US20050101469A1 - Aluminoborosilicate glass devoid of alkali and uses thereof - Google Patents

Aluminoborosilicate glass devoid of alkali and uses thereof Download PDF

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Publication number
US20050101469A1
US20050101469A1 US10/472,528 US47252803A US2005101469A1 US 20050101469 A1 US20050101469 A1 US 20050101469A1 US 47252803 A US47252803 A US 47252803A US 2005101469 A1 US2005101469 A1 US 2005101469A1
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US
United States
Prior art keywords
glass
weight
aluminoborosilicate glass
sro
bao
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
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US10/472,528
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English (en)
Inventor
Ulrich Peuchert
Ludwig Gaschler
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Schott AG
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Schott AG
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Filing date
Publication date
Application filed by Schott AG filed Critical Schott AG
Assigned to SCHOTT AG reassignment SCHOTT AG ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SCHOTT GLAS
Publication of US20050101469A1 publication Critical patent/US20050101469A1/en
Priority to US11/713,747 priority Critical patent/US7727916B2/en
Abandoned legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

Definitions

  • the invention relates to an alkali-free aluminoborosilicate glass.
  • the invention also relates to uses of this glass.
  • High requirements are placed on glasses for applications as substrates in flat-panel liquid-crystal display technology, for example in TN (twisted nematic)/STN (supertwisted nematic) displays, active matrix liquid-crystal displays (AMLCDs), thin-film transistors (TFTs) or plasma-addressed liquid crystals (PALCs).
  • TN twisted nematic
  • STN supertwisted nematic
  • AMLCDs active matrix liquid-crystal displays
  • TFTs thin-film transistors
  • PLCs plasma-addressed liquid crystals
  • the glasses should have high transparency over a broad spectral range (VIS, UV) and, in order to save weight, a low density.
  • a-Si amorphous silicon
  • the resulting, partially crystalline poly-Si layer is characterized by a thermal expansion coefficient of ⁇ 20/300 ⁇ 3.7 ⁇ 10 ⁇ 6 /K.
  • the thermal expansion coefficient ⁇ 20/300 may vary between 2.9 ⁇ 10 ⁇ 6 /K and 4.2 ⁇ 10 6 /K.
  • substantially crystalline Si layers are generated by high temperature treatments above 700° C. or direct deposition by CVD processes, which is likewise desired in thin-film photovoltaics, a substrate is required which has a significantly reduced thermal expansion of 3.2 ⁇ 10 ⁇ 6 /K or less.
  • applications in display and photovoltaics technology require the absence of alkali metal ions. Sodium oxide levels of less than 1500 ppm as a result of production can be tolerated in view of the generally “poisoning” action due to diffusion of Na + into the semiconductor layer.
  • the glass needs to have a suitable temperature-dependent viscosity characteristic line: with respect to thermal process and shape stability, it should have a sufficiently high glass transition temperature, i.e. T g >700° C., while on the other hand not having excessively high melting and processing (V A ) temperatures, i.e. a V A of ⁇ 1350° C.
  • Glass substrates for LCD display technology or thin-film photovoltaics technology are also described in “Glass substrates for AMLCD applications: properties and implications” by J. C. Lapp, SPIE Proceedings, Vol. 3014, invited paper (1997), and in “Photovoltaik—Strom aus der Sonne” by J. Schmid, Verlag C. F. Muller, Heidelberg 1994, respectively.
  • the transition to larger display formats places new requirements on the mechanical stability and the specific gravity of the glass substrates.
  • the transition from present-day 600 mm ⁇ 720 mm sheets to sheets having dimensions of e.g. 1 m ⁇ 1 m and more would lead to a corresponding increase in weight which would have an effect on, inter alia, the robot handling for transporting the glass sheet from one production process step to another.
  • a glass is desirable which has a high modulus of elasticity of >80 GPa, preferably ⁇ 85 GPa, combined with a low density of ⁇ 2.55 g/cm 3 . This also minimizes the risk of sagging of the sheet during coating of the glass substrate with an active silicon layer.
  • Some of these glasses and also the glasses of DE 197 36 912 C1 and, according to the examples, the glasses of JP 9-48 632 A contain relatively high amounts of the heavy alkaline earth metal oxides BaO and/or SrO which leads to poor meltability. Moreover, such glasses have an undesirably high density, which is disadvantageous in particular for large-format displays.
  • the glass contains >58-70% by weight of SiO 2 . At lower contents, the chemical resistance is impaired, while at higher levels, the thermal expansion becomes too low and the crystallization tendency of the glass increases. Preference is given to a maximum content of 68% by weight.
  • the glass contains 10-25% by weight of Al 2 O 3 . This has a positive effect on the devitrification stability of the glass and the heat resistance increases without excessively increasing the processing temperature. Preference is given to a content of 14-24% by weight of Al 2 O 3 .
  • the B 2 O 3 content is 0.5- ⁇ 9% by weight.
  • the B 2 O 3 content is restricted to the maximum content specified in order to achieve a high mechanical stability. Higher contents would also impair the chemical resistance to hydrochloric acid solutions.
  • the minimum B 2 O 3 content specified serves to ensure that the glass has good meltability and good devitrification stability. Preference is given to a content of 1-8.5% by weight. Particular preference is given to a maximum content of 5% by weight.
  • An essential glass component are the network-modifying alkaline earth metal oxides. With a sum of alkaline earth metal oxides of between >8 and 18% by weight, a coefficient of thermal expansion ⁇ 20/300 of between 2.8 ⁇ 10 ⁇ 6 /K and 3.9 ⁇ 10 ⁇ 6 /K is achieved. MgO is always present, while CaO, SrO and BaO are optional components. Preferably at least two alkaline earth metal oxides are present. This second alkaline earth oxide is particularly preferably CaO. Particularly preferably at least three alkaline earth metal oxides are present.
  • the glass contains >8-15% by weight of MgO. These relatively high levels make it possible to obtain a glass having a modulus of elasticity which is sufficient for the increased requirements, and a low density.
  • the B 2 O 3 content preferably depends on the MgO content because B 2 O 3 and MgO have opposite effects on the modulus of elasticity.
  • the MgO/B 2 O 3 ratio by weight is thus preferably >1, particularly preferably >1.35.
  • the glass may furthermore contain up to ⁇ 10%, preferably ⁇ 9%, by weight of CaO. Higher levels would lead to an excessive increase in density and to an increase in crystallization tendency. It is preferred that the glass contains CaO, specifically preferably in an amount of at least 0.5% by weight, particularly preferably at least 1% by weight.
  • the glass may furthermore contain BaO, which has a positive effect on its devitrification stability.
  • the maximum content is restricted to ⁇ 2% by weight to keep the density of the glass low.
  • the BaO content of the glass is particularly preferably between 0 and 0.5% by weight.
  • the glass is most preferably free of BaO.
  • the glass may furthermore contain SrO. Its presence likewise has a positive effect on the devitrification stability.
  • the maximum SrO content is restricted to ⁇ 3% by weight to keep the density of the glass low.
  • the glass contains particularly preferably between 0 and 1% by weight and most preferably between 0 and 0.5% by weight.
  • the sum of the two heavy alkaline earth metal oxides SrO and BaO is preferably limited to a maximum of 4% by weight.
  • the glass may furthermore contain up to ⁇ 2% by weight of ZnO.
  • ZnO has an effect on the viscosity characteristic line which is similar to that of boric acid, has a network-loosening function and has less effect on the thermal expansion than the alkaline earth metal oxides.
  • the maximum ZnO level is preferably limited to 1.5% by weight, in particular when the glass is processed by the float method. Higher levels would increase the risk of unwanted ZnO coatings on the glass surface which may form by evaporation and subsequent condensation in the hot-shaping range.
  • the glass is alkali-free.
  • alkali-free as used herein means that it is essentially free from alkali metal oxides, although it can contain impurities of less than 1500 ppm.
  • the glass may contain up to 2% by weight of ZrO 2 +TiO 2 , where both the TiO 2 content and the ZrO 2 content can each be up to 2% by weight.
  • ZrO 2 advantageously increases the heat resistance of the glass. Owing to its low solubility, ZrO 2 does, however, increase the risk of ZrO 2 -containing melt relicts, so-called zirconium nests, in the glass. ZrO 2 is therefore preferably omitted.
  • Low ZrO 2 contents originating from the corrosion of zirconium-containing trough material are unproblematic.
  • TiO 2 advantageously reduces the solarization tendency, i.e. the reduction in transmission in the visible wavelength region because of UV-VIS radiation. At contents of greater than 2% by weight, colour casts can occur due to complex formation with Fe 3+ ions which are present in the glass at low levels as a result of impurities of the raw materials employed.
  • the glass may contain conventional refining agents in the usual amounts: it may thus contain up to 1.5% by weight of As 2 O 3 , Sb 2 O 3 , SnO 2 , CeO 2 , Cl ⁇ , F ⁇ and/or SO 4 2 ⁇ .
  • the sum of the refining agents should, however, not exceed 1.5% by weight. If the refining agents As 2 O 3 and Sb 2 O 3 are omitted, the glass can be processed not only using a variety of drawing methods, but also by the float method.
  • Glasses were produced in Pt/Ir crucibles at 1620° C. from conventional raw materials which were essentially alkali-free apart from unavoidable impurities.
  • the melt was refined at this temperature for one and a half hours, then transferred into inductively heated platinum crucibles and stirred at 1550° C. for 30 minutes for homogenization.
  • the melts were poured into preheated graphite moulds and cooled down to room temperature.
  • the table shows eight examples of glasses according to the invention (A 1 -A 8 ) and an example of a comparative glass (C) with their compositions (in % by weight, based on oxide) and their most important properties.
  • the following properties are given:
  • the glasses according to the invention have the following advantageous properties:
  • the glasses are thus highly suitable for use as substrate glass in display technology, in particular for TFT displays, and in thin-film photovoltaics, in particular on the basis of polycrystalline Si, and as substrate glass for hard disks.

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
US10/472,528 2001-03-24 2002-03-06 Aluminoborosilicate glass devoid of alkali and uses thereof Abandoned US20050101469A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/713,747 US7727916B2 (en) 2001-03-24 2007-03-05 Alkali-free aluminoborosilicate glass, and uses thereof

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10114581A DE10114581C2 (de) 2001-03-24 2001-03-24 Alkalifreies Aluminoborosilicatglas und Verwendungen
DE10114581.0 2001-03-24
PCT/EP2002/002432 WO2002076899A1 (fr) 2001-03-24 2002-03-06 Verre d'aluminoborosilicate exempt d'alcalis et ses utilisations

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/713,747 Continuation US7727916B2 (en) 2001-03-24 2007-03-05 Alkali-free aluminoborosilicate glass, and uses thereof

Publications (1)

Publication Number Publication Date
US20050101469A1 true US20050101469A1 (en) 2005-05-12

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US10/472,528 Abandoned US20050101469A1 (en) 2001-03-24 2002-03-06 Aluminoborosilicate glass devoid of alkali and uses thereof
US11/713,747 Expired - Lifetime US7727916B2 (en) 2001-03-24 2007-03-05 Alkali-free aluminoborosilicate glass, and uses thereof

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US11/713,747 Expired - Lifetime US7727916B2 (en) 2001-03-24 2007-03-05 Alkali-free aluminoborosilicate glass, and uses thereof

Country Status (9)

Country Link
US (2) US20050101469A1 (fr)
EP (1) EP1373155B1 (fr)
JP (1) JP4944354B2 (fr)
KR (1) KR100526747B1 (fr)
CN (1) CN1262503C (fr)
AT (1) ATE271528T1 (fr)
DE (2) DE10114581C2 (fr)
TW (1) TW567175B (fr)
WO (1) WO2002076899A1 (fr)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040242398A1 (en) * 2003-05-29 2004-12-02 Minolta Co., Ltd. Glass composition and glass substrate
US20070027019A1 (en) * 2003-12-26 2007-02-01 Asahi Glass Company, Limited Alkali - free glass and liquid crystal display panel
US20070232478A1 (en) * 2006-03-31 2007-10-04 Joerg Fechner Aluminoborosilicate glass
US20090275462A1 (en) * 2007-02-16 2009-11-05 Nippon Electric Glass Co.,Ltd. Glass substrate for solar cell
US20110053755A1 (en) * 2006-12-14 2011-03-03 Hong Li Low Dielectric Glass And Fiber Glass For Electronic Applications
US20120058878A1 (en) * 2006-12-14 2012-03-08 Hong Li Low Dielectric Glass And Fiber Glass
JP2014502951A (ja) * 2011-01-11 2014-02-06 エージーワイ ホールディング コーポレイション 低い熱膨張係数を有するガラス組成物、および該ガラス組成物から生成されるガラス繊維
US9056786B2 (en) 2006-12-14 2015-06-16 Ppg Industries Ohio, Inc. Low density and high strength fiber glass for ballistic applications
US9156728B2 (en) 2006-12-14 2015-10-13 Ppg Industries Ohio, Inc. Low density and high strength fiber glass for ballistic applications
US9394196B2 (en) 2006-12-14 2016-07-19 Ppg Industries Ohio, Inc. Low density and high strength fiber glass for reinforcement applications
US9540273B2 (en) 2012-04-27 2017-01-10 Asahi Glass Company, Limited Non-alkali glass and method for producing same
US10347782B2 (en) * 2011-08-04 2019-07-09 Corning Incorporated Photovoltaic module package
US10494293B2 (en) * 2015-11-26 2019-12-03 Schott Ag Thermally tempered glass element and use thereof
US11745459B2 (en) 2016-12-22 2023-09-05 Schott Ag Thin glass substrate, in particular a borosilicate glass thin glass substrate, method and apparatus for its production

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5013308B2 (ja) * 2005-06-27 2012-08-29 日本電気硝子株式会社 ディスプレイ用ガラス基板
US8007913B2 (en) * 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
DE102008005857A1 (de) 2008-01-17 2009-07-23 Schott Ag Alkalifreies Glas
US8975199B2 (en) * 2011-08-12 2015-03-10 Corsam Technologies Llc Fusion formable alkali-free intermediate thermal expansion coefficient glass
JP6149284B2 (ja) * 2010-10-06 2017-06-21 コーニング インコーポレイテッド 高熱および化学安定性を有する無アルカリガラス組成物
WO2012156991A2 (fr) * 2011-05-11 2012-11-22 Sterlite Technologies Ltd Composition de verre et substrat de verre pour dispositifs d'affichage
CN103717543B (zh) * 2011-09-02 2016-09-21 Lg化学株式会社 无碱玻璃及其制备方法
CN102584007B (zh) * 2011-12-20 2015-12-16 东旭集团有限公司 一种环保型tft-lcd基板玻璃的配方
WO2013180220A1 (fr) * 2012-05-31 2013-12-05 旭硝子株式会社 Substrat de verre sans alcali et procédé de réduction de l'épaisseur du substrat de verre sans alcali
JP6107823B2 (ja) * 2012-06-05 2017-04-05 旭硝子株式会社 無アルカリガラスおよびその製造方法
US11352287B2 (en) 2012-11-28 2022-06-07 Vitro Flat Glass Llc High strain point glass
JP2016153346A (ja) * 2013-06-27 2016-08-25 旭硝子株式会社 無アルカリガラス
JP2016155692A (ja) * 2013-06-27 2016-09-01 旭硝子株式会社 無アルカリガラス
FR3008695B1 (fr) 2013-07-16 2021-01-29 Corning Inc Verre aluminosilicate dont la composition est exempte de metaux alcalins, convenant comme substrat de plaques de cuisson pour chauffage a induction
CN103613273A (zh) * 2013-10-24 2014-03-05 芜湖东旭光电科技有限公司 一种无碱液晶基板玻璃
CN105502931B (zh) * 2015-12-30 2018-12-25 芜湖东旭光电装备技术有限公司 低温多晶硅薄膜晶体管用玻璃基板的组合物、玻璃基板及制备方法和应用
US20170362119A1 (en) * 2016-06-17 2017-12-21 Corning Incorporated Transparent, near infrared-shielding glass ceramic
WO2018025727A1 (fr) * 2016-08-05 2018-02-08 旭硝子株式会社 Substrat de verre sans alcali, substrat stratifié et procédé de production de substrat de verre
JP7265224B2 (ja) * 2017-07-26 2023-04-26 日本電気硝子株式会社 支持ガラス基板及びこれを用いた積層基板
US10246371B1 (en) 2017-12-13 2019-04-02 Corning Incorporated Articles including glass and/or glass-ceramics and methods of making the same
US10450220B2 (en) 2017-12-13 2019-10-22 Corning Incorporated Glass-ceramics and glasses
CN109231816A (zh) * 2018-10-09 2019-01-18 成都中光电科技有限公司 一种可用于ltps的玻璃基板及其制备方法
CN117735832A (zh) * 2019-02-07 2024-03-22 Agc株式会社 无碱玻璃
CN112441743A (zh) * 2020-11-26 2021-03-05 河南旭阳光电科技有限公司 一种无碱玻璃组合物、无碱玻璃及制备方法和应用

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5459109A (en) * 1994-09-19 1995-10-17 Corning Incorporated Substrate glasses for plasma displays
US5508237A (en) * 1994-03-14 1996-04-16 Corning Incorporated Flat panel display
US6060168A (en) * 1996-12-17 2000-05-09 Corning Incorporated Glasses for display panels and photovoltaic devices
US6329310B1 (en) * 1999-04-12 2001-12-11 Schott Glas Alkali-free aluminoborosilicate glass and uses thereof
US6417124B1 (en) * 1999-08-21 2002-07-09 Schott Glas Alkali-free aluminoborosilicate glass, and uses thereof
US6465381B1 (en) * 1999-07-23 2002-10-15 Schott Glas Alkali-free aluminoborosilicate glass, its use and process for its preparation
US6537937B1 (en) * 1999-08-03 2003-03-25 Asahi Glass Company, Limited Alkali-free glass
US6867158B2 (en) * 2000-01-12 2005-03-15 Schott Glas Flat panel liquid-crystal display such as for a laptop computer

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155464A (en) 1979-05-24 1980-12-03 Tokyo Shibaura Electric Co Halogennfilled incandescent lamp
JPH0617249B2 (ja) 1986-08-15 1994-03-09 松下電工株式会社 ガラスセラミツク焼結体
JPS6425132A (en) * 1987-07-22 1989-01-27 Hitachi Ltd Liquid crystal display device
JPS6428249U (fr) 1987-08-07 1989-02-20
JPS6459741A (en) * 1987-08-31 1989-03-07 Toshiba Corp X-ray image tube device
JPS6472237A (en) * 1987-09-14 1989-03-17 Hitachi Ltd Address calculation system
WO1989002877A1 (fr) * 1987-10-01 1989-04-06 Asahi Glass Company Ltd. Verre sans alcali
JPH01143350A (ja) * 1987-11-30 1989-06-05 Fujitsu Ltd 半導体記憶装置
JPH01149520A (ja) * 1987-12-04 1989-06-12 Hitachi Ltd 半導体集積回路装置
JP2871163B2 (ja) * 1991-04-26 1999-03-17 日本板硝子株式会社 無アルカリガラス
GB9204537D0 (en) * 1992-03-03 1992-04-15 Pilkington Plc Alkali-free glass compositions
US5374595A (en) * 1993-01-22 1994-12-20 Corning Incorporated High liquidus viscosity glasses for flat panel displays
JPH0891874A (ja) 1994-09-29 1996-04-09 Sumitomo Osaka Cement Co Ltd ガラス球状粉末及びその製造方法
EP0714862B1 (fr) * 1994-11-30 1999-03-31 Asahi Glass Company Ltd. Verre exempt de métaux alcalins et écran d'affichage plat
JPH08231240A (ja) 1995-02-28 1996-09-10 Nitto Boseki Co Ltd 高強度ガラス繊維用組成物
JP3666608B2 (ja) * 1995-04-27 2005-06-29 日本電気硝子株式会社 無アルカリガラス基板
JP3666610B2 (ja) * 1995-08-02 2005-06-29 日本電気硝子株式会社 無アルカリガラス基板
WO1997011919A1 (fr) * 1995-09-28 1997-04-03 Nippon Electric Glass Co., Ltd. Substrat de verre exempt d'alcalis
WO1997011920A1 (fr) * 1995-09-28 1997-04-03 Nippon Electric Glass Co., Ltd. Substrat de verre exempt d'alcalis
JP3858293B2 (ja) * 1995-12-11 2006-12-13 日本電気硝子株式会社 無アルカリガラス基板
DE19601922C2 (de) * 1996-01-13 2001-05-17 Schott Glas Zinn- und zirkonoxidhaltige, alkalifreie Erdalkali-Alumo-Borosilicatgläser und deren Verwendung
DE19603698C1 (de) * 1996-02-02 1997-08-28 Schott Glaswerke Alkalifreies Aluminoborosilicatglas und dessen Verwendung
DE19617344C1 (de) * 1996-04-30 1997-08-07 Schott Glaswerke Alkalifreies Aluminoborosilicatglas und seine Verwendung
JP3861271B2 (ja) * 1996-08-21 2006-12-20 日本電気硝子株式会社 無アルカリガラス及びその製造方法
JP3861272B2 (ja) * 1996-12-18 2006-12-20 日本電気硝子株式会社 無アルカリガラス及びその製造方法
JP3800443B2 (ja) * 1996-10-22 2006-07-26 日本電気硝子株式会社 ディスプレイ用無アルカリガラス基板及びその製造方法
JPH10139467A (ja) * 1996-11-12 1998-05-26 Asahi Glass Co Ltd 無アルカリガラス及びフラットディスプレイパネル
JP4739468B2 (ja) * 1997-05-20 2011-08-03 旭硝子株式会社 無アルカリガラスおよびその清澄方法
DE19739912C1 (de) * 1997-09-11 1998-12-10 Schott Glas Alkalifreies Aluminoborosilicatglas und dessen Verwendung
JPH11292563A (ja) * 1998-04-03 1999-10-26 Nippon Electric Glass Co Ltd 無アルカリガラス基板
JPH11322358A (ja) * 1998-05-20 1999-11-24 Nippon Sheet Glass Co Ltd 耐熱性ガラス組成物
US6468933B1 (en) * 1998-09-22 2002-10-22 Nippon Electric Glass Co., Ltd. Alkali-free glass and method of producing the same
JP4306044B2 (ja) * 1998-09-22 2009-07-29 日本電気硝子株式会社 無アルカリガラス及びその製造方法
JP4547093B2 (ja) * 1998-11-30 2010-09-22 コーニング インコーポレイテッド フラットパネルディスプレイ用ガラス
DE10085618B4 (de) 1999-06-29 2016-09-29 Hoya Corp. Glassubstrat und Glaszusammensetzung zur Verwendung in einem Flüssigkristallfeld
JP4265036B2 (ja) * 1999-07-14 2009-05-20 コニカミノルタオプト株式会社 結晶化ガラス組成物
JP4576680B2 (ja) 1999-08-03 2010-11-10 旭硝子株式会社 無アルカリガラス
JP2001151534A (ja) * 1999-11-25 2001-06-05 Nippon Electric Glass Co Ltd 液晶ディスプレイ用ガラス基板
DE10034985C1 (de) 2000-07-19 2001-09-06 Schott Glas Verfahren zur Herstellung von Aluminosilicatgläsern, Aluminosilicatgläser sowie deren Verwendungen
DE10064804C2 (de) * 2000-12-22 2003-03-20 Schott Glas Alkalifreie Aluminoborosilicatgläser und ihre Verwendung
DE10214449B4 (de) * 2002-03-30 2005-03-24 Schott Ag Verfahren zur Herstellung von alkalifreien Aluminosilicatgläsern

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5508237A (en) * 1994-03-14 1996-04-16 Corning Incorporated Flat panel display
US5459109A (en) * 1994-09-19 1995-10-17 Corning Incorporated Substrate glasses for plasma displays
US6060168A (en) * 1996-12-17 2000-05-09 Corning Incorporated Glasses for display panels and photovoltaic devices
US6329310B1 (en) * 1999-04-12 2001-12-11 Schott Glas Alkali-free aluminoborosilicate glass and uses thereof
US6465381B1 (en) * 1999-07-23 2002-10-15 Schott Glas Alkali-free aluminoborosilicate glass, its use and process for its preparation
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US20070232478A1 (en) * 2006-03-31 2007-10-04 Joerg Fechner Aluminoborosilicate glass
US9056786B2 (en) 2006-12-14 2015-06-16 Ppg Industries Ohio, Inc. Low density and high strength fiber glass for ballistic applications
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US20120058878A1 (en) * 2006-12-14 2012-03-08 Hong Li Low Dielectric Glass And Fiber Glass
US8697590B2 (en) 2006-12-14 2014-04-15 Ppg Industries Ohio, Inc. Low dielectric glass and fiber glass for electronic applications
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US9096462B2 (en) 2006-12-14 2015-08-04 Ppg Industries Ohio, Inc. Low dielectric glass and fiber glass
US9156728B2 (en) 2006-12-14 2015-10-13 Ppg Industries Ohio, Inc. Low density and high strength fiber glass for ballistic applications
US9394196B2 (en) 2006-12-14 2016-07-19 Ppg Industries Ohio, Inc. Low density and high strength fiber glass for reinforcement applications
US20110053755A1 (en) * 2006-12-14 2011-03-03 Hong Li Low Dielectric Glass And Fiber Glass For Electronic Applications
US8497220B2 (en) * 2007-02-16 2013-07-30 Nippon Electric Glass Co., Ltd. Glass substrate for solar cell
US20090275462A1 (en) * 2007-02-16 2009-11-05 Nippon Electric Glass Co.,Ltd. Glass substrate for solar cell
JP2014502951A (ja) * 2011-01-11 2014-02-06 エージーワイ ホールディング コーポレイション 低い熱膨張係数を有するガラス組成物、および該ガラス組成物から生成されるガラス繊維
US10347782B2 (en) * 2011-08-04 2019-07-09 Corning Incorporated Photovoltaic module package
US9540273B2 (en) 2012-04-27 2017-01-10 Asahi Glass Company, Limited Non-alkali glass and method for producing same
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CN1262503C (zh) 2006-07-05
US7727916B2 (en) 2010-06-01
DE10114581A1 (de) 2002-10-10
TW567175B (en) 2003-12-21
ATE271528T1 (de) 2004-08-15
JP2004531443A (ja) 2004-10-14
DE10114581C2 (de) 2003-03-27
CN1525945A (zh) 2004-09-01
DE50200669D1 (de) 2004-08-26
JP4944354B2 (ja) 2012-05-30
EP1373155A1 (fr) 2004-01-02
EP1373155B1 (fr) 2004-07-21
KR100526747B1 (ko) 2005-11-08
KR20030093253A (ko) 2003-12-06
WO2002076899A1 (fr) 2002-10-03

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