US20080142372A1 - Additive for chromium electrolytes - Google Patents
Additive for chromium electrolytes Download PDFInfo
- Publication number
- US20080142372A1 US20080142372A1 US11/849,491 US84949107A US2008142372A1 US 20080142372 A1 US20080142372 A1 US 20080142372A1 US 84949107 A US84949107 A US 84949107A US 2008142372 A1 US2008142372 A1 US 2008142372A1
- Authority
- US
- United States
- Prior art keywords
- additive
- chromium
- chromic acid
- acids
- long
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000654 additive Substances 0.000 title claims abstract description 61
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 35
- 239000011651 chromium Substances 0.000 title claims abstract description 35
- 239000003792 electrolyte Substances 0.000 title claims abstract description 33
- 230000000996 additive effect Effects 0.000 title claims description 52
- 150000003839 salts Chemical class 0.000 claims abstract description 16
- 238000007747 plating Methods 0.000 claims abstract description 11
- 229920000642 polymer Polymers 0.000 claims abstract description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 5
- 239000011737 fluorine Substances 0.000 claims abstract description 5
- 238000001465 metallisation Methods 0.000 claims abstract description 5
- 238000002203 pretreatment Methods 0.000 claims abstract 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 29
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 29
- 239000002253 acid Substances 0.000 claims description 18
- 150000007513 acids Chemical class 0.000 claims description 17
- 239000004094 surface-active agent Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 6
- 238000009499 grossing Methods 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 229910006069 SO3H Inorganic materials 0.000 abstract 1
- 239000013533 biodegradable additive Substances 0.000 abstract 1
- 238000005137 deposition process Methods 0.000 abstract 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 18
- -1 sulphate ions Chemical class 0.000 description 7
- 238000012360 testing method Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000003595 mist Substances 0.000 description 3
- 125000000542 sulfonic acid group Chemical group 0.000 description 3
- JHDXAQHGAJXNBY-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate;tetraethylazanium Chemical compound CC[N+](CC)(CC)CC.[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JHDXAQHGAJXNBY-UHFFFAOYSA-M 0.000 description 2
- 241000446313 Lamella Species 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 230000002045 lasting effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- 229910019624 (NH4)8Mo7O24·4H2O Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- NJPNZJFVJXSSKZ-UHFFFAOYSA-N azanium;1-fluorooctane-1-sulfonate Chemical compound [NH4+].CCCCCCCC(F)S([O-])(=O)=O NJPNZJFVJXSSKZ-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000002207 metabolite Substances 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- FACKKNUWEJWKIC-UHFFFAOYSA-N propane-1,2,3-trisulfonic acid Chemical compound OS(=O)(=O)CC(S(O)(=O)=O)CS(O)(=O)=O FACKKNUWEJWKIC-UHFFFAOYSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 238000011937 reductive transformation Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- PLQISZLZPSPBDP-UHFFFAOYSA-M sodium;pentadecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCCCCS([O-])(=O)=O PLQISZLZPSPBDP-UHFFFAOYSA-M 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/08—Deposition of black chromium, e.g. hexavalent chromium, CrVI
Definitions
- the present invention relates to the field of additives for chromium electrolytes, especially to the field of the additive surfactants for chromium electrolytes, and to the field of the additives for chromic acid solutions applied for polymer metallizations.
- foam-forming wetting agents foam-forming wetting agents
- surfactants foam-forming wetting agents
- PFOAs perfluoroalkylsulphonic acids
- These products are also stable to the highly oxidative properties of chromic acid.
- fluorine surfactants are not biodegradable, since they do not undergo any photolytic, hydrolytic, oxidative or reductive transformation whatsoever. They are biodegraded neither aerobically nor anaerobically. Owing to their physicochemical properties, perfluoroalkylsulphonic acids remain as end metabolites and are not degraded any further.
- DE-B 1 034 945 has proposed already up to 10 g/l alkylmethylsulphonates (i.e. salts of bis or monoalkylmethan sulfonic acid) as additives, which are said to have the properties of a surfactant and simultaneously bring about process-improving influences with regard to the smoothing of the chromium layer.
- these additives are unsuitable in practice, since they decompose in the course of chromium-plating within a very short time.
- DE-C 39 33 896 describes the addition of saturated aliphatic sulfonic acids or their salts or their halogen derivatives having maximum 2 C atoms and maximum 6 sulfonic acid groups during the electrolytic chromium-plating.
- the addition of fluoro compounds are also mentioned.
- the working current density ranges from 10 to 1200 A/dm 2 .
- ammonium fluorooctan sulfonate is applied as wetting agent based on 300 g/l CrO 3 and 1.3% (related to CrO 3 ) H 2 SO 4 , the current density is 50 A/dm 2 and the temperature 55° C.; the additive is a saturated aliphatic sulfonic acid having 1 C and 1 sulfonic acid group (3.2 g/l).
- the galvanic chromium electrolytes of DE-A 43 05 732 contains 0,4 to 10 g 1,3-propandisulfonic acid-2-sulfinic acid and/or 1,2,3-propantrisulfonic acid or the salts thereof besides 150 to 400 g/l CrO 3 and 1 to 4% by weight (related to CrO 3 ) H 2 SO 4 .
- 3 to 5 g additive are applied at 55° C. and a current density of 50 A/dm 2 .
- the galvanic chromium electrolyte of DE-C 44 30 923 contains 2 to 10 g/l methansulfonic acid and 2 to 20 g/l MgSiF 6 as additive to CrO 3 . In a specific example there are also 0,1 ml/l tetraethylammonium perfluorooctyl sulfonate and 1 g/l sugar present.
- the chromium deposition is conducted at 40° C. and a current density of 1.82 A/dm 2 and during 1 h.
- a chromium electrolyte is known containing besides 100 to 600 g/l CrO 3 and sulphate ions in a relation of Cr 6 +to S 0 4 2 ⁇ from 90 to 120 to 1 additionally 0.01 to 3.0 g/l Na-2-hydroxyethan sulfonate or its free acid.
- the chromium deposition is conducted in 3 steps from 44 to 57° C. during more than 1 h.
- the chromium layers of De-A 102 55 853 are produced in an electrolyte containing 50 to 600 g/l CrO 3 , 0,5 to 10 g/l H 2 SO 4 , 1 to 20 g/l of an aliphatic sulfonic acid having 1 to 6 C atoms and 10 to 200 g/l of a molybdate, vanadate or zirkonate.
- the electrolyte contains 250 g/l CrO 3 , 2.5 g/l H 2 SO 4 , 4 g/l methan sulfonic acid and 100 g/l (NH 4 ) 8 Mo 7 O 24 ⁇ 4 H 2 O; the electrolyse is conducted at 55° C. and at a current density of 40 A/dm 2 during 30 min. or at 50 A/dm 2 during 120 min.
- the electrolyte of DE-B 10 2004 019 370 does not contain—compared with the beforementioned solution—molybdates, vanadates or zirkonates.
- methan sulfonic acid as a solution of 70%
- methan sulfonic acid in an amount of 9 ml/l at 60 to 70° C. during 30 min. at 30 to 80 A/dm 2 is applied.
- the current efficiency is at ⁇ 12% (as in the beforementioned solution).
- chromium electrolytes known from the prior art are either only suitable for very specific applications, or show the disadvantages—already discussed before—caused by a fluoro part in the additive molecule.
- an additive for aqueous chromic acid solutions being free of fluorine surfactants and being biodegradable and having in a chromic acid solution which contains the said additive a surface tension of ⁇ 35 mN/m, and having in the application in the electrolytical chromium-plating, determined at 45° C. and 6000 Ah of charge passage, in the chromic acid solution which contains the said additive a stability of ⁇ 4 h.
- additive within the present invention can relate either to an individual substance or to a substance mixture; for reasons of readability and clarity, however, “additive” is only referred to in the singular within the present invention. If the additive used is a substance mixture, what is meant in general is that the substance mixture has the properties described, but the individual components of the mixture may also only have the properties described.
