TWI777886B - 製造光學感測器裝置的方法 - Google Patents

製造光學感測器裝置的方法 Download PDF

Info

Publication number
TWI777886B
TWI777886B TW111100620A TW111100620A TWI777886B TW I777886 B TWI777886 B TW I777886B TW 111100620 A TW111100620 A TW 111100620A TW 111100620 A TW111100620 A TW 111100620A TW I777886 B TWI777886 B TW I777886B
Authority
TW
Taiwan
Prior art keywords
layer
mirror
spacer layer
spacer
layers
Prior art date
Application number
TW111100620A
Other languages
English (en)
Chinese (zh)
Other versions
TW202215080A (zh
Inventor
喬治 Ｊ 奧肯福斯
Original Assignee
美商菲爾薇解析公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商菲爾薇解析公司 filed Critical 美商菲爾薇解析公司
Publication of TW202215080A publication Critical patent/TW202215080A/zh
Application granted granted Critical
Publication of TWI777886B publication Critical patent/TWI777886B/zh

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
    • G01J3/36—Investigating two or more bands of a spectrum by separate detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/46—Measurement of colour; Colour measuring devices, e.g. colorimeters
    • G01J3/50—Measurement of colour; Colour measuring devices, e.g. colorimeters using electric radiation detectors
    • G01J3/51—Measurement of colour; Colour measuring devices, e.g. colorimeters using electric radiation detectors using colour filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/46—Measurement of colour; Colour measuring devices, e.g. colorimeters
    • G01J3/50—Measurement of colour; Colour measuring devices, e.g. colorimeters using electric radiation detectors
    • G01J3/51—Measurement of colour; Colour measuring devices, e.g. colorimeters using electric radiation detectors using colour filters
    • G01J3/513—Measurement of colour; Colour measuring devices, e.g. colorimeters using electric radiation detectors using colour filters having fixed filter-detector pairs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/204—Filters in which spectral selection is performed by means of a conductive grid or array, e.g. frequency selective surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/286—Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/199—Back-illuminated image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H10F39/8063—Microlenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H10F39/8067—Reflectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
    • H10H20/841—Reflective coatings, e.g. dielectric Bragg reflectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/855—Optical field-shaping means, e.g. lenses
    • H10H20/856—Reflecting means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/856—Arrangements for extracting light from the devices comprising reflective means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1204—Grating and filter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/2806—Array and filter array
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/282—Modified CCD or like
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2823—Imaging spectrometer
    • G01J2003/2826—Multispectral imaging, e.g. filter imaging

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Geophysics And Detection Of Objects (AREA)
TW111100620A 2015-12-29 2016-12-26 製造光學感測器裝置的方法 TWI777886B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201562272086P 2015-12-29 2015-12-29
US62/272,086 2015-12-29
US201662294970P 2016-02-12 2016-02-12
US62/294,970 2016-02-12
US15/385,240 US9923007B2 (en) 2015-12-29 2016-12-20 Metal mirror based multispectral filter array
US15/385,240 2016-12-20

Publications (2)

Publication Number Publication Date
TW202215080A TW202215080A (zh) 2022-04-16
TWI777886B true TWI777886B (zh) 2022-09-11

Family

ID=57714462

Family Applications (5)

Application Number Title Priority Date Filing Date
TW111100620A TWI777886B (zh) 2015-12-29 2016-12-26 製造光學感測器裝置的方法
TW105143180A TWI713666B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列
TW113104792A TWI893644B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列
TW111133441A TWI835276B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列
TW109141166A TWI755172B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列

Family Applications After (4)

Application Number Title Priority Date Filing Date
TW105143180A TWI713666B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列
TW113104792A TWI893644B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列
TW111133441A TWI835276B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列
TW109141166A TWI755172B (zh) 2015-12-29 2016-12-26 基於金屬鏡的多光譜濾光片陣列

Country Status (7)

