WO2010116112A3 - Procédé d'élaboration par projection thermique d'une cible - Google Patents

Procédé d'élaboration par projection thermique d'une cible Download PDF

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Publication number
WO2010116112A3
WO2010116112A3 PCT/FR2010/050704 FR2010050704W WO2010116112A3 WO 2010116112 A3 WO2010116112 A3 WO 2010116112A3 FR 2010050704 W FR2010050704 W FR 2010050704W WO 2010116112 A3 WO2010116112 A3 WO 2010116112A3
Authority
WO
WIPO (PCT)
Prior art keywords
target
thermal projection
compound
production method
projection
Prior art date
Application number
PCT/FR2010/050704
Other languages
English (en)
Other versions
WO2010116112A2 (fr
Inventor
Dominique Billieres
Original Assignee
Saint-Gobain Coating Solutions
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint-Gobain Coating Solutions filed Critical Saint-Gobain Coating Solutions
Priority to AU2010233526A priority Critical patent/AU2010233526B2/en
Priority to PL10723660T priority patent/PL2417280T3/pl
Priority to EP10723660.6A priority patent/EP2417280B1/fr
Priority to US13/259,991 priority patent/US9156089B2/en
Priority to ES10723660.6T priority patent/ES2444948T3/es
Priority to CN2010800160871A priority patent/CN102395701A/zh
Priority to SG2011073947A priority patent/SG175161A1/en
Priority to KR1020117023564A priority patent/KR101728923B1/ko
Priority to BRPI1010513A priority patent/BRPI1010513B1/pt
Priority to EA201171236A priority patent/EA026548B1/ru
Priority to JP2012504064A priority patent/JP5635589B2/ja
Priority to CA2757903A priority patent/CA2757903C/fr
Priority to UAA201113242A priority patent/UA106984C2/uk
Priority to MX2011010533A priority patent/MX2011010533A/es
Publication of WO2010116112A2 publication Critical patent/WO2010116112A2/fr
Publication of WO2010116112A3 publication Critical patent/WO2010116112A3/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/08—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/115—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by spraying molten metal, i.e. spray sintering, spray casting
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/137—Spraying in vacuum or in an inert atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Abstract

Procédé de réalisation d'une cible par projection thermique, notamment par projection plasma, ladite cible comprenant au moins un composé choisi par les métaux réfractaires, les oxydes résistifs, les oxydes volatils caractérisé en ce qu'on projette par projection thermique sur au moins une portion de surface de la cible, au moins une fraction dudit composé sous forme d'une composition de poudre dudit composé, sous atmosphère contrôlée, et en ce qu'on utilise des jets refroidisseurs cryogéniques puissants dirigés vers la cible pendant sa construction.
PCT/FR2010/050704 2009-04-10 2010-04-12 Procédé d'élaboration par projection thermique d'une cible WO2010116112A2 (fr)

Priority Applications (14)

Application Number Priority Date Filing Date Title
AU2010233526A AU2010233526B2 (en) 2009-04-10 2010-04-12 Production method with thermal projection of a target
PL10723660T PL2417280T3 (pl) 2009-04-10 2010-04-12 Sposób wytwarzania tarczy przez natryskiwanie termiczne
EP10723660.6A EP2417280B1 (fr) 2009-04-10 2010-04-12 Procédé d'élaboration d'une cible par projection thermique
US13/259,991 US9156089B2 (en) 2009-04-10 2010-04-12 Process for producing a target by thermal spraying
ES10723660.6T ES2444948T3 (es) 2009-04-10 2010-04-12 Procedimiento de elaboración de una diana por proyección térmica
CN2010800160871A CN102395701A (zh) 2009-04-10 2010-04-12 通过热喷镀制备靶的方法
SG2011073947A SG175161A1 (en) 2009-04-10 2010-04-12 Production method with thermal projection of a target
KR1020117023564A KR101728923B1 (ko) 2009-04-10 2010-04-12 열 투사에 의한 타겟의 제조 방법
BRPI1010513A BRPI1010513B1 (pt) 2009-04-10 2010-04-12 processos de produção de um alvo por projeção térmica
EA201171236A EA026548B1 (ru) 2009-04-10 2010-04-12 Способ получения мишени термонапылением
JP2012504064A JP5635589B2 (ja) 2009-04-10 2010-04-12 溶射によってターゲットを製造するための方法
CA2757903A CA2757903C (fr) 2009-04-10 2010-04-12 Procede d'elaboration par projection thermique d'une cible
UAA201113242A UA106984C2 (uk) 2009-04-10 2010-04-12 Спосіб одержання мішені плазмовим напиленням, мішень і спосіб одержання шару з металу на підкладці шляхом розпилення мішені
MX2011010533A MX2011010533A (es) 2009-04-10 2010-04-12 Metodo para producir una diana mediante proyeccion termica.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0952394 2009-04-10
FR0952394A FR2944293B1 (fr) 2009-04-10 2009-04-10 Procede d'elaboration par projection thermique d'une cible

Publications (2)

Publication Number Publication Date
WO2010116112A2 WO2010116112A2 (fr) 2010-10-14
WO2010116112A3 true WO2010116112A3 (fr) 2011-03-10

Family

ID=41212209

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2010/050704 WO2010116112A2 (fr) 2009-04-10 2010-04-12 Procédé d'élaboration par projection thermique d'une cible

Country Status (17)

Country Link
US (1) US9156089B2 (fr)
EP (1) EP2417280B1 (fr)
JP (1) JP5635589B2 (fr)
KR (1) KR101728923B1 (fr)
CN (1) CN102395701A (fr)
AU (1) AU2010233526B2 (fr)
BR (1) BRPI1010513B1 (fr)
CA (1) CA2757903C (fr)
EA (1) EA026548B1 (fr)
ES (1) ES2444948T3 (fr)
FR (1) FR2944293B1 (fr)
MX (1) MX2011010533A (fr)
MY (1) MY156586A (fr)
PL (1) PL2417280T3 (fr)
SG (1) SG175161A1 (fr)
UA (1) UA106984C2 (fr)
WO (1) WO2010116112A2 (fr)

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FR2944295B1 (fr) * 2009-04-10 2014-08-15 Saint Gobain Coating Solutions Cible a base de molybdene et procede d'elaboration par projection thermique d'une cible
JP2012149321A (ja) * 2011-01-20 2012-08-09 Taiheiyo Cement Corp スパッタリングターゲットおよびその製造方法
EP2584062A1 (fr) * 2011-10-19 2013-04-24 Heraeus Materials Technology GmbH & Co. KG Cible de circuits et son utilisation
CN104005018A (zh) * 2014-05-29 2014-08-27 耿荣献 高抗磨耐火材料模具表面的耐磨涂层工艺
CN104831210A (zh) * 2015-05-09 2015-08-12 安徽鼎恒再制造产业技术研究院有限公司 一种Co-ZrO2-HfO2涂层材料及其制备方法
CN104827027B (zh) * 2015-06-05 2017-01-18 哈尔滨工程大学 用于等离子熔覆的Ni‑(Ta/Zr/Hf)‑Re合金粉末的制备方法
CN104947051A (zh) * 2015-06-10 2015-09-30 深圳市威勒达科技开发有限公司 一种矾铝合金靶材及其制备方法
DE102015213896A1 (de) * 2015-07-23 2017-01-26 Volkswagen Aktiengesellschaft Verfahren zur Beschichtung eines metallischen Werkzeugs und Bauteil
WO2017105488A1 (fr) * 2015-12-18 2017-06-22 Intel Corporation Cibles en alliage de métaux réfractaires pour dépôt physique en phase vapeur
US9609874B1 (en) * 2016-07-21 2017-04-04 Kuwait Institute For Scientific Research Metallic glassy alloy powders for antibacterial coating
KR102630654B1 (ko) * 2017-05-01 2024-01-29 더 존스 홉킨스 유니버시티 나노트위닝된 니켈-몰리브덴-텅스텐 합금을 증착시키는 방법
RU178216U1 (ru) * 2017-06-14 2018-03-28 Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" Настроечная шкала составной магнетронной мишени
RU183138U1 (ru) * 2018-03-20 2018-09-12 Федеральное государственное бюджетное учреждение науки Институт радиотехники и электроники им. В.А. Котельникова Российской академии наук Составная мишень для получения нанокомпозитов при магнетронном распылении
BE1026683B1 (nl) 2018-10-05 2020-05-07 Soleras Advanced Coatings Bvba Sputterdoel
BE1026850B1 (nl) 2018-11-12 2020-07-07 Soleras Advanced Coatings Bv Geleidende sputter doelen met silicium, zirkonium en zuurstof
CN109881162A (zh) * 2018-11-29 2019-06-14 芮瑛 一种基于等离子喷涂技术的溅射用靶材制备工艺
BE1028481B1 (nl) * 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv Sputterdoel met grote densiteit
BE1028482B1 (nl) * 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv Vervaardiging en hervullen van sputterdoelen
CN112475676B (zh) * 2020-11-11 2022-11-15 宁波江丰电子材料股份有限公司 一种钽靶材焊接面的处理方法
CN112695286A (zh) * 2020-12-15 2021-04-23 株洲火炬安泰新材料有限公司 一种低电阻率ito靶材粉末的成型方法
CN113308671A (zh) * 2021-05-28 2021-08-27 矿冶科技集团有限公司 一种高纯钽旋转靶材及其制备方法

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KR20120024538A (ko) 2012-03-14
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