TWI822937B - 薄膜之製造方法及製造裝置以及液晶固化薄膜之製造方法 - Google Patents
薄膜之製造方法及製造裝置以及液晶固化薄膜之製造方法 Download PDFInfo
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- TWI822937B TWI822937B TW108147979A TW108147979A TWI822937B TW I822937 B TWI822937 B TW I822937B TW 108147979 A TW108147979 A TW 108147979A TW 108147979 A TW108147979 A TW 108147979A TW I822937 B TWI822937 B TW I822937B
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JP2011028039A (ja) * | 2009-07-27 | 2011-02-10 | Nitto Denko Corp | 積層光学フィルムの製造方法 |
JP2016012031A (ja) * | 2014-06-27 | 2016-01-21 | 日本ゼオン株式会社 | 複層フィルムの製造方法、位相差フィルム、円偏光板、及び、有機エレクトロルミネッセンス表示装置 |
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JP2006099855A (ja) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 透明層製造方法および透明層製造装置 |
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JP2015143786A (ja) | 2014-01-31 | 2015-08-06 | 住友化学株式会社 | 液晶硬化膜 |
JPWO2016171041A1 (ja) * | 2015-04-24 | 2018-02-15 | 日本ゼオン株式会社 | 複層フィルムの製造方法及び複層フィルム |
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JP2011028039A (ja) * | 2009-07-27 | 2011-02-10 | Nitto Denko Corp | 積層光学フィルムの製造方法 |
JP2016012031A (ja) * | 2014-06-27 | 2016-01-21 | 日本ゼオン株式会社 | 複層フィルムの製造方法、位相差フィルム、円偏光板、及び、有機エレクトロルミネッセンス表示装置 |
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