Country Link
US (6) US9923007B2 (enExample)
EP (1) EP3187909A1 (enExample)
JP (3) JP6812238B2 (enExample)
KR (3) KR102376881B1 (enExample)
CN (2) CN115727950A (enExample)
CA (2) CA2952683A1 (enExample)
TW (5) TWI777886B (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10495516B2 (en) * 2015-06-30 2019-12-03 Imec Vzw Dedicated transformation spectroscopy
US9960199B2 (en) * 2015-12-29 2018-05-01 Viavi Solutions Inc. Dielectric mirror based multispectral filter array
US9923007B2 (en) 2015-12-29 2018-03-20 Viavi Solutions Inc. Metal mirror based multispectral filter array
US11137527B2 (en) 2017-05-22 2021-10-05 Viavi Solutions Inc. Mixed spacer multispectral filter
US10782460B2 (en) * 2017-05-22 2020-09-22 Viavi Solutions Inc. Multispectral filter
US10247865B2 (en) * 2017-07-24 2019-04-02 Viavi Solutions Inc. Optical filter
US10622270B2 (en) 2017-08-31 2020-04-14 Texas Instruments Incorporated Integrated circuit package with stress directing material
US10553573B2 (en) 2017-09-01 2020-02-04 Texas Instruments Incorporated Self-assembly of semiconductor die onto a leadframe using magnetic fields
KR102461721B1 (ko) * 2017-09-15 2022-11-01 삼성전자주식회사 필터 어레이와 이를 포함하는 분광 측정 소자 및 분광 측정 소자를 채용한 분광기
US10886187B2 (en) 2017-10-24 2021-01-05 Texas Instruments Incorporated Thermal management in integrated circuit using phononic bandgap structure
US10833648B2 (en) 2017-10-24 2020-11-10 Texas Instruments Incorporated Acoustic management in integrated circuit using phononic bandgap structure
US10444432B2 (en) 2017-10-31 2019-10-15 Texas Instruments Incorporated Galvanic signal path isolation in an encapsulated package using a photonic structure
US10497651B2 (en) 2017-10-31 2019-12-03 Texas Instruments Incorporated Electromagnetic interference shield within integrated circuit encapsulation using photonic bandgap structure
US10371891B2 (en) 2017-10-31 2019-08-06 Texas Instruments Incorporated Integrated circuit with dielectric waveguide connector using photonic bandgap structure
US10557754B2 (en) 2017-10-31 2020-02-11 Texas Instruments Incorporated Spectrometry in integrated circuit using a photonic bandgap structure
US10677972B2 (en) * 2017-12-08 2020-06-09 Viavi Solutions Inc. Multispectral sensor response balancing
MX2023000863A (es) 2018-01-30 2023-03-01 Viavi Solutions Inc Dispositivo optico que tiene partes opticas y mecanicas.
US10948640B2 (en) 2018-03-13 2021-03-16 Viavi Solutions Inc. Sensor window with a set of layers configured to a particular color and associated with a threshold opacity in a visible spectral range wherein the color is a color-matched to a surface adjacent to the sensor window
US11009636B2 (en) * 2018-03-13 2021-05-18 Viavi Solutions Inc. Sensor window to provide different opacity and transmissivity at different spectral ranges
EP3546902B1 (en) * 2018-03-29 2021-01-27 ams Sensors Germany GmbH Multispectral sensor and method for multispectral light sensing
US11650361B2 (en) * 2018-12-27 2023-05-16 Viavi Solutions Inc. Optical filter
US11366011B2 (en) 2019-02-13 2022-06-21 Viavi Solutions Inc. Optical device
CN109798979B (zh) * 2019-03-12 2021-02-12 天津津航技术物理研究所 宽光谱范围的半导体工艺兼容高光谱成像芯片设计方法
CN112179491B (zh) * 2019-07-01 2022-03-25 华为技术有限公司 一种高光谱成像系统、摄像头以及终端设备
KR102857450B1 (ko) * 2020-04-08 2025-09-09 삼성전자주식회사 광 필터 및 이를 포함하는 분광기
US12392945B2 (en) * 2020-04-28 2025-08-19 Viavi Solutions Inc. Induced transmission filter with hydrogenated silicon, silver, and silicon dioxide
EP3978905A1 (en) * 2020-10-02 2022-04-06 Université Côte d'Azur Optoacoustic monitoring device for cell characterization
MX2023011740A (es) 2021-04-05 2023-10-13 Sumitomo Chemical Co Composicion de transpiracion termica y metodo para exterminar artropodos nocivos usando la misma.
FR3122930B1 (fr) * 2021-05-11 2023-05-26 Safran Electronics & Defense Filtre multi-spectral
CN113865701B (zh) * 2021-09-26 2024-09-10 上海申矽凌微电子科技股份有限公司 光学滤波器、制造方法及环境光传感器
US12372400B2 (en) * 2021-12-06 2025-07-29 Viavi Solutions Inc. Optical system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6631033B1 (en) * 1999-01-29 2003-10-07 Qinetiq Limited Multilayer optical filters
US20120327248A1 (en) * 2009-11-30 2012-12-27 Imec Integrated circuit for spectral imaging system
US20140014838A1 (en) * 2012-07-16 2014-01-16 Karen Denise Hendrix Optical filter and sensor system
US8715443B2 (en) * 2010-11-22 2014-05-06 Hamamatsu Photonics K.K. Method for producing spectroscopic sensor

Family Cites Families (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3442572A (en) 1964-08-25 1969-05-06 Optical Coating Laboratory Inc Circular variable filter
US3530824A (en) 1964-08-25 1970-09-29 Optical Coating Laboratory Inc Deposition apparatus including rotatable and orbital masking assembly
US3617331A (en) 1964-08-25 1971-11-02 Optical Coating Laboratory Inc Method for manufacture of rotatable variable filter
JPS57184937A (en) 1981-05-08 1982-11-13 Omron Tateisi Electronics Co Color discriminating element
JPS6342429A (ja) 1986-08-08 1988-02-23 Minolta Camera Co Ltd 分光測定センサ
US4822998A (en) 1986-05-15 1989-04-18 Minolta Camera Kabushiki Kaisha Spectral sensor with interference filter
JPH0785034B2 (ja) 1986-05-15 1995-09-13 ミノルタ株式会社 分光測定センサ
US4957371A (en) 1987-12-11 1990-09-18 Santa Barbara Research Center Wedge-filter spectrometer
US5144498A (en) 1990-02-14 1992-09-01 Hewlett-Packard Company Variable wavelength light filter and sensor system
US5246803A (en) * 1990-07-23 1993-09-21 Eastman Kodak Company Patterned dichroic filters for solid state electronic image sensors
US5784507A (en) 1991-04-05 1998-07-21 Holm-Kennedy; James W. Integrated optical wavelength discrimination devices and methods for fabricating same
US5872655A (en) 1991-07-10 1999-02-16 Optical Coating Laboratory, Inc. Monolithic linear variable filter and method of manufacture
US5337191A (en) 1993-04-13 1994-08-09 Photran Corporation Broad band pass filter including metal layers and dielectric layers of alternating refractive index
CN1074136C (zh) * 1993-06-07 2001-10-31 卡西欧计算机公司 液晶显示装置
JPH08508114A (ja) 1993-12-23 1996-08-27 ハネウエル・インコーポレーテッド カラーフィルタ・アレイ
US5905571A (en) * 1995-08-30 1999-05-18 Sandia Corporation Optical apparatus for forming correlation spectrometers and optical processors
US5986808A (en) 1996-10-11 1999-11-16 California Institute Of Technology Surface-plasmon-wave-coupled tunable filter
US6297907B1 (en) 1997-09-02 2001-10-02 California Institute Of Technology Devices based on surface plasmon interference filters
EP0933925A3 (en) * 1997-12-31 2002-06-26 Texas Instruments Inc. Photofinishing utilizing modulated light source array
US8928967B2 (en) * 1998-04-08 2015-01-06 Qualcomm Mems Technologies, Inc. Method and device for modulating light
JP4111288B2 (ja) 1998-07-09 2008-07-02 Ｔｄｋ株式会社 波長選択型光検出器
US6215802B1 (en) 1999-05-27 2001-04-10 Blue Sky Research Thermally stable air-gap etalon for dense wavelength-division multiplexing applications
JP3383942B2 (ja) 1999-08-02 2003-03-10 Ｈｏｙａ株式会社 Ｗｄｍ光学フィルター用ガラス基板、ｗｄｍ光学フィルター、ｗｄｍ用光合分波器
US6638668B2 (en) 2000-05-12 2003-10-28 Ocean Optics, Inc. Method for making monolithic patterned dichroic filter detector arrays for spectroscopic imaging
US6574490B2 (en) 2001-04-11 2003-06-03 Rio Grande Medical Technologies, Inc. System for non-invasive measurement of glucose in humans
US6912330B2 (en) 2001-05-17 2005-06-28 Sioptical Inc. Integrated optical/electronic circuits and associated methods of simultaneous generation thereof
US6891685B2 (en) 2001-05-17 2005-05-10 Sioptical, Inc. Anisotropic etching of optical components
US20030087121A1 (en) 2001-06-18 2003-05-08 Lawrence Domash Index tunable thin film interference coatings
US6841238B2 (en) * 2002-04-05 2005-01-11 Flex Products, Inc. Chromatic diffractive pigments and foils
US7002697B2 (en) 2001-08-02 2006-02-21 Aegis Semiconductor, Inc. Tunable optical instruments
US6850366B2 (en) 2002-10-09 2005-02-01 Jds Uniphase Corporation Multi-cavity optical filter
WO2005017570A2 (en) 2003-08-06 2005-02-24 University Of Pittsburgh Surface plasmon-enhanced nano-optic devices and methods of making same
JP2005107010A (ja) * 2003-09-29 2005-04-21 Hitachi Metals Ltd 多層膜光学フィルターの製造方法および多層膜光学フィルター
CN1864091A (zh) 2003-10-07 2006-11-15 伊吉斯半导体公司 在热膨胀率匹配的透明衬底上具有加热体的可调谐光学滤波器
US7123796B2 (en) * 2003-12-08 2006-10-17 University Of Cincinnati Light emissive display based on lightwave coupling
JP4638356B2 (ja) 2004-01-15 2011-02-23 パナソニック株式会社 固体撮像装置、固体撮像装置の製造方法及びこれを用いたカメラ
US7133197B2 (en) 2004-02-23 2006-11-07 Jds Uniphase Corporation Metal-dielectric coating for image sensor lids
KR20050103027A (ko) 2004-04-23 2005-10-27 매그나칩 반도체 유한회사 노치 필터를 갖는 이미지센서 및 그 제조 방법
US7879209B2 (en) 2004-08-20 2011-02-01 Jds Uniphase Corporation Cathode for sputter coating
US7521666B2 (en) 2005-02-17 2009-04-21 Capella Microsystems Inc. Multi-cavity Fabry-Perot ambient light filter apparatus
CN1306288C (zh) 2005-04-27 2007-03-21 中国科学院上海技术物理研究所 具有平整谐振腔层的滤光片列阵
US8084728B2 (en) 2005-07-06 2011-12-27 Capella Microsystems, Corp. Optical sensing device
JP2007019143A (ja) 2005-07-06 2007-01-25 Matsushita Electric Ind Co Ltd 固体撮像装置の製造方法、固体撮像装置及びカメラ
US7406394B2 (en) 2005-08-22 2008-07-29 Applied Materials, Inc. Spectra based endpointing for chemical mechanical polishing
US7315667B2 (en) 2005-12-22 2008-01-01 Palo Alto Research Center Incorporated Propagating light to be sensed
JP5028279B2 (ja) 2006-01-24 2012-09-19 パナソニック株式会社 固体撮像装置及びカメラ
US7378346B2 (en) 2006-03-22 2008-05-27 Motorola, Inc. Integrated multi-wavelength Fabry-Perot filter and method of fabrication
KR100762204B1 (ko) 2006-04-25 2007-10-02 전자부품연구원 광학 다층 박막 제조방법
JP2007317750A (ja) 2006-05-23 2007-12-06 Matsushita Electric Ind Co Ltd 撮像装置
US8766385B2 (en) 2006-07-25 2014-07-01 Commissariat A L'energie Atomique Et Aux Energies Alternatives Filtering matrix structure, associated image sensor and 3D mapping device
FR2904432B1 (fr) 2006-07-25 2008-10-24 Commissariat Energie Atomique Structure matricielle de filtrage optique et capteur d'images associe
US7701024B2 (en) 2006-12-13 2010-04-20 Panasonic Corporation Solid-state imaging device, manufactoring method thereof and camera
KR100819706B1 (ko) 2006-12-27 2008-04-04 동부일렉트로닉스 주식회사 씨모스 이미지센서 및 그 제조방법
US8274739B2 (en) 2006-12-29 2012-09-25 Nanolambda, Inc. Plasmonic fabry-perot filter
JP4958594B2 (ja) * 2007-03-22 2012-06-20 富士フイルム株式会社 反射防止膜、光学素子および光学系
US7576860B2 (en) * 2007-05-11 2009-08-18 Hewlett-Packard Development Company, L.P. Light filter having a wedge-shaped profile
JP4891841B2 (ja) 2007-06-08 2012-03-07 浜松ホトニクス株式会社 分光モジュール
KR101491889B1 (ko) 2007-06-08 2015-02-11 하마마츠 포토닉스 가부시키가이샤 분광기
US8284401B2 (en) 2007-07-10 2012-10-09 Nanolambda, Inc. Digital filter spectrum sensor
JP5017193B2 (ja) 2008-06-30 2012-09-05 パナソニック株式会社 固体撮像装置及びカメラ
US8896839B2 (en) 2008-07-30 2014-11-25 Pason Systems Corp. Multiplex tunable filter spectrometer
FR2937425B1 (fr) 2008-10-22 2010-12-31 Commissariat Energie Atomique Structure de filtrage optique en longueur d'onde et capteur d'images associe
FR2939887B1 (fr) 2008-12-11 2017-12-08 Silios Tech Dispositif de spectroscopie optique comportant une pluralite de sources d'emission
WO2010108086A2 (en) 2009-03-20 2010-09-23 Nanolambda, Inc. Nano-optic filter array based sensor
JP5440110B2 (ja) * 2009-03-30 2014-03-12 株式会社リコー 分光特性取得装置、分光特性取得方法、画像評価装置、及び画像形成装置
EP2443493B1 (en) * 2009-06-17 2018-09-26 Philips Lighting Holding B.V. Interference filters with high transmission and large rejection range for mini-spectrometer
WO2011052331A1 (ja) * 2009-10-30 2011-05-05 シャープ株式会社 表示装置
US8559113B2 (en) 2009-12-10 2013-10-15 Raytheon Company Multi-spectral super-pixel filters and methods of formation
JP2011198853A (ja) 2010-03-17 2011-10-06 Fujifilm Corp マイクロレンズ非搭載の光電変換膜積層型固体撮像素子及びその製造方法並びに撮像装置
JP5619666B2 (ja) 2010-04-16 2014-11-05 ジェイディーエス ユニフェイズ コーポレーションＪＤＳ Ｕｎｉｐｈａｓｅ Ｃｏｒｐｏｒａｔｉｏｎ マグネトロン・スパッタリング・デバイスで使用するためのリング・カソード
WO2012007147A1 (de) 2010-07-15 2012-01-19 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. . Optisches bandpass-filtersystem, insbesondere für mehrkanalige spektralselektive messungen
DE102010033137A1 (de) * 2010-08-03 2012-02-09 Osram Opto Semiconductors Gmbh Leuchtdiodenchip
JP2012042584A (ja) 2010-08-17 2012-03-01 Seiko Epson Corp 光フィルター、光フィルターモジュール、分光測定器および光機器
CN102798918B (zh) * 2011-05-25 2016-08-03 苏州大学 一种反射式彩色滤光片
FR2977684A1 (fr) * 2011-07-08 2013-01-11 Commissariat Energie Atomique Procede de realisation par impression d'un filtre pour une radiation electromagnetique
TW201317665A (zh) 2011-10-28 2013-05-01 Subtron Technology Co Ltd 光學觸控結構及其製作方法
CN104040309B (zh) 2011-11-03 2019-06-07 威利食品有限公司 用于最终使用者食品分析的低成本光谱测定系统
EP2773929B1 (en) 2011-11-04 2023-12-13 IMEC vzw Spectral camera with mosaic of filters for each image pixel
EP2773989A4 (en) * 2011-11-04 2015-10-21 Univ New York State Res Found PHOTONIC BANDWIDTH WIDTH STRUCTURES FOR MULTISPECTRAL IMAGING DEVICES
IN2014CN03038A (enExample) 2011-11-04 2015-07-03 Imec
WO2013064507A1 (en) 2011-11-04 2013-05-10 Imec Spectral camera with overlapping segments of image copies interleaved onto sensor array
JP2013190580A (ja) * 2012-03-13 2013-09-26 Toshiba Corp 液晶表示装置
JP5710526B2 (ja) * 2012-03-14 2015-04-30 株式会社東芝 固体撮像装置、及び固体撮像装置の製造方法
FR2994282B1 (fr) * 2012-07-31 2014-09-05 Commissariat Energie Atomique Structure de filtrage optique dans le domaine visible et/ou infrarouge
JP2015532725A (ja) * 2012-08-13 2015-11-12 プレジデント アンド フェローズ オブ ハーバード カレッジ 光学装置、光フィルタの製造方法、画像形成装置およびその製造方法
US9793098B2 (en) * 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9448346B2 (en) * 2012-12-19 2016-09-20 Viavi Solutions Inc. Sensor device including one or more metal-dielectric optical filters
US10197716B2 (en) 2012-12-19 2019-02-05 Viavi Solutions Inc. Metal-dielectric optical filter, sensor device, and fabrication method
EP2746740B1 (en) 2012-12-21 2019-05-08 IMEC vzw Spectral imaging device and method to calibrate the same
WO2014120686A1 (en) * 2013-01-29 2014-08-07 Jds Uniphase Corporation A variable optical filter and a wavelength-selective sensor based thereon
WO2014123522A1 (en) * 2013-02-06 2014-08-14 Empire Technology Development Llc Thermo-optic tunable spectrometer
TWI612649B (zh) * 2013-03-18 2018-01-21 新力股份有限公司 半導體裝置及電子機器
US9443993B2 (en) 2013-03-28 2016-09-13 Seiko Epson Corporation Spectroscopic sensor and method for manufacturing same
US20140320611A1 (en) 2013-04-29 2014-10-30 nanoLambda Korea Multispectral Multi-Camera Display Unit for Accurate Color, Multispectral, or 3D Images
WO2015015493A2 (en) 2013-08-02 2015-02-05 Verifood, Ltd. Spectrometry system and method, spectroscopic devices and systems
US9212996B2 (en) 2013-08-05 2015-12-15 Tellspec, Inc. Analyzing and correlating spectra, identifying samples and their ingredients, and displaying related personalized information
US9635228B2 (en) * 2013-08-27 2017-04-25 Semiconductor Components Industries, Llc Image sensors with interconnects in cover layer
JP6466851B2 (ja) 2013-10-31 2019-02-06 浜松ホトニクス株式会社 光検出装置
JP6390090B2 (ja) 2013-11-19 2018-09-19 セイコーエプソン株式会社 光学フィルターデバイス、光学モジュール、及び電子機器
US9645075B2 (en) 2013-11-26 2017-05-09 nanoLambda Korea Multispectral imager with hybrid double layer filter array
KR102163727B1 (ko) * 2014-04-03 2020-10-08 삼성전자주식회사 광 이용 효율이 향상된 이미지 센서
KR102240253B1 (ko) 2014-06-18 2021-04-13 비아비 솔루션즈 아이엔씨. 금속-유전체 광학 필터, 센서 디바이스, 및 제조 방법
US10247604B2 (en) 2014-10-30 2019-04-02 Infineon Technologies Ag Spectrometer, method for manufacturing a spectrometer, and method for operating a spectrometer
KR102323208B1 (ko) 2014-11-03 2021-11-08 삼성전자주식회사 수직 적층 구조를 갖는 분광기 및 이를 포함하는 비침습형 생체 센서
US20160238759A1 (en) 2015-02-18 2016-08-18 Materion Corporation Near infrared optical interference filters with improved transmission
EP3112828B1 (en) * 2015-06-30 2022-10-05 IMEC vzw Integrated circuit and method for manufacturing integrated circuit
US9923007B2 (en) 2015-12-29 2018-03-20 Viavi Solutions Inc. Metal mirror based multispectral filter array
US9960199B2 (en) * 2015-12-29 2018-05-01 Viavi Solutions Inc. Dielectric mirror based multispectral filter array

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6631033B1 (en) * 1999-01-29 2003-10-07 Qinetiq Limited Multilayer optical filters
US20120327248A1 (en) * 2009-11-30 2012-12-27 Imec Integrated circuit for spectral imaging system
US8715443B2 (en) * 2010-11-22 2014-05-06 Hamamatsu Photonics K.K. Method for producing spectroscopic sensor
US20140014838A1 (en) * 2012-07-16 2014-01-16 Karen Denise Hendrix Optical filter and sensor system

Also Published As

Publication number Publication date
TW202300960A (zh) 2023-01-01
US20170186793A1 (en) 2017-06-29
CN107037520A (zh) 2017-08-11
KR20240028407A (ko) 2024-03-05
US12170300B2 (en) 2024-12-17
US20210384242A1 (en) 2021-12-09
JP2023106454A (ja) 2023-08-01
TWI835276B (zh) 2024-03-11
KR20220038327A (ko) 2022-03-28
TWI755172B (zh) 2022-02-11
US20230268362A1 (en) 2023-08-24
KR20170078544A (ko) 2017-07-07
TW202422120A (zh) 2024-06-01
US11670658B2 (en) 2023-06-06
TWI713666B (zh) 2020-12-21
KR102642004B1 (ko) 2024-02-29
TW202215080A (zh) 2022-04-16
US20200258927A1 (en) 2020-08-13
CN115727950A (zh) 2023-03-03
TWI893644B (zh) 2025-08-11
CA3246830A1 (en) 2025-10-31
JP6812238B2 (ja) 2021-01-13
US10651216B2 (en) 2020-05-12
JP2017151419A (ja) 2017-08-31
JP2021063990A (ja) 2021-04-22
CN107037520B (zh) 2022-11-25
CA2952683A1 (en) 2017-06-29
US20250113635A1 (en) 2025-04-03
US20180204864A1 (en) 2018-07-19
JP7336428B2 (ja) 2023-08-31
EP3187909A1 (en) 2017-07-05
TW202111294A (zh) 2021-03-16
TW201734415A (zh) 2017-10-01
KR102376881B1 (ko) 2022-03-21
US9923007B2 (en) 2018-03-20
US11114485B2 (en) 2021-09-07

Similar Documents

Publication Publication Date Title
TWI777886B (zh) 製造光學感測器裝置的方法
US11450698B2 (en) Dielectric mirror based multispectral filter array
HK40083123A (en) Metal mirror based multispectral filter array
HK1241036B (en) Metal mirror based multispectral filter array
HK1241036A1 (en) Metal mirror based multispectral filter array
TW202542554A (zh) 基於金屬鏡的多光譜濾光片陣列
HK1240654A1 (en) Dielectric mirror based multispectral filter array

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent