TWI811414B - 磁碟基板用研磨劑組合物 - Google Patents

磁碟基板用研磨劑組合物 Download PDF

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Publication number
TWI811414B
TWI811414B TW108127247A TW108127247A TWI811414B TW I811414 B TWI811414 B TW I811414B TW 108127247 A TW108127247 A TW 108127247A TW 108127247 A TW108127247 A TW 108127247A TW I811414 B TWI811414 B TW I811414B
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Taiwan
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monomer
monomers
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essential
abrasive composition
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TW108127247A
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English (en)
Chinese (zh)
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TW202018053A (zh
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安藤順一郎
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日商山口精研工業股份有限公司
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
TW108127247A 2018-08-03 2019-07-31 磁碟基板用研磨劑組合物 TWI811414B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-146517 2018-08-03
JP2018146517A JP7128684B2 (ja) 2018-08-03 2018-08-03 磁気ディスク基板用研磨剤組成物

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TW202018053A TW202018053A (zh) 2020-05-16
TWI811414B true TWI811414B (zh) 2023-08-11

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TW108127247A TWI811414B (zh) 2018-08-03 2019-07-31 磁碟基板用研磨劑組合物

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JP (1) JP7128684B2 (enrdf_load_stackoverflow)
MY (1) MY197950A (enrdf_load_stackoverflow)
TW (1) TWI811414B (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7440326B2 (ja) * 2020-04-01 2024-02-28 山口精研工業株式会社 研磨剤組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336945B1 (en) * 1996-11-14 2002-01-08 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
CN102108281A (zh) * 2009-12-25 2011-06-29 花王株式会社 研磨液组合物
TW201734160A (zh) * 2016-02-29 2017-10-01 Fujimi Inc 研磨用組成物及使用其之研磨方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014032718A (ja) * 2012-08-01 2014-02-20 Kao Corp 磁気ディスク基板の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336945B1 (en) * 1996-11-14 2002-01-08 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
CN102108281A (zh) * 2009-12-25 2011-06-29 花王株式会社 研磨液组合物
TW201734160A (zh) * 2016-02-29 2017-10-01 Fujimi Inc 研磨用組成物及使用其之研磨方法

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TW202018053A (zh) 2020-05-16
JP2020021527A (ja) 2020-02-06
MY197950A (en) 2023-07-25
JP7128684B2 (ja) 2022-08-31

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