TWI733858B - 組成物、硬化膜、紅外線透過濾波器、固體攝像元件及紅外線感測器 - Google Patents

組成物、硬化膜、紅外線透過濾波器、固體攝像元件及紅外線感測器 Download PDF

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Publication number
TWI733858B
TWI733858B TW106124103A TW106124103A TWI733858B TW I733858 B TWI733858 B TW I733858B TW 106124103 A TW106124103 A TW 106124103A TW 106124103 A TW106124103 A TW 106124103A TW I733858 B TWI733858 B TW I733858B
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Taiwan
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composition
compound
infrared
mass
group
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TW106124103A
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English (en)
Chinese (zh)
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TW201809874A (zh
Inventor
有村啓佑
荒山恭平
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日商富士軟片股份有限公司
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/14625—Optical elements or arrangements associated with the device

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Solid State Image Pick-Up Elements (AREA)
TW106124103A 2016-08-18 2017-07-19 組成物、硬化膜、紅外線透過濾波器、固體攝像元件及紅外線感測器 TWI733858B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-160523 2016-08-18
JP2016160523 2016-08-18

Publications (2)

Publication Number Publication Date
TW201809874A TW201809874A (zh) 2018-03-16
TWI733858B true TWI733858B (zh) 2021-07-21

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ID=61197383

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TW106124103A TWI733858B (zh) 2016-08-18 2017-07-19 組成物、硬化膜、紅外線透過濾波器、固體攝像元件及紅外線感測器

Country Status (4)

Country Link
JP (1) JP6629976B2 (ko)
KR (1) KR102129747B1 (ko)
TW (1) TWI733858B (ko)
WO (1) WO2018034082A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102142179B1 (ko) * 2016-10-10 2020-08-06 주식회사 엘지화학 잉크젯용 적외선 투과 잉크 조성물, 이를 이용한 베젤 패턴의 형성방법, 이에 따라 제조한 베젤 패턴 및 이를 포함하는 디스플레이 기판
EP3805822A4 (en) * 2018-06-01 2022-05-11 Toray Industries, Inc. COLORED RESIN COMPOSITION, METHOD FOR PREPARING IT, PROTECTIVE FILM AGAINST NEAR INFRARED TRANSMISSION LIGHT AND DECORATIVE SUBSTRATE
JPWO2023022199A1 (ko) * 2021-08-18 2023-02-23

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201437695A (zh) * 2013-03-29 2014-10-01 Fujifilm Corp 彩色濾光片的製造方法、彩色濾光片及固體攝影元件
TW201520609A (zh) * 2013-10-17 2015-06-01 Jsr Corp 光學濾波器、固體攝像裝置及照相機模組
TW201542709A (zh) * 2014-05-01 2015-11-16 Fujifilm Corp 著色組成物、膜、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝像元件及紅外線感測器
WO2015198782A1 (ja) * 2014-06-25 2015-12-30 ソニー株式会社 赤外光カットフィルタ、固体撮像素子及び撮像装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003096215A (ja) 2001-09-21 2003-04-03 Teijin Dupont Films Japan Ltd 近赤外線遮蔽フィルム及びそれを用いた積層体
JP2011033673A (ja) * 2009-07-30 2011-02-17 Seiko Epson Corp カラーフィルター用インク、カラーフィルター、画像表示装置、および、電子機器
JP5936299B2 (ja) 2010-11-08 2016-06-22 Jsr株式会社 近赤外線カットフィルター、およびそれを備える固体撮像素子ならびに固体撮像装置
JP5796792B2 (ja) * 2011-08-04 2015-10-21 エルジー・ケム・リミテッド 染料を含む高分子化合物、硬化性樹脂組成物、感光材、及び、電子素子
JP2014026178A (ja) * 2012-07-27 2014-02-06 Fujifilm Corp 近赤外線吸収性組成物、これを用いた近赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法
JP6170673B2 (ja) 2012-12-27 2017-07-26 富士フイルム株式会社 カラーフィルタ用組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー
JP6166997B2 (ja) * 2013-09-27 2017-07-19 富士フイルム株式会社 感光性樹脂組成物、赤外線透過フィルタおよびその製造方法、赤外線センサならびにカラーフィルタ。
JP2015200878A (ja) 2014-03-31 2015-11-12 富士フイルム株式会社 赤外線センサ、近赤外線吸収組成物、硬化膜、近赤外線吸収フィルタ、イメージセンサ、カメラモジュールおよび化合物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201437695A (zh) * 2013-03-29 2014-10-01 Fujifilm Corp 彩色濾光片的製造方法、彩色濾光片及固體攝影元件
TW201520609A (zh) * 2013-10-17 2015-06-01 Jsr Corp 光學濾波器、固體攝像裝置及照相機模組
TW201542709A (zh) * 2014-05-01 2015-11-16 Fujifilm Corp 著色組成物、膜、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝像元件及紅外線感測器
WO2015198782A1 (ja) * 2014-06-25 2015-12-30 ソニー株式会社 赤外光カットフィルタ、固体撮像素子及び撮像装置

Also Published As

Publication number Publication date
KR20190008327A (ko) 2019-01-23
KR102129747B1 (ko) 2020-07-03
JP6629976B2 (ja) 2020-01-15
WO2018034082A1 (ja) 2018-02-22
JPWO2018034082A1 (ja) 2019-06-13
TW201809874A (zh) 2018-03-16

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