TWI797114B - 移動體裝置、曝光裝置、平板顯示器的製造方法、元件製造方法以及移動體的驅動方法 - Google Patents

移動體裝置、曝光裝置、平板顯示器的製造方法、元件製造方法以及移動體的驅動方法 Download PDF

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Publication number
TWI797114B
TWI797114B TW107111169A TW107111169A TWI797114B TW I797114 B TWI797114 B TW I797114B TW 107111169 A TW107111169 A TW 107111169A TW 107111169 A TW107111169 A TW 107111169A TW I797114 B TWI797114 B TW I797114B
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TW
Taiwan
Prior art keywords
moving body
actuator
relatively
moving
stage
Prior art date
Application number
TW107111169A
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English (en)
Chinese (zh)
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TW201843706A (zh
Inventor
原篤史
坂田晃一
橋場成史
Original Assignee
日商尼康股份有限公司
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Publication of TW201843706A publication Critical patent/TW201843706A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D3/00—Control of position or direction
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D3/00—Control of position or direction
    • G05D3/12—Control of position or direction using feedback
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW107111169A 2017-03-31 2018-03-30 移動體裝置、曝光裝置、平板顯示器的製造方法、元件製造方法以及移動體的驅動方法 TWI797114B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-071013 2017-03-31
JP2017071013 2017-03-31

Publications (2)

Publication Number Publication Date
TW201843706A TW201843706A (zh) 2018-12-16
TWI797114B true TWI797114B (zh) 2023-04-01

Family

ID=63676422

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107111169A TWI797114B (zh) 2017-03-31 2018-03-30 移動體裝置、曝光裝置、平板顯示器的製造方法、元件製造方法以及移動體的驅動方法

Country Status (5)

Country Link
JP (2) JPWO2018181912A1 (ja)
KR (2) KR102595405B1 (ja)
CN (1) CN110709793B (ja)
TW (1) TWI797114B (ja)
WO (1) WO2018181912A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113323512B (zh) * 2020-02-28 2022-06-17 上海微电子装备（集团）股份有限公司 版盒解锁装置及掩模传输版库设备

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0867773A2 (en) * 1997-03-25 1998-09-30 Nikon Corporation Stage apparatus and method for producing circuit device utilizing the same
WO2000002239A1 (fr) * 1998-07-03 2000-01-13 Nikon Corporation Systeme d'exposition, procede de production de ce dernier, procede de transfert de tranches, dispositif et procede de fabrication du dispositif
US20050200827A1 (en) * 2004-03-01 2005-09-15 Canon Kabushiki Kaisha Positioning apparatus and exposure apparatus using the same
US20100018950A1 (en) * 2007-03-05 2010-01-28 Nikon Corporation Movable body apparatus, pattern forming apparatus and pattern forming method, device manufacturing method, manufacturing method of movable body apparatus, and movable body drive method
TW201319758A (zh) * 2011-08-30 2013-05-16 尼康股份有限公司 基板處理裝置及基板處理方法、曝光方法及曝光裝置、以及元件製造方法、及平板顯示器之製造方法
TW201704892A (zh) * 2015-03-31 2017-02-01 尼康股份有限公司 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3745167B2 (ja) * 1998-07-29 2006-02-15 キヤノン株式会社 ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法
JP2003045785A (ja) * 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法
JP4211272B2 (ja) * 2002-04-12 2009-01-21 株式会社ニコン 露光装置及び露光方法
JP3963805B2 (ja) 2002-09-12 2007-08-22 シーケーディ株式会社 微動装置
JP4458322B2 (ja) * 2003-01-14 2010-04-28 キヤノン株式会社 露光装置およびデバイス製造方法
US20060061218A1 (en) 2004-09-21 2006-03-23 Nikon Corporation Dual force wafer table
JP2007027331A (ja) * 2005-07-14 2007-02-01 Canon Inc 駆動装置及びこれを用いた露光装置並びにデバイス製造方法
JP2008147280A (ja) * 2006-12-07 2008-06-26 Nikon Corp 露光装置
JP2008182210A (ja) * 2006-12-27 2008-08-07 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP4553405B2 (ja) * 2008-12-24 2010-09-29 キヤノン株式会社 位置決め装置、露光装置およびデバイス製造方法
JP5807841B2 (ja) * 2011-08-30 2015-11-10 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP2014098731A (ja) * 2012-11-13 2014-05-29 Nikon Corp 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP6181956B2 (ja) * 2013-03-26 2017-08-16 キヤノン株式会社 ステージ装置、リソグラフィ装置及びデバイス製造方法
JPWO2015147039A1 (ja) * 2014-03-26 2017-04-13 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0867773A2 (en) * 1997-03-25 1998-09-30 Nikon Corporation Stage apparatus and method for producing circuit device utilizing the same
WO2000002239A1 (fr) * 1998-07-03 2000-01-13 Nikon Corporation Systeme d'exposition, procede de production de ce dernier, procede de transfert de tranches, dispositif et procede de fabrication du dispositif
US20050200827A1 (en) * 2004-03-01 2005-09-15 Canon Kabushiki Kaisha Positioning apparatus and exposure apparatus using the same
US20100018950A1 (en) * 2007-03-05 2010-01-28 Nikon Corporation Movable body apparatus, pattern forming apparatus and pattern forming method, device manufacturing method, manufacturing method of movable body apparatus, and movable body drive method
TW201319758A (zh) * 2011-08-30 2013-05-16 尼康股份有限公司 基板處理裝置及基板處理方法、曝光方法及曝光裝置、以及元件製造方法、及平板顯示器之製造方法
TW201704892A (zh) * 2015-03-31 2017-02-01 尼康股份有限公司 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法

Also Published As

Publication number Publication date
KR102441111B1 (ko) 2022-09-06
CN110709793A (zh) 2020-01-17
KR20190122777A (ko) 2019-10-30
TW201843706A (zh) 2018-12-16
KR102595405B1 (ko) 2023-10-27
CN110709793B (zh) 2024-03-08
JP7472958B2 (ja) 2024-04-23
KR20220122785A (ko) 2022-09-02
JP2023029356A (ja) 2023-03-03
JPWO2018181912A1 (ja) 2020-02-13
WO2018181912A1 (ja) 2018-10-04

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