KR20050016847A - 유기 전계 발광층 증착용 증착원 - Google Patents
유기 전계 발광층 증착용 증착원Info
- Publication number
- KR20050016847A KR20050016847A KR1020030053761A KR20030053761A KR20050016847A KR 20050016847 A KR20050016847 A KR 20050016847A KR 1020030053761 A KR1020030053761 A KR 1020030053761A KR 20030053761 A KR20030053761 A KR 20030053761A KR 20050016847 A KR20050016847 A KR 20050016847A
- Authority
- KR
- South Korea
- Prior art keywords
- upper member
- cover
- vapor
- deposition
- heat
- Prior art date
Links
- 238000000151 deposition Methods 0.000 title abstract description 47
- 230000008021 deposition Effects 0.000 claims abstract description 52
- 239000000463 material Substances 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000007599 discharging Methods 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 230000004888 barrier function Effects 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 description 9
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 238000005137 deposition process Methods 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 239000011364 vaporized material Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (4)
- 인가된 전원에 의하여 가열되어 그 내부에 수용된 증착 재료로 열을 전달, 가열하며, 발생된 재료 증기를 외부로 배출시켜 기판 표면에 증착 재료층을 형성하는 증착원에 있어서,가열 수단이 장착되어 증착 재료로 열을 공급하는 측벽 부재;바닥 부재;재료 증기 배출용 개구가 형성된 상부 부재;측벽 부재 상단에 고정된 상태로 상기 상부 부재 상에 위치하며, 상부 부재에 형성된 증기 배출용 개구 대응하는 개구가 형성된 커버; 및상기 커버와 상부 부재 사이에 형성된 공간에 위치하며, 중앙부에는 커버 및 상부 부재에 각각 형성된 증기 배출용 개구와 대응하는 개구가 형성되어 있는 열 차단판을 포함하는 증착원.
- 제 1 항에 있어서, 상기 열 차단판은 그 일단이 상기 측벽 부재 상단부 내주면에 고정되어 있는 증착원.
- 제 1 항 또는 제 2 항에 있어서, 열 차단판은 열 전도율이 낮은 물질로 이루어진 증착원.
- 제 3 항에 있어서, 상기 열 차단판은 SUS 계열의 재료 또는 탄탈륨으로 이루어진 증착원.
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030053761A KR100656820B1 (ko) | 2003-08-04 | 2003-08-04 | 유기 전계 발광층 증착용 증착원 |
EP11160616.6A EP2369035B9 (en) | 2003-08-04 | 2004-07-30 | Evaporation source |
EP11160651A EP2381011B1 (en) | 2003-08-04 | 2004-07-30 | Evaporation source for evaporating an organic electroluminescent layer |
EP04018108.3A EP1505167B1 (en) | 2003-08-04 | 2004-07-30 | Evaporation source |
US10/909,353 US20050039684A1 (en) | 2003-08-04 | 2004-08-03 | Evaporation source for evaporating an organic electroluminescent layer |
CNB2004100560137A CN100340695C (zh) | 2003-08-04 | 2004-08-04 | 用于蒸发有机电发光层的蒸发源 |
JP2004228309A JP4383982B2 (ja) | 2003-08-04 | 2004-08-04 | 有機電界発光層の蒸着源 |
US11/514,261 US7359630B2 (en) | 2003-08-04 | 2006-09-01 | Evaporation source for evaporating an organic electroluminescent layer |
US11/514,260 US8562741B2 (en) | 2003-08-04 | 2006-09-01 | Evaporation source for evaporating an organic electroluminescent layer |
US11/514,266 US7641737B2 (en) | 2003-08-04 | 2006-09-01 | Evaporation source for evaporating an organic |
JP2008139740A JP4988650B2 (ja) | 2003-08-04 | 2008-05-28 | 有機電界発光層の蒸着源 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030053761A KR100656820B1 (ko) | 2003-08-04 | 2003-08-04 | 유기 전계 발광층 증착용 증착원 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050016847A true KR20050016847A (ko) | 2005-02-21 |
KR100656820B1 KR100656820B1 (ko) | 2006-12-13 |
Family
ID=37226786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030053761A KR100656820B1 (ko) | 2003-08-04 | 2003-08-04 | 유기 전계 발광층 증착용 증착원 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100656820B1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070066232A (ko) * | 2005-12-21 | 2007-06-27 | 삼성에스디아이 주식회사 | 증착장치 |
KR20160055302A (ko) * | 2014-11-07 | 2016-05-18 | 엘지디스플레이 주식회사 | 금속 증착용 도가니 |
KR20170056368A (ko) * | 2015-11-13 | 2017-05-23 | 주식회사 선익시스템 | 클로깅 현상을 방지하기 위한 증발원 |
KR20170056371A (ko) * | 2015-11-13 | 2017-05-23 | 주식회사 선익시스템 | 클로깅 현상을 방지하기 위한 증발원 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5492120B2 (ja) * | 2011-03-08 | 2014-05-14 | 株式会社日立ハイテクノロジーズ | 蒸発源および蒸着装置 |
-
2003
- 2003-08-04 KR KR1020030053761A patent/KR100656820B1/ko active IP Right Grant
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070066232A (ko) * | 2005-12-21 | 2007-06-27 | 삼성에스디아이 주식회사 | 증착장치 |
KR20160055302A (ko) * | 2014-11-07 | 2016-05-18 | 엘지디스플레이 주식회사 | 금속 증착용 도가니 |
KR20170056368A (ko) * | 2015-11-13 | 2017-05-23 | 주식회사 선익시스템 | 클로깅 현상을 방지하기 위한 증발원 |
KR20170056371A (ko) * | 2015-11-13 | 2017-05-23 | 주식회사 선익시스템 | 클로깅 현상을 방지하기 위한 증발원 |
Also Published As
Publication number | Publication date |
---|---|
KR100656820B1 (ko) | 2006-12-13 |
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