US20080142372A1 - Additive for chromium electrolytes - Google Patents

Additive for chromium electrolytes Download PDF

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Publication number
US20080142372A1
US20080142372A1 US11/849,491 US84949107A US2008142372A1 US 20080142372 A1 US20080142372 A1 US 20080142372A1 US 84949107 A US84949107 A US 84949107A US 2008142372 A1 US2008142372 A1 US 2008142372A1
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US
United States
Prior art keywords
additive
chromium
chromic acid
acids
long
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/849,491
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English (en)
Inventor
Lorenz Laser
Matthias Weiss
Frank Honselmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TIB CHemicals AG
Original Assignee
Goldschmidt TIB GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Goldschmidt TIB GmbH filed Critical Goldschmidt TIB GmbH
Priority to US11/849,491 priority Critical patent/US20080142372A1/en
Assigned to GOLDSCHMIDT TIB GMBH reassignment GOLDSCHMIDT TIB GMBH ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: WEISS, MATTHIAS, LASER, LORENZ, HONSELMANN, FRANK
Publication of US20080142372A1 publication Critical patent/US20080142372A1/en
Priority to US13/160,292 priority patent/US20110290658A1/en
Abandoned legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/08Deposition of black chromium, e.g. hexavalent chromium, CrVI

Definitions

  • the present invention relates to the field of additives for chromium electrolytes, especially to the field of the additive surfactants for chromium electrolytes, and to the field of the additives for chromic acid solutions applied for polymer metallizations.
  • foam-forming wetting agents foam-forming wetting agents
  • surfactants foam-forming wetting agents
  • PFOAs perfluoroalkylsulphonic acids
  • These products are also stable to the highly oxidative properties of chromic acid.
  • fluorine surfactants are not biodegradable, since they do not undergo any photolytic, hydrolytic, oxidative or reductive transformation whatsoever. They are biodegraded neither aerobically nor anaerobically. Owing to their physicochemical properties, perfluoroalkylsulphonic acids remain as end metabolites and are not degraded any further.
  • DE-B 1 034 945 has proposed already up to 10 g/l alkylmethylsulphonates (i.e. salts of bis or monoalkylmethan sulfonic acid) as additives, which are said to have the properties of a surfactant and simultaneously bring about process-improving influences with regard to the smoothing of the chromium layer.
  • these additives are unsuitable in practice, since they decompose in the course of chromium-plating within a very short time.
  • DE-C 39 33 896 describes the addition of saturated aliphatic sulfonic acids or their salts or their halogen derivatives having maximum 2 C atoms and maximum 6 sulfonic acid groups during the electrolytic chromium-plating.
  • the addition of fluoro compounds are also mentioned.
  • the working current density ranges from 10 to 1200 A/dm 2 .
  • ammonium fluorooctan sulfonate is applied as wetting agent based on 300 g/l CrO 3 and 1.3% (related to CrO 3 ) H 2 SO 4 , the current density is 50 A/dm 2 and the temperature 55° C.; the additive is a saturated aliphatic sulfonic acid having 1 C and 1 sulfonic acid group (3.2 g/l).
  • the galvanic chromium electrolytes of DE-A 43 05 732 contains 0,4 to 10 g 1,3-propandisulfonic acid-2-sulfinic acid and/or 1,2,3-propantrisulfonic acid or the salts thereof besides 150 to 400 g/l CrO 3 and 1 to 4% by weight (related to CrO 3 ) H 2 SO 4 .
  • 3 to 5 g additive are applied at 55° C. and a current density of 50 A/dm 2 .
  • the galvanic chromium electrolyte of DE-C 44 30 923 contains 2 to 10 g/l methansulfonic acid and 2 to 20 g/l MgSiF 6 as additive to CrO 3 . In a specific example there are also 0,1 ml/l tetraethylammonium perfluorooctyl sulfonate and 1 g/l sugar present.
  • the chromium deposition is conducted at 40° C. and a current density of 1.82 A/dm 2 and during 1 h.
  • a chromium electrolyte is known containing besides 100 to 600 g/l CrO 3 and sulphate ions in a relation of Cr 6 +to S 0 4 2 ⁇ from 90 to 120 to 1 additionally 0.01 to 3.0 g/l Na-2-hydroxyethan sulfonate or its free acid.
  • the chromium deposition is conducted in 3 steps from 44 to 57° C. during more than 1 h.
  • the chromium layers of De-A 102 55 853 are produced in an electrolyte containing 50 to 600 g/l CrO 3 , 0,5 to 10 g/l H 2 SO 4 , 1 to 20 g/l of an aliphatic sulfonic acid having 1 to 6 C atoms and 10 to 200 g/l of a molybdate, vanadate or zirkonate.
  • the electrolyte contains 250 g/l CrO 3 , 2.5 g/l H 2 SO 4 , 4 g/l methan sulfonic acid and 100 g/l (NH 4 ) 8 Mo 7 O 24 ⁇ 4 H 2 O; the electrolyse is conducted at 55° C. and at a current density of 40 A/dm 2 during 30 min. or at 50 A/dm 2 during 120 min.
  • the electrolyte of DE-B 10 2004 019 370 does not contain—compared with the beforementioned solution—molybdates, vanadates or zirkonates.
  • methan sulfonic acid as a solution of 70%
  • methan sulfonic acid in an amount of 9 ml/l at 60 to 70° C. during 30 min. at 30 to 80 A/dm 2 is applied.
  • the current efficiency is at ⁇ 12% (as in the beforementioned solution).
  • chromium electrolytes known from the prior art are either only suitable for very specific applications, or show the disadvantages—already discussed before—caused by a fluoro part in the additive molecule.
  • an additive for aqueous chromic acid solutions being free of fluorine surfactants and being biodegradable and having in a chromic acid solution which contains the said additive a surface tension of ⁇ 35 mN/m, and having in the application in the electrolytical chromium-plating, determined at 45° C. and 6000 Ah of charge passage, in the chromic acid solution which contains the said additive a stability of ⁇ 4 h.
  • additive within the present invention can relate either to an individual substance or to a substance mixture; for reasons of readability and clarity, however, “additive” is only referred to in the singular within the present invention. If the additive used is a substance mixture, what is meant in general is that the substance mixture has the properties described, but the individual components of the mixture may also only have the properties described.
  • “stability” means especially the lasting efficacy of the additive with regard to the surface tension under the chemically demanding conditions of a chromium electrolyte in the application in the electrolytical chromium-plating.
  • “stability” over a certain period means that the surface tension increases by not more than 5 mN/m over this time.
  • chromium electrolyte(s) and/or “chromic acid solution(s)” are understood to mean chromium electrolytes or chromic acid solutions which—besides chromic acid and water—comprises catalysts and/or further acids among other components.
  • a chromic acid solution which contains e.g. 0.1 g/l of additive and 250 g/l of chromic acid, preferably has a surface tension of ⁇ 28 mN/m, even more preferably ⁇ 25 mN.
  • a chromic acid solution which contains e.g. 0.1 g/l of additive and 400 g/l of chromic acid, preferably has a surface tension of ⁇ 35 mN/m, even more preferably ⁇ 30 mN/m.
  • An additive according to the present invention has at 45° C. in a chromium electrolyte which contains 0.1 g/l and 270 g/l of chromic acid preferably has a stability of ⁇ 8 h, even more preferably of ⁇ 12 h.
  • the additive is free of fluorine surfactants. This is understood to mean especially that the additive does not contain any organofluorine compound, or that the proportion of organofluorine compounds in the additive is below the detection limit. Furthermore, the additive is biodegradable. This is understood to mean especially that, according to OECD criteria, ⁇ 99.5%, preferably ⁇ 99.8%, of the additive has degraded in the screening test after 8 days. In many applications, such an additive contributes to minimizing expenditure with regard to preventing the contamination of the environment, or even to making it entirely superfluous.
  • a chromium electrolyte which contains e.g. 0.1 g/l of additive and 250 g/l of chromic acid, preferably has a current density of 30 A/dm 2 to 60 A/dm 2 , even more preferably 40 A/dm 2 to 50 A/dm 2 .
  • a chromium electrolyte which contains e.g. 0.2 g/l of additive and 350 to 400 g/l of chromic acid, preferably has a current density of 5 A/dm 2 to 25 A/dm 2 , even more preferably 8 A/dm 2 to 20 A/dm 2 .
  • the additive comprises at least a surfactant selected from the group consisting of long-chain alkylmonosulphonic acids, long-chain alkyldisulphonic acids, long-chain alkylpolysulphonic acids, salts of the long-chain alkylmonosulphonic acids, salts of the long-chain alkyldisulphonic acids and salts of the long-chain alkylpolysulphonic acids.
  • long-chain is understood to mean at least 4 C atoms.
  • the long-chain alkyl radicals are preferably unbranched, but it is also possible to use branched alkylmono-,-di- and -polysulphonic acids and salts thereof.
  • the salts used are alkali metal salts, alkaline earth metal salts, NH 4 + salts, NR 4 + salts (where R ⁇ C 1 to C 4 alkyl).
  • Polysulphonic acids have 3 to 6 sulfonic acid group per molecule.
  • the additive comprises, as surfactant at least one compound CH 3 (CH 2 )nSO 3 H or salts thereof, where n is 10 to 18. In practice, these compounds often have a particularly elevated stability and are preferred in this respect. More preferably, the additive comprises such surfactants, where n is 12 to 17; even more preferably n is 14 to 16.
  • the present invention also relates to use of the inventive additive as a smoothing agent in chromium electrolytes.
  • concentration of additive is between 0.05 g/l and 20 g/l, preferably from 0.1 g/l to 10 g/l, and more preferably from 1 g/l to 3 g/l.
  • the present invention also relates to use of the inventive additive as an additive in polymer mordants. It has been found that, surprisingly, the inventive additive can be used not only in chromium electrolytes but also in this pretreatment of polymer metallizations. In these mordants, the additive has a wetting effect and lowers the surface tension of the chromic acid-containing mordants. The positive influence on chromic acid mist formation and entrainment is comparable to the effects described above for chromium electrolytes.
  • the amounts of surfactant in a chromic acid-containing mordant are basically identical with its amounts in chromium electrolytes.
  • a black chromium coating was performed in
  • the chromic acid solution continued to be stable after an application time of 4 h during the electrolytical chromium-plating, i.e. the surface tension is only increased by much less than 5 mN/m.
  • the chromium layer deposited had a very uniform appearance.
  • the dispersibility of the electrolyte was improved.
  • the testing of several sheets gave a dispersion of the chromium layer which was improved by an average of 1.0 to 1.5 cm according to corresponding tests in a Hull cell.
  • the surface tension was measured with a K8 tensiometer from Krüss GmbH in Hamburg.
  • the unit works by the Du Noüy ring method.
  • the force of a liquid lamella drawn up by the ring is measured.
  • the liquid is raised until there is contact of the ring with the surface.
  • With the aid of a torsion balance the force required to raise the platinum ring is measured.
  • At the point of the highest force applied when the liquid lamella breaks off, there is a force equilibrium from which the surface tension of the liquid can be calculated.
  • the ring geometry is taken into account by means of an instrument-specific calibration by the manufacturer.
  • the current density is determined by means of a measurement of the currents with an amperemeter and reference to the known surface geometry of the components to be chromium-plated.
  • the dispersibility of an electrolyte is determined by the evaluation of sheets after tests with the electrolyte in a Hull cell.
  • the dispersion of the chromium layer is determined by measuring the expansion of the coated surface on the sheet after it has passed through the test run. The measurement is effected with a ruler. In general, several sheets are coated and measured under the same conditions in order to obtain reliable averages.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Primary Cells (AREA)
  • Chemically Coating (AREA)
US11/849,491 2006-09-05 2007-09-04 Additive for chromium electrolytes Abandoned US20080142372A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US11/849,491 US20080142372A1 (en) 2006-09-05 2007-09-04 Additive for chromium electrolytes
US13/160,292 US20110290658A1 (en) 2006-09-05 2011-06-14 Additive for chromium electrolytes

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102006042076.4 2006-09-05
DE102006042076A DE102006042076A1 (de) 2006-09-05 2006-09-05 Ein neues Additiv für Chromelektrolyte
US84408806P 2006-09-13 2006-09-13
US11/849,491 US20080142372A1 (en) 2006-09-05 2007-09-04 Additive for chromium electrolytes

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/160,292 Division US20110290658A1 (en) 2006-09-05 2011-06-14 Additive for chromium electrolytes

Publications (1)

Publication Number Publication Date
US20080142372A1 true US20080142372A1 (en) 2008-06-19

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US11/849,491 Abandoned US20080142372A1 (en) 2006-09-05 2007-09-04 Additive for chromium electrolytes
US13/160,292 Abandoned US20110290658A1 (en) 2006-09-05 2011-06-14 Additive for chromium electrolytes

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Country Status (16)

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US (2) US20080142372A1 (es)
EP (1) EP2061916A1 (es)
JP (1) JP5588677B2 (es)
KR (1) KR20090075677A (es)
AU (1) AU2007293648A1 (es)
BR (1) BRPI0716255A2 (es)
CA (1) CA2662238A1 (es)
DE (1) DE102006042076A1 (es)
EA (1) EA016032B1 (es)
IL (1) IL197411A0 (es)
MX (1) MX2009002410A (es)
NO (1) NO20091361L (es)
RS (1) RS20090102A (es)
SG (1) SG174763A1 (es)
WO (1) WO2008028932A1 (es)
ZA (1) ZA200901539B (es)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130341197A1 (en) * 2012-02-06 2013-12-26 Honeywell International Inc. Methods for producing a high temperature oxidation resistant mcralx coating on superalloy substrates
CN103510131A (zh) * 2012-06-26 2014-01-15 张益诚 形成黑色三价氧化铬镀层的电化学方法及其黑色三价氧化铬镀层
CN105177640A (zh) * 2015-08-04 2015-12-23 重庆立道表面技术有限公司 一种高效高性能高硬镀铬工艺
CN105980607A (zh) * 2013-09-05 2016-09-28 乐思股份有限公司 具有减少的空中传播的发射物的水性电解质组合物、这种组合物的方法和用途
US10087540B2 (en) 2015-02-17 2018-10-02 Honeywell International Inc. Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011102052A1 (de) * 2011-05-19 2012-11-22 Anke Gmbh & Co. Kg Netzmittel für elektrolytische Anwendung und dessen Verwendung
CN110565124A (zh) * 2019-08-05 2019-12-13 宣城金诺模塑科技有限公司 一种汽车饰件用镀铬溶液及其电镀方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3745097A (en) * 1969-05-26 1973-07-10 M & T Chemicals Inc Electrodeposition of an iridescent chromium coating
US4897166A (en) * 1987-07-14 1990-01-30 Bayer Aktiengesellschaft Antifoaming additive for acid liquids
US4997686A (en) * 1987-12-23 1991-03-05 Surface Technology, Inc. Composite electroless plating-solutions, processes, and articles thereof
US5453175A (en) * 1989-11-06 1995-09-26 Elf Atochem N. A., Inc. Protection of lead-containing anodes during chromium electroplating
US5575898A (en) * 1994-10-12 1996-11-19 Bayer Ag Process for through-hole plating of two-layer printed circuit boards and multilayers
US6447666B1 (en) * 1998-06-26 2002-09-10 Man Roland Druckmashinen Ag Galvanic bath, method for producing structured hard chromium layers and use thereof
US20030141195A1 (en) * 2000-07-10 2003-07-31 Gregor Brodt Method for electrolytic galvanising using electrolytes containing alkane sulphonic acid
US20060054509A1 (en) * 2002-11-29 2006-03-16 Rudolf Linde Production of structured hard chrome layers
US7025867B2 (en) * 2001-05-18 2006-04-11 Atotech Deutschland Gmbh Direct electrolytic metallization on non-conducting substrates
US20080060945A1 (en) * 2004-04-21 2008-03-13 Rudolf Linde Production of a Structured Hard Chromium Layer and Production of a Coating

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1012463B (de) * 1954-10-05 1957-07-18 Friedrich Kessler 5, 0 bis 50, 0 m Rollenbandmasse mit automatischer Einrollvorrichtung
DE1034945B (de) * 1956-05-15 1958-07-24 Riedel & Co Glaettungsmittel und Bad zur elektrolytischen Verchromung aus einer waessrigen sechswertigen Chromsaeureloesung
US3041257A (en) * 1960-08-25 1962-06-26 Westinghouse Electric Corp Chromium electroplating
CN87100440B (zh) * 1987-01-27 1988-05-11 中国人民解放军装甲兵工程学院 在不导电材料上刷镀铜的方法
AU638512B2 (en) * 1989-11-06 1993-07-01 Atotech Deutschland Gmbh Protection of lead-containing anodes during chromium electroplating
WO1994004722A1 (de) * 1992-08-14 1994-03-03 Blasberg Oberflächentechnik GmbH Anode für die galvanische verchromung
DE4328883C2 (de) * 1993-08-27 1996-08-14 Bayer Ag Verfahren zur Vorbereitung von Polyamidformteilen für die nachfolgende stromlose Metallisierung
EP0860519A1 (en) * 1997-02-12 1998-08-26 LUIGI STOPPANI S.p.A. Chromium plating from baths catalyzed with alkanedisulfonic-alkanesulfonic compounds with inhibitors such as aminoalkanesulfonic acids and heterocyclic bases
JP2005240180A (ja) * 2004-01-30 2005-09-08 Riken Corp 複合クロムめっき皮膜を有する摺動部材及びその製造方法
DE102004026489B3 (de) * 2004-05-27 2005-09-29 Enthone Inc., West Haven Verfahren zur Metallisierung von Kunststoffoberflächen

