US20200211876A1 - Reticle pod having side containment of reticle - Google Patents

Reticle pod having side containment of reticle Download PDF

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Publication number
US20200211876A1
US20200211876A1 US16/319,093 US201716319093A US2020211876A1 US 20200211876 A1 US20200211876 A1 US 20200211876A1 US 201716319093 A US201716319093 A US 201716319093A US 2020211876 A1 US2020211876 A1 US 2020211876A1
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US
United States
Prior art keywords
reticle
pod
cover
contact
retainers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US16/319,093
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English (en)
Inventor
Russ V. Raschke
Barry Gregerson
Shawn D. Eggum
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Entegris Inc
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Entegris Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris Inc filed Critical Entegris Inc
Priority to US16/319,093 priority Critical patent/US20200211876A1/en
Assigned to GOLDMAN SACHS BANK USA reassignment GOLDMAN SACHS BANK USA SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ENTEGRIS, INC., SAES PURE GAS, INC.
Assigned to ENTEGRIS, INC. reassignment ENTEGRIS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: EGGUM, SHAWN D., GREGERSON, BARRY, RASCHKE, RUSS V.
Assigned to MORGAN STANLEY SENIOR FUNDING, INC. reassignment MORGAN STANLEY SENIOR FUNDING, INC. ASSIGNMENT OF PATENT SECURITY INTEREST RECORDED AT REEL/FRAME 048811/0679 Assignors: GOLDMAN SACHS BANK USA
Publication of US20200211876A1 publication Critical patent/US20200211876A1/en
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67369—Closed carriers characterised by shock absorbing elements, e.g. retainers or cushions

