US20050039684A1 - Evaporation source for evaporating an organic electroluminescent layer - Google Patents

Evaporation source for evaporating an organic electroluminescent layer Download PDF

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Publication number
US20050039684A1
US20050039684A1 US10/909,353 US90935304A US2005039684A1 US 20050039684 A1 US20050039684 A1 US 20050039684A1 US 90935304 A US90935304 A US 90935304A US 2005039684 A1 US2005039684 A1 US 2005039684A1
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United States
Prior art keywords
cell
aperture
evaporation source
cover
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/909,353
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English (en)
Inventor
Kyung-Soo Yi
Chul-Young Jang
Sung-Jae Jung
Yoon-Heung Tak
Sung-tae Kim
Gol-Hee Lee
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LG Electronics Inc
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LG Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020030053761A external-priority patent/KR100656820B1/ko
Priority claimed from KR1020030056606A external-priority patent/KR100656845B1/ko
Priority claimed from KR1020030061351A external-priority patent/KR100662624B1/ko
Priority claimed from KR1020030061352A external-priority patent/KR100656535B1/ko
Application filed by LG Electronics Inc filed Critical LG Electronics Inc
Assigned to LG ELECTRONICS INC. reassignment LG ELECTRONICS INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: JANG, CHUL-YOUNG, JUNG, SUNG-JAE, KIM, SUNG-TAE, LEE, GOL-HEE, TAK, YOON-HEUNG, YI, KYUNG-SOO
Publication of US20050039684A1 publication Critical patent/US20050039684A1/en
Priority to US11/514,260 priority Critical patent/US8562741B2/en
Priority to US11/514,266 priority patent/US7641737B2/en
Priority to US11/514,261 priority patent/US7359630B2/en
Assigned to LG DISPLAY CO., LTD. reassignment LG DISPLAY CO., LTD. COMPANY TO COMPANY Assignors: LG ELECTRONICS INC.
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Definitions

  • the present invention relates to an evaporation source for evaporating an organic electroluminescent layer.
  • the present invention relates to the evaporation source preventing an aperture, through which a vaporized evaporation material is emitted, from being clogged by restricting heat transfer to outward.
  • Thermal, physical vacuum evaporation is a technique for forming an organic electroluminescent layer on a substrate by emitting a vaporized evaporation material (organic material).
  • a vaporized evaporation material organic material
  • an evaporation material retained in a vessel is heated to evaporation temperature, and after emitted from the vessel, the vaporized evaporation material is coated on the substrate.
  • This process is carried out in a chamber whose pressure is maintained between 10 ⁇ 7 and 10 ⁇ 2 Torr, wherein the vessel retaining the evaporation material and the substrate is installed in the chamber.
  • the evaporation source which is the vessel retaining the evaporation material, is made of an electrical resistance material, wherein the temperature of the electrical resistance material increases when the electric current flows through the walls of the evaporation source.
  • the electric current is applied to the evaporation source, the evaporation material retained therein is heated by radiation heat and conduction heat transferred from the walls of the evaporation source.
  • An aperture for emitting the vaporized evaporation material to outward is formed on the upper surface of the evaporation source.
  • FIG. 1 is a sectional view showing the inner configuration of the vacuum evaporation apparatus equipped with a conventional evaporation source.
  • the evaporation source 1 is installed in the chamber 3 of the evaporation apparatus, and the substrate 2 is placed above the evaporation source 1 .
  • the substrate 2 on which the organic electroluminescent layer is evaporated is mounted on an upper plate 3 - 1 of the chamber 3 , wherein the substrate 2 can be fixed or installed to move widthwise.
  • a general configuration of the vacuum evaporation apparatus is to mount the substrate 2 on the upper plate 3 - 1 to move horizontally, and thus the explanation about this configuration is omitted.
  • the evaporation source 1 is installed on an insulated structure 4 fixed to a base 3 - 2 of the chamber 3 , and connected to a cable for supplying electric power.
  • the evaporation source 1 is capable of moving horizontally widthwise as well as being fixed to the insulated structure 4 .
  • Another general configuration of the vacuum evaporation apparatus is to install the evaporation source 1 on the insulated structure 4 to move horizontally, and thus the explanation about this configuration is also omitted.
  • the aperture 1 A- 1 formed on the upper surface of the evaporation source 1 is shown in FIG. 1 , wherein the evaporation material vaporized in the evaporation source 1 is emitted through the aperture 1 A- 1 to outward in the direction of the substrate 2 .
