Classifications

• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M133/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen
  • C10M133/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms
  • C10M133/38—Heterocyclic nitrogen compounds
  • C10M133/44—Five-membered ring containing nitrogen and carbon only
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
  • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
  • B23D61/00—Tools for sawing machines or sawing devices; Clamping devices for these tools
  • B23D61/18—Sawing tools of special type, e.g. wire saw strands, saw blades or saw wire equipped with diamonds or other abrasive particles in selected individual positions
  • B23D61/185—Saw wires; Saw cables; Twisted saw strips
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B28—WORKING CEMENT, CLAY, OR STONE
  • B28D—WORKING STONE OR STONE-LIKE MATERIALS
  • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
  • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
  • B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
  • C09K3/00—Materials not provided for elsewhere
  • C09K3/14—Anti-slip materials; Abrasives
  • C09K3/1409—Abrasive particles per se
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M133/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen
  • C10M133/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms
  • C10M133/22—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms containing a carbon-to-nitrogen double bond, e.g. guanidines, hydrazones, semicarbazones
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M133/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen
  • C10M133/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms
  • C10M133/38—Heterocyclic nitrogen compounds
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M133/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen
  • C10M133/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms
  • C10M133/38—Heterocyclic nitrogen compounds
  • C10M133/40—Six-membered ring containing nitrogen and carbon only
  • C10M133/42—Triazines
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M133/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen
  • C10M133/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms
  • C10M133/38—Heterocyclic nitrogen compounds
  • C10M133/44—Five-membered ring containing nitrogen and carbon only
  • C10M133/46—Imidazoles
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M173/00—Lubricating compositions containing more than 10% water
  • C10M173/02—Lubricating compositions containing more than 10% water not containing mineral or fatty oils
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/016—Diazonium salts or compounds
  • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02002—Preparing wafers
  • H01L21/02005—Preparing bulk and homogeneous wafers
  • H01L21/02008—Multistep processes
  • H01L21/0201—Specific process step
  • H01L21/02024—Mirror polishing
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
  • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
  • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
  • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
  • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
  • H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
  • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
  • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
  • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
  • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
  • H01L21/321—After treatment
  • H01L21/32115—Planarisation
  • H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
  • C10M2207/02—Hydroxy compounds
  • C10M2207/021—Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms
  • C10M2207/022—Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms containing at least two hydroxy groups
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
  • C10M2215/22—Heterocyclic nitrogen compounds
  • C10M2215/221—Six-membered rings containing nitrogen and carbon only
  • C10M2215/222—Triazines
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
  • C10M2215/22—Heterocyclic nitrogen compounds
  • C10M2215/223—Five-membered rings containing nitrogen and carbon only
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
  • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
  • C10M2215/22—Heterocyclic nitrogen compounds
  • C10M2215/223—Five-membered rings containing nitrogen and carbon only
  • C10M2215/224—Imidazoles
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
  • C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
  • C10N2030/06—Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure
• • C—CHEMISTRY; METALLURGY
  • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
  • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
  • C10N2040/00—Specified use or application for which the lubricating composition is intended

Definitions

• the present invention relates to a silicon wafer processing fluid and silicon wafer processing method.
• processes including slicing a silicon ingot and polishing the silicon wafers are performed. For instance, a silicon ingot is sliced while supplying processing fluid to a wire. A silicon ingot is sliced according to either a loose abrasive method in which the silicon ingot is sliced while dispersing abrasive grains in the processing fluid or a fixed grain method in which the silicon ingot is sliced with the abrasive grains being rigidly attached on a surface of a wire.
• the processing fluid used for the loose abrasive method includes an aqueous processing fluid containing, for instance, a friction coefficient reducer, an auxiliary corrosion-resistance agent and the like.
• the friction-coefficient reducer contained in the processing fluid is an unsaturated fatty acid.
• the auxiliary corrosion-resistance agent is benzotriazole (see Patent Literature 1).
• the processing fluid used for the fixed grain method includes an aqueous processing fluid containing, for instance, glycols, carboxylic acids, alcanolamines and the like (see Patent Literature 2).
• An object of the invention is to provide a silicon wafer processing fluid and a silicon wafer processing method capable of restraining abrasion of abrasive grains and generation of hydrogen.
• the invention provides a silicon wafer processing fluid and silicon wafer processing method as follows.
• a silicon-wafer processing fluid according to an aspect of the invention containing: a friction modifier comprising a nitrogen-containing compound, in which a pH of the nitrogen-containing compound is in a range from 2 to 8 when a mass ratio with water represented by the nitrogen-containing compound/the water is 1/99.
• the silicon-wafer processing fluid according to the above aspect of the invention in which the nitrogen-containing compound is a heterocyclic compound.
• the heterocyclic compound is selected from the group consisting of benzotriazole, 3,4-dihydro-3-hydroxy-4-oxo-1,2,3-benzotriazine, indazole, benzimidazole and derivatives thereof.
• the silicon-wafer processing fluid according to the above aspect of the invention in which a pH of the silicon-wafer processing fluid is in a range from 3 to 9.
• a content of the nitrogen-containing compound is in a range from 0.05 mass % to 10 mass % based on a total amount of the processing fluid.
• the silicon-wafer processing fluid contains water in a range from 50 mass % to 99.95 mass % based on a total amount of the processing fluid.
• a silicon-wafer processing fluid according to the above aspect of the invention in which the silicon-wafer processing fluid is used for processing a silicon wafer with a wire on which abrasive grains are rigidly attached.
• a silicon-wafer processing method according to another aspect of the invention including: using a silicon-wafer processing fluid containing a friction modifier comprising a nitrogen-containing compound; and processing the silicon wafer with a wire on which abrasive grains are rigidly attached, in which a pH of the nitrogen-containing compound is in a range from 2 to 8 when a mass ratio with water represented by the nitrogen-containing compound/the water is 1/99.
• a silicon wafer processing fluid and a silicon wafer processing method capable of restraining abrasion of abrasive grains and generation of hydrogen can be provided.
• a silicon-wafer processing fluid of the invention (sometimes referred to as “processing fluid” hereinafter) is used for processing a silicon wafer with a wire.
• the processing fluid of the invention is used for slicing a silicon ingot according to the fixed grain method.
• the processing fluid of the invention may be used in the loose abrasive method.
• the processing fluid of the invention contains a friction modifier.
• the friction modifier contains a nitrogen-containing compound, pH of the nitrogen-containing compound being in a range from 2 to 8 when a mass ratio with water (i.e. nitrogen-containing compound/water) is 1/99.
• pH is in a range from 3 to 7, more preferably in a range from 4 to 6.
• the nitrogen-containing compound having pH of the above specific range is, for instance, a heterocyclic compound, which specifically is benzotriazole, 3,4-dihydro-3-hydroxy-4-oxo-1,2,3-benzotriazine, indazole, benzimidazole and derivatives thereof.
• benzotriazole and 3,4-dihydro-3-hydroxy-4-oxo-1,2,3-benzotriazine are preferably used.
• the lubricity of the wire is enhanced, so that abrasion of the abrasive grains rigidly attached on the wire can be restrained and the abrasive grains can be kept from being fallen off from the wire. Accordingly, breakage of the wire can be prevented and the processing efficiency and slicing accuracy can be enhanced, thereby improving the yield rate. Further, the nitrogen-containing compound restrains the generation of hydrogen due to the reaction between the chips of a silicon ingot and water. As a result, the processing fluid is kept from spilling over the processing fluid tank.
• pH of the processing fluid of the invention is in a range from 3 to 9, more preferably in a range from 5 to 7. Since the pH of the processing fluid is in a range from medium acidity to mild alkalinity, the generation of hydrogen can be further restrained. In addition, the corrosion of wire and silicon can be prevented.
• the content of the nitrogen-containing compound in the invention is in a range from 0.05 to 10 mass % based on a total amount of the processing fluid, more preferably in a range from 0.1 to 5 mass %. Since the content is at least 0.05 mass %, the abrasion of abrasive grains and generation of hydrogen can be further restrained and corrosion of wire and silicon can be prevented. On the other hand, since the content is at most 10 mass %, the production cost can be restrained.
• the processing fluid of the invention contains water.
• the water may be of any kind of water including tap water and purified water.
• the content of water is preferably in a range from 50 to 99.95 mass %, more preferably in a range from 60 to 95 mass %.
• environmental burden can be reduced as compared to ethyleneglycol that is conventionally used as a main component. Further, since water is the main component, inflammability can be lowered.
• the silicon-wafer processing method of the invention is, for instance, a fixed grain method, where abrasive grains are rigidly attached on a wire in advance.
• a silicon ingot is introduced into a processing chamber of a wire saw in which the wire is stretched around.
• the silicon ingot is sliced while supplying the processing fluid of the invention to the wire.
• the processing fluid of the invention contains the nitrogen-containing compound having pH of a specific range, abrasion of the abrasive grains can be prevented. Further, though the chips of the silicon ingot are generated, the nitrogen-containing compound of the invention restrains the reaction between the chips and water.
• processing fluid of the invention may be added with known additive(s) including friction modifier, antifoaming agent, metal deactivator, bactericide (preservative), viscosity modifier, pH modifier, thickener, dispersant and the like, as long as the addition of the additive(s) is not inconsistent with an object of the invention.
• additive(s) including friction modifier, antifoaming agent, metal deactivator, bactericide (preservative), viscosity modifier, pH modifier, thickener, dispersant and the like, as long as the addition of the additive(s) is not inconsistent with an object of the invention.
• the friction modifier is used for restraining the abrasion of the abrasive grains.
• Various surfactants and water-soluble polymer compounds are usable as the friction modifier.
• the surfactant include non-ionic surfactant such as glycols.
• the water-soluble polymer compound include carboxylic acid polymer compounds such as polyacrylic acid and alkyleneglycol polymer compounds such as polyethylene glycol.
• the antifoaming agent is used for keeping the processing fluid from spilling out of the processing fluid tank provided inside the processing chamber.
• examples of the antifoaming agent include silicone oil, fluorosilicone oil and fluoroalkylether.
• metal deactivator examples include imidazoline, pyrimidine derivative, thiadiazole and benzotriazole.
• the bactericide is used for preventing corrosion of the wire and the like.
• examples of the bactericide (preservative) include paraoxy benzoic acid esters (parabens), benzoic acid, salicylic acid, sorbic acid, dehydroacetic acid, p-toluenesulfonic acids and salts thereof, and phenoxyethanol.
• the pH modifier is used for adjusting the pH of the processing fluid of the invention in a range from 3 to 9.
• the pH modifier is classified into an acidic modifier and a basic modifier.
• the acidic modifier include acidic compounds such as polyacrylic acid and isononanoic acid.
• the basic modifier include basic compounds such as N-methyldiethanolamine and cyclohexyl diethanolamine.
• the thickener is used for increasing the viscosity of the processing fluid of the invention to improve adherability to the wire.
• the abrasion of the abrasive grains can be restrained.
• the thickener include carboxylic acid polymer compounds and alkyleneglycol polymer compounds similar to the friction modifier.
• the dispersant is used for restraining the chips from depositing on the wire saw.
• examples of the dispersant include various surfactants and water-soluble polymers similar to the friction modifier.
• the content of the additives may be determined in accordance with the intended use of the processing fluid. However, the total content of the additives is usually in a range approximately from 0.01 mass % to 30 mass % based on the total amount of the processing fluid.
• the processing fluid of the invention is used for slicing a silicon ingot in the above description, the processing fluid of the invention may be used for polishing a silicon wafer.
• the manufacturing method of the processing fluid of the invention is not specifically limited.
• the processing fluid may be prepared in a condensed state in which less amount of water is contained, and water may be added before use to adjust the concentration.
• glycols may alternatively be used as the main component.
• a processing fluid of a composition shown in Table 1 was prepared and was subjected to various tests for evaluation. The components contained in the processing fluid and the test items are shown below. Evaluation results and pH of the processing fluid are also shown in Table 1.
• Nitrogen-containing compound benzotriazole (SEETEC BT manufactured by SHIPRO KASEI KAISHA, LTD) (4) Nitrogen-containing compound: 3,4-dihydro-3-hydroxy-4-oxo-1,2,3-benzotriazine (5) Nitrogen-containing compound: imidazole (6) nitrogen-containing compound: 3,4-dihydro-2H-pyrido(1,2-a)pyrimidin-2-one.
• Nitrogen-containing compound N-methyl diethanolamine (aminoalcohol MDA manufactured by Nippon Nyukazai Co, Ltd.) (8) Dodecanedioic acid (registered trademark “Corfree M1”, manufactured by INVISTA (Japan) K.K)
• the friction coefficient was measured for evaluation under the following test conditions.
• Tester F-2100 manufactured by ORIENTEC Co., Ltd.
• Ball 3/16 inch ball made of SUJ2
• Test plate polycrystalline silicon
• Used amount of wire 30 m (repeatedly used by reciprocatory movement)
• Amount of processing fluid left still 100 g
• the processing fluid was evaluated according to the content of water contained in the processing fluid based on the following evaluation criteria.
• the processing fluid of the invention reduces the friction coefficient due to the presence of a predetermined nitrogen-containing compound.
• the processing fluid restrains the abrasion of the abrasive grains and keeps the abrasive grains from being fallen off.
• the processing fluid of the invention reduces the amount of generated hydrogen, so that the processing fluid is kept from spilling out of a processing fluid tank.
• the main component of the processing fluid of the invention is water, the processing fluid imposes less environmental burden and exhibits excellent source-saving performance.
• Comparatives 1 to 5 do not contain the nitrogen-containing compound of a predetermined pH as a friction modifier as required by the invention, increase in both the friction coefficient and generated hydrogen cannot be restrained. Further, since the main component of the processing fluid of Comparative 4 is propylene glycol, the processing fluid imposes larger environmental burden and exhibits poor source-saving performance.
• the silicon-wafer processing fluid and silicon-wafer processing method of the invention are suitably used for slicing a silicon ingot with a wire on which abrasive grains are rigidly attached.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Organic Chemistry (AREA)
• Chemical Kinetics & Catalysis (AREA)
• General Chemical & Material Sciences (AREA)
• Oil, Petroleum & Natural Gas (AREA)
• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Manufacturing & Machinery (AREA)
• Computer Hardware Design (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
• Mechanical Engineering (AREA)
• Spectroscopy & Molecular Physics (AREA)
• Materials Engineering (AREA)
• Mechanical Treatment Of Semiconductor (AREA)
• Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
• Processing Of Stones Or Stones Resemblance Materials (AREA)
• Lubricants (AREA)

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• 2010
  • 2010-08-24 JP JP2010186782A patent/JP5588786B2/ja active Active
• 2011
  • 2011-08-23 CN CN201180040687.6A patent/CN103053010B/zh active Active
  • 2011-08-23 SG SG2013009261A patent/SG187749A1/en unknown
  • 2011-08-23 WO PCT/JP2011/068899 patent/WO2012026437A1/ja active Application Filing
  • 2011-08-23 US US13/816,938 patent/US20130143405A1/en not_active Abandoned
  • 2011-08-23 MY MYPI2013000464A patent/MY158440A/en unknown
  • 2011-08-23 TW TW100130151A patent/TWI550077B/zh active
  • 2011-08-23 KR KR1020137004357A patent/KR101809778B1/ko active IP Right Grant
  • 2011-08-23 EP EP11819900.9A patent/EP2610896A4/en not_active Withdrawn
• 2014
  • 2014-10-24 US US14/523,494 patent/US9441179B2/en active Active

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