UA106984C2 - Спосіб одержання мішені плазмовим напиленням, мішень і спосіб одержання шару з металу на підкладці шляхом розпилення мішені - Google Patents
Спосіб одержання мішені плазмовим напиленням, мішень і спосіб одержання шару з металу на підкладці шляхом розпилення мішеніInfo
- Publication number
- UA106984C2 UA106984C2 UAA201113242A UAA201113242A UA106984C2 UA 106984 C2 UA106984 C2 UA 106984C2 UA A201113242 A UAA201113242 A UA A201113242A UA A201113242 A UAA201113242 A UA A201113242A UA 106984 C2 UA106984 C2 UA 106984C2
- Authority
- UA
- Ukraine
- Prior art keywords
- target
- projection
- producing
- obtaining
- substrate
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000002184 metal Substances 0.000 title abstract 2
- 229910052751 metal Inorganic materials 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 3
- 238000010276 construction Methods 0.000 abstract 1
- 238000004320 controlled atmosphere Methods 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
- B22F7/08—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/115—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by spraying molten metal, i.e. spray sintering, spray casting
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/137—Spraying in vacuum or in an inert atmosphere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3491—Manufacturing of targets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Composite Materials (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating By Spraying Or Casting (AREA)
- Physical Vapour Deposition (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Спосіб одержання мішені плазмовим напиленням, причому вказана мішень містить щонайменше одну сполуку, вибрану з тугоплавких металів, резистивних оксидів, летких оксидів, який відрізняється тим, що за допомогою плазмового напилення у контрольованій атмосфері наносять на щонайменше одну частину поверхні мішені щонайменше одну фракцію вказаної сполуки у вигляді порошкової композиції вказаної сполуки, і тим, що використовують потужні охолоджувальні кріогенні струмені, спрямовані до мішені під час її створення.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0952394A FR2944293B1 (fr) | 2009-04-10 | 2009-04-10 | Procede d'elaboration par projection thermique d'une cible |
PCT/FR2010/050704 WO2010116112A2 (fr) | 2009-04-10 | 2010-04-12 | Procédé d'élaboration par projection thermique d'une cible |
Publications (1)
Publication Number | Publication Date |
---|---|
UA106984C2 true UA106984C2 (uk) | 2014-11-10 |
Family
ID=41212209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAA201113242A UA106984C2 (uk) | 2009-04-10 | 2010-04-12 | Спосіб одержання мішені плазмовим напиленням, мішень і спосіб одержання шару з металу на підкладці шляхом розпилення мішені |
Country Status (17)
Country | Link |
---|---|
US (1) | US9156089B2 (uk) |
EP (1) | EP2417280B1 (uk) |
JP (1) | JP5635589B2 (uk) |
KR (1) | KR101728923B1 (uk) |
CN (1) | CN102395701A (uk) |
AU (1) | AU2010233526B2 (uk) |
BR (1) | BRPI1010513B1 (uk) |
CA (1) | CA2757903C (uk) |
EA (1) | EA026548B1 (uk) |
ES (1) | ES2444948T3 (uk) |
FR (1) | FR2944293B1 (uk) |
MX (1) | MX2011010533A (uk) |
MY (1) | MY156586A (uk) |
PL (1) | PL2417280T3 (uk) |
SG (1) | SG175161A1 (uk) |
UA (1) | UA106984C2 (uk) |
WO (1) | WO2010116112A2 (uk) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2944295B1 (fr) * | 2009-04-10 | 2014-08-15 | Saint Gobain Coating Solutions | Cible a base de molybdene et procede d'elaboration par projection thermique d'une cible |
JP2012149321A (ja) * | 2011-01-20 | 2012-08-09 | Taiheiyo Cement Corp | スパッタリングターゲットおよびその製造方法 |
EP2584062A1 (de) * | 2011-10-19 | 2013-04-24 | Heraeus Materials Technology GmbH & Co. KG | Sputtertarget und seine Verwendung |
CN104005018A (zh) * | 2014-05-29 | 2014-08-27 | 耿荣献 | 高抗磨耐火材料模具表面的耐磨涂层工艺 |
CN104831210A (zh) * | 2015-05-09 | 2015-08-12 | 安徽鼎恒再制造产业技术研究院有限公司 | 一种Co-ZrO2-HfO2涂层材料及其制备方法 |
CN104827027B (zh) * | 2015-06-05 | 2017-01-18 | 哈尔滨工程大学 | 用于等离子熔覆的Ni‑(Ta/Zr/Hf)‑Re合金粉末的制备方法 |
CN104947051A (zh) * | 2015-06-10 | 2015-09-30 | 深圳市威勒达科技开发有限公司 | 一种矾铝合金靶材及其制备方法 |
DE102015213896A1 (de) * | 2015-07-23 | 2017-01-26 | Volkswagen Aktiengesellschaft | Verfahren zur Beschichtung eines metallischen Werkzeugs und Bauteil |
US20180327887A1 (en) * | 2015-12-18 | 2018-11-15 | Intel Corporation | Refractory metal alloy targets for physical vapor deposition |
US9609874B1 (en) * | 2016-07-21 | 2017-04-04 | Kuwait Institute For Scientific Research | Metallic glassy alloy powders for antibacterial coating |
KR102630654B1 (ko) * | 2017-05-01 | 2024-01-29 | 더 존스 홉킨스 유니버시티 | 나노트위닝된 니켈-몰리브덴-텅스텐 합금을 증착시키는 방법 |
RU178216U1 (ru) * | 2017-06-14 | 2018-03-28 | Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" | Настроечная шкала составной магнетронной мишени |
RU183138U1 (ru) * | 2018-03-20 | 2018-09-12 | Федеральное государственное бюджетное учреждение науки Институт радиотехники и электроники им. В.А. Котельникова Российской академии наук | Составная мишень для получения нанокомпозитов при магнетронном распылении |
BE1026683B1 (nl) | 2018-10-05 | 2020-05-07 | Soleras Advanced Coatings Bvba | Sputterdoel |
BE1026850B1 (nl) | 2018-11-12 | 2020-07-07 | Soleras Advanced Coatings Bv | Geleidende sputter doelen met silicium, zirkonium en zuurstof |
CN109881162A (zh) * | 2018-11-29 | 2019-06-14 | 芮瑛 | 一种基于等离子喷涂技术的溅射用靶材制备工艺 |
BE1028482B1 (nl) * | 2020-07-14 | 2022-02-14 | Soleras Advanced Coatings Bv | Vervaardiging en hervullen van sputterdoelen |
BE1028481B1 (nl) * | 2020-07-14 | 2022-02-14 | Soleras Advanced Coatings Bv | Sputterdoel met grote densiteit |
CN112475676B (zh) * | 2020-11-11 | 2022-11-15 | 宁波江丰电子材料股份有限公司 | 一种钽靶材焊接面的处理方法 |
CN112695286A (zh) * | 2020-12-15 | 2021-04-23 | 株洲火炬安泰新材料有限公司 | 一种低电阻率ito靶材粉末的成型方法 |
CN113308671A (zh) * | 2021-05-28 | 2021-08-27 | 矿冶科技集团有限公司 | 一种高纯钽旋转靶材及其制备方法 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4356073A (en) | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4692305A (en) * | 1985-11-05 | 1987-09-08 | Perkin-Elmer Corporation | Corrosion and wear resistant alloy |
DE4031489A1 (de) * | 1990-10-05 | 1992-04-09 | Ver Glaswerke Gmbh | Verfahren zum beschichten von glasscheiben mit hilfe eines thermischen spritzverfahrens |
FR2672648B1 (fr) | 1991-02-08 | 1993-04-16 | Mure Ets | Dispositif pour le maintien, provisoire d'un organe de levage sur une surface metallique de coffrage pendant les phases de coulee et de prise du beton d'un element en beton prefabrique. |
JP3241153B2 (ja) * | 1993-04-02 | 2001-12-25 | 株式会社フジクラ | 溶射装置 |
JPH0726373A (ja) | 1993-07-09 | 1995-01-27 | Asahi Glass Co Ltd | 回転カソードターゲットとその製造方法および該ターゲットを用いて形成される膜 |
JPH0736373A (ja) * | 1993-07-16 | 1995-02-07 | Omron Corp | プログラマブルコントローラ |
JPH08199372A (ja) * | 1995-01-26 | 1996-08-06 | Nisshin Steel Co Ltd | 傾斜機能材料の製法および装置 |
IL122949A (en) * | 1995-08-31 | 2000-08-13 | Innovative Sputtering Tech | Process for manufacturing ito alloy articles |
GB9600210D0 (en) * | 1996-01-05 | 1996-03-06 | Vanderstraeten E Bvba | Improved sputtering targets and method for the preparation thereof |
JPH09272965A (ja) * | 1996-04-09 | 1997-10-21 | Toshiba Corp | 真空成膜装置用部品とそれを用いた真空成膜装置、およびターゲット、バッキングプレート |
US6056857A (en) * | 1997-08-13 | 2000-05-02 | Praxair S.T. Technology, Inc. | Cryogenic annealing of sputtering targets |
EP0960955A1 (en) * | 1998-05-26 | 1999-12-01 | Universiteit Gent | Method and apparatus for flame spraying to form a tough coating |
US20080213496A1 (en) * | 2002-02-14 | 2008-09-04 | Applied Materials, Inc. | Method of coating semiconductor processing apparatus with protective yttrium-containing coatings |
FR2845078B1 (fr) * | 2002-09-26 | 2004-10-29 | Alstom | PROCEDE DE FABRICATION D'UN SUBSTRAT EN NITRURE D'ALUMINIUM AlN |
ES2371070T3 (es) * | 2003-02-24 | 2011-12-27 | Tekna Plasma Systems Inc. | Procedimiento para fabricar un blanco de pulverización catódica. |
CN100585752C (zh) | 2003-05-20 | 2010-01-27 | 出光兴产株式会社 | 非晶透明导电膜及其原料溅射靶、非晶透明电极衬底及其制造方法、及液晶显示器用滤色器 |
EP1524682B1 (en) * | 2003-10-17 | 2011-10-05 | Tosoh Corporation | Component for vacuum apparatus, production method thereof and apparatus using the same |
JP2007529626A (ja) | 2004-03-15 | 2007-10-25 | ベーカート・アドヴァンスト・コーティングス | スパッタターゲットの熱応力緩和方法 |
US20060042728A1 (en) | 2004-08-31 | 2006-03-02 | Brad Lemon | Molybdenum sputtering targets |
US8088232B2 (en) | 2004-08-31 | 2012-01-03 | H.C. Starck Inc. | Molybdenum tubular sputtering targets with uniform grain size and texture |
WO2006041730A2 (en) | 2004-10-07 | 2006-04-20 | Atmel Corporation | Method and system for a programming approach for a nonvolatile electronic device |
CA2532388A1 (en) * | 2005-01-07 | 2006-07-07 | Inframat Corporation | Coated medical devices and methods of making and using |
FR2881757B1 (fr) * | 2005-02-08 | 2007-03-30 | Saint Gobain | Procede d'elaboration par projection thermique d'une cible a base de silicium et de zirconium |
US8715772B2 (en) | 2005-04-12 | 2014-05-06 | Air Products And Chemicals, Inc. | Thermal deposition coating method |
CA2607091C (en) | 2005-05-05 | 2014-08-12 | H.C. Starck Gmbh | Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
US7662253B2 (en) * | 2005-09-27 | 2010-02-16 | Lam Research Corporation | Apparatus for the removal of a metal oxide from a substrate and methods therefor |
US7644872B2 (en) * | 2006-03-23 | 2010-01-12 | United Technologies Corporation | Powder port blow-off for thermal spray processes |
JP4762062B2 (ja) * | 2006-06-22 | 2011-08-31 | 出光興産株式会社 | 焼結体、膜及び有機エレクトロルミネッセンス素子 |
US7737383B2 (en) * | 2006-08-25 | 2010-06-15 | Thermal Dynamics Corporation | Contoured shield orifice for a plasma arc torch |
US8097105B2 (en) * | 2007-01-11 | 2012-01-17 | Lam Research Corporation | Extending lifetime of yttrium oxide as a plasma chamber material |
US9279178B2 (en) * | 2007-04-27 | 2016-03-08 | Honeywell International Inc. | Manufacturing design and processing methods and apparatus for sputtering targets |
US8197894B2 (en) * | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
-
2009
- 2009-04-10 FR FR0952394A patent/FR2944293B1/fr not_active Expired - Fee Related
-
2010
- 2010-04-12 AU AU2010233526A patent/AU2010233526B2/en not_active Ceased
- 2010-04-12 ES ES10723660.6T patent/ES2444948T3/es active Active
- 2010-04-12 BR BRPI1010513A patent/BRPI1010513B1/pt not_active IP Right Cessation
- 2010-04-12 US US13/259,991 patent/US9156089B2/en active Active
- 2010-04-12 SG SG2011073947A patent/SG175161A1/en unknown
- 2010-04-12 PL PL10723660T patent/PL2417280T3/pl unknown
- 2010-04-12 UA UAA201113242A patent/UA106984C2/uk unknown
- 2010-04-12 KR KR1020117023564A patent/KR101728923B1/ko active IP Right Grant
- 2010-04-12 EP EP10723660.6A patent/EP2417280B1/fr active Active
- 2010-04-12 WO PCT/FR2010/050704 patent/WO2010116112A2/fr active Application Filing
- 2010-04-12 EA EA201171236A patent/EA026548B1/ru not_active IP Right Cessation
- 2010-04-12 MX MX2011010533A patent/MX2011010533A/es active IP Right Grant
- 2010-04-12 MY MYPI2011004833A patent/MY156586A/en unknown
- 2010-04-12 CA CA2757903A patent/CA2757903C/fr not_active Expired - Fee Related
- 2010-04-12 JP JP2012504064A patent/JP5635589B2/ja active Active
- 2010-04-12 CN CN2010800160871A patent/CN102395701A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
CA2757903C (fr) | 2014-09-23 |
US9156089B2 (en) | 2015-10-13 |
US20120055783A1 (en) | 2012-03-08 |
KR101728923B1 (ko) | 2017-04-20 |
JP5635589B2 (ja) | 2014-12-03 |
BRPI1010513B1 (pt) | 2020-05-05 |
BRPI1010513A2 (pt) | 2016-03-15 |
SG175161A1 (en) | 2011-11-28 |
JP2012523498A (ja) | 2012-10-04 |
EA201171236A1 (ru) | 2012-04-30 |
CA2757903A1 (fr) | 2010-10-14 |
CN102395701A (zh) | 2012-03-28 |
AU2010233526B2 (en) | 2016-07-28 |
EA026548B1 (ru) | 2017-04-28 |
WO2010116112A2 (fr) | 2010-10-14 |
PL2417280T3 (pl) | 2014-04-30 |
MX2011010533A (es) | 2011-11-04 |
EP2417280A2 (fr) | 2012-02-15 |
FR2944293B1 (fr) | 2012-05-18 |
EP2417280B1 (fr) | 2013-11-06 |
KR20120024538A (ko) | 2012-03-14 |
MY156586A (en) | 2016-03-15 |
ES2444948T3 (es) | 2014-02-27 |
AU2010233526A1 (en) | 2011-11-17 |
WO2010116112A3 (fr) | 2011-03-10 |
FR2944293A1 (fr) | 2010-10-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
UA106984C2 (uk) | Спосіб одержання мішені плазмовим напиленням, мішень і спосіб одержання шару з металу на підкладці шляхом розпилення мішені | |
GB201212407D0 (en) | Composition for forming a seed layer | |
UA115469C2 (uk) | Способи покращення оброблюваності у гарячому стані металевих сплавів | |
BRPI0907265A2 (pt) | método para a produção de camadas de óxida de metal através de vaporização a arco, alvo de pó metalúrgico, camada de óxido de metal e seu uso. | |
WO2014090922A3 (en) | Metal powder suitable for thermal spraying | |
MX2010005433A (es) | Metodo para la produccion de componentes revestidos y endurecidos hechos de acero y cinta de acero revestida y capaz de ser endurecida para este proposito. | |
WO2014125258A3 (en) | Selective laser solidification apparatus and method | |
WO2011159417A3 (en) | Thermal interface material assemblies, and related methods | |
WO2012099710A3 (en) | Improving hot workability of metal alloys via surface coating | |
WO2013014213A3 (de) | Verfahren zur substratbeschichtung und verwendung additivversehener, pulverförmiger beschichtungsmaterialien in derartigen verfahren | |
WO2012104536A3 (fr) | Dispositif de frittage et fusion par laser comprenant un moyen de chauffage de la poudre par induction | |
MY168688A (en) | Hardfaced wearpart using brazing and associated method and assembly for manufacturing | |
MX351791B (es) | Polvo de aspersion con base en carburo de tungsteno y sustrato teniendo capa de aspersion termica con base en carburo de tungsteno. | |
MX2009009815A (es) | Una pieza de soldadura fuerte, un metodo para elaborar una pieza de soldadura fuerte, y un metodo de soldadura fuerte y componentes hechos a partir de dicha pieza de soldadura fuerte. | |
SG170059A1 (en) | Process for the repair and restoration of dynamically stressed components comprising aluminium alloys for aircraft applications | |
IN2015DN01825A (uk) | ||
MX338478B (es) | Sistemas y metodos para el procesamiento de lingotes de aleaciones. | |
GB201113756D0 (en) | Forming a layered structure | |
MX2013005999A (es) | Polvo de pulverizacion libre de zinc, capa de pulverizacion termica que contiene cobre, asi como metodo de fabricacion de una capa de pulverizacion termica que contiene cobre. | |
PL2294241T3 (pl) | Sposób wytwarzania tarczy tlenkowej do rozpylania jonowego, zawierającej pierwszą i drugą fazę | |
JP2012030253A5 (uk) | ||
WO2014197087A3 (en) | Component repair using brazed surface textured superalloy foil | |
WO2012052252A3 (de) | Ausgangswerkstoff einer sinterverbindung und verfahren zur herstellung der sinterverbindung | |
WO2014126633A3 (en) | Spallation-resistant thermal barrier coating | |
WO2012052251A3 (de) | Ausgangswerkstoff einer sinterverbindung und verfahren zur herstellung der sinterverbindung |