JP7366513B1 - 活性ガス生成装置 - Google Patents

活性ガス生成装置 Download PDF

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Publication number
JP7366513B1
JP7366513B1 JP2023517797A JP2023517797A JP7366513B1 JP 7366513 B1 JP7366513 B1 JP 7366513B1 JP 2023517797 A JP2023517797 A JP 2023517797A JP 2023517797 A JP2023517797 A JP 2023517797A JP 7366513 B1 JP7366513 B1 JP 7366513B1
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JP
Japan
Prior art keywords
grooves
space
active gas
electrode structures
high voltage
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JP2023517797A
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English (en)
Japanese (ja)
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JPWO2024057424A1 (https=
JPWO2024057424A5 (https=
Inventor
謙資 渡辺
廉 有田
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Toshiba Mitsubishi Electric Industrial Systems Corp
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Toshiba Mitsubishi Electric Industrial Systems Corp
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Publication of JPWO2024057424A5 publication Critical patent/JPWO2024057424A5/ja
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/3255—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrostatic Separation (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
JP2023517797A 2022-09-14 2022-09-14 活性ガス生成装置 Active JP7366513B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/034306 WO2024057424A1 (ja) 2022-09-14 2022-09-14 活性ガス生成装置

Publications (3)

Publication Number Publication Date
JP7366513B1 true JP7366513B1 (ja) 2023-10-23
JPWO2024057424A1 JPWO2024057424A1 (https=) 2024-03-21
JPWO2024057424A5 JPWO2024057424A5 (https=) 2024-08-21

Family

ID=88418527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023517797A Active JP7366513B1 (ja) 2022-09-14 2022-09-14 活性ガス生成装置

Country Status (7)

Country Link
US (1) US20240429028A1 (https=)
EP (1) EP4401514A4 (https=)
JP (1) JP7366513B1 (https=)
KR (1) KR102939982B1 (https=)
CN (1) CN118044338A (https=)
TW (1) TWI875036B (https=)
WO (1) WO2024057424A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557564A (en) * 1978-06-30 1980-01-19 Sumitomo Precision Prod Co Ltd Ozonizer
JPH071592U (ja) * 1993-06-10 1995-01-10 啓平 李 コロナ発生器
WO2005005798A1 (ja) * 2003-07-10 2005-01-20 Ngk Insulators, Ltd. プラズマ発生電極及びプラズマ反応器
JP2014094863A (ja) * 2012-11-09 2014-05-22 Wakomu:Kk オゾン発生装置、及び、オゾン発生方法
US20160233059A1 (en) * 2015-02-06 2016-08-11 Ionfield Holdings, Llc Methods and systems for generating plasma to clean objects

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7767167B2 (en) * 2003-07-28 2010-08-03 Iono2X Engineering, L.L.C. Dielectric barrier discharge cell with hermetically sealed electrodes, apparatus and method for the treatment of odor and volatile organic compound contaminants in air emissions, and for purifying gases and sterilizing surfaces
KR101254342B1 (ko) * 2006-10-17 2013-04-12 엘지전자 주식회사 플라즈마 발생 장치
US9120073B2 (en) * 2009-06-05 2015-09-01 Eon Labs, Llc Distributed dielectric barrier discharge reactor
EP2960358A1 (en) * 2014-06-25 2015-12-30 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Plasma source and surface treatment method
WO2019138453A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置及び成膜処理装置
KR102510329B1 (ko) * 2018-06-25 2023-03-17 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 활성 가스 생성 장치 및 성막 처리 장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557564A (en) * 1978-06-30 1980-01-19 Sumitomo Precision Prod Co Ltd Ozonizer
JPH071592U (ja) * 1993-06-10 1995-01-10 啓平 李 コロナ発生器
WO2005005798A1 (ja) * 2003-07-10 2005-01-20 Ngk Insulators, Ltd. プラズマ発生電極及びプラズマ反応器
JP2014094863A (ja) * 2012-11-09 2014-05-22 Wakomu:Kk オゾン発生装置、及び、オゾン発生方法
US20160233059A1 (en) * 2015-02-06 2016-08-11 Ionfield Holdings, Llc Methods and systems for generating plasma to clean objects

Also Published As

Publication number Publication date
TWI875036B (zh) 2025-03-01
JPWO2024057424A1 (https=) 2024-03-21
TW202411457A (zh) 2024-03-16
EP4401514A1 (en) 2024-07-17
US20240429028A1 (en) 2024-12-26
KR20240048546A (ko) 2024-04-15
EP4401514A4 (en) 2026-02-11
KR102939982B1 (ko) 2026-03-16
CN118044338A (zh) 2024-05-14
WO2024057424A1 (ja) 2024-03-21

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