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3745097A (en) * 1969-05-26 1973-07-10 M & T Chemicals Inc Electrodeposition of an iridescent chromium coating
US4897166A (en) * 1987-07-14 1990-01-30 Bayer Aktiengesellschaft Antifoaming additive for acid liquids
US4997686A (en) * 1987-12-23 1991-03-05 Surface Technology, Inc. Composite electroless plating-solutions, processes, and articles thereof
US5453175A (en) * 1989-11-06 1995-09-26 Elf Atochem N. A., Inc. Protection of lead-containing anodes during chromium electroplating
US5575898A (en) * 1994-10-12 1996-11-19 Bayer Ag Process for through-hole plating of two-layer printed circuit boards and multilayers
US6447666B1 (en) * 1998-06-26 2002-09-10 Man Roland Druckmashinen Ag Galvanic bath, method for producing structured hard chromium layers and use thereof
US20030141195A1 (en) * 2000-07-10 2003-07-31 Gregor Brodt Method for electrolytic galvanising using electrolytes containing alkane sulphonic acid
US7025867B2 (en) * 2001-05-18 2006-04-11 Atotech Deutschland Gmbh Direct electrolytic metallization on non-conducting substrates
US20060054509A1 (en) * 2002-11-29 2006-03-16 Rudolf Linde Production of structured hard chrome layers
US20080060945A1 (en) * 2004-04-21 2008-03-13 Rudolf Linde Production of a Structured Hard Chromium Layer and Production of a Coating

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130341197A1 (en) * 2012-02-06 2013-12-26 Honeywell International Inc. Methods for producing a high temperature oxidation resistant mcralx coating on superalloy substrates
US9771661B2 (en) * 2012-02-06 2017-09-26 Honeywell International Inc. Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates
CN103510131A (zh) * 2012-06-26 2014-01-15 张益诚 形成黑色三价氧化铬镀层的电化学方法及其黑色三价氧化铬镀层
CN105980607A (zh) * 2013-09-05 2016-09-28 乐思股份有限公司 具有减少的空中传播的发射物的水性电解质组合物、这种组合物的方法和用途
US10087540B2 (en) 2015-02-17 2018-10-02 Honeywell International Inc. Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same
CN105177640A (zh) * 2015-08-04 2015-12-23 重庆立道表面技术有限公司 一种高效高性能高硬镀铬工艺

Also Published As

Publication number Publication date
US20110290658A1 (en) 2011-12-01
DE102006042076A1 (de) 2008-03-20
EP2061916A1 (de) 2009-05-27
IL197411A0 (en) 2009-12-24
MX2009002410A (es) 2009-05-28
JP2010502836A (ja) 2010-01-28
CA2662238A1 (en) 2008-03-13
EA200970249A1 (ru) 2009-08-28
BRPI0716255A2 (pt) 2013-09-03
ZA200901539B (en) 2010-02-24
SG174763A1 (en) 2011-10-28
RS20090102A (en) 2010-08-31
NO20091361L (no) 2009-05-28
KR20090075677A (ko) 2009-07-08
JP5588677B2 (ja) 2014-09-10
EA016032B1 (ru) 2012-01-30
WO2008028932A1 (de) 2008-03-13
AU2007293648A1 (en) 2008-03-13

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Owner name: GOLDSCHMIDT TIB GMBH, GERMANY

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LASER, LORENZ;WEISS, MATTHIAS;HONSELMANN, FRANK;REEL/FRAME:020412/0163;SIGNING DATES FROM 20070817 TO 20070829

STCB Information on status: application discontinuation

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