TWI741014B - 圖型形成用感光性樹脂組成物、硬化膜、低折射率膜、光學裝置、及經圖型化之硬化膜或低折射率膜之形成方法 - Google Patents

圖型形成用感光性樹脂組成物、硬化膜、低折射率膜、光學裝置、及經圖型化之硬化膜或低折射率膜之形成方法 Download PDF

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Publication number
TWI741014B
TWI741014B TW106129109A TW106129109A TWI741014B TW I741014 B TWI741014 B TW I741014B TW 106129109 A TW106129109 A TW 106129109A TW 106129109 A TW106129109 A TW 106129109A TW I741014 B TWI741014 B TW I741014B
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TW
Taiwan
Prior art keywords
group
resin composition
photosensitive resin
carbon atoms
butyl
Prior art date
Application number
TW106129109A
Other languages
English (en)
Chinese (zh)
Other versions
TW201821447A (zh
Inventor
武內弘明
田村弘毅
Original Assignee
日商東京應化工業股份有限公司
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Publication date
Application filed by 日商東京應化工業股份有限公司 filed Critical 日商東京應化工業股份有限公司
Publication of TW201821447A publication Critical patent/TW201821447A/zh
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Publication of TWI741014B publication Critical patent/TWI741014B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Surface Treatment Of Optical Elements (AREA)
TW106129109A 2016-10-31 2017-08-28 圖型形成用感光性樹脂組成物、硬化膜、低折射率膜、光學裝置、及經圖型化之硬化膜或低折射率膜之形成方法 TWI741014B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016213465A JP7028550B2 (ja) 2016-10-31 2016-10-31 パターン形成用感光性樹脂組成物、硬化膜、低屈折率膜、光学デバイス、並びにパターン化された硬化膜又は低屈折率膜の形成方法
JP2016-213465 2016-10-31

Publications (2)

Publication Number Publication Date
TW201821447A TW201821447A (zh) 2018-06-16
TWI741014B true TWI741014B (zh) 2021-10-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW106129109A TWI741014B (zh) 2016-10-31 2017-08-28 圖型形成用感光性樹脂組成物、硬化膜、低折射率膜、光學裝置、及經圖型化之硬化膜或低折射率膜之形成方法

Country Status (3)

Country Link
JP (1) JP7028550B2 (ko)
KR (1) KR102387490B1 (ko)
TW (1) TWI741014B (ko)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103857750A (zh) * 2011-10-12 2014-06-11 东洋油墨Sc控股株式会社 树脂组合物、涂膜及触控面板用绝缘膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5189404B2 (ja) 2008-05-09 2013-04-24 住友化学株式会社 感光性組成物
JP5618746B2 (ja) * 2010-10-06 2014-11-05 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、反射防止膜、光学デバイス、及び、固体撮像素子
JP6125833B2 (ja) * 2012-12-27 2017-05-10 株式会社日本触媒 硬化性樹脂組成物及びその用途
JP6161984B2 (ja) * 2013-07-31 2017-07-12 株式会社日本触媒 硬化性樹脂組成物及びその用途
CN105467752A (zh) * 2014-06-23 2016-04-06 太阳油墨（苏州）有限公司 用于制造印刷电路板的光固化性热固化性树脂组合物、干膜、固化物、及印刷电路板

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103857750A (zh) * 2011-10-12 2014-06-11 东洋油墨Sc控股株式会社 树脂组合物、涂膜及触控面板用绝缘膜

Also Published As

Publication number Publication date
KR20180048300A (ko) 2018-05-10
KR102387490B1 (ko) 2022-04-15
JP2018072616A (ja) 2018-05-10
JP7028550B2 (ja) 2022-03-02
TW201821447A (zh) 2018-06-16

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