CN118044338A - 活性气体生成装置 - Google Patents
活性气体生成装置 Download PDFInfo
- Publication number
- CN118044338A CN118044338A CN202280065345.8A CN202280065345A CN118044338A CN 118044338 A CN118044338 A CN 118044338A CN 202280065345 A CN202280065345 A CN 202280065345A CN 118044338 A CN118044338 A CN 118044338A
- Authority
- CN
- China
- Prior art keywords
- electrode
- grooves
- space
- dielectric film
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/3255—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/327—Arrangements for generating the plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electrostatic Separation (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/034306 WO2024057424A1 (ja) | 2022-09-14 | 2022-09-14 | 活性ガス生成装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN118044338A true CN118044338A (zh) | 2024-05-14 |
Family
ID=88418527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202280065345.8A Pending CN118044338A (zh) | 2022-09-14 | 2022-09-14 | 活性气体生成装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240429028A1 (https=) |
| EP (1) | EP4401514A4 (https=) |
| JP (1) | JP7366513B1 (https=) |
| KR (1) | KR102939982B1 (https=) |
| CN (1) | CN118044338A (https=) |
| TW (1) | TWI875036B (https=) |
| WO (1) | WO2024057424A1 (https=) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS557564A (en) * | 1978-06-30 | 1980-01-19 | Sumitomo Precision Prod Co Ltd | Ozonizer |
| JPH071592U (ja) * | 1993-06-10 | 1995-01-10 | 啓平 李 | コロナ発生器 |
| EP1645730B1 (en) * | 2003-07-10 | 2012-02-15 | NGK Insulators, Ltd. | Plasma generating electrode and plasma reactor |
| US7767167B2 (en) * | 2003-07-28 | 2010-08-03 | Iono2X Engineering, L.L.C. | Dielectric barrier discharge cell with hermetically sealed electrodes, apparatus and method for the treatment of odor and volatile organic compound contaminants in air emissions, and for purifying gases and sterilizing surfaces |
| KR101254342B1 (ko) * | 2006-10-17 | 2013-04-12 | 엘지전자 주식회사 | 플라즈마 발생 장치 |
| US9120073B2 (en) * | 2009-06-05 | 2015-09-01 | Eon Labs, Llc | Distributed dielectric barrier discharge reactor |
| JP6175721B2 (ja) * | 2012-11-09 | 2017-08-09 | 株式会社渡辺商行 | オゾン発生装置、及び、オゾン発生方法 |
| EP2960358A1 (en) * | 2014-06-25 | 2015-12-30 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Plasma source and surface treatment method |
| US20160233059A1 (en) * | 2015-02-06 | 2016-08-11 | Ionfield Holdings, Llc | Methods and systems for generating plasma to clean objects |
| WO2019138453A1 (ja) | 2018-01-10 | 2019-07-18 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置及び成膜処理装置 |
| KR102510329B1 (ko) * | 2018-06-25 | 2023-03-17 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 활성 가스 생성 장치 및 성막 처리 장치 |
-
2022
- 2022-09-14 KR KR1020247009854A patent/KR102939982B1/ko active Active
- 2022-09-14 WO PCT/JP2022/034306 patent/WO2024057424A1/ja not_active Ceased
- 2022-09-14 US US18/700,848 patent/US20240429028A1/en active Pending
- 2022-09-14 EP EP22958754.8A patent/EP4401514A4/en active Pending
- 2022-09-14 CN CN202280065345.8A patent/CN118044338A/zh active Pending
- 2022-09-14 JP JP2023517797A patent/JP7366513B1/ja active Active
-
2023
- 2023-06-16 TW TW112122746A patent/TWI875036B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JP7366513B1 (ja) | 2023-10-23 |
| TWI875036B (zh) | 2025-03-01 |
| JPWO2024057424A1 (https=) | 2024-03-21 |
| TW202411457A (zh) | 2024-03-16 |
| EP4401514A1 (en) | 2024-07-17 |
| US20240429028A1 (en) | 2024-12-26 |
| KR20240048546A (ko) | 2024-04-15 |
| EP4401514A4 (en) | 2026-02-11 |
| KR102939982B1 (ko) | 2026-03-16 |
| WO2024057424A1 (ja) | 2024-03-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |