UA112300C2 - Поділ модульного пристрою для нанесення покриття - Google Patents
Поділ модульного пристрою для нанесення покриттяInfo
- Publication number
- UA112300C2 UA112300C2 UAA201306278A UAA201306278A UA112300C2 UA 112300 C2 UA112300 C2 UA 112300C2 UA A201306278 A UAA201306278 A UA A201306278A UA A201306278 A UAA201306278 A UA A201306278A UA 112300 C2 UA112300 C2 UA 112300C2
- Authority
- UA
- Ukraine
- Prior art keywords
- coating device
- glass substrate
- deposition
- modular coating
- division
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Даний винахід стосується способу осадження під вакуумом багатошарової покриваючої стопи шарів на плоску скляну підкладку та модульного пристрою для нанесення покриття для осадження тонких шарів на плоску скляну підкладку. Зона поділу газів, розташована між двома зонами осадження модульного пристрою для нанесення покриття, містить принаймні один інжектор газу в області шляху переміщення скляної підкладки, що проходить через отвори від зони осадження в напрямку іншої зони осадження через розділову зону. Цей винахід забезпечує поліпшення коефіцієнта поділу між двома зонами осадження.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10188560 | 2010-10-22 | ||
PCT/EP2011/068176 WO2012052428A1 (en) | 2010-10-22 | 2011-10-18 | Modular coater separation |
Publications (1)
Publication Number | Publication Date |
---|---|
UA112300C2 true UA112300C2 (uk) | 2016-08-25 |
Family
ID=43664901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAA201306278A UA112300C2 (uk) | 2010-10-22 | 2011-10-18 | Поділ модульного пристрою для нанесення покриття |
Country Status (14)
Country | Link |
---|---|
US (1) | US9938617B2 (uk) |
EP (1) | EP2630271B1 (uk) |
JP (1) | JP5984820B2 (uk) |
KR (1) | KR101926884B1 (uk) |
CN (1) | CN103237919B (uk) |
BR (1) | BR112013009629B1 (uk) |
EA (1) | EA025781B1 (uk) |
ES (1) | ES2872339T3 (uk) |
MX (2) | MX360285B (uk) |
MY (1) | MY164208A (uk) |
PL (1) | PL2630271T3 (uk) |
UA (1) | UA112300C2 (uk) |
WO (1) | WO2012052428A1 (uk) |
ZA (1) | ZA201303646B (uk) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2013739B1 (en) * | 2014-11-04 | 2016-10-04 | Asm Int Nv | Atomic layer deposition apparatus and method for processing substrates using an apparatus. |
WO2016075189A1 (de) * | 2014-11-14 | 2016-05-19 | Von Ardenne Gmbh | Kammerdeckel zum abdichten einer kammeröffnung in einer gasseparationskammer und gasseparationskammer |
DE102014116700B4 (de) * | 2014-11-14 | 2016-09-22 | Von Ardenne Gmbh | Kammerdeckel und Vakuumkammeranordnung |
FR3034434B1 (fr) | 2015-03-31 | 2021-10-22 | Coating Plasma Ind | Installation pour le traitement d'objets par plasma, et procede de mise en oeuvre de cette installation |
JP6800236B2 (ja) * | 2016-02-19 | 2020-12-16 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 真空チャンバ内のガス分離通路のガス分離品質を検査する方法、および真空処理装置 |
CN207483840U (zh) * | 2017-11-21 | 2018-06-12 | 北京铂阳顶荣光伏科技有限公司 | 板材镀膜设备 |
CN109206020B (zh) * | 2018-10-19 | 2021-07-27 | 布勒莱宝光学设备(北京)有限公司 | 红外截止膜及其生产方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IN161171B (uk) | 1982-09-16 | 1987-10-10 | Energy Conversion Devices Inc | |
JPS62202078A (ja) | 1986-03-03 | 1987-09-05 | Seiko Epson Corp | スパツタ装置 |
US5324360A (en) * | 1991-05-21 | 1994-06-28 | Canon Kabushiki Kaisha | Method for producing non-monocrystalline semiconductor device and apparatus therefor |
DE4303462C2 (de) * | 1992-03-30 | 1994-03-31 | Leybold Ag | Mehrkammerbeschichtungsanlage |
DE4313284A1 (de) | 1993-04-23 | 1994-10-27 | Leybold Ag | Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer |
JP3349953B2 (ja) * | 1998-05-25 | 2002-11-25 | シャープ株式会社 | 基板処理装置 |
JP2001023907A (ja) | 1999-07-07 | 2001-01-26 | Mitsubishi Heavy Ind Ltd | 成膜装置 |
JP4316767B2 (ja) | 2000-03-22 | 2009-08-19 | 株式会社半導体エネルギー研究所 | 基板処理装置 |
US6336999B1 (en) * | 2000-10-11 | 2002-01-08 | Centre Luxembourgeois De Recherches Pour Le Verre Et Al Ceramique S.A. (C.R.V.C.) | Apparatus for sputter-coating glass and corresponding method |
US20040058293A1 (en) | 2002-08-06 | 2004-03-25 | Tue Nguyen | Assembly line processing system |
DE10352144B8 (de) * | 2003-11-04 | 2008-11-13 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten |
DE102004021734B4 (de) * | 2004-04-30 | 2010-09-02 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur kontinuierlichen Beschichtung flacher Substrate mit optisch aktiven Schichtsystemen |
US20070256934A1 (en) * | 2006-05-08 | 2007-11-08 | Perata Michael R | Apparatus and Method for Coating Substrates With Approximate Process Isolation |
DE102007058052B4 (de) * | 2007-11-30 | 2013-12-05 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage |
DE102008019427A1 (de) * | 2008-04-17 | 2009-10-29 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Diffusionsbehandlung von Werkstücken |
EP2281300A4 (en) * | 2008-05-30 | 2013-07-17 | Alta Devices Inc | METHOD AND DEVICE FOR A CHEMICAL STEAM SEPARATION REACTOR |
US20100206229A1 (en) | 2008-05-30 | 2010-08-19 | Alta Devices, Inc. | Vapor deposition reactor system |
JP2010077508A (ja) | 2008-09-26 | 2010-04-08 | Tokyo Electron Ltd | 成膜装置及び基板処理装置 |
FI122880B (fi) * | 2009-02-09 | 2012-08-15 | Beneq Oy | Sulkujärjestely, tuotantolinja ja menetelmä |
DE102009029902A1 (de) * | 2009-02-25 | 2010-09-02 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage mit zwei oder mehr Vakuumkammern und Verfahren zur Behandlung von Substraten in der Anlage |
US8118982B2 (en) * | 2009-03-06 | 2012-02-21 | Applied Materials, Inc. | Gas flow set-up for multiple, interacting reactive sputter sources |
US8117987B2 (en) | 2009-09-18 | 2012-02-21 | Applied Materials, Inc. | Hot wire chemical vapor deposition (CVD) inline coating tool |
WO2011097012A1 (en) | 2010-02-03 | 2011-08-11 | Xunlight Corporation | An isolation chamber and method of using the isolation chamber to make solar cell material |
-
2011
- 2011-10-18 EP EP11772954.1A patent/EP2630271B1/en active Active
- 2011-10-18 BR BR112013009629-2A patent/BR112013009629B1/pt active IP Right Grant
- 2011-10-18 MX MX2013004489A patent/MX360285B/es active IP Right Grant
- 2011-10-18 PL PL11772954T patent/PL2630271T3/pl unknown
- 2011-10-18 KR KR1020137012855A patent/KR101926884B1/ko active IP Right Grant
- 2011-10-18 MX MX2018007835A patent/MX366096B/es unknown
- 2011-10-18 UA UAA201306278A patent/UA112300C2/uk unknown
- 2011-10-18 ES ES11772954T patent/ES2872339T3/es active Active
- 2011-10-18 JP JP2013534291A patent/JP5984820B2/ja active Active
- 2011-10-18 WO PCT/EP2011/068176 patent/WO2012052428A1/en active Application Filing
- 2011-10-18 MY MYPI2013001398A patent/MY164208A/en unknown
- 2011-10-18 US US13/880,908 patent/US9938617B2/en active Active
- 2011-10-18 CN CN201180058105.7A patent/CN103237919B/zh active Active
- 2011-10-18 EA EA201390594A patent/EA025781B1/ru not_active IP Right Cessation
-
2013
- 2013-05-20 ZA ZA2013/03646A patent/ZA201303646B/en unknown
Also Published As
Publication number | Publication date |
---|---|
MY164208A (en) | 2017-11-30 |
CN103237919B (zh) | 2016-11-09 |
US9938617B2 (en) | 2018-04-10 |
MX360285B (es) | 2018-10-26 |
ZA201303646B (en) | 2014-04-30 |
BR112013009629B1 (pt) | 2020-11-17 |
MX366096B (es) | 2019-06-27 |
BR112013009629A2 (pt) | 2016-07-12 |
EP2630271B1 (en) | 2021-03-24 |
JP2013545891A (ja) | 2013-12-26 |
CN103237919A (zh) | 2013-08-07 |
ES2872339T3 (es) | 2021-11-02 |
KR101926884B1 (ko) | 2018-12-07 |
PL2630271T3 (pl) | 2021-11-02 |
US20130337193A1 (en) | 2013-12-19 |
MX2013004489A (es) | 2013-09-13 |
KR20130132814A (ko) | 2013-12-05 |
EA201390594A1 (ru) | 2013-08-30 |
EA025781B1 (ru) | 2017-01-30 |
EP2630271A1 (en) | 2013-08-28 |
JP5984820B2 (ja) | 2016-09-06 |
WO2012052428A1 (en) | 2012-04-26 |
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