US20160376725A1 - Method for performing electropolishing treatment on aluminum material - Google Patents
Method for performing electropolishing treatment on aluminum material Download PDFInfo
- Publication number
- US20160376725A1 US20160376725A1 US15/102,985 US201415102985A US2016376725A1 US 20160376725 A1 US20160376725 A1 US 20160376725A1 US 201415102985 A US201415102985 A US 201415102985A US 2016376725 A1 US2016376725 A1 US 2016376725A1
- Authority
- US
- United States
- Prior art keywords
- treatment
- aluminum material
- electropolishing
- solution
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000011282 treatment Methods 0.000 title claims abstract description 374
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 262
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 262
- 239000000463 material Substances 0.000 title claims abstract description 252
- 238000000034 method Methods 0.000 title claims abstract description 60
- 230000003647 oxidation Effects 0.000 claims abstract description 37
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 37
- 206010040844 Skin exfoliation Diseases 0.000 claims abstract description 24
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 15
- 239000000243 solution Substances 0.000 claims description 109
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 82
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 38
- 238000005192 partition Methods 0.000 claims description 30
- 239000007864 aqueous solution Substances 0.000 claims description 20
- 150000001412 amines Chemical class 0.000 claims description 18
- 239000010407 anodic oxide Substances 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 229910000838 Al alloy Inorganic materials 0.000 claims description 11
- 238000007599 discharging Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 8
- 150000007519 polyprotic acids Polymers 0.000 claims description 6
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 5
- 150000003863 ammonium salts Chemical class 0.000 claims description 2
- 239000002932 luster Substances 0.000 abstract description 23
- 230000007547 defect Effects 0.000 description 26
- 238000004090 dissolution Methods 0.000 description 26
- 239000002253 acid Substances 0.000 description 24
- 230000000052 comparative effect Effects 0.000 description 15
- 239000000126 substance Substances 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 14
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 10
- 238000011835 investigation Methods 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 9
- 239000008151 electrolyte solution Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 230000010355 oscillation Effects 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229920006362 Teflon® Polymers 0.000 description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018182 Al—Cu Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- 229910018464 Al—Mg—Si Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- -1 ammonium ions Chemical class 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NRNCYVBFPDDJNE-UHFFFAOYSA-N pemoline Chemical compound O1C(N)=NC(=O)C1C1=CC=CC=C1 NRNCYVBFPDDJNE-UHFFFAOYSA-N 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- GRIPFENGMLEXMO-UHFFFAOYSA-N sulfuric acid Chemical compound OS(O)(=O)=O.OS(O)(=O)=O.OS(O)(=O)=O GRIPFENGMLEXMO-UHFFFAOYSA-N 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/18—Polishing of light metals
- C25F3/20—Polishing of light metals of aluminium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/20—Electrolytic after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-262340 | 2013-12-19 | ||
| JP2013262340A JP6078851B2 (ja) | 2013-12-19 | 2013-12-19 | アルミニウム材の電解研磨処理方法 |
| PCT/JP2014/079045 WO2015093159A1 (ja) | 2013-12-19 | 2014-10-31 | アルミニウム材の電解研磨処理方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20160376725A1 true US20160376725A1 (en) | 2016-12-29 |
Family
ID=53402516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US15/102,985 Abandoned US20160376725A1 (en) | 2013-12-19 | 2014-10-31 | Method for performing electropolishing treatment on aluminum material |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20160376725A1 (ko) |
| JP (1) | JP6078851B2 (ko) |
| KR (1) | KR20160100343A (ko) |
| CN (3) | CN107858743A (ko) |
| TW (1) | TWI636160B (ko) |
| WO (1) | WO2015093159A1 (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20180298512A1 (en) * | 2017-04-13 | 2018-10-18 | General Electric Company | Electropolishing and anodizing method for brush holder apparatus |
| CN111088503A (zh) * | 2019-12-31 | 2020-05-01 | 中山市皓祥模具五金有限公司 | 一种铝制品的表面处理工艺 |
| CN111235579A (zh) * | 2019-12-31 | 2020-06-05 | 南方科技大学 | 金属抛光方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1006000B (zh) * | 1985-04-23 | 1989-12-06 | 东北工学院 | 铝或铝合金表面乳白色薄膜生成法 |
| EP1046514B1 (en) * | 1999-04-22 | 2005-07-06 | Fuji Photo Film Co., Ltd. | Method for producing aluminium support for lithographic printing plate |
| JP4703803B2 (ja) * | 1999-10-08 | 2011-06-15 | 株式会社アルバック | アルミニウム材の電解研磨処理方法 |
| KR100371564B1 (ko) * | 2000-10-27 | 2003-02-07 | 삼성테크윈 주식회사 | 금속표면처리장치와 이를 이용한 금속표면처리방법 |
| DE10149928C1 (de) * | 2001-10-10 | 2002-12-12 | Wkw Erbsloeh Automotive Gmbh | Verfahren zum Glänzen von Aluminium und dessen Verwendung |
| JP4929679B2 (ja) * | 2005-10-26 | 2012-05-09 | 日本ケミコン株式会社 | アルミニウムエッチング箔の製造方法 |
| CN102649209B (zh) * | 2011-02-23 | 2015-08-12 | 汉达精密电子(昆山)有限公司 | 一种铝合金外观件的制作方法 |
| CN103122475B (zh) * | 2011-11-21 | 2015-11-25 | 比亚迪股份有限公司 | 一种铝合金电化学抛光液及一种铝合金电化学抛光方法 |
-
2013
- 2013-12-19 JP JP2013262340A patent/JP6078851B2/ja not_active Expired - Fee Related
-
2014
- 2014-10-31 US US15/102,985 patent/US20160376725A1/en not_active Abandoned
- 2014-10-31 CN CN201711318826.2A patent/CN107858743A/zh active Pending
- 2014-10-31 WO PCT/JP2014/079045 patent/WO2015093159A1/ja active Application Filing
- 2014-10-31 CN CN201480069286.7A patent/CN105829585A/zh active Pending
- 2014-10-31 KR KR1020167019028A patent/KR20160100343A/ko not_active Application Discontinuation
- 2014-10-31 CN CN201711320047.6A patent/CN108060452A/zh active Pending
- 2014-11-06 TW TW103138551A patent/TWI636160B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW201538802A (zh) | 2015-10-16 |
| TWI636160B (zh) | 2018-09-21 |
| CN108060452A (zh) | 2018-05-22 |
| CN107858743A (zh) | 2018-03-30 |
| JP2015117418A (ja) | 2015-06-25 |
| CN105829585A (zh) | 2016-08-03 |
| WO2015093159A1 (ja) | 2015-06-25 |
| JP6078851B2 (ja) | 2017-02-15 |
| KR20160100343A (ko) | 2016-08-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: NIPPON LIGHT METAL COMPANY, LTD., JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:SEKI, YUSUKE;EBIHARA, KEN;REEL/FRAME:038881/0120 Effective date: 20160401 |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |