines to define a plurality of pixel regions, source and drain electrodes at both sides of the semiconductor layer, and a second projection pattern on the first projection pattern, forming a passivation layer along an entire surface of the second substrate and having a contact hole including the drain electrode, forming a plurality of pixel electrodes on the passivation layer, each connected to the drain electrode, dispensing a liquid crystal material onto one of the first and second substrates, forming a seal pattern on one
  • a method of manufacturing a liquid crystal display (LCD) device includes forming a plurality of first and second column spacers on a first substrate, forming a plurality of gate lines each having a gate electrode, and a common line having a plurality of common electrodes, on the second substrate, forming a gate insulating layer on an entire surface of the second substrate including the gate lines and the common line, forming a semiconductor layer and a first projection pattern on the gate insulating layer corresponding to one of the gate electrodes and one of the first column spacers, forming a plurality of data lines on the second substrate perpendicular to the gate lines to define a plurality of pixel regions, source and drain electrodes at both sides of the semiconductor layer, and a second projection pattern on the first projection pattern, forming a passivation layer along an entire surface of the second substrate having a contact hole including the drain electrode, forming a plurality of pixel electrodes on the passivation layer, each connected to the drain electrode and parallel to the common electrodes within
  • a method of manufacturing a liquid crystal display (LCD) device includes preparing first and second substrates having a plurality of pixel regions, forming a plurality of projections on the second substrate each corresponding to one of the pixel regions, forming first and second column spacers on the first substrate within two different ones of the pixel regions at every three pixel regions, each of the first column spacers overlapping one of the projections, and each of the second column spacers not overlapping the projections, dispensing a liquid crystal material onto one of the first and second substrates, forming a seal pattern on one of the first and second substrates, and bonding the first and second substrates together such that the one of the first column spacers and the projections contact each other.
  • a method of manufacturing a liquid crystal display (LCD) device includes preparing first and second substrates, forming a gate line and a gate electrode on the second substrate, forming a gate insulating layer on an entire surface of the second substrate including the gate line and the gate electrode, forming a semiconductor layer and a first projection pattern on the gate insulating layer corresponding to the gate electrode and a predetermined portion of the gate line, forming a data line on the second substrate perpendicular to the gate line to define a pixel region, source and drain electrodes at both sides of the semiconductor layer, and a second projection pattern on the first projection pattern, forming a passivation layer on the second substrate and having a contact hole including the drain electrode, forming a pixel electrode on the passivation layer connected to the drain electrode with the pixel region, forming first and second column spacers within the first pixel region and a second pixel region at every third pixel region on the first substrate, the first column spacer overlapping one of a plurality of projections on the
  • a liquid crystal display (LCD) device in another aspect, includes a first substrate having a plurality of first and second column spacers, a second substrate facing the first substrate, the second substrate contacting the first column spacers, and a liquid crystal layer between the first and second substrates.
  • FIG. 1 is a schematic perspective view of an LCD device according to the related art
  • FIG. 2 is a flow chart of a method of fabricating an LCD device according to the related art
  • FIG. 3 is a flow chart of another method of fabricating an LCD device according to the related art
  • FIG. 4 is a cross sectional view of bonded TFT and color filter substrates having column spacers according to the related art
  • FIG. 5A is a plan view of an LCD device according to the related art
  • FIG. 5B is a cross sectional view along I-I′ of FIG. 5A according to the related art
  • FIG. 6 is a cross sectional view of an exemplary LCD device according to the present invention.
  • FIGS. 7A and 7B are cross sectional views of another exemplary LCD device according to the present invention.
  • FIG. 8 is a schematic plan view of an exemplary IPS mode LCD device according to the present invention.
  • FIG. 9 is a cross sectional view along II-II′ of FIG. 8 according to the present invention.
  • FIG. 10 is a cross sectional view along II-II′ of FIG. 8 according to the present invention.
  • FIG. 11 is a plan view of an exemplary TFT substrate according to the present invention.
  • FIG. 12 is a plan view of an exemplary LCD device according to the present invention.
  • FIG. 13 is a cross sectional view along III-III′ of FIG. 12 according to the present invention.
  • FIG. 14 is a cross sectional view of another exemplary LCD device according to the present invention.
  • FIG. 15 is a cross sectional view of another exemplary LCD device according to the present invention.
  • FIG. 16 is a cross sectional of another exemplary LCD device according to the present invention.
  • FIG. 17 is a cross sectional view of another exemplary LCD device according to the present invention.
  • FIG. 18 is a cross sectional view of another exemplary LCD device according to the present invention.
  • FIG. 19 is a plan view of an exemplary TN mode LCD device according to the present invention.
  • FIG. 20 is a cross sectional view along IV-IV′ of FIG. 19 according to the present invention.
  • FIG. 6 is a cross sectional view of an exemplary LCD device according to the present invention in FIG. 6
  • an LCD may include a color filter substrate 100 , a TFT substrate 200 , a liquid crystal layer (not shown), a plurality of first and second column spacers 50 a and 50 b , and a plurality of projections 51 .
  • the color filter substrate 100 may have a color filter array disposed thereon and the TFT substrate 200 may have a TFT array disposed thereon to oppose the color filter substrate 100 , wherein the liquid crystal layer 55 may be formed between the color filter substrate 100 and the TFT substrate 200 .
  • the plurality of first and second column spacers 50 a and 50 b may be formed on the color filter substrate 100 at a predetermined interval from the TFT substrate 200 , and the plurality of projections 51 may be formed on the TFT substrate 200 corresponding to the plurality of first column spacers 50 a . Accordingly, the plurality of projections 51 may be formed to correspond to the first column spacers 50 a , thereby maintaining a uniform cell gap between the TFT substrate 200 and the color filter substrate 100 .
  • the second column spacers 50 b may function as buffers for preventing formation of hollow portion within the LCD panel when the substrates of the LCD panel are pressed by an external force. Accordingly, a contact area between the projection 51 and the first column spacer 50 a may be determined according to an upper surface area of the projection 51 .
  • the first and second column spacers 50 a and 50 b may be formed on portions corresponding to gate or data lines of the TFT substrate 200 .
  • the second column spacers 50 b may be formed on portions corresponding to pixel regions.
  • a surface area of the projection 51 may be relatively smaller than a surface area of the first column spacer 50 a .
  • a surface area of the first column spacer 50 a may have a first area contacting the projection 51 and a second area not contacting the projection 51 .
  • FIGS. 7A and 7B are cross sectional views of another exemplary LCD device according to the present invention, wherein FIG. 7A and FIG. 7B illustrate changes of an LCD device upon a touch contact and after a touch contact.
  • FIG. 7A when the LCD panel is touched, the contact area between the first column spacer 50 a and the projection 51 may decrease, thereby reducing frictional forces therebetween. After touching, liquid crystal molecules may be rapidly restored to an original state, as shown in FIG. 7B . Thus, the liquid crystal molecules may be prevented from migrating into the touch portion, thereby preventing light leakage and obtaining uniform light luminance along an entire LCD panel.
  • FIG. 8 is a schematic plan view of an exemplary IPS mode LCD device according to the present invention
  • FIG. 9 is a cross sectional view along II-II′ of FIG. 8 according to the present invention.
  • a color filter substrate 100 and a TFT substrate 200 may be bonded to each other at a predetermined interval therebetween, and a liquid crystal layer (not shown) may be formed between the color filter substrate 100 and the TFT substrate 200 by an injection method.
  • the color filter substrate 100 may include a black matrix layer 31 , an R/G/B color filter layer (not shown), and an overcoat layer 33 , all formed on a glass substrate 60 .
  • the black matrix layer 31 may exclude light from portions corresponding to gate and data lines and thin film transistors, except at respective pixel regions.
  • the color filter layer (not shown) may be formed to produce various colored light at the portions corresponding to the respective pixel regions, and the overcoat layer 33 may be formed along an entire surface of the black matrix layer 31 and the color filter layer.
  • first and second column spacers 50 a and 50 b may be formed of photosensitive resin on the predetermined portions of the overcoat layer 33 .
  • the TFT substrate 200 may be disposed to oppose the color filter substrate 100 .
  • the TFT substrate 200 may include a plurality of gate lines 41 and a plurality of data lines 42 , all formed on a glass substrate 70 .
  • the gate and data lines 41 and 42 may be formed perpendicular to each other, thereby defining the pixel regions.
  • a common line 47 may be formed in parallel to the gate lines 41 , and a plurality of common electrodes 47 a may extend from the common line 47 to the pixel regions and may be formed at fixed intervals.
  • a thin film transistor TFT may be formed at each crossing portion of the gate and data lines 41 and 42 , and may include source and drain electrodes 42 a and 42 b.
  • a plurality of pixel electrodes 43 may be formed between and parallel to the common electrodes 47 a , wherein each of the pixel electrodes 43 may be connected to the drain electrode 42 b of the TFT.
  • the projections 51 (in FIGS. 7A and 7 b ) extending from a semiconductor layer 44 and the data line 42 may be formed above the gate line 41 corresponding to the first column spacer 50 a.
  • An exemplary method of fabricating the TFT, the pixel electrodes, and the projections may include deposition of a metal material, such as Mo, Al, or Cr, along an entire surface of the glass substrate 70 by a sputtering method, and may be patterned by photolithographic processes, thereby simultaneously forming the plurality of gate lines 41 , a gate electrode 41 a projecting from the gate line 41 , the common line 47 , and the common electrode 47 a.