  • the evaporation sources are classified into point evaporation source and linear evaporation source depending on the shape of evaporation source and aperture.
  • the entire shape of the point evaporation source is cylindrical, and the shape of its aperture is circular.
  • the entire shape of the linear evaporation source is hexahedral, and the shape of its aperture is rectangular.
  • evaporation source The selection of evaporation source is determined by considering the conditions of evaporation process and substrate, and the shape of evaporation layer to be formed. For convenience's sake, the point evaporation source will be explained below.
  • FIG. 2 is a sectional view showing a conventional point evaporation source.
  • the point evaporation source 1 comprises a cell 1 C, a base 1 D and a cell cap 1 A.
  • the evaporation material which is an organic material, is retained in the inner space formed by the cell 1 C, the base 1 D and the cell cap 1 A.
  • a heating means 1 B- 1 for example, an electric resistance coil connected to electric power, is placed between the cell 1 C and an external wall 1 B to heat the evaporation material M retained in the inner space.
  • the heating means 1 B- 1 is installed for the cell 1 C of the entire height to heat the entire evaporation material M.
  • a cell cap aperture 1 A- 1 is formed in the center of the cell cap 1 A, wherein the vaporized evaporation material M heated by the heating means 1 B- 1 is emitted through the cell cap aperture 1 A- 1 to outward, that is, to the direction of the substrate 2 .
  • the temperature around the cell cap aperture 1 A- 1 is lower than the temperature of the inner space in which the vaporized evaporation material is generated because the cell cap 1 A has no additional heating means installed thereon, and is exposed to the outside. Therefore, a part of the vaporized evaporation material emitted through the cell cap aperture 1 A- 1 is deposited around the cell cap aperture 1 A- 1 due to lower temperature thereabout.
  • a cover 1 E made of metallic material, is mounted on the upper end of the external wall 1 B as shown in FIG. 2 , wherein the shape of the cover 1 E is of a circular plate.
  • the cover 1 E mounted on the upper end of the external wall 1 B is placed on the cell cap 1 A, and maintains a predetermined space from the cell cap 1 A.
  • a cover aperture 1 E- 1 for emitting the vaporized evaporation material is formed on the cover 1 E to correspond to the cell cap aperture 1 A- 1 . Therefore, the cell cap 1 A may maintain a predetermined temperature because the cover 1 E prevents the heat transferred from the cell cap 1 A from being emitted to outward.
  • the heat transferred from the cell cap 1 A is emitted to outward because the cover 1 E is metallic. Therefore, the cell cap 1 A cannot maintain a predetermined temperature, and so the deposition of the vaporized evaporation material around the cell cap aperture 1 A- 1 cannot be completely prevented.
  • the object of the present invention is to provide an evaporation source for preventing a vaporized evaporation material from being deposited around an aperture formed on a cell cap by inhibiting heat transferred to the cell cap having the aperture from heating means from being emitted to outward, and thus enabling the cell cap to maintain a predetermined temperature.
  • the evaporation source includes a cell retaining an evaporation material therein; a cell cap installed on the upper part of the cell, and having a cell cap aperture for emitting a vaporized evaporation material; an external wall placed in the outside of the cell to support a heating means set up at the outside of the cell; a cover placed above the cell cap, fixed to the upper end of the external wall, and having a cover aperture corresponding to the cell cap aperture; and a shut-off plate placed between the cover and the cell cap and having a shut-off plate aperture corresponding to the cell cap aperture and the cover aperture in the center of the shut-off plate.
  • the evaporation source includes a cell retaining an evaporation material therein; a cell cap installed on the upper part of the cell, and having a cell cap aperture for emitting a vaporized evaporation material; an external wall placed in the outside of the cell to support a heating means set up at the outside of the cell; a cover placed on the cell cap, fixed to the upper end of the external wall, and having a cover aperture corresponding to the cell cap aperture; and an upper reflector and a lower reflector having an upper aperture and a lower aperture corresponding to the cover aperture in the center thereof respectively and placed above the cover to prevent heat from being emitted to the outside of the cover, wherein the upper reflector is placed above the lower reflector.
  • the evaporation source includes a cell retaining an evaporation material therein; a cell cap installed on the upper part of the cell and having a cell cap aperture for emitting a vaporized evaporation material; an external wall placed in the outside of the cell to support a heating means set up at the outside of the cell; and a reflector comprising a body placed above the cell cap, a metal layer placed on the lower surface of the body and a supporting member mounted on the body to contact the surface of the cell cap, wherein the body, made of a low conductivity material, has an reflector aperture corresponding to the cell cap aperture in the center thereof, and the metal layer has a low emissivity value.
  • the evaporation source includes a cell retaining an evaporation material therein; a cell cap installed on the upper part of the cell and having a cell cap aperture for emitting a vaporized evaporation material; an external wall placed in the outside of the cell to support a heating means set up at the outside of the cell; and a cover contacting the upper surface of the cell cap, fixed to the upper end of the external wall, and having a cover aperture corresponding to the cell cap aperture.
  • the vaporized evaporation material is not deposited around the cell cap aperture because the temperature of the cell cap remains at a predetermined temperature while the vaporized evaporation material is emitted to outward, and the evaporation layer is formed on the substrate.
  • FIG. 1 is a sectional view showing the inner configuration of the vacuum evaporation apparatus equipped with a conventional evaporation source.
  • FIG. 2 is a sectional view showing a conventional point evaporation source.
  • FIG. 3 is a sectional view showing the point evaporation source according to the first embodiment of the present invention.
  • FIG. 4 is a sectional view showing the point evaporation source according to the second embodiment of the present invention.
  • FIG. 5 is a bottom view showing the upper reflector of the point evaporation source according to the second embodiment of the present invention.
  • FIG. 6 is a detailed view showing part “A” of FIG. 4 .
  • FIG. 7 is a sectional view showing the point evaporation source according to the third embodiment of the present invention.
  • FIG. 8 is a detailed view showing part “B” of FIG. 7 .
  • FIG. 9 is a sectional view showing the point evaporation source according to the fourth embodiment of the present invention.
  • FIG. 10 is a detailed view showing part “C” of FIG. 9 .
  • FIG. 11 is a sectional view showing another point evaporation source according to the fourth embodiment of the present invention.
  • FIG. 12 is a detailed view showing part “D” of FIG. 11 .
  • FIG. 3 is a sectional view showing the point evaporation source according to the first embodiment of the present invention.
  • the point evaporation source 10 according to the first embodiment of the present invention comprises a cell 11 which is cylindrical, a cell cap 12 on which a cell cap aperture 12 A for emitting the vaporized evaporation material is formed, an external wall 13 which is cylindrical, and base 14 .
  • a heating means 13 A is placed between the cell 11 and the external wall 13 .
  • a cover 15 fixed to the upper end of the external wall 13 is placed on the cell cap 12 with maintaining a predetermined distance from the cell cap, wherein the shape of the cover 15 is of a circular plate.
  • a cover aperture 15 A formed on the cover 15 corresponds to the cell cap aperture 12 A.
  • a shut-off plate 16 is placed between the cover 15 and the cell cap 12 , and is level with the cover 15 and the cell cap 12 , wherein the outer circumferential surface of the shut-off plate 16 is fixed to the inner circumferential surface of the cover 15 .
  • the shut-off plate 16 may be placed between the cover 15 and the cell cap 12 by fixing each end of a plurality of supporting rods (not shown) to the upper surface of the shut-off plate 16 and the lower surface of the cover 15 together.
  • the shut-off plate 16 has a shut-off plate aperture corresponding to the cell cap aperture 12 A and the cover aperture 15 A in the center of the shut-off plate 16 . Therefore, the vaporized evaporation material emitted from the cell cap aperture 12 A is emitted through the shut-off plate aperture and the cover aperture 15 A to outward in the direction of the substrate.
  • the evaporation source In the evaporation source according to the first embodiment of the present invention, heat is transferred from the inner space of the cell 11 , in which the vaporized evaporation material is generated, to the cell cap 12 , and then the heat transferred from the cell cap 12 to the cover 15 is shut off by the shut-off plate 16 placed above the cell cap 12 . Therefore, the temperature between the cell cap 12 and the shut-off plate 16 remains higher than the temperature between the shut-off plate 16 and the cover 15 .
  • the temperatures of the cell cap 12 and the cell cap aperture 12 A remains in a predetermined temperature, and thus the deposition of the vaporized evaporation material around the cell cap aperture 12 A is prevented because the temperature of the cell cap aperture 12 A is not decreased.
  • shut-off plate 16 is desirable for the shut-off plate 16 to be made of low conductivity material, for example, SUS material or tantalum.
  • the above constitution for the point evaporation source according to the first embodiment of the present invention is applicable to the linear evaporation source.
  • the evaporation source according to the first embodiment of the present invention can properly maintain the temperature around the cell cap aperture through shutting off the transfer of heat from the cell cap to outward, and transferring heat to the cell cap, by placing the shut-off plate, which is made of low conductivity material, between the cell cap and the cover. Therefore, such problem that the vaporized evaporation material emitted through the cell cap aperture to outward is deposited around the cell cap aperture due to the decreased temperature is efficiently prevented.
  • FIG. 4 is a sectional view showing the point evaporation source according to the second embodiment of the present invention.
  • the point evaporation source 20 according to the first embodiment of the present invention comprises a cell 21 which is cylindrical, a cell cap 22 on which a cell cap aperture 22 A for emitting the vaporized evaporation material M is formed, an external wall 23 which is cylindrical, and base 24 .
  • a heating means 23 A is placed between the cell 21 and the external wall 23 .
  • the cover 25 of a circular plate shape fixed to the upper end of the external wall 23 is mounted on the cell cap 22 to contact the surface thereof.
  • a lower reflector 26 and an upper reflector 27 are placed above the cover 25 in sequence.
  • the lower reflector 26 contacts the upper surface of the cover 25
  • the upper reflector 27 is placed above the lower reflector 26 with maintaining a predetermined distance.
  • FIG. 5 is a bottom view showing the upper reflector of the point evaporation source according to the second embodiment of the present invention.
  • FIG. 6 is a detailed view showing part “A” of FIG. 4 .
  • FIG. 5 and FIG. 6 show the correlation between the lower reflector 26 and the upper reflector 27 .
  • the lower reflector 26 and the upper reflector 27 which are of circular plate shapes, have a lower aperture and an upper aperture corresponding to the cover aperture 25 A and the cell cap aperture 22 A, respectively, in their centers. Therefore, the lower reflector 26 and the upper reflector 27 have no effect to the function to emit the vaporized evaporation material.
  • a plurality of projections 27 B are formed on the lower surface of the upper reflector 27 , wherein each projection 27 B is pointed at the end. Also, a plurality of recesses 26 B are formed on the upper surface of the lower reflector 26 , wherein each recess 26 B corresponds to each projection 27 B. Each projection 27 B of the upper reflector 27 is retained in each recess 26 B of the lower reflector 26 contacting at a point.
  • Each recess 26 B formed on the upper surface of the lower reflector 26 has an elliptical shape in which a long principal axis is circumferentially oriented and a short principal axis is radially oriented.
  • a plurality of the evaporation sources are circularly arranged in the vacuum evaporation apparatus, and emit the vaporized evaporation material with moving along a circular course. Under this condition, to compensate the relative motion of the upper reflector 27 to the lower reflector 26 , which moves circularly with the cover 25 , that is, to prevent the projection 27 B contacting the recess 26 B at a point from being separated from the recess 26 B, each recess 26 B is elliptically made.
  • the cell cap 22 remains at a predetermined temperature by the lower reflector 26 with preventing the heat transferred from the inner space of the evaporation source to the cell cap 22 and the cover 25 from being emitted to outward.
  • the heat transferred to the lower reflector 26 is not transferred to the upper reflector 27 because the upper reflector 27 maintains a predetermined distance from the lower reflector 26 by the projections 27 B.
  • the amount of the heat transferred to the upper reflector 27 through the projections 27 B is extremely little because the projection 27 B contacts the recess 26 B at a point.
  • pairs of the recess 26 B and the projections 27 B are at least more than three so that the upper reflector 27 is balanced on the lower reflector 26 .
  • the evaporation source according to the second embodiment of the present invention can prevent the phenomenon that the vaporized evaporation material is deposited around the cell cap aperture, by minimizing the heat emission to outward of the evaporation source by the lower reflector and the upper reflector, and by making the cell cap and the cover placed below the lower reflector and the upper reflector maintain a predetermined temperature at any time.
  • FIG. 7 is a sectional view showing the point evaporation source according to the third embodiment of the present invention.
  • FIG. 8 is a detailed view showing part “B” of FIG. 7 .
  • the point evaporation source 30 according to the third embodiment of the present invention comprises a cell 31 which is cylindrical, a cell cap 32 on which a cell cap aperture 32 A for emitting the vaporized evaporation material is formed, an external wall 33 which is cylindrical, and base 34 .
  • a heating means 33 A is placed between the cell 31 and the external wall 33 .
  • a reflector 35 fixed to the upper end of the inner circumferential surface of the external wall 33 is mounted on the cell cap 32 , and level with the cell cap 32 .
  • the reflector 35 has a reflector aperture 35 A corresponding to the cell cap aperture 32 A in the center of the reflector 35 .
  • the reflector 35 comprises a body 35 B, a metal layer 35 D placed on the lower surface of the body 35 B, and a supporting member 35 C mounted on the body 35 B to contact the surface of the cell cap 32 , wherein the body 35 B is made of low conductivity metal or ceramic material.
  • the body 35 B with low conductivity prevents the heat transfer from the cell cap 32 to outward. Also, the metal layer 35 D with low emissivity value is formed on the lower surface of the body 35 B to transfer the heat to the cell cap 32 again. Therefore, the cell cap 32 maintains a predetermined temperature.
  • the supporting member 35 C is made of low conductivity metal or ceramic material.
  • the supporting member 35 C and the body 35 B can be integrally formed. However, in case of ceramic material, it is desirable for the supporting member 35 C and the body 35 B to be made separately because it is difficult to form the supporting member 35 C and the body 35 B integrally, wherein a bolt type or a close fit type is desirable.
  • the supporting member 35 C is at least more than four so that the supporting member 35 C supports the body 35 B because the supporting member 35 C contacts the cell cap 32 at a point. Also, it is desirable for the supporting member 35 C to be a pin type in order to minimize the contact area with the cell cap 32 , but not limited thereto.
  • the body 35 B and the supporting member 35 C prefferably be made of ceramic material, for example ZrO 2 , Al 2 O 3 , TiO 2 , and/or metal with low conductivity, for example Mn or Ti.
  • the metal layer 35 D it is desirable for the metal layer 35 D to be made of Au, Ag, or Al.
  • the metal layer 35 D can be formed on the lower surface of the body 35 B by the thermal spray method, ECM (Electro Chemical Metalizing) method, or the electro plating method, wherein the thermal spray method comprises the flame spray method, the plasma spray method, or HVOF (High Velocity Oxigen-Fuel).
  • ECM Electro Chemical Metalizing
  • HVOF High Velocity Oxigen-Fuel
  • the evaporation source according to the third embodiment of the present invention can maintain the temperature of the cell cap aperture at a predetermined level by the reflector made of the different materials, preventing the heat from being emitted to outward. Therefore, the problem that the vaporized evaporation material emitted through the cell cap aperture to outward is deposited around the cell cap aperture due to the decreased temperature can be efficiently resolved.
  • FIG. 9 is a sectional view showing the point evaporation source according to the fourth embodiment of the present invention.
  • the point evaporation source 40 according to the fourth embodiment of the present invention comprises a cell 41 which is cylindrical, a cell cap 42 on which a cell cap aperture 42 A for emitting the vaporized evaporation material is formed, an external wall 43 which is cylindrical, and base 44 .
  • a heating means 43 A is placed between the cell 41 and the external wall 43 , and the cell cap 42 is mounted on the upper end of the cell 41 .
  • a cover 45 fixed to the upper end of the external wall 43 is mounted on the cell cap 42 contacting the upper surface thereof to smoothly transfer the heat to the cell cap 42 .
  • the cover 45 has a cover aperture 45 A corresponding to the cell cap aperture 42 A.
  • the heat generated from the heating means 43 A is transferred to the cover 45 .
  • the heat transferred to the cover 45 is transferred to the cell cap 42 contacting the cover 45 . Therefore, the temperature of the cell cap aperture 42 A, which is formed in the center of the cell cap 42 , is not decreased due to the heat transferred from the cover 45 .
  • cover aperture 45 A and the cell cap aperture 42 A prefferably have the same size.
  • the heat generated by the heating means 43 A is transferred to the cell cap aperture 42 A through the cover 45 as well as the cell cap 42 , thereby more efficiently maintaining the temperature of the cell cap aperture 42 A at a predetermined level.
  • FIG. 10 is a detailed view showing part “C” of FIG. 9 .
  • the thickness of the cover 45 it is desirable for the thickness of the cover 45 to be decreased in the direction of the cover aperture 45 A to prevent the vaporized evaporation material from being deposited on the cover 45 during the evaporation process. Therefore, the inner circumferential surface of the cover aperture 45 A is sharply edged.
  • FIG. 11 is a sectional view showing another point evaporation source according to the fourth embodiment of the present invention.
  • a shut-off layer 46 is formed on the upper surface of the cover 45 fixed to the upper end of the external wall 43 , wherein the shut-off layer 46 is made of low conductivity material.
  • the shut-off layer 46 has a shut-off layer aperture 46 A for emitting the vaporized evaporation material at a corresponding position to the cover aperture 45 A.
  • the heat generated from the heating means 43 A is transferred to the cover 45 made of metallic material.
  • the heat transferred to the cover 45 is transferred to the cell cap 42 contacting the cover 45 .
  • the shut-off layer 46 formed on the upper surface of the cover 45 prevents the heat from being emitted from the cover 45 to outward. Therefore, most of the heat is transferred to the cell cap 42 .
  • the shut-off layer 46 is made of low conductive material, for example ceramic material or metal material, wherein the ceramic material could be Al 2 O 3 , TiO 2 , SiC, or ZrO 2 , and the metal material could be Mn or Ti. It is desirable for the shut-off layer 46 to be formed on the cover 45 by the electro plating method.
  • FIG. 12 is a detailed view showing part “D” of FIG. 11 .
  • the shut-off layer aperture 46 A is smaller than the cover aperture 45 A, the vaporized evaporation material emitted through the cell cap aperture 42 A to outward is deposited on the shut-off layer aperture 46 A. Therefore, the shut-off layer aperture 46 A is larger than the cover aperture 45 A so that the vaporized evaporation material is not deposited on the shut-off layer aperture 46 A.
  • shut-off layer aperture 46 A and the cover aperture 45 A have the same size, it is desirable for the thickness of the shut-off layer 46 to be decreased in the direction of the shut-off layer aperture 46 A to prevent the vaporized evaporation material from being deposited on the shut-off layer 46 during the evaporation process. Therefore, the inner circumferential surface of the shut-off layer aperture 46 A is sharply edged.
  • the evaporation source according to the fourth embodiment of the present invention can maintain the cell cap aperture at a predetermined temperature by placing the cover to contact the cell cap, thereby transferring the heat generated in the heating means to the cell cap aperture through the cover. Also, the shut-off layer formed on the upper surface of the cover prevents the heat from being emitted to outward. Therefore, the problem that the vaporized evaporation material emitted through the cell cap aperture to outward is deposited around the cell cap aperture due to the decreased temperature can be efficiently resolved.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
US10/909,353 2003-08-04 2004-08-03 Evaporation source for evaporating an organic electroluminescent layer Abandoned US20050039684A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US11/514,260 US8562741B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic electroluminescent layer
US11/514,266 US7641737B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic
US11/514,261 US7359630B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic electroluminescent layer

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
KR2003-53761 2003-08-04
KR1020030053761A KR100656820B1 (ko) 2003-08-04 2003-08-04 유기 전계 발광층 증착용 증착원
KR1020030056606A KR100656845B1 (ko) 2003-08-14 2003-08-14 유기 전계 발광층 증착용 증착원
KR2003-56606 2003-08-14
KR1020030061351A KR100662624B1 (ko) 2003-09-03 2003-09-03 낮은 열전달율을 갖는 리플렉터 및 이를 포함하는 유기전계 발광층 증착용 증착원
KR1020030061352A KR100656535B1 (ko) 2003-09-03 2003-09-03 열 차단층을 포함하는 유기 전계 발광층 증착용 증착원
KR2003-61352 2003-09-03
KR2003-61351 2003-09-03

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US11/514,261 Division US7359630B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic electroluminescent layer
US11/514,260 Division US8562741B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic electroluminescent layer
US11/514,266 Division US7641737B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic

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US11/514,266 Active US7641737B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic
US11/514,260 Active 2028-06-13 US8562741B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic electroluminescent layer
US11/514,261 Active US7359630B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic electroluminescent layer

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US11/514,261 Active US7359630B2 (en) 2003-08-04 2006-09-01 Evaporation source for evaporating an organic electroluminescent layer

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CN1590581A (zh) 2005-03-09
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