TWI753021B - 密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法 - Google Patents

密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法 Download PDF

Info

Publication number
TWI753021B
TWI753021B TW106134120A TW106134120A TWI753021B TW I753021 B TWI753021 B TW I753021B TW 106134120 A TW106134120 A TW 106134120A TW 106134120 A TW106134120 A TW 106134120A TW I753021 B TWI753021 B TW I753021B
Authority
TW
Taiwan
Prior art keywords
inorganic filler
resin composition
sealing
mass
average particle
Prior art date
Application number
TW106134120A
Other languages
English (en)
Chinese (zh)
Other versions
TW201817808A (zh
Inventor
竹内勇磨
高橋寿登
稲葉貴一
Original Assignee
日商昭和電工材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商昭和電工材料股份有限公司 filed Critical 日商昭和電工材料股份有限公司
Publication of TW201817808A publication Critical patent/TW201817808A/zh
Application granted granted Critical
Publication of TWI753021B publication Critical patent/TWI753021B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50—Amines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50—Amines
    • C08G59/5033—Amines aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H01L23/295—Organic, e.g. plastic containing a filler
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/002—Physical properties
    • C08K2201/005—Additives being defined by their particle size in general
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/002—Physical properties
    • C08K2201/006—Additives being defined by their surface area
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
TW106134120A 2016-10-14 2017-10-03 密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法 TWI753021B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016202714 2016-10-14
JP2016-202714 2016-10-14

Publications (2)

Publication Number Publication Date
TW201817808A TW201817808A (zh) 2018-05-16
TWI753021B true TWI753021B (zh) 2022-01-21

Family

ID=61905596

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106134120A TWI753021B (zh) 2016-10-14 2017-10-03 密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法

Country Status (6)

Country Link
US (2) US11186742B2 (enExample)
JP (2) JP7231821B2 (enExample)
KR (2) KR20190069464A (enExample)
CN (2) CN120399400A (enExample)
TW (1) TWI753021B (enExample)
WO (1) WO2018070237A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI811215B (zh) * 2018-04-13 2023-08-11 日商力森諾科股份有限公司 密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法
US11873414B2 (en) 2016-10-14 2024-01-16 Resonac Corporation Sealing resin composition, electronic component device, and method of manufacturing electronic component device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240050451A (ko) * 2018-04-13 2024-04-18 가부시끼가이샤 레조낙 밀봉용 수지 조성물, 전자 부품 장치 및 전자 부품 장치의 제조 방법
JP7020343B2 (ja) * 2018-08-21 2022-02-16 昭和電工マテリアルズ株式会社 封止樹脂材料
CN114585684A (zh) * 2019-10-24 2022-06-03 松下知识产权经营株式会社 密封用树脂组合物及半导体装置
CN117736550A (zh) * 2022-09-15 2024-03-22 华为技术有限公司 树脂组合物及其制备方法和应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000336247A (ja) * 1999-05-27 2000-12-05 C I Kasei Co Ltd 液状エポキシ樹脂封止材

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4033257B2 (ja) 2002-04-08 2008-01-16 京セラケミカル株式会社 液状封止用樹脂組成物および半導体封止装置
JP4516779B2 (ja) * 2004-04-14 2010-08-04 株式会社アドマテックス 金属酸化物表面処理粒子、その製造方法および樹脂組成物の製造方法
JP4460968B2 (ja) * 2004-07-27 2010-05-12 株式会社アドマテックス 樹脂組成物の製造方法
JP5042529B2 (ja) 2005-05-30 2012-10-03 株式会社アドマテックス 微小粒子含有組成物及びその製造方法
JP4967353B2 (ja) 2006-01-31 2012-07-04 住友ベークライト株式会社 半導体封止用エポキシ樹脂組成物及び半導体装置
JP5162160B2 (ja) * 2007-06-04 2013-03-13 サンダイヤポリマー株式会社 吸収性樹脂粒子、この製造方法、これを含む吸収体及び吸収性物品
JP2009114222A (ja) * 2007-11-01 2009-05-28 Kyocera Chemical Corp 注形用エポキシ樹脂組成物および電気・電子部品装置
JP2010192525A (ja) 2009-02-16 2010-09-02 Namics Corp 半導体装置およびその製造方法
TWI492339B (zh) 2009-06-01 2015-07-11 信越化學工業股份有限公司 A dam material composition for a bottom layer filler material for a multilayer semiconductor device, and a manufacturing method of a multilayer semiconductor device using the dam material composition
JP2011006618A (ja) 2009-06-26 2011-01-13 Namics Corp 封止用液状樹脂組成物、フリップチップ実装体およびその製造方法
US20120111621A1 (en) 2009-07-24 2012-05-10 Sumitomo Bakelite Company, Ltd. Resin composition, resin sheet, prepreg, metal-clad laminate, printed wiring board and semiconductor device
JP2012107149A (ja) 2010-11-19 2012-06-07 Sumitomo Bakelite Co Ltd 液状封止樹脂組成物および半導体装置
TWI673318B (zh) 2013-11-29 2019-10-01 日商納美仕股份有限公司 環氧樹脂組成物、半導體密封劑及半導體裝置
JP6196138B2 (ja) 2013-11-29 2017-09-13 ナミックス株式会社 半導体封止剤および半導体装置
JP6656792B2 (ja) * 2014-03-28 2020-03-04 日立化成株式会社 電子部品用液状樹脂組成物及び電子部品装置
JP6415104B2 (ja) 2014-05-16 2018-10-31 ナミックス株式会社 液状封止材、それを用いた電子部品
JP6431343B2 (ja) 2014-11-21 2018-11-28 日東電工株式会社 接着シート、ダイシングシート付き接着シート、積層シート及び半導体装置の製造方法
CN107251209B (zh) 2015-03-19 2019-12-27 纳美仕有限公司 倒装芯片安装体的制造方法、倒装芯片安装体及先供给型底部填充用树脂组合物
WO2018070237A1 (ja) 2016-10-14 2018-04-19 日立化成株式会社 封止用樹脂組成物、電子部品装置及び電子部品装置の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000336247A (ja) * 1999-05-27 2000-12-05 C I Kasei Co Ltd 液状エポキシ樹脂封止材

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11873414B2 (en) 2016-10-14 2024-01-16 Resonac Corporation Sealing resin composition, electronic component device, and method of manufacturing electronic component device
TWI811215B (zh) * 2018-04-13 2023-08-11 日商力森諾科股份有限公司 密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法

Also Published As

Publication number Publication date
JP7513074B2 (ja) 2024-07-09
CN120399400A (zh) 2025-08-01
US20210363380A1 (en) 2021-11-25
US11873414B2 (en) 2024-01-16
KR102725565B1 (ko) 2024-11-05
WO2018070237A1 (ja) 2018-04-19
CN109844020A (zh) 2019-06-04
WO2018070237A9 (ja) 2018-06-14
US11186742B2 (en) 2021-11-30
US20190233672A1 (en) 2019-08-01
JP2023016887A (ja) 2023-02-02
TW201817808A (zh) 2018-05-16
KR20220152583A (ko) 2022-11-16
JP7231821B2 (ja) 2023-03-02
KR20190069464A (ko) 2019-06-19
JPWO2018070237A1 (ja) 2019-09-05

Similar Documents

Publication Publication Date Title
TWI753021B (zh) 密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法
TWI667267B (zh) 液狀封裝材、及使用其之電子元件
JP7167912B2 (ja) 液状封止樹脂組成物、電子部品装置及び電子部品装置の製造方法
JP5270833B2 (ja) 液状樹脂組成物、半導体装置及びその製造方法
TWI612096B (zh) 液狀樹脂組成物、覆晶安裝體及其製造方法
JP7251583B2 (ja) 封止用樹脂組成物、硬化物、電子部品装置及び電子部品装置の製造方法
JP7509192B2 (ja) 封止用樹脂組成物、電子部品装置及び電子部品装置の製造方法
JP2018172546A (ja) アンダーフィル用樹脂組成物、半導体装置の製造方法及び半導体装置
KR20210058107A (ko) 에폭시 복합 조성물 및 이를 포함하는 반도체 패키지
TWI811215B (zh) 密封用樹脂組成物、電子零件裝置及電子零件裝置的製造方法
JP5886051B2 (ja) 樹脂組成物
JP5958799B2 (ja) 半導体封止用液状エポキシ樹脂組成物とそれを用いた半導体装置
JP6482016B2 (ja) 封止材組成物、それを用いた半導体装置
JP2019214644A (ja) ディップ用先供給型半導体封止材、それを用いた半導体装置