  • a metal material such as Mo, Al, or Cr
  • an insulating material of SiN x may be deposited along the entire surface of the glass substrate 70 including the gate lines 41 , thereby forming a gate insulating layer 45 .
  • the semiconductor layer 44 may be deposited on the gate insulating layer 45 and patterned to form a first projection pattern 44 a for forming the projection on the gate insulating layer 45 corresponding to the first column spacer 50 a .
  • an amorphous silicon layer (or polysilicon layer) and a heavily doped silicon layer may be sequentially deposited and simultaneously patterned, thereby forming the semiconductor layer 44 .
  • a metal material such as Mo, Al, or Cr, may be deposited along the entire surface of the glass substrate 70 by a sputtering method and patterned by photolithographic processes, thereby forming the data line 42 perpendicular to the gate line 41 .
  • the source and drain electrodes 42 a and 42 b may be formed at both sides of the semiconductor layer 44 , and a second projection pattern 42 c may be formed on the first projection pattern 44 a . Accordingly, the source electrode 42 a may project from the data line 42 .
  • a portion of the doped silicon layer between the source electrode 42 a and the drain electrode 42 b may be removed.
  • the projection 51 may be formed of the first and second projections patterns 44 a and 42 c.
  • a passivation layer 46 of SiN x may be formed along the entire surface of the glass substrate 70 including the source electrode 42 a and the drain electrode 42 b using a chemical vapor deposition (CVD) method.
  • the passivation layer 46 may be formed of an organic material having a low dielectric constant, such as BenzoCycloButene (BCB), Spin On Glass (SOG,) or acryl, to improve an aperture ratio of liquid crystal cell.
  • BCB BenzoCycloButene
  • SOG Spin On Glass
  • the passivation layer 46 may be selectively etched on the drain electrode 42 b , thereby forming a contact hole exposing a predetermined portion of the drain electrode 42 b .
  • a transparent conductive layer may be formed on the passivation layer 46 to be connected to the drain electrode 42 b through the contact hole by sputtering. Then, the transparent conductive layer may be selectively removed to form the pixel electrode 43 connected to the drain electrode 42 between and parallel to the common electrodes 47 a.
  • first and second alignment layers may be formed on the color filter substrate 100 having the column spacers 50 a and 50 b , and on the TFT substrate 200 having the projection 51 , respectively, wherein a rubbing process may be performed thereto.
  • the surfaces of the first and second alignment layers may be rubbed with a cloth at a constant pressure and speed.
  • polymer chains of the alignment layers may be aligned along a predetermined direction, thereby determining an initial alignment direction of liquid crystal molecules of the liquid crystal layer.
  • the upper surface of the projection 51 is relatively smaller than the lower surface of the first column spacer 50 a .
  • the projection 51 is formed at the portion corresponding to the first column spacer 50 a to decrease the contact area between the first column spacer and structures formed on the TFT substrate 200 when the screen of the LCD device is touched along one direction.
  • it is possible to improve the restoring force of the liquid crystal by decreasing the frictional force between the first column spacer and the structures formed on the TFT substrate.
  • the TFT substrate 200 corresponding to the first column spacer 50 a may have a vertical deposition structure including the substrate 70 , the gate line 41 , the gate insulating layer 45 , the first projection pattern 44 a of the semiconductor layer, the second projection pattern 42 c formed of the same material as the data line, and the passivation layer 46 .
  • the TFT substrate 200 corresponding to the second column spacer 50 b may have a vertical deposition structure including the substrate 70 , the gate line 41 , the gate insulating layer 45 , and the passivation layer 46 .
  • an entire surface of the first column spacer 50 may not contact the projection 51 .
  • the surface area of the first column spacer 50 a may be divided into first and second areas, wherein the first area may contact the projection 51 and the second area may not contact the projection 51 .
  • the TFT substrate 200 corresponding to the first area may have a vertical deposition structure including the substrate 70 , the gate line 41 , the gate insulating layer 45 , the first projection pattern 44 a of the semiconductor layer, the second projection pattern 42 c formed of the same material as the data line, and the passivation layer 46 .
  • the TFT substrate 200 corresponding to the second area may have a vertical deposition structure including the substrate 70 , the gate line 41 , the gate insulating layer 45 , and the passivation layer 46 . Accordingly, a step difference of about 500 ⁇ or more may exist between the surfaces of the TFT substrate 200 corresponding to the first column spacer 50 a and the second column spacer 50 b . Similarly, a step difference of about 500 ⁇ or more may exist between the surfaces of the TFT substrate 200 corresponding to the first and second areas.
  • the color filter substrate 100 may include the column spacers 50 a and 50 b
  • the TFT substrate 200 may include the projections 51 .
  • the column spacers may be formed on the TFT substrate, and the projections 51 may be formed on the color filter substrate.
  • the first and second column spacers 50 a and 50 b may be alternately formed within the pixel regions, and each of the projections 51 may be formed at portions corresponding to the first column spacer 50 a .
  • the first or second column spacers 50 a or 50 b may be formed within every two pixel regions, and the projection 51 may be formed at portions corresponding t o the first column spacer 50 a.
  • FIG. 10 is a cross sectional view along II-II′ of FIG. 8 according to the present invention.
  • an LCD device may include a color filter substrate 100 and a TFT substrate 200 bonded at a predetermined interval therebetween, and a liquid crystal layer (not shown) may be formed by injecting a liquid crystal material between the color filter substrate 100 and the TFT substrate 200 .
  • the color filter substrate 100 may include a black matrix layer 31 , an R/G/B color filter layer (not shown), and an overcoat layer 33 , all formed on a glass substrate 60 .
  • the black matrix layer 31 may exclude light from portions corresponding to gate and data lines and thin film transistors, except for pixel regions.
  • the color filter layer (not shown) may produce various colored light at the portions corresponding to the respective pixel regions, and the overcoat layer 33 may be formed along an entire surface of the black matrix layer 31 and the color filter layer.
  • first and second column spacers 50 a and 50 b may be formed on predetermined portions of the overcoat layer 33 , wherein the first and second column spacers 50 a and 50 b may be formed of photosensitive resin.
  • the TFT substrate 200 including a plurality of gate lines 41 and a plurality of data lines 42 may be formed to oppose the color filter substrate 100 , wherein the gate and data lines 41 and 42 may cross each other to define a plurality of the pixel regions.
  • a common line 47 may be formed in parallel to the gate lines 41 , and a plurality of common electrodes 47 a , which may extend from the common line 47 toward the pixel regions, may be formed at fixed intervals.
  • a thin film transistor TFT may be formed at each of the crossing regions of the gate and data lines 41 and 42 , wherein the TFT may include source and drain electrodes 42 a and 42 b.
  • a plurality of pixel electrodes 43 may be formed between and in parallel to the common electrodes 47 a , wherein each of the pixel electrodes 43 may be connected to the drain electrode 42 b of the TFT.
  • a projection 51 may be formed on the TFT substrate 200 corresponding to the first column spacer 50 a.
  • An exemplary method of fabricating the thin film transistor, the pixel electrode, and the projection may include deposition of a metal material, such as Mo, Al, or Cr, along an entire surface of the glass substrate 70 , and patterning by photolithographic processes, thereby simultaneously forming the plurality of gate lines 41 , a gate electrode 41 a extending from the gate line 41 , the common line 47 , and the common electrode 47 a.
  • a metal material such as Mo, Al, or Cr
  • a gate insulating layer 45 may be formed by depositing an insulating material of SiN x along the entire surface of the glass substrate 70 including the gate lines 41 . Then, a semiconductor layer 44 may be formed on the gate insulating layer 45 above the gate electrode 41 a .
  • an amorphous silicon layer (or polysilicon layer) and a heavily doped silicon layer may be sequentially deposited and simultaneously patterned, thereby forming the semiconductor layer 44 .
  • a metal material such as Mo, Al, or Cr, may be deposited along the entire surface of the glass substrate 70 by a sputtering method, and patterned by photolithographic processes, thereby forming the data line 42 perpendicular to the gate line 41 .
  • source and drain electrodes 42 a and 42 b may be formed at both sides of the semiconductor layer 44 , wherein the source electrode 42 a may project from the data line 42 .
  • a portion of the doped silicon layer between the source electrode 42 a and the drain electrode 42 b may be removed.
  • a passivation layer 46 of SiN x may be formed along the entire surface of the substrate including the source electrode 42 a and the drain electrode 42 b using a CVD method.
  • the passivation layer 46 may be formed of an organic material having a low dielectric constant, such as BCB, SOG, or acryl, to improve an aperture ratio of the liquid crystal cell.
  • the passivation layer 46 may be selectively etched on the drain electrode 42 b , thereby forming a contact hole exposing a predetermined portion of the drain electrode 42 b .
  • a transparent conductive layer may be formed on the passivation layer 46 to be connected to the drain electrode 42 b through the contact hole by a sputtering method. Then, the transparent conductive layer may be selectively removed to form the pixel electrode 43 connected to the drain electrode 42 and to be formed in between and in parallel to the common electrodes 47 a.
  • the projections 51 may be formed on the color filter substrate 100 corresponding to the first column spacer 50 a by depositing the same material as the column spacer on the passivation layer 46 , and selectively removing the deposited material.
  • first and second alignment layers may be formed on the color filter substrate 100 and the TFT substrate 200 , respectively, and then a rubbing process may be performed thereto.
  • the surfaces of the alignment layers may be rubbed with a cloth at a uniform pressure and speed.
  • polymer chains of the alignment layers may be aligned along a predetermined direction, thereby determining an initial alignment direction of the liquid crystal material.
  • an upper surface of the projection 51 may be relatively smaller than a lower surface of the first column spacer 50 a .
  • the projection 51 may be formed at a portion corresponding to the first column spacer 50 a to reduce a contact surface between the first column spacer and structures formed on the TFT substrate 200 when a screen of the LCD device is touched along one direction. Accordingly, a restoring force of the liquid crystal material may be increased, and frictional forces between the first column spacer 50 a and the structures formed on the TFT substrate 200 may be reduced.
  • column spacers may be formed on a color filter substrate, and projections may be formed on a TFT substrate.
  • the column spacers may be formed on the TFT substrate, and the projections may be formed on the color filter substrate.
  • the projections 51 may be additionally formed corresponding to the first column spacer 50 a , thereby requiring an additional process.
  • the first and second column spacers 50 a and 50 b may be alternately formed within the pixel regions, and the projections 51 may be formed at portions corresponding to the first column spacer 50 a .
  • the first or second column spacers 50 a or 50 b may be alternately formed within every two pixel regions, and the projections 51 may be formed at portions corresponding to the first column spacer 50 a .
  • a step difference of about 500 ⁇ or more may exist between the surfaces of the TFT substrate 200 corresponding to the first column spacer 50 a and the second column spacer 50 b .
  • a step difference of about 500 ⁇ or more may exist between the surfaces of the TFT substrate 200 corresponding to the first and second areas.
  • FIG. 11 is a plan view of an exemplary TFT substrate according to the present invention
  • FIG. 12 is a plan view of an exemplary LCD device according to the present invention
  • FIG. 13 is a cross sectional view along III-III′ of FIG. 12 according to the present invention.
  • an LCD device may include a color filter substrate 100 and a TFT substrate 200 bonded at a predetermined interval therebetween, and a liquid crystal layer (not shown) may be formed by injecting a liquid crystal material between the color filter substrate 100 and the TFT substrate 200 .
  • the color filter substrate 100 may include a black matrix layer 31 , an R/G/B color filter layer (not shown), and an overcoat layer 33 , all formed on a glass substrate 60 , wherein the black matrix layer 31 may exclude light from portions corresponding to gate and data lines and thin film transistors, except for pixel regions.
  • the color filter layer (not shown) may produce various colored light at the portions corresponding to the pixel regions, and the overcoat layer 33 may be formed along an entire surface of the black matrix layer 31 and the color filter layer.
  • first and second column spacers 50 a and 50 b may be formed on predetermined portions of the overcoat layer 33 , and may be formed of photosensitive resin.
  • the two column spacers of the first and second column spacers 50 a and 50 b may be formed within the two pixel regions at every third pixel region.
  • the first column spacer 50 a may be formed within a first pixel region among the three pixel regions
  • the second column spacer 50 b may be formed within another one of the three pixel regions.
  • the first column spacer 50 a may be formed in the pixel region corresponding to a red color
  • the second column spacer 50 b may be formed within a pixel region corresponding to a blue color
  • the pixel region corresponding to green color may have no column spacer therein.
  • the column spacers may be formed at fixed intervals.
  • the TFT substrate 200 may include a plurality of gate lines 41 and a plurality of data lines 42 that cross each other to define a plurality of the pixel regions.
  • a common line 47 may be formed in parallel to the gate line, and a plurality of common electrodes 47 a , which may extend from the common line 47 to the pixel regions, may be formed at fixed intervals.
  • a thin film transistor TFT may be formed at each of the crossing regions of the gate and data lines 41 and 42 , and may including source and drain electrodes 42 a and 42 b.
  • a plurality of pixel electrodes 43 may be formed between and parallel to the common electrodes 47 a , and each of the pixel electrodes 43 may be connected to the drain electrode 42 b of the TFT.
  • a projection 51 may be formed on the gate line 41 within each of the pixel regions, wherein the projections 51 may be formed of a first projection pattern 44 a and a second projection pattern 42 c .
  • some projections 51 may overlap with the first column spacer 50 a , and some projections 51 may not overlap with the second column spacers 50 b .
  • the upper surfaces of each of the projections 51 may be relatively smaller than lower surfaces of the first column spacer 50 a.
  • An exemplary method of fabricating the TFT, the pixel electrode, and the projection may include deposition of a metal material, such as Mo, Al, or Cr, along an entire surface of the glass substrate 70 by a sputtering method, and patterning by photolithographic processes, thereby forming the plurality of gate lines 41 , a gate electrode 41 a that extends from the gate line 41 , the common line 47 and the common electrode 47 a.
  • a metal material such as Mo, Al, or Cr
  • a gate insulating layer 45 may be formed by depositing an insulating material of SiN x along the entire surface of the glass substrate 70 including the gate lines 41 . Then, the semiconductor layer 44 may be deposited on the gate insulating layer 45 , and patterned to form the first projection pattern 44 a for forming the projection 51 on the gate insulating layer 45 within each of the pixel regions.
  • the first projection pattern 44 a may be formed to overlap the first column spacer 50 a within one pixel region among at least three pixel regions. For example, an amorphous silicon layer (or polysilicon layer) and a heavily doped silicon layer may be sequentially deposited, and then simultaneously patterned, thereby forming the semiconductor layer 44 .
  • a metal material such as Mo, Al, or Cr
  • a metal material such as Mo, Al, or Cr
  • the source and drain electrodes 42 a and 42 b may be formed at both sides of the semiconductor layer 44 , and the second projection pattern 42 c is formed on the first projection pattern 44 a .
  • the source electrode 42 a may project from the data line 42 .
  • the projections 51 may be formed by the first and second projections patterns 44 a and 42 c.
  • a passivation layer 46 of SiN x may be formed along the entire surface of the TFT substrate 70 including the source electrode 42 a and the drain electrode 42 b using a CVD method.
  • the passivation layer 46 may be formed of an organic material having a low dielectric constant, such as BCB, SOG, or acryl, to improve an aperture ratio of the liquid crystal cell.
  • the passivation layer 46 may be selectively etched on the drain electrode 42 b , thereby forming a contact hole exposing a predetermined portion of the drain electrode 42 b .
  • a transparent conductive layer may be formed on the passivation layer 46 to be electrically connected to the drain electrode 42 b through the contact hole. Then, the transparent conductive layer may be selectively removed to form the pixel electrode 43 connected to the drain electrode 42 , and formed in between and parallel to the common electrodes 47 a.
  • first and second alignment layers may be formed on the color filter substrate 100 having the column spacers 50 a and 50 b , and the TFT substrate 200 having the projections 51 , respectively, and then a rubbing process may be performed thereto.
  • the surfaces of the alignment layers may be rubbed with a cloth at a uniform pressure and speed.
  • polymer chains of the alignment layers may be aligned along a predetermined direction, thereby determining an initial alignment direction of liquid crystal molecules of the liquid crystal layer.
  • column spacers may be formed on a color filter substrate and projections may be formed on a TFT substrate.
  • the column spacers may be formed on the TFT substrate and the projections may be formed on the color filter substrate.
  • the projections may be formed on a passivation layer.
  • a projection may be formed at a portion corresponding to a first column spacer.
  • spots may be generated at a contact area between a first column spacer and the projection, thereby making it problematic in maintaining a uniform cell gap.
  • the contact area increases between the projection and the first column spacer.
  • at least two projections may be formed at the portion corresponding to the first column spacer to decrease a contact pressure due to the increase of the contact area between the projection and the first column spacer.
  • FIG. 14 is a cross sectional view of another exemplary LCD device according to the present invention.
  • the exemplary LCD device FIG. 14 may include materials and structures similar to those of FIGS. 8-13 , whereby detailed explanation of the common structure has been omitted for the sake of brevity.
  • an LCD device may include a color filter substrate 100 and a TFT substrate 200 , wherein a first column spacer 50 a and a second column spacers 50 b (not shown) may be formed on the color filter substrate 100 , and at least two projections 51 may be formed on the TFT substrate 200 corresponding to the first column spacer 50 a .
  • at least two projections 51 may be formed of materials from a semiconductor layer and a data line on a gate insulating layer. Alternatively, at least two projections 51 may be formed on a passivation layer.
  • FIG. 15 is a cross sectional view of another exemplary LCD device according to the present invention.
  • the exemplary LCD device FIG. 15 may include materials and structures similar to those of FIGS. 8-13 , whereby detailed explanation of the common structure has been omitted for the sake of brevity.
  • an LCD device may include a first projection pattern 51 a and a second projection pattern 51 b , wherein the first and second projection patterns 51 a and 51 b may have different sizes and may both be formed on a TFT substrate 200 .
  • the second projection pattern 51 b corresponding to a first column spacer 50 a may be relatively smaller than the first projection pattern 51 a , thereby reducing frictional forces by decreasing a contact area between the first column spacer 50 a and the second projection pattern 51 b and preventing effects of spots due to touch contact.
  • the first and second projection patterns 51 a and 51 b may be formed of the same material, and may include materials from a semiconductor layer and a data line formed upon a gate insulating layer. Alternatively, the first and second projection patterns 51 a and 51 b may be formed on a passivation layer.
  • FIG. 16 is a cross sectional of another exemplary LCD device according to the present invention.
  • the exemplary LCD device FIG. 16 may include structures and materials similar to those of FIGS. 8-13 , whereby detailed explanation of the common structure has been omitted for the sake of brevity.
  • a first projection pattern 51 a may be formed on a TFT substrate 200 corresponding to a first column spacer 50 a of a color filter substrate 100 .
  • a second projection pattern 51 b may be formed on the TFT substrate 200 to partially overlap the first projection pattern 51 a .
  • a contact area between the first column spacer 50 a and the projection may be determined by an upper surface of the second projection pattern 51 b.
  • frictional forces between the upper surface of the second projection pattern 51 b and the first column spacer 50 a may decrease, thereby minimizing formation of spots due to touch contact.
  • the first and second projection patterns 51 a and 51 b may be formed on a passivation layer.
  • FIG. 17 is a cross sectional view of another exemplary LCD device according to the present invention.
  • the exemplary LCD device FIG. 17 may include structures and materials similar to those of FIGS. 8-13 , whereby detailed explanation of the common structure has been omitted for the sake of brevity.
  • a first organic insulating layer may be deposited on a TFT substrate 200 , and then patterned to form first and second projection patterns 51 a and 51 b at a predetermined interval from each other.
  • a second insulating layer may be formed along an entire surface of the TFT substrate 200 including the first and second projection patterns 51 a and 51 b , and then patterned to form a third projection pattern 51 c contacting a first column spacer 50 a .
  • the third projection pattern 51 c may partially overlap the first and second projection patterns 51 a and 51 b. Accordingly, although there may be misalignment when patterning the first and second organic insulating layers for forming the first and second projection patterns 51 a and 51 b , a contact area between the first column spacer 50 a and the third projection pattern 51 c may remain constant since the first and second organic insulating layers may be formed of the same thickness.
  • the third projection pattern 51 c may include a groove 51 d therein according to a step difference created by the first and second projection patterns 51 a and 51 b , thereby reducing a contact area between the third projection pattern 51 c and the first column spacer 50 a .
  • the projection patterns 51 a , 51 b , and 51 c may be formed on a passivation layer.
  • FIG. 18 is a cross sectional view of another exemplary LCD device according to the present invention.
  • the exemplary LCD device FIG. 18 may include structures and materials similar to those of FIGS. 8-13 , whereby detailed explanation of the common structure has been omitted for the sake of brevity.
  • an LCD device may include a projection having a first projection pattern 51 a and a second projection pattern 51 b , wherein the first and second projection patterns 51 a and 51 b may have different sizes.
  • the first projection pattern 51 a may be smaller than the second projection pattern 51 b , whereby the first projection pattern 51 a may be covered by the second projection pattern 51 b and may be formed of the same material.
  • the first and second projection patterns 51 a and 51 b may be formed on a passivation layer.
  • FIGS. 8-18 may be applied in IPS mode LCD devices, they may also be applied in TN mode LCD devices.
  • FIG. 19 is a plan view of an exemplary TN mode LCD device according to the present invention
  • FIG. 20 is a cross sectional view along IV-IV′ of FIG. 19 according to the present invention
  • a color filter substrate 100 may include a black matrix layer 31 , an R/G/B color filter layer 32 , and a common electrode 34 , all formed on a glass substrate 60 .
  • the black matrix layer 31 may exclude light from portions corresponding to gate and data lines and thin film transistors, except for pixel regions.
  • the color filter layer 32 may be formed to produce various colored light at the portions corresponding to the pixel regions, and the common electrode 34 may be formed along an entire surface of the glass substrate 60 including the black matrix layer 31 and the color filter layer 32 .
  • first and second column spacers 50 a and 50 b may be formed on predetermined portions of the common electrode 34 , and may be formed of photosensitive resin.
  • a TFT substrate 200 may include a plurality of gate lines 41 and a plurality of data lines 42 , all formed on a glass substrate 70 .
  • the gate and data lines 41 and 42 may cross each other, thereby defining a plurality of the pixel regions.
  • pixel electrodes 43 may be formed within the pixel regions, and a thin film transistor may be formed at each of the crossing regions of the gate and data lines 41 and 42 .
  • a projection which may include a semiconductor layer 44 a and the data line 42 , may be formed on the gate line 41 .
  • An exemplary method of fabricating the thin film transistor, the pixel electrode, and the projection may include deposition of a metal material, such as Mo, Al, or Cr, along an entire surface of the glass substrate 70 by a sputtering method, and patterned by photolithographic processes, thereby simultaneously forming the plurality of gate lines 41 , wherein gate electrodes 41 a may extend from the gate lines 41 .
  • a metal material such as Mo, Al, or Cr
  • an insulating material of SiN x may be deposited along the entire surface of the glass substrate 70 including the gate lines 41 , thereby forming a gate insulating layer 45 .
  • the semiconductor layer 44 may be deposited on the gate insulating layer 45 above the gate electrode 41 a , and patterned to form a first projection pattern 44 a for forming the projection on the gate insulating layer 45 corresponding to the first column spacer 50 a .
  • an amorphous silicon layer (or polysilicon layer) and a silicon layer heavily doped with phosphorous P may be sequentially deposited, and then simultaneously patterned, thereby forming the semiconductor layer 44 .
  • a metal material such as Mo, Al, or Cr
  • a metal material such as Mo, Al, or Cr
  • a metal material such as Mo, Al, or Cr
  • source and drain electrodes 42 a and 42 b may be formed at both sides of the semiconductor layer 44
  • a second projection pattern 42 c may be formed on the first projection pattern 44 a .
  • the source electrode 42 a may project from the data line 42 .
  • a portion of the doped silicon layer between the source electrode 42 a and the drain electrode 42 b may be removed.
  • the projection may be formed by the first and second projections patterns 44 a and 42 c.
  • a passivation layer 46 of SiN x may be formed along the entire surface of the substrate including the source electrode 42 a and the drain electrode 42 b using a CVD method.
  • the passivation layer 46 may be formed of an organic material having a low dielectric constant, such as BCB, SOG, or acryl, to improve an aperture ratio of the liquid crystal cell.
  • the passivation layer 46 may be selectively etched on the drain electrode 42 b , thereby forming a contact hole exposing a predetermined portion of the drain electrode 42 b .
  • a transparent conductive layer may be formed on the passivation layer 46 to be electrically connected to the drain electrode 42 b through the contact hole. Then, the transparent conductive layer may be selectively removed to remain within the pixel region, thereby forming the pixel electrode 43 in the pixel region.
  • first and second alignment layers may be formed on the color filter substrate 100 and the TFT substrate 200 , respectively, and then a rubbing process may be performed thereto.
  • the surfaces of the alignment layers may be rubbed with a cloth at a uniform pressure and speed.
  • polymer chains of the alignment layers may be aligned along a predetermined direction, thereby determining an initial alignment direction of liquid crystal molecules of the liquid crystal layer 55 .
  • an upper surface of the projection 51 may be relatively smaller than a lower surface of the first column spacer 50 a.
  • a column spacer may be formed on a color filter substrate and projections may be formed on a TFT substrate.
  • the column spacers may be formed on the TFT substrate and the projections may be formed on the color filter substrate.
  • the first and second column spacers 50 a and 50 b may be spaced apart from the TFT substrate 200 at a predetermined interval of about 500 ⁇ or more, whereby the projections may be selectively formed to have a height within the predetermined interval between the color filter and TFT substrates 100 and 200 . Accordingly, the second column spacers may be formed having no corresponding projection to prevent formation of hollow regions within the LCD panel when the LCD panel is pressed with an external force.
  • the first and second column spacers 50 a and 50 b are shown to be formed on the color filter substrate 100 , they also may be formed on the TFT substrate 200 . Accordingly, when forming the first and second column spacers 50 a and 50 b on the TFT substrate, the projections may be formed on the color filter substrate 100 corresponding to the first and second column spacers 50 a and 50 b.
  • the liquid crystal layer of the LCD device may be formed using a liquid crystal dispersion method to improve device yield.
  • the projections corresponding to the column spacers may be formed to reduce frictional forces between the column spacers and the substrate. For example, although a surface of the LCD panel may be touched along a predetermined direction, the frictional forces may be reduced between the column spacers and the opposing substrate. Accordingly, formation of spots due to touch contact may be prevented by improving a restoring force of the liquid crystal layer, thereby improving luminance and sensitivity of the LCD panel.
  • the projections may be selectively formed to correspond to the column spacers, whereby the column spacers may be formed having no corresponding projection to prevent formation of hollow region within the LCD panel when the LCD panel is pressed by an external force.
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US20090316105A1 (en) 2009-12-24
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US8284373B2 (en) 2012-10-09
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GB2411485B (en) 2006-09-20
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US7502090B2 (en) 2009-03-10
US20070188697A1 (en) 2007-08-16
CN100376937C (zh) 2008-03-26
CN1661425A (zh) 2005-08-31

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