KR102939982B1 - 활성 가스 생성 장치 - Google Patents

활성 가스 생성 장치

Info

Publication number
KR102939982B1
KR102939982B1 KR1020247009854A KR20247009854A KR102939982B1 KR 102939982 B1 KR102939982 B1 KR 102939982B1 KR 1020247009854 A KR1020247009854 A KR 1020247009854A KR 20247009854 A KR20247009854 A KR 20247009854A KR 102939982 B1 KR102939982 B1 KR 102939982B1
Authority
KR
South Korea
Prior art keywords
electrode
space
grooves
dielectric film
active gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020247009854A
Other languages
English (en)
Korean (ko)
Other versions
KR20240048546A (ko
Inventor
겐스케 와타나베
렌 아리타
Original Assignee
가부시키가이샤 티마이크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 티마이크 filed Critical 가부시키가이샤 티마이크
Publication of KR20240048546A publication Critical patent/KR20240048546A/ko
Application granted granted Critical
Publication of KR102939982B1 publication Critical patent/KR102939982B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/3255—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrostatic Separation (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
KR1020247009854A 2022-09-14 2022-09-14 활성 가스 생성 장치 Active KR102939982B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/034306 WO2024057424A1 (ja) 2022-09-14 2022-09-14 活性ガス生成装置

Publications (2)

Publication Number Publication Date
KR20240048546A KR20240048546A (ko) 2024-04-15
KR102939982B1 true KR102939982B1 (ko) 2026-03-16

Family

ID=88418527

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247009854A Active KR102939982B1 (ko) 2022-09-14 2022-09-14 활성 가스 생성 장치

Country Status (7)

Country Link
US (1) US20240429028A1 (https=)
EP (1) EP4401514A4 (https=)
JP (1) JP7366513B1 (https=)
KR (1) KR102939982B1 (https=)
CN (1) CN118044338A (https=)
TW (1) TWI875036B (https=)
WO (1) WO2024057424A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060152133A1 (en) * 2003-07-10 2006-07-13 Ngk Insulators, Ltd. Plasma generating electrode and plasma reactor

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557564A (en) * 1978-06-30 1980-01-19 Sumitomo Precision Prod Co Ltd Ozonizer
JPH071592U (ja) * 1993-06-10 1995-01-10 啓平 李 コロナ発生器
US7767167B2 (en) * 2003-07-28 2010-08-03 Iono2X Engineering, L.L.C. Dielectric barrier discharge cell with hermetically sealed electrodes, apparatus and method for the treatment of odor and volatile organic compound contaminants in air emissions, and for purifying gases and sterilizing surfaces
KR101254342B1 (ko) * 2006-10-17 2013-04-12 엘지전자 주식회사 플라즈마 발생 장치
US9120073B2 (en) * 2009-06-05 2015-09-01 Eon Labs, Llc Distributed dielectric barrier discharge reactor
JP6175721B2 (ja) * 2012-11-09 2017-08-09 株式会社渡辺商行 オゾン発生装置、及び、オゾン発生方法
EP2960358A1 (en) * 2014-06-25 2015-12-30 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Plasma source and surface treatment method
US20160233059A1 (en) * 2015-02-06 2016-08-11 Ionfield Holdings, Llc Methods and systems for generating plasma to clean objects
WO2019138453A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置及び成膜処理装置
KR102510329B1 (ko) * 2018-06-25 2023-03-17 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 활성 가스 생성 장치 및 성막 처리 장치

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060152133A1 (en) * 2003-07-10 2006-07-13 Ngk Insulators, Ltd. Plasma generating electrode and plasma reactor

Also Published As

Publication number Publication date
JP7366513B1 (ja) 2023-10-23
TWI875036B (zh) 2025-03-01
JPWO2024057424A1 (https=) 2024-03-21
TW202411457A (zh) 2024-03-16
EP4401514A1 (en) 2024-07-17
US20240429028A1 (en) 2024-12-26
KR20240048546A (ko) 2024-04-15
EP4401514A4 (en) 2026-02-11
CN118044338A (zh) 2024-05-14
WO2024057424A1 (ja) 2024-03-21

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