TWI875036B - 活性氣體生成裝置 - Google Patents

活性氣體生成裝置 Download PDF

Info

Publication number
TWI875036B
TWI875036B TW112122746A TW112122746A TWI875036B TW I875036 B TWI875036 B TW I875036B TW 112122746 A TW112122746 A TW 112122746A TW 112122746 A TW112122746 A TW 112122746A TW I875036 B TWI875036 B TW I875036B
Authority
TW
Taiwan
Prior art keywords
electrode
space
electrode structures
grooves
trenches
Prior art date
Application number
TW112122746A
Other languages
English (en)
Chinese (zh)
Other versions
TW202411457A (zh
Inventor
渡辺謙資
有田廉
Original Assignee
日商Ｔｍｅｉｃ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ｔｍｅｉｃ股份有限公司 filed Critical 日商Ｔｍｅｉｃ股份有限公司
Publication of TW202411457A publication Critical patent/TW202411457A/zh
Application granted granted Critical
Publication of TWI875036B publication Critical patent/TWI875036B/zh

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/3255—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrostatic Separation (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
TW112122746A 2022-09-14 2023-06-16 活性氣體生成裝置 TWI875036B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2022/034306 2022-09-14
PCT/JP2022/034306 WO2024057424A1 (ja) 2022-09-14 2022-09-14 活性ガス生成装置

Publications (2)

Publication Number Publication Date
TW202411457A TW202411457A (zh) 2024-03-16
TWI875036B true TWI875036B (zh) 2025-03-01

Family

ID=88418527

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112122746A TWI875036B (zh) 2022-09-14 2023-06-16 活性氣體生成裝置

Country Status (7)

Country Link
US (1) US20240429028A1 (https=)
EP (1) EP4401514A4 (https=)
JP (1) JP7366513B1 (https=)
KR (1) KR102939982B1 (https=)
CN (1) CN118044338A (https=)
TW (1) TWI875036B (https=)
WO (1) WO2024057424A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557564A (en) * 1978-06-30 1980-01-19 Sumitomo Precision Prod Co Ltd Ozonizer
US20080088217A1 (en) * 2006-10-17 2008-04-17 Lg Electronics Inc. Plasma generating device, method of cleaning display panel, and method of manufacturing display panel using the same
US20100310434A1 (en) * 2009-06-05 2010-12-09 Eon Labs, Llc Distributed Dielectric Barrier Discharge Reactor
TW201607380A (zh) * 2014-06-25 2016-02-16 荷蘭Ｔｎｏ自然科學組織公司 電漿源、表面處理裝置以及表面處理方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH071592U (ja) * 1993-06-10 1995-01-10 啓平 李 コロナ発生器
EP1645730B1 (en) * 2003-07-10 2012-02-15 NGK Insulators, Ltd. Plasma generating electrode and plasma reactor
US7767167B2 (en) * 2003-07-28 2010-08-03 Iono2X Engineering, L.L.C. Dielectric barrier discharge cell with hermetically sealed electrodes, apparatus and method for the treatment of odor and volatile organic compound contaminants in air emissions, and for purifying gases and sterilizing surfaces
JP6175721B2 (ja) * 2012-11-09 2017-08-09 株式会社渡辺商行 オゾン発生装置、及び、オゾン発生方法
US20160233059A1 (en) * 2015-02-06 2016-08-11 Ionfield Holdings, Llc Methods and systems for generating plasma to clean objects
WO2019138453A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置及び成膜処理装置
KR102510329B1 (ko) * 2018-06-25 2023-03-17 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 활성 가스 생성 장치 및 성막 처리 장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557564A (en) * 1978-06-30 1980-01-19 Sumitomo Precision Prod Co Ltd Ozonizer
US20080088217A1 (en) * 2006-10-17 2008-04-17 Lg Electronics Inc. Plasma generating device, method of cleaning display panel, and method of manufacturing display panel using the same
US20100310434A1 (en) * 2009-06-05 2010-12-09 Eon Labs, Llc Distributed Dielectric Barrier Discharge Reactor
TW201607380A (zh) * 2014-06-25 2016-02-16 荷蘭Ｔｎｏ自然科學組織公司 電漿源、表面處理裝置以及表面處理方法

Also Published As

Publication number Publication date
JP7366513B1 (ja) 2023-10-23
JPWO2024057424A1 (https=) 2024-03-21
TW202411457A (zh) 2024-03-16
EP4401514A1 (en) 2024-07-17
US20240429028A1 (en) 2024-12-26
KR20240048546A (ko) 2024-04-15
EP4401514A4 (en) 2026-02-11
KR102939982B1 (ko) 2026-03-16
CN118044338A (zh) 2024-05-14
WO2024057424A1 (ja) 2024-03-21

Similar Documents

Publication Publication Date Title
JP3114739U (ja) プラズマ反応器のガス分配板電極
KR100317915B1 (ko) 플라즈마 식각 장치
JP2023147625A (ja) ダイヘッド
JP6844937B2 (ja) 活性ガス生成装置
JP7297399B1 (ja) 活性ガス生成装置
TWI875036B (zh) 活性氣體生成裝置
JP2024042093A5 (https=)
US7118984B2 (en) Method for fabricating semiconductor component
JP2004127853A (ja) プラズマ表面処理装置の電極構造
US4745332A (en) Control plate for picture-reproducing devices
TWI847337B (zh) 活性氣體生成裝置
JP2008277774A (ja) プラズマ処理装置
US5394180A (en) Modular multijet deflection head and manufacturing method
JP2000108361A (ja) インクジェットヘッドの製造方法
JP3844188B2 (ja) アクチュエータユニット及びインクジェット式記録ヘッド
JPWO2024057424A5 (https=)
JP2000141653A (ja) インクジェットヘッドおよびその製造方法
JP3844187B2 (ja) アクチュエータユニット及びインクジェット式記録ヘッド
GB2582439A (en) Electrode assembly for mass spectrometer
JP2008226634A (ja) プラズマ処理装置
JP4218188B2 (ja) アクチュエータユニット及びインクジェット式記録ヘッド
KR20240016218A (ko) 기판 지지기 및 플라즈마 처리 장치
WO2023120245A1 (ja) 基板支持器及びプラズマ処理装置
JPWO2023105753A5 (https=)
JP2003182069A (ja) インクジェットヘッドおよびその製造方法