TWI797114B - Moving body device, exposure apparatus, manufacturing method of flat panel display, element manufacturing method, and driving method of moving body - Google Patents

Abstract

A moving body device, an exposure device, a method of manufacturing a flat panel display, a method of manufacturing an element, and a method of driving a moving body. The base plate platform device includes: a fine movement platform; an X coarse movement platform; a Y coarse movement platform; an actuator unit, including a first thrust for the X coarse movement platform relative to the Y coarse movement platform, which is given to the fine movement platform voice coil motor, and an air actuator that provides the second thrust greater than the first thrust to the fine movement stage, and the actuator unit makes the fine movement stage and the X coarse movement stage relative to the Y coarse movement stage. drive; and a control system, which controls the voice coil motor and the air actuator, and controls the voice coil motor and the air actuator based on the thrust required when the fine motion platform and the X coarse motion platform are relatively moved relative to the Y coarse motion platform. at least either one.

Description

Manufacturer of mobile devices, exposure devices, and flat panel displays method, device manufacturing method, and driving method of a moving body

The present invention relates to a moving body device, an exposure device, a method for manufacturing a flat panel display, a method for manufacturing an element, and a method for driving a moving body. More specifically, it relates to a method for relatively moving a first moving body and a second moving body. A moving body device and a driving method of the moving body, an exposure device including the moving body device, and a method of manufacturing a flat panel display or an element using the exposure device.

Previously, in the lithography process of manufacturing electronic components (micro devices) such as liquid crystal display parts and semiconductor parts (integrated circuits, etc.), the use of illumination light through a projection optical system (lens) (energy beam (energy beam)) exposes the glass plate or wafer (hereinafter collectively referred to as "substrate"), and the photomask (photo mask) or network cable (reticle) (hereinafter collectively referred to as "mask") has The prescribed pattern is transferred to the substrate by an exposure device.

As such an exposure apparatus, there is known an exposure apparatus including a stage device having a coarse and fine movement configuration including a coarse movement stage movable in a horizontal plane with a long stroke (long stroke), and a holding stage. The micro-motion platform of the substrate, and the micro-motion actuator such as an electromagnetic motor is used to push the micro-motion platform from the coarse motion platform. force to perform high-precision position control of the micro-motion stage (for example, refer to Patent Document 1).

Here, due to the increase in the size of the substrate in recent years, the micro-motion stage tends to increase in size. Along with this, in order to cope with the increase in the size of the micro-motion platform which is the object to be driven, the micro-motion actuator is also required to increase in output (upsizing).

[Prior art literature] [Patent Document]

[Patent Document 1] Specification of U.S. Patent Application Publication No. 2010/0018950

According to a first embodiment, there is provided a moving body device, which includes: a first moving body capable of moving in a predetermined direction; a second moving body configured so that the first moving body can move relatively and move toward the predetermined moving in one direction; a base supporting the second moving body; an actuator unit including a first thrust that makes the second moving body relatively move in the predetermined direction with respect to the base and a first actuator applied to the first moving body, and a second actuator applied to the first moving body by setting the thrust force to a second thrust force greater than the first thrust force, and driving the first moving body and the second moving body relative to the base with respect to the predetermined direction; and a control system controlling the first actuator and the second actuator based on making the The thrust force required when the first moving body and the second moving body move relative to the base controls at least one of the first actuator and the second actuator.

According to a second embodiment, there is provided an exposure apparatus including: a first A moving body device according to an embodiment; and a pattern forming device for forming a predetermined pattern with an energy beam on an object held on the first moving body of the moving body device.

According to a third embodiment, there is provided a method of manufacturing a flat panel display, including: exposing the object using the exposure device of the second embodiment; and developing the exposed substrate.

According to a fourth embodiment, there is provided a device manufacturing method including: exposing the object using the exposure device according to the second embodiment; and developing the exposed object.

According to a fifth embodiment, there is provided a method of driving a moving body, including: relatively driving a first moving body and a second moving body in a predetermined direction with respect to a base supporting the second moving body, the first moving body can move in the specified direction, and the second moving body is set so that the first moving body can move relatively and move toward the specified direction; the second moving body will move relative to the base The thrust for relative movement in the predetermined direction is defined as a first thrust, which is applied to the first moving body by a first actuator; the second moving body will move in the predetermined direction relative to the base. The thrust of the relative movement is set to a second thrust greater than the first thrust, which is applied to the first moving body by a second actuator; and the first actuator and the second actuator are controlled, Controlling at least one of the first actuator and the second actuator based on the thrust force required to relatively move the first moving body and the second moving body relative to the base .

10: Liquid crystal exposure device

12: Lighting system

14: Mask platform device

14a: Main platform

14b: Secondary platform

14c: Stand

14d: Voice coil motor

16: Projection optical system

18: Device body

18a: Shelving platform

18b: Middle frame platform

18c: Lower shelf

19: Anti-vibration device

20: Substrate platform device

22: Substrate holder

24:Micro-motion platform

26: Coarse movement platform

26: Coarse movement platform

28: Self-weight support device

30: Bottom frame

32: Y coarse motion platform

34: X coarse motion platform

36: X-ray

38, 50: Linear guides

42: Weight cancellation device

44: Y stepping guide

46: Leveling device

48: Air Bearing

52: Connecting components

54: Optical interferometer

56: strip mirror

60: Substrate drive system

62: 1st drive system

64: Second drive system

66: 3rd drive system

68: Z Tilt Drive System

70: Actuator unit

70X ₁ , 70X ₂ : X actuator unit

70Y ₁ , 70Y ₂ : Y actuator unit

72:Voice coil motor

72X:X voice coil motor

72Z:Z voice coil motor

74:Air actuator

74a: Pressure sensor

74b: Pressurized air devices

74c: Valve

74X:X Air Actuator

76a: Stator

76b: Movers

78: Pillar

80: Controller

82a: FF (feedforward) controller

82b: FB (feedback) controller

84a:Air drive

84b: Motor driver

86a:LPF _mix

86b:LPF _air

88: Acceleration sensor

90: Master control device

92: Mask drive system

94: Mask measurement system

96:Substrate measurement system

F: floor

G: center of gravity position

IL: illumination light

M: mask

P: Substrate

X, Y, Z: direction

FIG. 1 is a diagram schematically showing the configuration of a liquid crystal exposure apparatus according to one embodiment.

2 is a diagram for explaining the configuration of a first drive system (fine stage drive system) among substrate drive systems included in the liquid crystal exposure apparatus of FIG. 1 .

FIG. 3 is a conceptual diagram of a first drive system.

FIG. 4 is a diagram for explaining the control balance of two actuators included in the first drive system.

Fig. 5 is a control block diagram of the first drive system.

6 is a block diagram showing an input-output relationship of a main controller included in the liquid crystal exposure apparatus.

Hereinafter, an embodiment will be described using FIGS. 1 to 6 .

In FIG. 1, the structure of the exposure apparatus (here, liquid crystal exposure apparatus 10) which concerns on one Embodiment is shown schematically. The liquid crystal exposure apparatus 10 is a projection exposure apparatus of a step-and-scan system in which an object (here, a glass substrate P) is used as an exposure target, and is a so-called scanner. The glass substrate P (hereinafter simply referred to as "substrate P") is formed in a rectangular (square) shape in plan view, and is used for liquid crystal display devices (flat panel displays) and the like.

The liquid crystal exposure device 10 includes an illumination system 12, holding and forming a circuit diagram The mask platform device 14 of the mask M such as a case, the projection optical system 16, the device body 18, and the substrate P coated with a resist (sensing agent) on the surface (the surface facing the +Z side in FIG. 1 ) are opposed to each other. A moving body device (here, a substrate stage device 20 ) that moves relatively to the projection optical system 16 , a control system for the components, and the like. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned relative to the projection optical system 16 during exposure is referred to as the X-axis direction, and the direction perpendicular to the X-axis in the horizontal plane is referred to as the Y-axis direction. The direction perpendicular to the X-axis and the Y-axis is referred to as the Z-axis direction, and the rotation directions around the X-axis, Y-axis, and Z-axis are respectively referred to as the θx direction, θy direction, and θz direction. In addition, positions in the X-axis direction, Y-axis direction, and Z-axis direction will be described as X positions, Y positions, and Z positions, respectively.

The lighting system 12 is configured in the same manner as the lighting system disclosed in US Pat. A reflective mirror, a dichroic mirror, a shutter, a wavelength selection filter, various lenses, and the like shown in the figure are formed as a plurality of illumination light (illumination light) IL for exposure and are irradiated onto the mask M. As the illumination light IL, i-line (wavelength: 365 nm), g-line (wavelength: 436 nm), h-line (wavelength: 405 nm) and the like (or synthetic light of the i-line, g-line, and h-line) can be used.

As the mask M held by the mask stage device 14, a transmission type photomask in which a predetermined circuit pattern is formed on the lower surface (the surface facing the −Z side in FIG. 1 ) can be used. The mask platform device 14 is the same so-called rough and fine movement platform device as the device disclosed in International Publication No. 2010/131485, and includes a main platform for holding the mask M. stage (fine movement platform) 14a and a pair of auxiliary platforms (coarse movement platform) 14b. Each sub-stage 14b is driven with a long stroke in the X-axis direction by a linear motor on a corresponding stage 14c. In the mask stage device 14, a plurality of voice coil motors (voice coil motors) 14d constituting a mask drive system 92 (not shown in FIG. 1 ; refer to FIG. 6 ) together with the linear motor, and A thrust is appropriately applied to the main platform 14a from the sub-platform 14b. The main controller 90 (not shown in FIG. 1 ; refer to FIG. 6 ) moves the main stage 14 a (mask M) in the X-axis direction with the pair of sub-stages 14 b with respect to the illumination light IL through the mask drive system 92 . The upper side is driven with a long stroke, and is appropriately finely driven in the XY plane (including the Y-axis direction and the θz direction) with respect to the pair of sub-stages 14b. The position information in the XY plane of the main platform 14a is passed through the mask measurement system 94 (not shown in FIG. 1 . Refer to FIG. 6 ) including an encoder system (encoder system) or an interferometer (interferometer) system. Device 90 is obtained.

The projection optical system 16 is disposed below the mask stage device 14 . The projection optical system 16 is a so-called multi-lens projection optical system having the same structure as the projection optical system disclosed in US Pat. mod.

In the liquid crystal exposure device 10, if a plurality of illumination lights IL from the illumination system 12 are used to illuminate the illumination area on the mask M, the illumination light IL that has passed through (transmitted) the mask M will be transmitted through the projection optics. The system 16 forms a projected image (partial erect image) of the circuit pattern of the mask M in the illuminated area in the illuminated area (exposure area) conjugated to the illuminated area on the substrate P. Then, by moving the mask M relative to the illumination region (illumination light IL) in the scanning direction, And the substrate P moves relative to the exposure area (illumination light IL) along the scanning direction to perform scanning exposure of one shot area on the substrate P, and transfer the pattern formed on the mask M to the shot area. within the area.

The device body 18 supports the mask platform device 14 and the projection optical system 16 , and is installed on the floor F of a clean room via an anti-vibration device 19 . The device body 18 has the same configuration as the device body disclosed in US Patent Application Publication No. 2008/0030702, and includes an upper stand portion 18a, a pair of middle stand portions 18b, and a lower stand portion 18c. The pedestal 14 c of the cover platform device 14 is installed on the floor F in a state of being physically separated from the device main body 18 so as to be vibrately insulated from the device main body 18 .

The substrate stage device 20 is a device for controlling the position of the substrate P relative to the projection optical system 16 (illumination light IL) with high precision. axis direction) with a predetermined long stroke, and micro-drive in six degrees of freedom directions (X-axis, Y-axis, Z-axis, θx, θy, and θz directions). The substrate stage device 20 is a stage device with a so-called rough and fine movement structure similar to that disclosed in the US Patent Application Publication No. 2012/0057140 specification, except for a first driving system 62 (see FIG. 6 ) described later. The holder 22 holds the micro-movement stage 24 of the substrate P, the coarse-motion stage 26 of the gantry type (gantry type), a self-supporting device 28, a base frame (base frame) 30, and a substrate for driving each element constituting the substrate stage device 20 The driving system 60 (not shown in FIG. 1 , refer to FIG. 6 ), and the substrate measurement system 96 (not shown in FIG. 1 , refer to FIG. 6 ) for measuring the position information of the various elements.

The fine movement stage 24 is formed in a rectangular plate shape (or box shape) in plan view, and the substrate holder 22 is fixed to the upper surface thereof. The substrate holder 22 is formed in a rectangular plate shape (or box shape) in plan view whose dimensions in the X-axis direction and the Y-axis direction are longer than the fine movement stage 24, and places the substrate P on its upper surface (substrate mounting surface). . The dimensions of the upper surface of the substrate holder 22 in the X-axis direction and the Y-axis direction are set to be approximately the same as those of the substrate P (actually slightly shorter). The board|substrate P is held on the board|substrate holder 22 by vacuum suction in the state mounted on the upper surface of the board|substrate holder 22, and plane correction is performed on substantially the whole (entire surface) along the upper surface of the board|substrate holder 22.

The coarse motion stage 26 includes a Y coarse motion stage 32 and an X coarse motion stage 34 . The Y coarse movement stage 32 is disposed below the fine movement stage 24 (on the −Z side), that is, on the chassis 30 . The Y coarse motion stage 32 has a pair of X-ray beams 36 arranged in parallel at predetermined intervals along the Y-axis direction. A pair of X-ray beams 36 are placed on the base frame 30 via a mechanical linear guide, and can move freely in the Y-axis direction on the base frame 30 . The chassis 30 is installed on the floor F in a state of being physically separated from the apparatus main body 18 so as to be vibrately insulated from the apparatus main body 18 .

The X coarse motion stage 34 is disposed above the Y coarse motion stage 32 (on the +Z side), that is, below the fine motion stage 24 (between the fine motion stage 24 and the Y coarse motion stage 32 ). The X coarse motion stage 34 is a rectangular plate-shaped member in a plan view, and is placed on a pair of X beams 36 included in the Y coarse motion stage 32 through a plurality of mechanical linear guides 38 . The movable stage 32 is freely movable with respect to the X-axis direction, whereas it moves integrally with the Y-coarse movement stage 32 with respect to the Y-axis direction.

Self-weight supporting device 28 comprises the self-weight of supporting micro-motion platform 24 from below. A weight canceling device 42, and a Y step guide 44 supporting the weight canceling device 42 from below. A weight canceling device 42 (also called a stem or the like) is inserted into an opening (not shown) formed on the X coarse motion platform 34, and at the height of the center of gravity, the weight canceling device 42 (also called a stem, etc.) A connecting member (not shown) is mechanically connected to the X coarse motion platform 34 . The weight cancellation device 42 moves in the X-axis direction and/or the Y-axis direction integrally with the X coarse motion table 34 by being pulled by the X coarse motion table 34 .

The weight cancellation device 42 supports the self-weight of the micro-motion stage 24 from below in a non-contact manner via a pseudo-spherical bearing device called a leveling device 46 . The leveling device 46 supports the fine movement stage 24 so as to be able to swing (tilt) with respect to the XY plane. The leveling device 46 supports the weight canceling device 42 in a non-contact state from below via an air bearing (not shown). Thus, the relative movement of the micro-movement platform 24 in the X-axis direction, the Y-axis direction and the θz direction relative to the weight canceling device 42 (and the X coarse movement platform 34) and the swing relative to the horizontal plane (the relative movement in the θx direction and the θy direction) are allowed. move). The structures and functions of the weight cancellation device 42 , the leveling device 46 , and the deflection device have already been disclosed in US Patent Application Publication No. 2010/0018950, etc., so description thereof will be omitted.

The Y step guide 44 includes a member extending parallel to the X axis, and is disposed between a pair of X beams 36 included in the Y coarse motion stage 32 . The Y step guide 44 supports the weight canceling device 42 through an air bearing 48 in a non-contact state, and functions as a pressure plate when the weight canceling device 42 moves in the X-axis direction. The Y step guide 44 is placed on the lower platform portion 18c via the mechanical linear guide 50, and is relatively The lower stand portion 18c is movable in the Y-axis direction. The Y stepping guide 44 is mechanically connected to a pair of X-ray beams 36 through a plurality of coupling members 52 (flexure devices), and is pulled along the Y axis integrally with the Y coarse motion table 32 by being pulled by the Y coarse motion table 32 direction to move.

The substrate drive system 60 (not shown in FIG. 1 ; see FIG. 6 ) includes a first drive system 62 (see Fig. 6), the second drive system 64 (referring to Fig. 6) for making the Y coarse motion platform 32 drive with long stroke along the Y-axis direction on the chassis 30, and for making the X coarse motion platform 34 in the Y coarse motion The third driving system 66 (refer to FIG. 6 ) is driven by a long stroke in the X-axis direction on the platform 32 . The types of actuators constituting the second drive system 64 and the third drive system 66 are not particularly limited, and as an example, a linear motor or a ball screw drive device (a linear motor is shown in FIG. 1 ) can be used. The detailed structure of the 2nd drive system 64 and the 3rd drive system 66 is disclosed in US Patent Application Publication No. 2010/0018950 specification etc. as an example, and therefore description is abbreviate|omitted.

FIG. 2 shows a plan view of the substrate stage apparatus 20 with the substrate holder 22 (refer to FIG. 1 ) removed (Y coarse motion stage 32 , base frame 30 (refer to FIG. 1 ), etc. are also not shown). As shown in FIG. 2 , the first drive system 62 includes a pair of X actuator units 70X ₁ and X actuator units 70X 2 for imparting thrust in the X-axis direction to the micro-motion platform 24, and a pair of X-actuator units 70X ₂ for the micro-motion platform 24. 24 is a pair of Y actuator unit 70Y ₁ and Y actuator unit 70Y ₂ that impart thrust in the Y axis direction. A pair of X actuator units 70X ₁ and X actuator units 70X ₂ are arranged at a distance from each other in the Y-axis direction on the +X side of the fine movement stage 24 . The pair of X-actuator units 70X ₁ and X-actuator unit 70X ₂ are arranged symmetrically (upper-downward symmetry in FIG. 2 ) with respect to the center-of-gravity position G of the system (mass system) including the fine motion stage 24 . Here, the "system including the fine motion stage 24" refers to a system including the fine motion stage 24 and its integral parts (the substrate holder 22 and the like. Refer to FIG. 1 ).

The pair of Y actuator units 70Y ₁ and Y actuator unit 70Y ₂ are arranged at a distance from each other in the X-axis direction on the +Y side of the fine movement stage 24 . The pair of Y actuator units 70Y ₁ and 70Y ₂ are arranged symmetrically (right-left symmetry in FIG. 2 ) with respect to the center-of-gravity position G of the system including the fine motion stage 24 . The configuration of each Y actuator unit 70Y ₁ and Y actuator unit 70Y ₂ is the same as that of the X actuator unit 70X ₁ except for the configuration difference. Therefore, hereinafter, four actuator units and X actuator units are represented. The configuration of unit 70X ₁ is described. In addition, in FIG. 1, in order to explain the structure of the rough movement stage 26, the self-weight supporting device 28, etc., for convenience, a pair of X actuator unit _70X1 , X actuator unit _70X2 is not shown in figure.

The X actuator unit _70X1 includes a set of actuators including a moving magnet type X voice coil motor 72X and an X air actuator (pneumatic actuator) 74X. The X voice coil motor 72X is mainly used for position control (micro-drive) of submicron order (submicron order) to the projection optical system 16 (referring to FIG. 1 ) of the micro-motion platform 24, and the X air actuator 74X is mainly used for making the micro-motion platform 24 is used when accelerating to the specified exposure speed. As the X voice coil motor 72X and the X air actuator 74X included in the X actuator unit _70X1 , devices with a stroke (maximum transmission amount) of about ± several mm (for example, 2 mm to 3 mm) are used, and the X air actuator The motor 74X is a device that uses a higher output (capable of generating large thrust) than the X voice coil motor 72X. On the other hand, as the X voice coil motor 72X, compared with the X air actuator 74X, a device capable of controlling the position of the object to be driven (here, the fine movement stage 24 ) at a submicron level (micro-drive) is used.

A stator (stator) 76 a of the X voice coil motor 72X is attached to the X coarse movement stage 34 via a support 78 , and a mover 76 b is attached to a side surface of the fine movement stage 24 . The X air actuator 74X includes synthetic rubber bellows, and one end of the bellows in the expansion and contraction direction (here, the X-axis direction) is mechanically connected to the support 78 (X coarse motion platform 34 ), The other end is mechanically connected to the side of the micro-motion platform 24 . As mentioned above, the X voice coil motor 72X and the X air actuator 74X are arranged side by side. When any one of the actuator 72X and the actuator 74X is used to impart thrust to the micro-movement platform 24, the driving reaction force only acts on the micro-motion platform 24. The X coarse motion platform 34 (it can be considered that the X coarse motion platform 34 imparts a thrust to the fine motion platform 24, or transmits the thrust from the X coarse motion platform 34 to the fine motion platform 24). Details of the X voice coil motor 72X, the X air actuator 74X, and their control systems will be described later.

The main controller 90 (refer to FIG. 6 ) in order to set the micro-movement stage 24 from a static state (a state in which the speed and acceleration are zero) to a predetermined constant-speed movement state during the scanning exposure operation, via the third drive system 66 (refer to FIG. 6) Give the X coarse motion stage 34 a thrust (acceleration) in the X-axis direction so that the X coarse motion stage 34 moves with a long stroke in the scanning direction, and the X coarse motion stage 34 moves from the X coarse motion stage 34 via the first drive system 62 to The fine movement stage 24 imparts thrust (acceleration) in the X-axis direction. Also, after the X coarse movement platform 34 and the fine movement platform 24 reach the desired exposure speed (or before reaching the exposure speed), by including a prescribed settling time, the automatic The X coarse motion stage 34 that moves at a constant speed applies a thrust smaller than that during the acceleration drive control to the fine motion stage 24 via the first drive system 62 , and performs constant speed drive control on the fine motion stage 24 . In addition, during the scanning exposure, at the same time as the above-mentioned constant speed movement control, based on the alignment measurement result, etc., the micro-movement stage 24 is made to move freely in three horizontal planes with respect to the projection optical system 16 (refer to FIG. 1 ) via the first drive system 62 . Micro-drive in the degree direction (at least one of the X-axis direction, the Y-axis direction, and the θz direction). In addition, when the main controller 90 moves between the irradiation areas of the substrate P in the Y-axis direction (Y stepping operation), the Y coarse motion stage 32 and the X coarse motion stage 32 are controlled via the second drive system 64 (refer to FIG. 6 ). 34 provides thrust in the Y-axis direction, and applies thrust in the Y-axis direction to the fine movement stage 24 from the X coarse movement stage 34 via the first drive system 62 .

As described above, the main control device 90 (refer to FIG. 6 ) appropriately uses a total of four actuator units (70X ₁ , 70X ₂ , 70Y ₁ , 70Y ₂ ) Appropriately impart thrusts in the X-axis direction, the Y-axis direction and the θz direction to the micro-motion platform 24. At this time, one of a set (two) of actuators included in one actuator unit (in the case of the X actuator unit 70X ₁ , the X voice coil motor 72X and the X air actuator 74X) Either or both are a predetermined control balance (used in accordance with a control algorithm) set in advance based on the conditions when the micro-motion stage 24 is driven. The predetermined control balance will be described later.

In addition, the first drive system 62 (see FIG. 6 ) includes a Z tilt drive for driving the fine movement stage 24 in the Z tilt direction (the Z axis direction and the direction of swinging with respect to the XY plane) relative to the X coarse movement stage 34. System 68 (see FIG. 6). Z As shown in FIG. 1 , the tilt drive system 68 includes a plurality of Z voice coil motors 72Z disposed between the fine movement stage 24 and the X coarse movement stage 34 . The plurality of Z voice coil motors 72Z are arranged in at least three locations that are not on the same straight line. The configuration of the Z tilt drive system 68 including the Z voice coil motor 72Z has already been disclosed in US Patent Application Publication No. 2010/0018950, etc., and therefore description thereof will be omitted.

The position information of the micro-movement stage 24 (substrate P) in six degrees of freedom directions is obtained by the main control device 90 (refer to FIG. 6 respectively) via the substrate measurement system 96 . Substrate measurement system 96 includes an optical interferometer system including optical interferometer 54 affixed to apparatus body 18 . Furthermore, in Fig. 1, only the Y interferometer for obtaining the position information on the Y-axis direction of the micro-motion platform 24 is shown in the figure, but in fact, the Y interferometer is used to obtain the position information of the micro-motion platform 24 in the X-axis direction. A plurality of X interferometers for positional information are arranged respectively. Also, a bar mirror 56 corresponding to the optical interferometer 54 is fixed on the fine movement stage 24 (only the Y bar mirror corresponding to the Y interferometer is shown in FIG. 1 ). Also, although not shown in FIG. 1 , the substrate measurement system 96 also includes a Z inclination measurement system (the configuration is not particularly limited) for obtaining positional information in the Z inclination direction of the fine movement stage 24 . An example of the optical interferometer system and the Z-tilt measurement system has been disclosed in US Patent Application Publication No. 2010/0018950, etc., and therefore description thereof will be omitted. Furthermore, the composition of the measurement system used to obtain the position information in the horizontal plane of the micro-motion platform 24 can be appropriately changed, and is not limited to the optical interferometer system, and can also be used as disclosed in International Publication No. 2015/147319 An encoder system, or a hybrid measurement system of an optical interferometer system and an encoder system.

Next, the configuration of each actuator constituting the first drive system 62 and its control system will be described. Here, the configuration of the four actuator units 70X ₁ , 70X ₂ , 70Y ₁ , and 70Y ₂ included in the first drive system 62 is not arranged (thrust generation direction). Except for different aspects, they are substantially the same, so here, for the convenience of description, the four actuator units 70X ₁ , 70X ₂ , 70Y ₁ , and 70Y ₂ are referred to as actuators. The actuator unit 70 is not particularly distinguished, and the actuator unit 70 will be described as a unit including the voice coil motor 72 and the air actuator 74 .

As shown in FIG. 3 , the actuator unit 70 includes a controller 80 . The controller 80 is individually arranged for the four actuator units 70X ₁ , 70X ₂ , 70Y ₁ , and 70Y ₂ (see FIG. 2 ). A set of actuators (voice coil motor 72 and air actuator 74 ) included in one actuator unit 70 is controlled by a common controller 80 . Furthermore, in FIG. 3, it is shown that the controller 80 constitutes a part of the actuator unit 70, but the controller 80 may also be the main control device 90 (see FIG. 6) part.

The controller 80 controls the drive of the voice coil motor 72 (controls the magnitude and direction of the thrust force) by controlling the supply of current to the coil of the stator of the voice coil motor 72 . In addition, the controller 80 constantly monitors the output of the pressure sensor 74a that measures the pressure in the bellows of the air actuator 74, and is arranged between the air actuator 74 and the compressor (compressor). The opening and closing control of the valve 74c between the pressurized air devices 74b is carried out to control the drive of the air actuator 74 (control of the magnitude and direction of thrust).

Here, after the air actuator 74 has been supplied with air (thrust has been generated) In this state, the X coarse motion stage 34 and the fine motion stage 24 are mechanically linked by the rigidity of the air actuator 74 itself. When the X coarse motion platform 34 moves with a long stroke in the X-axis direction and/or the Y-axis direction in the linked state, the fine motion platform 24 mechanically linked with the X coarse motion platform 34 can be connected to the X coarse motion platform. 34 move together in long strokes. As mentioned above, the stroke of the air actuator 74 itself is about several millimeters. In the state where air is supplied to the air actuator 74, the X coarse motion stage 34 presses or pulls the fine motion stage 24 via the air actuator 74, Therefore, the fine movement stage 24 can be moved with a long stroke without supplying current to the voice coil motor 72 .

On the other hand, in the state where air is not supplied to the air actuator 74 (thrust is not generated), the rigidity of the air actuator 74 itself can be substantially ignored, and the fine movement stage 24 becomes relative to the X coarse movement stage 34. The state in which there is no mechanical constraint (free movement) along the direction of the XY plane. When the X coarse motion platform 34 moves with a long stroke in the X-axis direction and/or the Y-axis direction in the unconstrained state, by using the voice coil motor 72 to give thrust to the micro-motion platform 24, the micro-motion platform 24 and The X coarse motion stage 34 moves with a long stroke together. Also, simultaneously with the long-stroke movement described above, the fine movement stage 24 may be slightly driven in the horizontal plane relative to the X coarse movement stage 34 by the voice coil motor 72 . Furthermore, the "state where the rigidity of the air actuator 74 can be substantially ignored" means that when the fine motion platform 24 is driven by the voice coil motor 72, the rigidity of the air actuator 74 (bellows) does not become a sound. The degree of resistance (load) of the coil motor 74 or the like. Furthermore, the so-called "the state where no thrust is generated by the air actuator 74" can also supply air to the air actuator 74, as long as there is no mechanical movement between the fine movement stage 24 and the X coarse movement stage 34 in the direction along the XY plane. Restricted (freedom of movement) state is sufficient.

Furthermore, in the actuator unit 70 of the present embodiment, the air actuator 74 is mechanically connected to the fine motion stage 24 and the X coarse motion stage 34 respectively, so that between the fine motion stage 24 and the X coarse motion stage 34 , including the state where air is not supplied to the air actuator 74, there is always an object that can transmit vibrations to each other. On the other hand, the air box included in the air actuator 74 has a synthetic rubber air box similar to that used in a known anti-vibration (vibration-isolating) device (the anti-vibration device 19 (see FIG. 1 ) of this embodiment, etc.). The same shock-removing function of the box-shaped air spring can attenuate the vibration between the micro-motion platform 24 and the X coarse-motion platform 34 (impede the transmission of vibration). As described above, in the air actuator 74 , the bellows function as a damper, and the fine movement stage 24 and the X coarse movement stage 34 are in a vibrationally pseudo-separated state. Therefore, the position control of the fine movement stage 24 using the voice coil motor 72 can be performed with high precision.

Also, in the substrate stage device 20 of the present embodiment, as described above, when the position of the micro-motion stage 24 is controlled, the two (one set) actuators included in the actuator unit 70, that is, the voice coil motor 72 and The air actuator 74 is used with a predetermined control balance. Next, the control balance of the two actuators will be described.

FIG. 4 is a conceptual diagram illustrating the control balance of two actuators included in the actuator unit 70 of the present embodiment. As shown in FIG. 4 , in the present embodiment, when controlling the position of the fine motion stage 24 , actuators that apply necessary (requested) thrust to the fine motion stage 24 are used according to frequencies. Specifically, among the two actuators, the voice coil motor 72 as a micro-actuator can be controlled and driven in a higher bandwidth than the air actuator 74, so the micro-motion stage can be performed in a high bandwidth. For position control of 24, a voice coil motor 72 is used. Also, in the low bandwidth When controlling the position of the micro-motion platform 24, an air actuator 74 that can generate a thrust greater than that of the voice coil motor 72 is used. Also, in the medium bandwidth between the high bandwidth and the low bandwidth, the air actuator 74 is used. Furthermore, in this embodiment, as an example, it is assumed that the bandwidth of less than 3Hz is regarded as the low bandwidth, the bandwidth of greater than or equal to 3Hz and less than 10Hz~20Hz is regarded as the middle bandwidth, and the bandwidth of greater than or equal to 10Hz~20Hz As a high bandwidth, the frequency of each bandwidth is not limited thereto, and can be appropriately changed.

Also, as known from FIG. 4 , in the position control of the micro-motion platform 24 within the low frequency bandwidth using the air actuator 74, thrust is given to the micro-motion platform 24 by feedforward (feedforward, FF) control (air feedforward Force (Air FF Force). In the position control of the fine movement stage 24 within the medium frequency band using the air actuator 74 , thrust (air feedback force (Air FB Force)) is given to the fine movement stage 24 by feedback (feedback, FB) control. In addition, in the position control of the fine movement stage 24 within a high bandwidth using the voice coil motor 72 , the thrust (motor force) of the voice coil motor 72 is applied to the fine movement stage 24 . Furthermore, in the position control of the micro-motion stage 24 within the medium bandwidth, the thrust obtained by feedback (FB) control using the air actuator 74 and the thrust of the voice coil motor 72 may be given to the Micro-motion platform24.

FIG. 5 is a block diagram showing an example of a control circuit of the actuator unit 70 for performing the feedforward control and the feedback control. As shown in FIG. 5, the command value based on the target driving position of the substrate P supplied from the controller 80 (see FIG. 3) is input to the FF (feedforward) controller 82a and the FB (feedback) controller 82b, and divided into low frequency and 2 signals at frequencies other than low frequencies. The FF controller 82a outputs the calculated output value based on the low-frequency signal to control the air actuator 74 (actually, the valve 74c) The air drive 84a. The air actuator 74 applies thrust to the fine movement stage 24 based on the output value. The feed-forward control is to accelerate the static micro-movement platform 24 until reaching the scanning speed, or when the Y-stepping motion of the micro-motion platform 24, when the micro-motion platform 24 decelerates (in the case of negative acceleration), etc. This is performed when the stage 24 is positionally controlled with high precision.

Also, in the position control system of the micro-motion platform 24 (refer to FIG. 3 ), the current position information of the micro-motion platform 24 is updated based on the output of the substrate measurement system 96 (refer to FIG. 3 ) at regular control sampling intervals, and the information of the current position of the micro-motion platform 24 is fed back. The difference between the actual measured value and the command value of the position of the micro-motion platform 24 is the position error signal, and the position control of the micro-motion platform 24 is performed with higher precision. As shown in FIG. 5, a feedback signal (position error signal) is input to the feedback controller 82b. The output (command value) from the feedback controller 82b is divided based on frequency in a low pass filter (LPF _mix 86a and LPF _air 86b). That is, as described above, the output value calculated based on the signal of the intermediate frequency (low bandwidth of the position error signal) is input to the air driver 84a, and the output value calculated based on the high frequency signal is input to the driver 84a for controlling the sound. The motor driver 84b of the circle motor 72. The air actuator 74 and the voice coil motor 72 (when the position error is small (high bandwidth), only the voice coil motor 72 ) give thrust to the fine movement stage 24 based on the output value. The feedback control is performed when the position of the fine movement stage 24 is controlled with high precision during the stable operation of the fine movement stage 24 and during the scanning exposure operation.

In addition, in the substrate stage device 20 (see FIG. 1 ) of this embodiment, the acceleration sensor 88 (see FIG. 3 ) is used to monitor the motion of the fine movement stage 24 together with the feedback control based on the position error signal. Acceleration, carry out acceleration reaction Feedback control is to correct the position error of the micro-motion platform 24 generated based on the vibration of the micro-motion platform 24 . The acceleration feedback control is the same as the control performed in known active anti-vibration (vibration-isolating) devices and the like, so detailed descriptions are omitted here.

As described above, in the substrate stage apparatus 20 of the present embodiment, in the feedback control for performing high-precision position control of the fine movement stage 24 (substrate P), the frequency of applying the required thrust is divided by the bandwidth of the frequency. Actuators (two actuators are used respectively), so compared with the case where feedback control (fine positioning control) is assumed to be performed using all the voice coil motors 72, the load of the voice coil motors 72 is lighter, so a lower output ( Smaller and lower power consumption) actuators are used as the voice coil motor 72 .

Also, in this embodiment, as feed-forward control, only the air actuator 74 that can generate a large thrust is used to impart thrust to the micro-movement platform 24, so the voice coil motor 72 can not be energized, and the micro-motion platform 24 can be accelerated and decelerated, thereby Good efficiency.

In addition, the actuator unit 70 collectively controls two actuators (the voice coil motor 72 and the air actuator 74 ) with one controller 80 (one signal input), so the configuration of the control system is simple.

In addition, the structure of each element which comprises the liquid crystal exposure apparatus 10 of embodiment demonstrated above is not limited to the structure demonstrated above, It can change suitably. As an example, the first drive system 62 of the above-mentioned embodiment includes a total of four actuator units (70X ₁ , 70X ₂ , 70Y ₁ , and 70Y ₂ ), but the number of actuator units is not limited thereto. In addition, the numbers of the X actuator units generating thrust in the X-axis direction and the Y actuator units generating thrust in the Y-axis direction may be different.

Also, in the actuator unit 70 of the above embodiment, two actuators The actuators (voice coil motor 72 and air actuator 74) are arranged adjacently (spaced apart) (to make the thrust act on different positions of the micro-movement platform 24), but the configuration of each actuator is not limited to this, and also The voice coil motor 72 and the air actuator 74 can be arranged coaxially. Specifically, by using a cylindrical bellows for the air actuator 74 and inserting the voice coil motor 72 on the inner diameter side of the bellows, two actuators can be arranged substantially coaxially.

In addition, the types of actuators constituting one actuator unit can also be appropriately changed. That is, in the above-described embodiment, the voice coil motor 72 driven by electromagnetic force (Lorentz force) is used as the actuator for micro-drive, but other types of actuators (using Micro-actuators for piezoelectric parts, etc.). Similarly, the air actuator 74 is used as the actuator for imparting a large thrust to the micro-motion stage 24, but other types of actuators (electromagnetic motors, etc.) may also be used. In addition, in a plurality of actuator units, the configuration of the actuator included in each actuator unit may not necessarily be the same, for example, in the X-axis actuator unit and the Y-axis actuator unit, the configuration may also be Can be different.

Moreover, each actuator unit of the above-mentioned embodiment includes two actuators (one voice coil motor 72 and one air actuator 74) in one set, but the actuators constituting each actuator unit The quantity can also be 3 or more. At this time, it is also possible to set the actuators into two types in the same manner as in the above-mentioned embodiment, and arrange multiple ones or two types of actuators, and the types of three or more actuators can also be exchanged. Are not the same.

In addition, in the above-described embodiment, the actuator unit is arranged to generate thrust in the orthogonal two-axis directions (X-axis and Y-axis) in the two-dimensional plane, but the direction of the thrust generated by the actuator unit is not the same. Not limited to this, it can also be only in the uniaxial direction, or it can be more than three degrees of freedom. In addition, in the above-mentioned embodiment, the actuator unit is arranged on the +X side and the +Y side of the fine movement stage 24, but it may also be arranged on the -X side and the -Y side.

Also, in the above-mentioned embodiment, according to the three bandwidths (low bandwidth, middle bandwidth, and high bandwidth), the actuators for applying the thrust required for feedforward control and feedback control to the micro-movement stage 24 are selectively used respectively. The configuration of the actuator is not limited thereto, and the actuators may be selectively used according to two bandwidths (low bandwidth and high bandwidth). Specifically, only the low-bandwidth air actuator 74 may be used to accelerate the micro-motion stage 24 in the feedforward control, and the position of the micro-motion stage 24 may be controlled using only the high-bandwidth voice coil motor 72 in the feedback control.

In addition, in the above-mentioned embodiment, the case where the first drive system 62 for controlling the high-precision position of the fine motion stage 24 holding the substrate P is provided with a plurality of actuator units has been described, but the present invention is not limited thereto. An actuator unit having the same configuration may also be arranged in the mask driving system 92 (see FIG. 6 ) for driving the mask M (see FIG. 1 ). In the mask stage device 14 of the above-described embodiment, the mask M moves only in the X-axis direction with a long stroke, so as the actuator unit, only an actuator unit that generates thrust in the X-axis direction may be disposed. .

In addition, the structure of the substrate stage apparatus 20 of the above-mentioned embodiment is not limited to the structure described in the above-mentioned embodiment, but can be changed appropriately. In these modified examples, the same substrate driving system as that of the present embodiment can also be applied. 60. That is, as the substrate stage device, it may also be a coarse motion stage of a type in which a Y coarse motion stage is disposed on an X coarse motion stage as disclosed in US Patent Application Publication No. 2010/0018950 (herein , the fine motion platform 24 is given a thrust from the Y coarse motion platform through each actuator unit). In addition, the self-weight supporting device 28 may not necessarily be included as the substrate stage device. In addition, the substrate stage device may be a device that drives the substrate P only in a long stroke in the scanning direction.

Also, the control system 80 is described for the case where the four actuator units 70X ₁ , 70X ₂ , 70Y ₁ , and 70Y ₂ (see FIG. 2 ) are separately arranged, but Alternatively, one control system 80 may be provided for a pair of X actuator units 70X ₁ and X 70X ₂ , and one control system 80 may be provided for a pair of Y actuator units 70Y ₁ and Y 70Y ₂ control system 80 . In other words, a configuration in which the control system 80 is arranged for each driving direction may also be employed. In addition, one control system 80 may be arranged for all four actuator units 70X ₁ , 70X ₂ , 70Y ₁ , and 70Y ₂ .

In addition, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193nm), KrF excimer laser light (wavelength 248nm), vacuum ultraviolet light such as _F2 laser light (wavelength 157nm). In addition, as the illumination light, it is also possible to use a fiber amplifier (fiber amplifier) doped with erbium (or both erbium and ytterbium), which is self-distributed feedback (distributed feedback, DFB) semiconductor laser or fiber laser (fiber laser). Laser) oscillating infrared region, or single-wavelength laser light in the visible region is amplified, and the wavelength is converted into high harmonics of ultraviolet light using nonlinear optical crystals. Moreover, solid-state laser (wavelength: 355 nm, 266 nm) etc. can also be used.

Also, the case where the projection optical system 16 is a multi-lens type projection optical system including a plurality of optical systems has been described, but the number of projection optical systems is not limited to this, and may be one or more. Also, not limited to the multi-lens method The projection optical system may be a projection optical system using an Offner-type large mirror, or the like. In addition, as the projection optical system 16, an enlargement system or a reduction system may be used.

In addition, the use of the exposure device is not limited to the exposure device for liquid crystals for transferring the pattern of liquid crystal display components to a square glass plate, but can also be widely used in the manufacture of organic electro-luminescence (EL) panels. Exposure devices for semiconductor manufacturing, exposure devices for manufacturing thin-film magnetic heads, micro machines (micro machines) and deoxyribonucleic acid (DNA) wafers. In addition, it can be applied not only to exposure devices for manufacturing micro-elements such as semiconductor parts, but also to light exposure devices, extreme ultraviolet (extreme ultraviolet, EUV) exposure devices, X-ray exposure devices, and electron beam exposure devices. Masks or reticles are used to transfer circuit patterns to exposure devices such as glass substrates or silicon wafers.

In addition, the objects to be exposed are not limited to glass plates, and may be other objects such as wafers, ceramic substrates, film members, or mask blanks. Moreover, when the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and a film-like (sheet-like member having flexibility) is also included. In addition, the exposure apparatus of this embodiment is especially effective when the board|substrate whose one side length or diagonal length is 500 mm or more is an exposure object.

Electronic components such as liquid crystal display parts (or semiconductor parts) are manufactured through the following steps: designing the functions and performance of the components; The mask (or network cable) of step; Make glass substrate (or wafer); Photolithography step, utilize the exposure device of each embodiment described and described exposure method, transfer the pattern of mask (network cable) to A glass substrate; a developing step of developing the exposed glass substrate; an etching step of removing exposed members other than the portion where the resist remains; a resist removing step of removing unnecessary resist after etching etchant; component assembly steps; inspection steps, etc. In this case, in the lithography step, the exposure method is performed using the exposure apparatus of the above-mentioned embodiment to form a device pattern on the glass substrate, so that a high-density device can be manufactured with high productivity.

[industrial availability]

As described above, the moving body device and the driving method of the moving body according to the present invention are suitable for driving the moving body. Also, the exposure apparatus of the present invention is suitable for forming a pattern on an object. Also, the component manufacturing method of the present invention is suitable for the production of micro components. Moreover, the manufacturing method of the flat-panel display of this invention is suitable for manufacture of a flat-panel display.

20: Substrate platform device

24:Micro-motion platform

26: Coarse movement platform

34: X coarse motion platform

62: 1st drive system

70X ₁ , 70X ₂ : X actuator unit

70Y ₁ , 70Y ₂ : Y actuator unit

72X:X voice coil motor

74X:X Air Actuator

76a: Stator

76b: Movers

78: Pillar

G: center of gravity position

X, Y, Z: direction

Claims (23)

A moving body device, comprising: a first moving body capable of moving in a specified direction; a second moving body configured so that the first moving body can move relatively and move toward the specified direction; a base supports the first moving body 2 moving body; an actuator unit including a first actuator and a second actuator for relatively driving the first moving body and the second moving body relative to the base; and a control system for The first actuator and the second actuator are controlled so that when the first moving body and the second moving body move relative to the base, the first actuator and the second moving body At least any one of the second actuators is controlled, wherein the control system controls the second actuator to pass through the first moving body and the second moving body. When the second actuator is in a connected state, the relative movement between the first moving body and the second moving body is restricted, and the first moving body is moved at the same time, and the control system controls the first moving body actuator and the second actuator, and in the state where the first moving body and the second moving body are connected by the second actuator, the first moving body and the second moving body The second moving body relatively moves. The moving body device according to claim 1, wherein the actuator unit applies thrust force for accelerating and decelerating the second moving body to the first moving body through the second actuator . The moving body device as described in claim 1 or claim 2 of the patent application, wherein the second actuator is a pneumatic actuator. The moving body device according to claim 1 or claim 2, wherein the second actuator includes an attenuation portion for attenuating vibration between the first moving body and the second moving body. The moving body device as described in claim 1 or claim 2 of the patent application, wherein the first actuator is a linear motor. The moving body device according to claim 1 or claim 2, wherein the first actuator and the second actuator are arranged coaxially centered on a direction parallel to the predetermined direction. The moving body device according to claim 1 or 2 of the patent claims, wherein the actuator unit includes a device that moves the first moving body and the second moving body in the predetermined direction, that is, the first direction. A first actuator unit that moves relatively, the first actuator unit includes the first actuator and the second actuator, and the first actuator unit is in contact with the first actuator A plurality of them are provided at intervals in the second direction intersecting with each other. The moving body device according to claim 7, wherein the actuator unit includes a second actuator for relatively moving the first moving body and the second moving body in the second direction A plurality of second actuator units are arranged at intervals in the first direction. The mobile device described in item 1 or item 2 of the scope of patent application, which wherein the control system performs feedforward control based on the drive target position of the first moving body, using the second actuator of the actuator unit. The moving body device according to claim 9 of the patent application, wherein the control system performs feedback control based on the position error of the first moving body relative to the driving target position, and in the feedback control, the The first actuator is used for position control in a high bandwidth, and the second actuator is used for position control in a low bandwidth. An exposure device, comprising: the moving body device described in any one of the first to tenth items of the scope of patent application; and a pattern forming device for the first moving body held on the moving body device Objects, using energy beams to form prescribed patterns. The exposure apparatus according to claim 11, wherein the object is a substrate for a flat panel display. The exposure device as described in claim 12 of the patent application, wherein the length or diagonal length of at least one side of the object is greater than or equal to 500 mm. A method for manufacturing a flat panel display, comprising: using the exposure device described in item 12 or item 13 of the patent application to expose the object; and developing the exposed substrate. A component manufacturing method, comprising: exposing the object to light; and developing the exposed object. A method for driving a mobile body, comprising: relatively driving a first mobile body and a second mobile body in a predetermined direction relative to a base supporting the second mobile body, the first mobile body being movable in the predetermined direction , the second moving body is arranged so that the first moving body can move relatively and move toward the predetermined direction; when the first moving body and the second moving body are relatively moved relative to the base, Control at least one of the first actuator and the second actuator; by controlling the second actuator, the first moving body and the second When the moving body is connected by the second actuator, the relative movement of the first moving body and the second moving body is restricted, and the first moving body is moved; and by controlling the first moving body 1 actuator and the second actuator, and in a state where the first moving body and the second moving body are connected by the second actuator, the first moving body and the second moving body The second moving body relatively moves. The driving method of the moving body according to claim 16, wherein in the step of restricting the relative movement of the first moving body and the second moving body while moving the first moving body, the A thrust force for accelerating and decelerating the second moving body is applied to the first moving body via the second actuator. The driving of the mobile body as described in the 16th or 17th item of the patent application The moving method, wherein in the step of relatively moving the first mobile body and the second mobile body, when the first mobile body and the second mobile body are relatively moved with respect to the base, the The first moving body relatively moves with respect to the second moving body. The driving method of the mobile body as described in the sixteenth or seventeenth claims of the scope of the patent application, wherein the relative movement includes feedforward control based on the driving target position of the first mobile body, and in the control, the In the feedforward control described above, the second actuator is used. The driving method of the mobile body according to claim 19 of the scope of patent application, wherein the relative movement includes feedback control based on the position error of the first mobile body relative to the driving target position, and in the control, In the feedback control, the first actuator is used for position control in a high bandwidth, and the second actuator is used for position control in a low bandwidth. The driving method of a moving body according to claim 16, wherein the second actuator includes an attenuation section for attenuating vibration between the first moving body and the second moving body. A moving body device, comprising: a first moving body that can move in a prescribed direction; a second moving body that is set so that the first moving body can move relatively and can move toward The predetermined direction moves; the base supports the second moving body; the actuator unit includes a first actuator and a second actuator, and makes the first moving body and the second moving body relatively The base is relatively driven; the control system controls the first actuator and the second actuator to make the first moving body and the second moving body relatively move relative to the base , at least one of the first actuator and the second actuator is controlled, wherein the control system controls the air pressure of the second actuator, and the When the first moving body and the second moving body are connected by the second actuator, the relative movement of the first moving body and the second moving body is restricted, and the first moving body is moved. body moves, the control system controls the air pressure of the second actuator and the first actuator, and the first moving body and the second moving body pass through the second actuator In the connected state, the first moving body and the second moving body are relatively moved. The moving body device according to claim 22, wherein the second actuator includes an attenuation portion for attenuating vibration between the first moving body and the second moving body.

Images