Definitions

  • the present disclosure relates generally to containers for storing, transporting, shipping and/or processing fragile devices such as photomasks, reticles and wafers, and more particularly to a dual containment reticle pod having an inner pod incorporating a reticle retainer that limits or restricts movement in the X and Y directions in an effort to minimize particle generation within the pod.
  • the reticle retainers, as described herein are configured to contact a side wall of the reticle housed within the inner pod and, in some cases, minimize the amount of load that is applied to a top surface of the reticle in a Z direction.
  • a method of retaining a reticle includes: receiving a reticle on a base having features configured to support the reticle thereon; placing a cover on the base including the reticle to define an inner pod, the cover including one or more reticle retainers each including a reticle contact member, each reticle contact member including an outwardly extending arm that is extends at least partially above the top surface of the cover and a downwardly extending leg that extends through the cover; and limiting movement of the reticle.
  • FIG. 1 is an isometric view of an exemplary reticle pod.
  • FIG. 2 is a cross-sectional view the reticle pod shown in FIG. 1 taken along line 2 - 2 .
  • FIG. 6B is a schematic, cross-sectional view of the reticle retainer shown in FIG. 6A .
  • FIG. 12B is a close-up schematic view of a top of a reticle retainer according to an embodiment of the disclosure.
  • FIGS. 15A-15C show various views of a reticle contact member according to an embodiment of the disclosure.
  • FIGS. 17A and 17B are partial, side cross-sectional views of the inner pod showing the reticle retainer in a first position and a second position.
  • FIGS. 23A and 23B are partial, side cross-sectional views of the inner pod showing the reticle retainer in a first position and a second position.
  • FIG. 24 is a partial cross-sectional view of a reticle pod assembly showing an inner pod disposed within an outer pod.
  • FIG. 25 is a simplified, perspective view of the inner pod shown in FIG. 18 .
  • FIG. 26 is a perspective view of an inner pod in accordance with yet another embodiment of the disclosure.
  • FIGS. 27 and 28 are cross-sectional views of a portion of the inner pod shown in FIG. 26 .
  • FIGS. 29A-29C are different views of a reticle retainer in accordance with yet another embodiment of the disclosure.
  • the reticle pod 10 includes an outer pod 11 including an outer pod cover 14 that is configured to mate with an outer pod base 18 enclosing an inner pod 15 which in turn holds the reticle 12 .
  • the inner pod 15 includes an inner pod cover 26 configured to mate with an inner pod base 32 to form a sealed environment in which the reticle 12 is contained.
  • the outer pod cover 14 can include one or more contact pads or protrusions provided on an inner surface that are configured to contact and apply a downward pressure to a corresponding reticle retainer provided in the cover of the inner pod. Additionally, in some cases, the outer pod cover 14 may include an optional robotic flange 22 which facilitates the automated transportation of the reticle pod 10 throughout a fabrication facility.
  • the reticle supports 48 may be in the form of a spherical balls or protrusions that extend away from the first major surface 34 of the base 32 . In some embodiments, the reticle supports 48 may be located an equal distance between each of the reticle guides 46 of a pair of reticle guides 46 . Additionally, the reticle supports 48 may be configured such that they suspend the reticle 12 at a predefined height above the major surface 34 of the inner pod base 32 creating a gap between the reticle and the surface 34 of the inner pod base. In some cases, the gap is dimensioned to define a diffusion layer or diffusion barrier between the reticle 12 and the base 32 . The diffusion barrier inhibits particles from migrating into the gap.
  • FIG. 5 a close up, cross-sectional view of another reticle retainer 160 .
  • the reticle retainer 160 includes a block or pin 168 extending through a bore 172 provided in the cover 26 .
  • the pin 168 can be attached to a resilient member 176 which is accessible on the outer surface of the cover 26 .
  • the resilient member 176 can be an elastomeric disk that is configured to bias the pin 168 in a retracted position. In the retracted position, the pin 168 is positioned upwards and away from the reticle 12 .
  • the disk forming the resilient member 176 may form a seal between the pin 168 and the bore 172 to prevent particulate matter from entering the inner pod.
  • the pin 268 is similar to the pins 68 and 168 described herein.
  • the pin 268 is positioned upwards and away from the reticle 12 in the absence of a downward force applied to the pin 268 in the Z-direction.
  • a downward force can be applied to the pin 268 by a corresponding structure provided on the inner surface of the outer pod cover.
  • the pin 268 contacts a distal end 270 of the spring arm 262 , causing the spring arm 262 to move from its relaxed state to a second state in which the spring arm 262 contacts an edge 272 of the reticle 12 .
  • the edge 272 of the reticle 12 can be chamfered or beveled.
  • the spring arm 364 can be made of stainless steel, titanium, titanium alloy, NITINOL which has shape memory properties, and selected elastomeric polymers. In some cases, separate reticle restraints may be provided on the inner surface of the top cover 26 to constrain vertical movement of the reticle in the Z direction. However, because the reticle retainer 360 restricts lateral movement in the X and Y directions, the load applied in the Z direction can be reduced.
  • FIG. 8 shows yet another reticle retainer 460 .
  • up to four such reticle retainers 460 can be located at different regions of the pod to provide up to four different points of contact.
  • a stationery retaining pin or block 468 that contacts the reticle retainer 460 to move the reticle retainer into contact with a side wall 472 of the reticle 12 .
  • the reticle retainer 460 is coupled to the cover 26 and is configured to pivot from a first position in which there is no to contact with the reticle to a second position in which the retainer 460 contacts the reticle 12 from the side as shown in FIG. 8 .
  • reticle restraints provided on the inner surface of the top cover 26 may be provided to constrain vertical movement of the reticle in the Z direction.
  • the reticle retainer 460 restricts lateral movement in the X and Y directions, the load applied in the Z direction can be reduced.
  • the reticle retainer 460 is spring loaded and is biased to a first position. In either embodiment, contact with the pin 468 causes the reticle retainer 460 to move from its first position to a second position where it contacts a sidewall 472 of the reticle.
  • FIGS. 10A-10D show the reticle retainer 460 in operation.
  • the pin 468 begins to contact an edge of the retainer 460 , as shown in FIG. 10A .
  • the reticle retainer 460 begins to contact a side wall 472 of the reticle 12 and minimizes the gap between the reticle 12 and the pin 468 .
  • the reticle retainer 460 can be received in a slot defined in the socket 482 .
  • the reticle retainer 460 is not received in the slot; however, contact is maintained between the retainer 460 and the side wall 472 of the reticle.
  • FIGS. 11-12C show various views of yet another embodiment of a reticle retainer 560 .
  • up to four such reticle retainers 560 can be located at different regions of the pod to provide up to four different points of contact.
  • the reticle retainer 560 is configured to contact a top surface 502 and a side wall 572 of a reticle 12 . Because the reticle retainer 560 contacts the side wall 572 of the reticle 12 , the load applied to the top surface 502 can be reduced, and movement of the reticle is constrained in the X, Y, and Z directions.
  • the reticle retainer body 562 includes two recesses 578 .
  • a reticle contact member or ball 580 a, 580 b is received in each of the recesses 578 .
  • the reticle contact members or balls 580 a, 580 b can be formed from a metal, meal alloy, ceramic or polymeric material.
  • a first ball 580 a can be positioned at an angle relative to the second ball 580 b such when the reticle retainer 560 engages the reticle 12 , the first ball 580 a is in contact with an upper surface 502 of the reticle 12 of the reticle and the second ball 580 b is in contact with a side wall 572 of the reticle 12 .
  • FIG. 13 shows an inner pod 600 .
  • the inner pod 600 includes an inner pod cover 602 configured to mate with the inner pod base 604 to define a sealed environment. A reticle can be contained within the sealed environment.
  • the inner pod cover 602 has a size and shape generally corresponding to the size and shape of the inner pod base 604 .
  • the inner pod cover 602 may include a plurality of protrusions or pins 608 sized and configured to be received by a plurality of corresponding recesses or notches 609 defined in an edge of the base 604 .
  • the pins 608 and notches 609 cooperate together to guide and align the cover 602 over the base 604 , and also to retain the cover 602 in position when the cover 602 is engaged with the base 604 .
  • the inner pod cover 602 also incorporates one or more sets of reticle retainers 610 and 614 .
  • the reticle retainers 610 and 614 help to reduce or prevent movement of the reticle that may generate particles.
  • the sets of reticle retainers 610 and 614 are incorporated into the inner pod cover 602 such that when the inner pod cover 602 is closed the reticle retainers collectively constrain horizontal or side to side movement of the reticle in the X and Y planes in addition to the Z-direction.
  • the reticle retainers 610 engage the side and/or an edge of the reticle in response to a downward force applied to the retainer in the Z-direction by a corresponding structure provided on the inner surface of the outer pod cover.
  • the number and location of the reticle retainers 610 , 614 can vary depending upon the size of the overall pod and the load to be applied to the reticle contained within the inner pod. In some cases, it may be useful to combine reticle retainers configured to contact a top surface of the reticle with reticle retainers configured to contact a reticle from a side or an edge of the reticle. In other cases, the inner pod cover may include reticle retainers configured to contact a side or an edge of the reticle and may eliminate reticle retainers configured to contact a top surface of the reticle. In some embodiments, as shown in FIG.
  • the inner pod cover 602 can include one or more filters including a filter media contained therein for maintaining and controlling the microenvironment within the inner pod when the inner pod cover 602 is engaged with the inner pod base 604 .
  • FIGS. 17A and 17B show cross-sectional views of the inner pod 600 including the reticle retainer 610 .
  • FIG. 17A shows the reticle retainer 610 in a first, non-contact position and
  • FIG. 17B shows the reticle retainer 610 in a second, contact position in which the leg 630 of the reticle contact member 616 has been brought into contact with a side surface 644 of the reticle 12 upon application of a downward force in the Z-direction to the arm 626 .
  • the reticle contact member 616 pivots or rotates about a first axis of rotation 646 , causing the fingers 628 to move downward to be received in the recess 622 and also causing the leg 630 to pivot forward towards the side surface 644 .
  • Rotation about the first axis of rotation 646 ceases when the leg 630 contact the side surface of the reticle 644 as shown in FIG. 17B .
  • a second axis of rotation 648 is created by the reticle 12 pushing back on the leg 630 .
  • the return action of the reticle 12 pushing back on the leg 630 action causes additional force to be placed on the fingers 628 received in the recess 622 , further strengthening and stabilizing the point of contact between the reticle contact member 616 and the reticle 12 .
  • the axis of rotation 646 is flexible, and changes from rotation axis 646 to rotation axis 648 . This shift or change in the rotation axis from the first axis of rotation 646 to the second axis of rotation 648 is provided by the resilient member 618 .
  • FIG. 18 shows an inner pod 700 according to another embodiment of the disclosure.
  • the inner pod 700 includes an inner pod cover 702 configured to mate with the inner pod base 704 to define a sealed environment. A reticle can be contained within the sealed environment.
  • the inner pod cover 702 has a size and shape generally corresponding to the size and shape of the inner pod base 704 .
  • the inner pod cover 702 may include a plurality of protrusions or pins 708 sized and configured to be received by a plurality of corresponding recesses or notches 709 defined in an edge of the base 704 .
  • the pins 708 and notches 709 cooperate together to guide and align the cover 702 over the base 704 . Additionally, the pins 708 and notches 709 retain the cover 702 in position when the cover 702 is engaged with the base 704 .
  • the inner pod cover 702 can include two pairs of reticle retainers 710 , each configured to contact the reticle from the side and at least one pair of reticle retainers 714 configured to contact a top surface of the reticle.
  • each pair of reticle retainers 710 configured for side contact are positioned on the inner pod cover 702 such that they work together to constrain a corner of the reticle from movement in the X and Y planes.
  • FIGS. 21A and 21B show top and bottom views of a cap 720 A according to one embodiment.
  • the cap 720 A is disposed over and in contact with the reticle contact member 716 and the resilient member 718 .
  • the cap 720 A includes two generally circular or C-shaped bracket members 736 that contact and retrain side to side movement of the two reticle contact members 716 that are located adjacent one another.
  • each of the bracket members 736 includes a circular ridge 738 that contacts and applies a pressure to the resilient member 718 .
  • the cap includes an aperture 740 for receiving a fastener such as a screw that is spaced apart from each of the bracket member 736 .
  • FIGS. 23A and 23B show cross-section views of the inner pod 700 including the reticle retainer 710 .
  • FIG. 23A shows the reticle retainer 710 in a first, non-contact position and
  • FIG. 23B shows the reticle retainer 710 in a second, contact position in which the leg 732 of the reticle contact member 716 has been brought into contact with a side surface 744 of the reticle 12 upon application of a downward force in the Z-direction to the arm 726 and/or cross member 728 .
  • the reticle contact member 716 pivots or rotates about a first axis of rotation 746 , causing the shoulders 730 a, 730 b, of which only 730 a is visible in the figures, to move downward to be received in the recesses, and also causing the leg 732 to pivot forward towards the side surface 744 of the reticle 12 .
  • Rotation about the first axis of rotation 746 ceases when the leg 732 contacts the side surface 744 of the reticle 12 as shown in FIG. 23B .
  • a second axis of rotation 748 is created by the reticle 12 pushing back on the leg 732 .
  • the return action of the reticle 12 pushing back on the leg 732 action causes additional force to be placed on the shoulders 730 a, 730 b received in the recess 722 , further strengthening and stabilizing the point of contact between the reticle contact member 716 and the reticle 716 .
  • the axis of rotation 746 is flexible, and changes from rotation axis 746 to rotation axis 748 . This shift or change in the rotation axis from the first axis of rotation 746 to the second axis of rotation 748 is provided by the resilient member 718 .
  • the resilient member 718 provides a sufficient amount of flexibility such that the first axis of rotation 746 can shift in the X plane when the leg 732 contacts the side surface 744 of the reticle 12 at the second rotational axis 748 .
  • the resilient member 718 flexes to help main side contact between the leg 732 and the reticle 12 preventing movement of the reticle 12 in the X and/or Y plane. Referring back to FIG. 18 , constraining the reticle 12 in the X and Y planes by contacting the side surface 744 of the reticle 12 may reduce amount of the load need in the Z direction which may be applied by additional reticle retainers 714 .
  • the downward application force in the Z-direction to the arm 726 and/or cross member 728 causes the reticle contact member to 716 to engage a side surface 744 of the reticle 12 constraining and/or preventing the reticle 12 from side to side movement in the X and Y planes.
  • constraining the reticle 12 in the X and Y planes by contacting the side surface 744 of the reticle 12 may reduce amount of the load need in the Z direction which may be applied by additional reticle retainers 714 .
  • FIG. 25 is a simplified view of the inner pod 700 shown in FIG. 19 showing the relative locations of the locating pins 708 a, 708 b, 708 c, and 708 d to one another.
  • Each of the pins 708 a - 708 d are located adjacent a corner 712 of the inner pod 700 .
  • each of the pins 708 a - 708 d are received in a corresponding recesses defined in the base 704 .
  • pin 708 a is received in corresponding recess 709 a
  • pin 708 c is received in recess 709 c.
  • the corresponding pins and recesses cooperate together to guide and align the cover 702 over the base 704 and also to retain the cover 702 in position when the cover 702 is engaged with the base 704 . Additionally, the location of the pins and recesses relative to one another add in resisting movement of the cover 702 relative to the base 704 in the X and Y planes and also help to resist any rotational movement of the cover 702 relative to the base.
  • the second vertical plane defined by the second axis m bisects the first vertical plane defined by the first axis 1 at an orthogonal or 90 degree angle.
  • Placing a third pin 708 c and recess 709 c on an axis or in a plane that is on-angle or in some cases, orthogonal, relative to a first axis or plane defined by a first set of pins limits movement of the cover 702 relative to the base in both direction of the l axis.
  • FIGS. 26-29C relate to yet another embodiment of the disclosure.
  • FIG. 26 is a perspective view of an inner pod 800 including one or more reticle retainers 810 according to still other embodiments.
  • the inner pod 800 includes an inner pod cover 802 configured to mate with the inner pod base 804 to define a sealed environment. A reticle can be contained within the sealed environment.
  • the inner pod cover 802 has a size and shape generally corresponding to the size and shape of the inner pod base 804 .
  • the inner pod cover 802 may include a plurality of protrusions or pins sized and configured to be received by a plurality of corresponding recesses or notches defined in an edge of the base 804 . The pins and notches cooperate together to guide and align the cover 802 over the base 804 , and also to retain the cover 802 in position when the cover 802 is engaged with the base 804 .
  • Each pair of reticle retainers 810 is located on the inner pod cover 802 such that the two reticle reticle retainers 810 work together to constrain a corner of the reticle from movement in the X and Y planes.
  • the reticle retainers 810 engage the side of the reticle in response to a downward force applied to the retainer in the Z-direction by a corresponding structure provided on the inner surface of the outer pod cover. Unlike previous embodiments described herein, the reticle retainers 810 do not intentionally contact a top surface of the reticle.
  • FIGS. 27 and 28 are different cross-sectional views of the inner pod including a reticle retainer 810 and FIGS. 29A-29C are different views of an individual reticle retainer 810 .
  • Each reticle retainer 810 includes an arm 814 and a main body portion 816 .
  • the arm extends in a direction that is perpendicular to the direction in which the main body portion 816 extends.
  • the arm 814 extends in an X or Y direction and the main body portion 816 extends in a Z-direction.
  • the main body portion 816 contacts the side surface 818 of the reticle 12 in response to application of a downward force in the Z-direction to the arm 814 by a corresponding structure provided on the inner surface of the outer pod cover. Upon side contact, some centering of reticle will occur, but force during sliding will be minimal. Friction between the reticle and the reticle retainers also limits motion of the reticle in the X and Y direction during transit.
  • the main body port 816 can include a shoulder portion 820 that is positioned above a top surface of the reticle to limit movement of the reticle in the Z-direction as necessary. The shoulder portion 820 is not intended to contact a top surface of the reticle 12 .

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  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
US16/319,093 2016-08-27 2017-08-24 Reticle pod having side containment of reticle Abandoned US20200211876A1 (en)

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US16/319,093 US20200211876A1 (en) 2016-08-27 2017-08-24 Reticle pod having side containment of reticle

Applications Claiming Priority (5)

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US201662380377P 2016-08-27 2016-08-27
US201662405518P 2016-10-07 2016-10-07
US201662422229P 2016-11-15 2016-11-15
PCT/US2017/048396 WO2018044678A1 (fr) 2016-08-27 2017-08-24 Nacelle de réticule présentant un confinement latéral de réticule
US16/319,093 US20200211876A1 (en) 2016-08-27 2017-08-24 Reticle pod having side containment of reticle

Related Parent Applications (1)

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PCT/US2017/048396 A-371-Of-International WO2018044678A1 (fr) 2016-08-27 2017-08-24 Nacelle de réticule présentant un confinement latéral de réticule

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US17/089,987 Continuation US11594437B2 (en) 2016-08-27 2020-11-05 Reticle pod having side containment of reticle

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US20200211876A1 true US20200211876A1 (en) 2020-07-02

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US16/319,093 Abandoned US20200211876A1 (en) 2016-08-27 2017-08-24 Reticle pod having side containment of reticle
US17/089,987 Active US11594437B2 (en) 2016-08-27 2020-11-05 Reticle pod having side containment of reticle
US18/107,325 Pending US20230187246A1 (en) 2016-08-27 2023-02-08 Reticle pod having side containment of reticle

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US18/107,325 Pending US20230187246A1 (en) 2016-08-27 2023-02-08 Reticle pod having side containment of reticle

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US (3) US20200211876A1 (fr)
EP (1) EP3504591B1 (fr)
JP (1) JP6825083B2 (fr)
KR (1) KR102214147B1 (fr)
CN (1) CN109690401B (fr)
TW (1) TWI652757B (fr)
WO (1) WO2018044678A1 (fr)

Cited By (7)

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US20210173295A1 (en) * 2019-12-05 2021-06-10 Applied Materials, Inc. Reticle processing system
DE102020213422A1 (de) 2020-10-23 2021-10-28 Carl Zeiss Smt Gmbh Lagerelement für ein retikel für die mikrolithographie
US20210358787A1 (en) * 2020-05-14 2021-11-18 Gudeng Precision Industrial Co., Ltd. Reticle pod provided with holding pins and method for holding reticle
WO2022106071A1 (fr) * 2020-11-18 2022-05-27 Brooks Automation (Germany) Gmbh Dispositif de stockage de réticules euv et son procédé de fonctionnement
CN115524921A (zh) * 2021-08-30 2022-12-27 台湾积体电路制造股份有限公司 倍缩光罩外壳及其处置方法
TWI812968B (zh) * 2020-09-30 2023-08-21 家登精密工業股份有限公司 工件容器系統
WO2024006117A1 (fr) * 2022-06-28 2024-01-04 Entegris, Inc. Inserts pour espacement dans des contenants de réticule

Families Citing this family (11)

* Cited by examiner, † Cited by third party
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US20230187246A1 (en) 2023-06-15
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KR102214147B1 (ko) 2021-02-09
US11594437B2 (en) 2023-02-28
US20210057248A1 (en) 2021-02-25
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KR20190033578A (ko) 2019-03-29
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CN109690401A (zh) 2019-04-26
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JP6825083B2 (ja) 2021-02-03
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