- “stability” means especially the lasting efficacy of the additive with regard to the surface tension under the chemically demanding conditions of a chromium electrolyte in the application in the electrolytical chromium-plating.
- “stability” over a certain period means that the surface tension increases by not more than 5 mN/m over this time.
- chromium electrolyte(s) and/or “chromic acid solution(s)” are understood to mean chromium electrolytes or chromic acid solutions which—besides chromic acid and water—comprises catalysts and/or further acids among other components.
- a chromic acid solution which contains e.g. 0.1 g/l of additive and 250 g/l of chromic acid, preferably has a surface tension of ⁇ 28 mN/m, even more preferably ⁇ 25 mN.
- a chromic acid solution which contains e.g. 0.1 g/l of additive and 400 g/l of chromic acid, preferably has a surface tension of ⁇ 35 mN/m, even more preferably ⁇ 30 mN/m.
- An additive according to the present invention has at 45° C. in a chromium electrolyte which contains 0.1 g/l and 270 g/l of chromic acid preferably has a stability of ⁇ 8 h, even more preferably of ⁇ 12 h.
- the additive is free of fluorine surfactants. This is understood to mean especially that the additive does not contain any organofluorine compound, or that the proportion of organofluorine compounds in the additive is below the detection limit. Furthermore, the additive is biodegradable. This is understood to mean especially that, according to OECD criteria, ⁇ 99.5%, preferably ⁇ 99.8%, of the additive has degraded in the screening test after 8 days. In many applications, such an additive contributes to minimizing expenditure with regard to preventing the contamination of the environment, or even to making it entirely superfluous.
- a chromium electrolyte which contains e.g. 0.1 g/l of additive and 250 g/l of chromic acid, preferably has a current density of 30 A/dm 2 to 60 A/dm 2 , even more preferably 40 A/dm 2 to 50 A/dm 2 .
- a chromium electrolyte which contains e.g. 0.2 g/l of additive and 350 to 400 g/l of chromic acid, preferably has a current density of 5 A/dm 2 to 25 A/dm 2 , even more preferably 8 A/dm 2 to 20 A/dm 2 .
- the additive comprises at least a surfactant selected from the group consisting of long-chain alkylmonosulphonic acids, long-chain alkyldisulphonic acids, long-chain alkylpolysulphonic acids, salts of the long-chain alkylmonosulphonic acids, salts of the long-chain alkyldisulphonic acids and salts of the long-chain alkylpolysulphonic acids.
- long-chain is understood to mean at least 4 C atoms.
- the long-chain alkyl radicals are preferably unbranched, but it is also possible to use branched alkylmono-,-di- and -polysulphonic acids and salts thereof.
- the salts used are alkali metal salts, alkaline earth metal salts, NH 4 + salts, NR 4 + salts (where R ⁇ C 1 to C 4 alkyl).
- Polysulphonic acids have 3 to 6 sulfonic acid group per molecule.
- the additive comprises, as surfactant at least one compound CH 3 (CH 2 )nSO 3 H or salts thereof, where n is 10 to 18. In practice, these compounds often have a particularly elevated stability and are preferred in this respect. More preferably, the additive comprises such surfactants, where n is 12 to 17; even more preferably n is 14 to 16.
- the present invention also relates to use of the inventive additive as a smoothing agent in chromium electrolytes.
- concentration of additive is between 0.05 g/l and 20 g/l, preferably from 0.1 g/l to 10 g/l, and more preferably from 1 g/l to 3 g/l.
- the present invention also relates to use of the inventive additive as an additive in polymer mordants. It has been found that, surprisingly, the inventive additive can be used not only in chromium electrolytes but also in this pretreatment of polymer metallizations. In these mordants, the additive has a wetting effect and lowers the surface tension of the chromic acid-containing mordants. The positive influence on chromic acid mist formation and entrainment is comparable to the effects described above for chromium electrolytes.
- the amounts of surfactant in a chromic acid-containing mordant are basically identical with its amounts in chromium electrolytes.
- a black chromium coating was performed in
- the chromic acid solution continued to be stable after an application time of 4 h during the electrolytical chromium-plating, i.e. the surface tension is only increased by much less than 5 mN/m.
- the chromium layer deposited had a very uniform appearance.
- the dispersibility of the electrolyte was improved.
- the testing of several sheets gave a dispersion of the chromium layer which was improved by an average of 1.0 to 1.5 cm according to corresponding tests in a Hull cell.
- the surface tension was measured with a K8 tensiometer from Krüss GmbH in Hamburg.
- the unit works by the Du Noüy ring method.
- the force of a liquid lamella drawn up by the ring is measured.
- the liquid is raised until there is contact of the ring with the surface.
- With the aid of a torsion balance the force required to raise the platinum ring is measured.
- At the point of the highest force applied when the liquid lamella breaks off, there is a force equilibrium from which the surface tension of the liquid can be calculated.
- the ring geometry is taken into account by means of an instrument-specific calibration by the manufacturer.
- the current density is determined by means of a measurement of the currents with an amperemeter and reference to the known surface geometry of the components to be chromium-plated.
- the dispersibility of an electrolyte is determined by the evaluation of sheets after tests with the electrolyte in a Hull cell.
- the dispersion of the chromium layer is determined by measuring the expansion of the coated surface on the sheet after it has passed through the test run. The measurement is effected with a ruler. In general, several sheets are coated and measured under the same conditions in order to obtain reliable averages.
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Electroplating Methods And Accessories (AREA)
- Primary Cells (AREA)
- Chemical Treatment Of Metals (AREA)
- Chemically Coating (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/849,491 US20080142372A1 (en) | 2006-09-05 | 2007-09-04 | Additive for chromium electrolytes |
US13/160,292 US20110290658A1 (en) | 2006-09-05 | 2011-06-14 | Additive for chromium electrolytes |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006042076.4 | 2006-09-05 | ||
DE102006042076A DE102006042076A1 (de) | 2006-09-05 | 2006-09-05 | Ein neues Additiv für Chromelektrolyte |
US84408806P | 2006-09-13 | 2006-09-13 | |
US11/849,491 US20080142372A1 (en) | 2006-09-05 | 2007-09-04 | Additive for chromium electrolytes |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/160,292 Division US20110290658A1 (en) | 2006-09-05 | 2011-06-14 | Additive for chromium electrolytes |
Publications (1)
Publication Number | Publication Date |
---|---|
US20080142372A1 true US20080142372A1 (en) | 2008-06-19 |
Family
ID=38596409
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/849,491 Abandoned US20080142372A1 (en) | 2006-09-05 | 2007-09-04 | Additive for chromium electrolytes |
US13/160,292 Abandoned US20110290658A1 (en) | 2006-09-05 | 2011-06-14 | Additive for chromium electrolytes |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/160,292 Abandoned US20110290658A1 (en) | 2006-09-05 | 2011-06-14 | Additive for chromium electrolytes |
Country Status (16)
Country | Link |
---|---|
US (2) | US20080142372A1 (de) |
EP (1) | EP2061916A1 (de) |
JP (1) | JP5588677B2 (de) |
KR (1) | KR20090075677A (de) |
AU (1) | AU2007293648A1 (de) |
BR (1) | BRPI0716255A2 (de) |
CA (1) | CA2662238A1 (de) |
DE (1) | DE102006042076A1 (de) |
EA (1) | EA016032B1 (de) |
IL (1) | IL197411A0 (de) |
MX (1) | MX2009002410A (de) |
NO (1) | NO20091361L (de) |
RS (1) | RS20090102A (de) |
SG (1) | SG174763A1 (de) |
WO (1) | WO2008028932A1 (de) |
ZA (1) | ZA200901539B (de) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130341197A1 (en) * | 2012-02-06 | 2013-12-26 | Honeywell International Inc. | Methods for producing a high temperature oxidation resistant mcralx coating on superalloy substrates |
CN103510131A (zh) * | 2012-06-26 | 2014-01-15 | 张益诚 | 形成黑色三价氧化铬镀层的电化学方法及其黑色三价氧化铬镀层 |
CN105177640A (zh) * | 2015-08-04 | 2015-12-23 | 重庆立道表面技术有限公司 | 一种高效高性能高硬镀铬工艺 |
CN105980607A (zh) * | 2013-09-05 | 2016-09-28 | 乐思股份有限公司 | 具有减少的空中传播的发射物的水性电解质组合物、这种组合物的方法和用途 |
US10087540B2 (en) | 2015-02-17 | 2018-10-02 | Honeywell International Inc. | Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011102052A1 (de) | 2011-05-19 | 2012-11-22 | Anke Gmbh & Co. Kg | Netzmittel für elektrolytische Anwendung und dessen Verwendung |
CN110565124A (zh) * | 2019-08-05 | 2019-12-13 | 宣城金诺模塑科技有限公司 | 一种汽车饰件用镀铬溶液及其电镀方法 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3745097A (en) * | 1969-05-26 | 1973-07-10 | M & T Chemicals Inc | Electrodeposition of an iridescent chromium coating |
US4897166A (en) * | 1987-07-14 | 1990-01-30 | Bayer Aktiengesellschaft | Antifoaming additive for acid liquids |
US4997686A (en) * | 1987-12-23 | 1991-03-05 | Surface Technology, Inc. | Composite electroless plating-solutions, processes, and articles thereof |
US5453175A (en) * | 1989-11-06 | 1995-09-26 | Elf Atochem N. A., Inc. | Protection of lead-containing anodes during chromium electroplating |
US5575898A (en) * | 1994-10-12 | 1996-11-19 | Bayer Ag | Process for through-hole plating of two-layer printed circuit boards and multilayers |
US6447666B1 (en) * | 1998-06-26 | 2002-09-10 | Man Roland Druckmashinen Ag | Galvanic bath, method for producing structured hard chromium layers and use thereof |
US20030141195A1 (en) * | 2000-07-10 | 2003-07-31 | Gregor Brodt | Method for electrolytic galvanising using electrolytes containing alkane sulphonic acid |
US20060054509A1 (en) * | 2002-11-29 | 2006-03-16 | Rudolf Linde | Production of structured hard chrome layers |
US7025867B2 (en) * | 2001-05-18 | 2006-04-11 | Atotech Deutschland Gmbh | Direct electrolytic metallization on non-conducting substrates |
US20080060945A1 (en) * | 2004-04-21 | 2008-03-13 | Rudolf Linde | Production of a Structured Hard Chromium Layer and Production of a Coating |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1012463B (de) * | 1954-10-05 | 1957-07-18 | Friedrich Kessler | 5, 0 bis 50, 0 m Rollenbandmasse mit automatischer Einrollvorrichtung |
DE1034945B (de) * | 1956-05-15 | 1958-07-24 | Riedel & Co | Glaettungsmittel und Bad zur elektrolytischen Verchromung aus einer waessrigen sechswertigen Chromsaeureloesung |
US3041257A (en) * | 1960-08-25 | 1962-06-26 | Westinghouse Electric Corp | Chromium electroplating |
CN87100440B (zh) * | 1987-01-27 | 1988-05-11 | 中国人民解放军装甲兵工程学院 | 在不导电材料上刷镀铜的方法 |
WO1991006693A1 (en) * | 1989-11-06 | 1991-05-16 | Atochem North America, Inc. | Protection of lead-containing anodes during chromium electroplating |
WO1994004722A1 (de) * | 1992-08-14 | 1994-03-03 | Blasberg Oberflächentechnik GmbH | Anode für die galvanische verchromung |
DE4328883C2 (de) * | 1993-08-27 | 1996-08-14 | Bayer Ag | Verfahren zur Vorbereitung von Polyamidformteilen für die nachfolgende stromlose Metallisierung |
EP0860519A1 (de) * | 1997-02-12 | 1998-08-26 | LUIGI STOPPANI S.p.A. | Chromplattierung aus mit Alkanedisulfonsäure-Alkanesulfonsäure Verbindungen katalysierte Bäder mit Inhibitoren wie Aminealkanesulfonsäure und heterocyclische Basen |
JP2005240180A (ja) * | 2004-01-30 | 2005-09-08 | Riken Corp | 複合クロムめっき皮膜を有する摺動部材及びその製造方法 |
DE102004026489B3 (de) * | 2004-05-27 | 2005-09-29 | Enthone Inc., West Haven | Verfahren zur Metallisierung von Kunststoffoberflächen |
-
2006
- 2006-09-05 DE DE102006042076A patent/DE102006042076A1/de not_active Ceased
-
2007
- 2007-09-04 US US11/849,491 patent/US20080142372A1/en not_active Abandoned
- 2007-09-05 EA EA200970249A patent/EA016032B1/ru not_active IP Right Cessation
- 2007-09-05 RS RSP-2009/0102A patent/RS20090102A/sr unknown
- 2007-09-05 AU AU2007293648A patent/AU2007293648A1/en not_active Abandoned
- 2007-09-05 JP JP2009527138A patent/JP5588677B2/ja active Active
- 2007-09-05 BR BRPI0716255-3A patent/BRPI0716255A2/pt not_active IP Right Cessation
- 2007-09-05 MX MX2009002410A patent/MX2009002410A/es unknown
- 2007-09-05 KR KR1020097006769A patent/KR20090075677A/ko not_active Application Discontinuation
- 2007-09-05 CA CA002662238A patent/CA2662238A1/en not_active Abandoned
- 2007-09-05 EP EP07803268A patent/EP2061916A1/de not_active Withdrawn
- 2007-09-05 WO PCT/EP2007/059308 patent/WO2008028932A1/de active Application Filing
- 2007-09-05 SG SG2011063302A patent/SG174763A1/en unknown
-
2009
- 2009-03-04 ZA ZA2009/01539A patent/ZA200901539B/en unknown
- 2009-03-05 IL IL197411A patent/IL197411A0/en unknown
- 2009-04-02 NO NO20091361A patent/NO20091361L/no not_active Application Discontinuation
-
2011
- 2011-06-14 US US13/160,292 patent/US20110290658A1/en not_active Abandoned
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3745097A (en) * | 1969-05-26 | 1973-07-10 | M & T Chemicals Inc | Electrodeposition of an iridescent chromium coating |
US4897166A (en) * | 1987-07-14 | 1990-01-30 | Bayer Aktiengesellschaft | Antifoaming additive for acid liquids |
US4997686A (en) * | 1987-12-23 | 1991-03-05 | Surface Technology, Inc. | Composite electroless plating-solutions, processes, and articles thereof |
US5453175A (en) * | 1989-11-06 | 1995-09-26 | Elf Atochem N. A., Inc. | Protection of lead-containing anodes during chromium electroplating |
US5575898A (en) * | 1994-10-12 | 1996-11-19 | Bayer Ag | Process for through-hole plating of two-layer printed circuit boards and multilayers |
US6447666B1 (en) * | 1998-06-26 | 2002-09-10 | Man Roland Druckmashinen Ag | Galvanic bath, method for producing structured hard chromium layers and use thereof |
US20030141195A1 (en) * | 2000-07-10 | 2003-07-31 | Gregor Brodt | Method for electrolytic galvanising using electrolytes containing alkane sulphonic acid |
US7025867B2 (en) * | 2001-05-18 | 2006-04-11 | Atotech Deutschland Gmbh | Direct electrolytic metallization on non-conducting substrates |
US20060054509A1 (en) * | 2002-11-29 | 2006-03-16 | Rudolf Linde | Production of structured hard chrome layers |
US20080060945A1 (en) * | 2004-04-21 | 2008-03-13 | Rudolf Linde | Production of a Structured Hard Chromium Layer and Production of a Coating |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130341197A1 (en) * | 2012-02-06 | 2013-12-26 | Honeywell International Inc. | Methods for producing a high temperature oxidation resistant mcralx coating on superalloy substrates |
US9771661B2 (en) * | 2012-02-06 | 2017-09-26 | Honeywell International Inc. | Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates |
CN103510131A (zh) * | 2012-06-26 | 2014-01-15 | 张益诚 | 形成黑色三价氧化铬镀层的电化学方法及其黑色三价氧化铬镀层 |
CN105980607A (zh) * | 2013-09-05 | 2016-09-28 | 乐思股份有限公司 | 具有减少的空中传播的发射物的水性电解质组合物、这种组合物的方法和用途 |
US10087540B2 (en) | 2015-02-17 | 2018-10-02 | Honeywell International Inc. | Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same |
CN105177640A (zh) * | 2015-08-04 | 2015-12-23 | 重庆立道表面技术有限公司 | 一种高效高性能高硬镀铬工艺 |
Also Published As
Publication number | Publication date |
---|---|
DE102006042076A1 (de) | 2008-03-20 |
SG174763A1 (en) | 2011-10-28 |
EA200970249A1 (ru) | 2009-08-28 |
ZA200901539B (en) | 2010-02-24 |
EA016032B1 (ru) | 2012-01-30 |
IL197411A0 (en) | 2009-12-24 |
KR20090075677A (ko) | 2009-07-08 |
EP2061916A1 (de) | 2009-05-27 |
MX2009002410A (es) | 2009-05-28 |
US20110290658A1 (en) | 2011-12-01 |
AU2007293648A1 (en) | 2008-03-13 |
JP2010502836A (ja) | 2010-01-28 |
NO20091361L (no) | 2009-05-28 |
CA2662238A1 (en) | 2008-03-13 |
WO2008028932A1 (de) | 2008-03-13 |
RS20090102A (en) | 2010-08-31 |
BRPI0716255A2 (pt) | 2013-09-03 |
JP5588677B2 (ja) | 2014-09-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20110290658A1 (en) | Additive for chromium electrolytes | |
JP4738910B2 (ja) | 亜鉛−ニッケル合金めっき方法 | |
US7951600B2 (en) | Electrodeposition baths, systems and methods | |
EP2910667B1 (de) | Cyanidfreie saure zusammensetzungen und verfahren für mattsilberelektroplattierung | |
JP2015165053A (ja) | 電着浴、電着システム、及び電着方法 | |
CN109609979B (zh) | 一种提高稳定性的多层镍电镀添加剂 | |
KR900005845B1 (ko) | 아연-닉켈 합금 전착용 전해액 및 그의 전착방법 | |
CN105463528A (zh) | 基于铜(i)离子的用于白青铜的不含氰化物的电镀浴 | |
EP3178968A1 (de) | Elektroplattierungsbad für kupfer-nickel-legierung | |
KR101046301B1 (ko) | 니켈플래쉬 도금용액, 전기아연강판 및 이의 제조방법 | |
EP3428323B1 (de) | Nickel-elektroplattierungszusammensetzungen mit kationischen polymeren und verfahren zur elektroplattierung von nickel | |
US4439283A (en) | Zinc cobalt alloy plating | |
US4054495A (en) | Electrodeposition of nickel | |
KR20100121399A (ko) | 니켈플래쉬 도금용액, 전기아연도금강판 및 이의 제조방법 | |
US5176813A (en) | Protection of lead-containing anodes during chromium electroplating | |
KR100349150B1 (ko) | 표면품질과도금밀착성이양호한아연-니켈합금전기도금욕의첨가제및이를이용한아연-니켈전기합금도금강판제조방법 | |
KR920005437B1 (ko) | 한쪽면의 전기 도금 강판의 제조방법 | |
AU638512B2 (en) | Protection of lead-containing anodes during chromium electroplating | |
EP0566121A1 (de) | Verfahren zur Herstellung von mit einer Zink-Chromlegierung galvanisierten Stahlblechen mit hervorragender Haftfestigkeit | |
GB2160223A (en) | Zinc cobalt alloy plating | |
JPS6140315B2 (de) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: GOLDSCHMIDT TIB GMBH, GERMANY Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LASER, LORENZ;WEISS, MATTHIAS;HONSELMANN, FRANK;REEL/FRAME:020412/0163;SIGNING DATES FROM 20070817 TO 20070829 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |