TWI825133B - 測量裝置 - Google Patents
測量裝置 Download PDFInfo
- Publication number
- TWI825133B TWI825133B TW108125832A TW108125832A TWI825133B TW I825133 B TWI825133 B TW I825133B TW 108125832 A TW108125832 A TW 108125832A TW 108125832 A TW108125832 A TW 108125832A TW I825133 B TWI825133 B TW I825133B
- Authority
- TW
- Taiwan
- Prior art keywords
- contact
- contact piece
- measurement object
- measuring device
- base
- Prior art date
Links
- 238000005259 measurement Methods 0.000 claims abstract description 182
- 230000005540 biological transmission Effects 0.000 claims abstract description 120
- 239000000758 substrate Substances 0.000 claims abstract description 98
- 238000005452 bending Methods 0.000 claims description 13
- 230000008602 contraction Effects 0.000 claims description 2
- 230000004048 modification Effects 0.000 description 17
- 238000012986 modification Methods 0.000 description 17
- 238000003780 insertion Methods 0.000 description 11
- 230000037431 insertion Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 239000000523 sample Substances 0.000 description 9
- 230000007246 mechanism Effects 0.000 description 8
- 230000005489 elastic deformation Effects 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000007689 inspection Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 229910001315 Tool steel Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 230000009466 transformation Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Measuring Leads Or Probes (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018141831A JP2020016625A (ja) | 2018-07-27 | 2018-07-27 | 測定装置 |
JP2018-141831 | 2018-07-27 | ||
JP2018-141833 | 2018-07-27 | ||
JP2018141832A JP2020016626A (ja) | 2018-07-27 | 2018-07-27 | 測定装置 |
JP2018-141832 | 2018-07-27 | ||
JP2018141833A JP2020016627A (ja) | 2018-07-27 | 2018-07-27 | 測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202007979A TW202007979A (zh) | 2020-02-16 |
TWI825133B true TWI825133B (zh) | 2023-12-11 |
Family
ID=69181468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108125832A TWI825133B (zh) | 2018-07-27 | 2019-07-22 | 測量裝置 |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN112771387A (ja) |
TW (1) | TWI825133B (ja) |
WO (1) | WO2020022085A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI725821B (zh) * | 2020-04-20 | 2021-04-21 | 躍澐科技股份有限公司 | 測試探針座結構 |
TWI802934B (zh) * | 2020-07-16 | 2023-05-21 | 日商日置電機股份有限公司 | 測量裝置 |
WO2023228487A1 (ja) * | 2022-05-24 | 2023-11-30 | 株式会社村田製作所 | 測定ユニットおよび測定装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06308155A (ja) * | 1993-04-27 | 1994-11-04 | Tokyo Electron Ltd | プローブ装置 |
JP2000131340A (ja) * | 1998-10-28 | 2000-05-12 | Hioki Ee Corp | コンタクトプローブ装置 |
JP2004340586A (ja) * | 2003-05-13 | 2004-12-02 | Jst Mfg Co Ltd | 電気接触子、コンタクトブロック、高周波プローブ及び高周波プローブの製造方法 |
TW200533925A (en) * | 2004-02-23 | 2005-10-16 | Nihon Denshizairyo Kk | Probe card |
JP2006330006A (ja) * | 2006-09-04 | 2006-12-07 | Hioki Ee Corp | コンタクトプローブ装置および回路基板検査装置 |
JP2008045916A (ja) * | 2006-08-11 | 2008-02-28 | Japan Electronic Materials Corp | プローブの表面処理方法及びプローブ |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5506515A (en) * | 1994-07-20 | 1996-04-09 | Cascade Microtech, Inc. | High-frequency probe tip assembly |
JP4171094B2 (ja) * | 1998-01-13 | 2008-10-22 | 株式会社日本マイクロニクス | プローブユニット |
JP3871825B2 (ja) * | 1999-04-16 | 2007-01-24 | 株式会社日立製作所 | 金属質粉成形素材の再圧縮成形体及びその再圧縮成形体から得られる焼結体並びにそれらの製造方法 |
AU5224499A (en) * | 1999-07-21 | 2001-02-13 | Cascade Microtech, Inc. | Membrane probing system |
JP2001041975A (ja) * | 1999-07-29 | 2001-02-16 | Hioki Ee Corp | コンタクトプローブ装置および回路基板検査装置 |
DE19945178C2 (de) * | 1999-09-21 | 2003-05-28 | Rosenberger Hochfrequenztech | Meßspitze zur Hochfrequenzmessung und Verfahren zu deren Herstellung |
JP2003035725A (ja) * | 2001-07-25 | 2003-02-07 | Micronics Japan Co Ltd | 電気的接続装置 |
US7057404B2 (en) * | 2003-05-23 | 2006-06-06 | Sharp Laboratories Of America, Inc. | Shielded probe for testing a device under test |
JP2005272947A (ja) * | 2004-03-25 | 2005-10-06 | Tomokazu Takeuchi | 燒結金属 |
JP2006226829A (ja) * | 2005-02-17 | 2006-08-31 | Yamaha Corp | プローブヘッド及び電子デバイスの検査方法 |
JP5113481B2 (ja) * | 2007-10-23 | 2013-01-09 | 株式会社日本マイクロニクス | 接触子及びこれを用いる電気的接続装置 |
JP5219633B2 (ja) * | 2008-06-05 | 2013-06-26 | 東京特殊電線株式会社 | 高周波測定用プローブ |
JP2010060358A (ja) * | 2008-09-02 | 2010-03-18 | Murata Mfg Co Ltd | 角速度センサ |
JP5325085B2 (ja) * | 2009-12-24 | 2013-10-23 | 日本碍子株式会社 | 接続装置 |
US8963567B2 (en) * | 2011-10-31 | 2015-02-24 | International Business Machines Corporation | Pressure sensing and control for semiconductor wafer probing |
-
2019
- 2019-07-11 CN CN201980064236.2A patent/CN112771387A/zh active Pending
- 2019-07-11 WO PCT/JP2019/027525 patent/WO2020022085A1/ja active Application Filing
- 2019-07-22 TW TW108125832A patent/TWI825133B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06308155A (ja) * | 1993-04-27 | 1994-11-04 | Tokyo Electron Ltd | プローブ装置 |
JP2000131340A (ja) * | 1998-10-28 | 2000-05-12 | Hioki Ee Corp | コンタクトプローブ装置 |
JP2004340586A (ja) * | 2003-05-13 | 2004-12-02 | Jst Mfg Co Ltd | 電気接触子、コンタクトブロック、高周波プローブ及び高周波プローブの製造方法 |
TW200533925A (en) * | 2004-02-23 | 2005-10-16 | Nihon Denshizairyo Kk | Probe card |
JP2008045916A (ja) * | 2006-08-11 | 2008-02-28 | Japan Electronic Materials Corp | プローブの表面処理方法及びプローブ |
JP2006330006A (ja) * | 2006-09-04 | 2006-12-07 | Hioki Ee Corp | コンタクトプローブ装置および回路基板検査装置 |
Also Published As
Publication number | Publication date |
---|---|
TW202007979A (zh) | 2020-02-16 |
WO2020022085A1 (ja) | 2020-01-30 |
CN112771387A (zh) | 2021-05-07 |
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