TWI730192B - 磨削裝置 - Google Patents
磨削裝置 Download PDFInfo
- Publication number
- TWI730192B TWI730192B TW106137924A TW106137924A TWI730192B TW I730192 B TWI730192 B TW I730192B TW 106137924 A TW106137924 A TW 106137924A TW 106137924 A TW106137924 A TW 106137924A TW I730192 B TWI730192 B TW I730192B
- Authority
- TW
- Taiwan
- Prior art keywords
- grinding
- work
- workpiece
- wheel
- equipment
- Prior art date
Links
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0069—Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016-238428 | 2016-12-08 | ||
JP2016238428A JP6858539B2 (ja) | 2016-12-08 | 2016-12-08 | 研削装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201821217A TW201821217A (zh) | 2018-06-16 |
TWI730192B true TWI730192B (zh) | 2021-06-11 |
Family
ID=62545350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106137924A TWI730192B (zh) | 2016-12-08 | 2017-11-02 | 磨削裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6858539B2 (ja) |
KR (1) | KR102408593B1 (ja) |
CN (1) | CN108177038A (ja) |
TW (1) | TWI730192B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7301512B2 (ja) * | 2018-09-13 | 2023-07-03 | 株式会社岡本工作機械製作所 | 基板研削装置及び基板研削方法 |
JP2020066064A (ja) * | 2018-10-22 | 2020-04-30 | 株式会社ディスコ | 被加工物の加工方法及び加工装置 |
TW202120251A (zh) * | 2019-07-17 | 2021-06-01 | 日商東京威力科創股份有限公司 | 基板加工裝置、基板處理系統及基板處理方法 |
CN113305732B (zh) * | 2021-06-22 | 2022-05-03 | 北京中电科电子装备有限公司 | 一种用于半导体设备的多工位全自动减薄磨削方法 |
CN114639601B (zh) * | 2022-02-17 | 2023-04-28 | 中环领先半导体材料有限公司 | 一种提升减薄机稼动率的新型工艺 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05277915A (ja) * | 1992-03-31 | 1993-10-26 | Nec Yamagata Ltd | ウェーハ裏面研削装置 |
TW201216344A (en) * | 2010-10-12 | 2012-04-16 | Disco Corp | Processing apparatus |
JP5277915B2 (ja) | 2008-12-03 | 2013-08-28 | セイコーエプソン株式会社 | 点灯装置、光源装置、プロジェクタ及び放電灯の点灯方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2138719B (en) * | 1983-04-26 | 1986-08-13 | Marconi Electronic Devices | Grinding apparatus |
JPS61168462A (ja) * | 1985-01-18 | 1986-07-30 | Hitachi Ltd | ウエハ研削装置 |
JPH06143112A (ja) * | 1992-10-27 | 1994-05-24 | Koyo Mach Ind Co Ltd | 平面研削盤の研削方法 |
JP3589621B2 (ja) * | 2000-07-03 | 2004-11-17 | 株式会社ミツトヨ | 光電式エンコーダ及びそのセンサヘッドの製造方法 |
JP4455750B2 (ja) | 2000-12-27 | 2010-04-21 | 株式会社ディスコ | 研削装置 |
JP4790322B2 (ja) * | 2005-06-10 | 2011-10-12 | 株式会社ディスコ | 加工装置および加工方法 |
JP2008047696A (ja) * | 2006-08-16 | 2008-02-28 | Disco Abrasive Syst Ltd | ウエーハ搬送方法および研削装置 |
JP4348360B2 (ja) * | 2006-12-12 | 2009-10-21 | Okiセミコンダクタ株式会社 | 研削ヘッド、研削装置、研削方法、及び、半導体装置の製造方法 |
JP4818995B2 (ja) * | 2007-06-25 | 2011-11-16 | 大昌精機株式会社 | 両頭平面研削盤 |
JP5149020B2 (ja) * | 2008-01-23 | 2013-02-20 | 株式会社ディスコ | ウエーハの研削方法 |
JP5342253B2 (ja) * | 2009-01-28 | 2013-11-13 | 株式会社ディスコ | 加工装置 |
KR101297848B1 (ko) * | 2011-11-14 | 2013-08-19 | 주식회사 엘지실트론 | 웨이퍼 연마장치 |
JP2014004663A (ja) * | 2012-06-26 | 2014-01-16 | Disco Abrasive Syst Ltd | 被加工物の加工方法 |
JP2014030884A (ja) * | 2012-08-06 | 2014-02-20 | Disco Abrasive Syst Ltd | 研削装置 |
JP6087565B2 (ja) * | 2012-10-03 | 2017-03-01 | 株式会社ディスコ | 研削装置および研削方法 |
JP6425505B2 (ja) * | 2014-11-17 | 2018-11-21 | 株式会社ディスコ | 被加工物の研削方法 |
JP6441056B2 (ja) * | 2014-12-10 | 2018-12-19 | 株式会社ディスコ | 研削装置 |
-
2016
- 2016-12-08 JP JP2016238428A patent/JP6858539B2/ja active Active
-
2017
- 2017-11-02 TW TW106137924A patent/TWI730192B/zh active
- 2017-11-28 KR KR1020170160552A patent/KR102408593B1/ko active IP Right Grant
- 2017-11-30 CN CN201711237844.8A patent/CN108177038A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05277915A (ja) * | 1992-03-31 | 1993-10-26 | Nec Yamagata Ltd | ウェーハ裏面研削装置 |
JP5277915B2 (ja) | 2008-12-03 | 2013-08-28 | セイコーエプソン株式会社 | 点灯装置、光源装置、プロジェクタ及び放電灯の点灯方法 |
TW201216344A (en) * | 2010-10-12 | 2012-04-16 | Disco Corp | Processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP6858539B2 (ja) | 2021-04-14 |
KR102408593B1 (ko) | 2022-06-14 |
KR20180065903A (ko) | 2018-06-18 |
CN108177038A (zh) | 2018-06-19 |
JP2018094636A (ja) | 2018-06-21 |
TW201821217A (zh) | 2018-06-16 |
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