TWI730192B - Grinding device - Google Patents

Grinding device Download PDF

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TWI730192B
TWI730192B TW106137924A TW106137924A TWI730192B TW I730192 B TWI730192 B TW I730192B TW 106137924 A TW106137924 A TW 106137924A TW 106137924 A TW106137924 A TW 106137924A TW I730192 B TWI730192 B TW I730192B
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grinding
work
workpiece
wheel
equipment
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TW106137924A
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Chinese (zh)
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TW201821217A (en
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李宰榮
甲斐賢哉
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日商迪思科股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/30Work carriers for single side lapping of plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/0023Other grinding machines or devices grinding machines with a plurality of working posts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/0069Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/0076Other grinding machines or devices grinding machines comprising two or more grinding tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/005Feeding or manipulating devices specially adapted to grinding machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • B24B41/068Table-like supports for panels, sheets or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

[課題]提供一種能夠增加每單位時間之被加工物的磨削加工數量的磨削裝置。 [解決手段]一種具備第1磨削設備和第2磨削設備的磨削裝置,該磨削裝置將保持被加工物的複數個工作夾台在轉台上支撐成可旋動,且對於被加工物的被磨削面,該第1磨削設備一邊使第1磨削輪旋轉一邊施行第1磨削,該第2磨削設備一邊使第2磨削輪旋轉一邊施行第2磨削,且,對應於第1磨削設備及第2磨削設備,各別配設有2個工作夾台,又,在設於第1磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削,且在設於第2磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削。[Problem] To provide a grinding device that can increase the number of grinding processes of the workpiece per unit time. [Solution] A grinding device equipped with a first grinding device and a second grinding device. The grinding device supports a plurality of work chucks that hold the workpiece on a turntable so as to be rotatable. The first grinding device performs the first grinding while rotating the first grinding wheel, and the second grinding device performs the second grinding while rotating the second grinding wheel, and , Corresponding to the first grinding equipment and the second grinding equipment, each is equipped with 2 work clamps, and on the grinding surface of the grinding stone set on the first grinding wheel and 2 work clamps Grinding is performed in the radius area where the two suction surfaces of the table face each other, and the grinding surface of the grinding stone set on the second grinding wheel and the radius area where the two suction surfaces of the two work chucks face each other Grinding in the middle.

Description

磨削裝置Grinding device

發明領域 本發明是有關於一種磨削裝置,是藉由配設於磨削區域的磨削設備來磨削被加工物,該被加工物被保持在工作夾台上,且該工作夾台配設於轉台。FIELD OF THE INVENTION The present invention relates to a grinding device, which is used to grind a workpiece by a grinding device arranged in a grinding area, and the workpiece is held on a work chuck table, and the work chuck table is equipped with Located on the turntable.

發明背景 在半導體元件的製造步驟中,形成有複數個IC、LSI等元件之被加工物的半導體元件,在分割成一個個的元件之前,藉由磨削裝置磨削其背面而形成規定之厚度。將這樣的晶圓之背面予以磨削的磨削裝置具備有:轉台(turn table)、複數個工作夾台、及磨削設備,該轉台能夠沿著被加工物裝卸區域和磨削區域進行旋轉,該等工作夾台配設於轉台且依序移動至磨削區域,該磨削設備配設於磨削區域且將晶圓予以磨削,該晶圓被保持在工作夾台上,且該工作夾台定位於磨削區域(例如,參照專利文獻1)。 先前技術文獻 專利文獻BACKGROUND OF THE INVENTION In the manufacturing process of semiconductor devices, a semiconductor device formed with a plurality of ICs, LSIs, and other devices to be processed, before being divided into individual devices, is ground with a grinding device to form a predetermined thickness on the back surface. . A grinding device that grinds the backside of such a wafer is provided with a turn table, a plurality of work clamp tables, and grinding equipment. The turntable can rotate along the workpiece loading and unloading area and the grinding area. , The work chuck tables are arranged on the turntable and move to the grinding area in sequence, the grinding equipment is arranged in the grinding area and the wafer is ground, the wafer is held on the work chuck table, and the The work chuck is positioned in the grinding area (for example, refer to Patent Document 1). Prior Art Documents Patent Documents

專利文獻1:日本專利特開2002-200545號公報Patent Document 1: Japanese Patent Laid-Open No. 2002-200545

發明概要 發明欲解決之課題 通常,如上述之磨削裝置具備有粗磨削設備和精磨削設備來作為磨削設備,並且藉由粗磨削設備和精磨削設備同時磨削晶圓,且各自一次磨削1片晶圓。然而,為了提升生產效率,想要增加每單位時間內可磨削之晶圓片數的要求相應而生,而現存之磨削裝置難以回應該要求。SUMMARY OF THE INVENTION Problems to be solved by the invention Generally, the above-mentioned grinding device is equipped with rough grinding equipment and fine grinding equipment as grinding equipment, and the rough grinding equipment and the fine grinding equipment simultaneously grind wafers, And each one grinds one wafer at a time. However, in order to improve production efficiency, there is a requirement to increase the number of wafers that can be ground per unit time, and it is difficult for the existing grinding devices to meet the requirements.

本發明是有鑒於像這樣的問題點而作成的發明,其目的在於提供一種能夠增加每單位時間之被加工物的磨削加工的處理數量,以提升生產性的磨削裝置。 用以解決課題之手段The present invention is an invention made in view of such problems, and its object is to provide a grinding device capable of increasing the number of grinding processes of a workpiece per unit time to improve productivity. Means to solve the problem

本發明是一種磨削裝置,至少是由:工作夾台、轉台、第1磨削設備、及第2磨削設備所構成,該工作夾台為複數個,用來保持被加工物,該轉台能夠旋轉,且將工作夾台支撐成可旋動,該第1磨削設備用來對被保持在工作夾台上之被加工物的被磨削面施行第1磨削,該第2磨削設備用來對被保持在工作夾台上並且已施行過第1磨削之被加工物的被磨削面施行第2磨削,該磨削裝置之特徵在於:第1磨削設備至少是由第1磨削輪、及主軸單元所構成,該第1磨削輪配設了具有磨削面的磨削磨石,該主軸單元具有用來支撐第1磨削輪且可旋轉的主軸,第2磨削設備至少是由第2磨削輪、及主軸單元所構成,該第2磨削輪配設了具有磨削面的磨削磨石,該主軸單元具有用來支撐第2磨削輪且可旋轉的主軸,工作夾台是對應於第1磨削設備及第2磨削設備而各別配設2個,又,在配設於第1磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削,且在配設於第2磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削。The present invention is a grinding device, which is at least composed of: a work clamp table, a turntable, a first grinding device, and a second grinding device. The work clamp table is plural and is used to hold the workpiece. The turntable It can rotate and supports the work chuck to be rotatable. The first grinding equipment is used to perform the first grinding and the second grinding on the ground surface of the workpiece held on the work chuck. The equipment is used to perform the second grinding on the ground surface of the workpiece that is held on the work chuck and has been subjected to the first grinding. The grinding device is characterized in that: the first grinding device is at least The first grinding wheel is composed of a first grinding wheel and a spindle unit. The first grinding wheel is equipped with a grinding stone with a grinding surface. The spindle unit has a rotatable spindle for supporting the first grinding wheel. 2 Grinding equipment is composed of at least a second grinding wheel and a spindle unit. The second grinding wheel is equipped with a grinding stone with a grinding surface. The spindle unit is provided to support the second grinding wheel. And the rotatable spindle and work chuck are equipped with two respectively corresponding to the first grinding equipment and the second grinding equipment. In addition, it is used for the grinding of the grinding stone arranged on the first grinding wheel. Grinding is performed in the radius area where the two suction surfaces of the two work chucks face each other, and the grinding surface of the grinding stone arranged on the second grinding wheel and two of the two work chucks Grinding is performed in the radius area where the suction surfaces face each other.

依據該磨削裝置,由於是以第1磨削設備和第2磨削設備各自對被保持在2個工作夾台上的2個被加工物同時地進行磨削加工,所以與現存之磨削裝置相比,能夠對多數的被加工物有效率地施行磨削。 發明效果According to this grinding device, since the first grinding device and the second grinding device are used to simultaneously grind the two workpieces held on the two work chucks, it is consistent with the existing grinding Compared with the device, it can efficiently grind most workpieces. Invention effect

依據本發明,可得到一種能夠增加每單位時間之被加工物的磨削加工的處理數量,以提升生產性的磨削裝置。According to the present invention, it is possible to obtain a grinding device capable of increasing the number of grinding processes of a workpiece per unit time to improve productivity.

用以實施發明之形態 以下,參照附加圖式來說明本實施形態。圖1是顯示本實施形態之磨削裝置的頂視圖。沿著圖1的紙面之方向為水平方向,而垂直於圖1的紙面之方向為上下方向。Mode for Carrying Out the Invention Hereinafter, this embodiment will be described with reference to the attached drawings. Fig. 1 is a top view showing the grinding device of this embodiment. The direction along the paper surface of FIG. 1 is the horizontal direction, and the direction perpendicular to the paper surface of FIG. 1 is the vertical direction.

圖1所示之磨削裝置10是在基台11的上表面具有圓板狀的轉台12。轉台12是藉由省略圖示之旋轉驅動機構,以朝向上下方向延伸之旋轉軸P1為中心來進行旋轉。The grinding device 10 shown in FIG. 1 has a disk-shaped turntable 12 on the upper surface of a base 11. The turntable 12 is rotated around a rotation axis P1 extending in the up-down direction by a rotation drive mechanism (not shown).

如圖1所示,轉台12上設有6個工作夾台。6個工作夾台是由3個第1工作夾台TA與3個第2工作夾台TB所構成,該等第1工作夾台TA是以等間隔(120°間隔)配置在以旋轉軸P1為中心的轉台12之旋轉方向上,該等第2工作夾台TB是以等間隔(120°間隔)配置在以旋轉軸P1為中心的旋轉方向上。各工作夾台TA、TB是用以將板狀的被加工物W(參照圖2、圖3)予以吸附保持之構件,其詳細內容將在之後敘述。被加工物W除了半導體基板、其他無機材料基板以外,還有像是形成有元件之半導體晶圓或光元件晶圓等,只要是能作為磨削加工的對象物,就能夠適用於任意物。As shown in Figure 1, the turntable 12 is provided with 6 work clamping tables. The 6 working clamping tables are composed of 3 first working clamping tables TA and 3 second working clamping tables TB. The first working clamping tables TA are arranged at equal intervals (120° intervals) on the rotation axis P1 In the rotation direction of the turntable 12 as the center, the second work chuck tables TB are arranged at equal intervals (120° intervals) in the rotation direction centered on the rotation axis P1. Each work clamp table TA, TB is a member for sucking and holding a plate-shaped workpiece W (refer to FIGS. 2 and 3), and the details will be described later. In addition to semiconductor substrates and other inorganic material substrates, the workpiece W includes semiconductor wafers or optical element wafers with elements formed thereon, and can be applied to any object as long as it can be a grinding object.

圖1中,通過旋轉軸P1而在轉台12的半徑方向上延伸的虛擬的3條基準線L是以一點鏈線來表示。3條基準線L是以等間隔(120°間隔)配置在以旋轉軸P1為中心的旋轉方向上,並且相對於各基準線L,是以線對稱的關係將第1工作夾台TA和第2工作夾台TB各配置一個。將第1工作夾台TA和第2工作夾台TB作為工作夾台組,且各工作夾台TA、TB是以夾著該基準線L構成一對的成對關係來設置的。亦即,在轉台12上,設有3組工作夾台組14、15及16,且各工作夾台組都包含第1工作夾台TA和第2工作夾台TB。In FIG. 1, three virtual reference lines L extending in the radial direction of the turntable 12 through the rotation axis P1 are represented by one-point chain lines. The three reference lines L are arranged at equal intervals (120° intervals) in the rotation direction centered on the rotation axis P1, and with respect to each reference line L, the first work clamp table TA and the first work clamp table TA are line-symmetrical. 2 Each clamping table TB is equipped with one. The first work clamp table TA and the second work clamp table TB are used as a work clamp table group, and each work clamp table TA, TB is set in a paired relationship that sandwiches the reference line L to form a pair. That is, on the turntable 12, there are 3 sets of working clamping table groups 14, 15 and 16, and each working clamping table group includes a first working clamping table TA and a second working clamping table TB.

在從基台11的上表面朝上方突出的柱體17上,支撐有第1磨削設備20和第2磨削設備30,各磨削設備20、30對被保持在各工作夾台TA、TB之被加工物W(參照圖2、圖3)進行磨削加工。第1磨削設備20是對被加工物W施行第1磨削的粗磨削之設備。第2磨削設備30是對已藉由第1磨削設備20進行過粗磨削後之被加工物W,施行第2磨削的精磨削之設備。On the column 17 protruding upward from the upper surface of the base 11, a first grinding device 20 and a second grinding device 30 are supported, and each pair of grinding devices 20, 30 is held on each work clamp table TA, The workpiece W of TB (refer to Fig. 2 and Fig. 3) is ground. The first grinding equipment 20 is an equipment that performs rough grinding of the workpiece W by the first grinding. The second grinding device 30 is a device for performing the second grinding of the workpiece W that has been rough-ground by the first grinding device 20.

第1磨削設備20和第2磨削設備30,除了後述之磨削磨石26、36以外,大致具有共通的構造。圖2及圖3是共用在第1磨削設備20和第2磨削設備30雙方之說明的圖,其中以一般符號表示第1磨削設備20的構成要素,且以括弧符號來表示第2磨削設備30的構成要素。又,圖1中,為了容易區分基台11上之轉台12和各工作夾台TA、TB的關係,所以部分地用二點鏈線來虛擬表示第1磨削設備20和第2磨削設備30的構成要素。The first grinding machine 20 and the second grinding machine 30 have substantially the same structure except for the grinding stones 26 and 36 described later. 2 and 3 are diagrams for explaining both the first grinding equipment 20 and the second grinding equipment 30, in which the components of the first grinding equipment 20 are represented by general symbols, and the second grinding equipment is represented by parentheses. The components of the grinding equipment 30. In addition, in FIG. 1, in order to easily distinguish the relationship between the turntable 12 on the base 11 and the work clamp tables TA, TB, a two-dot chain line is partially used to virtually represent the first grinding equipment 20 and the second grinding equipment. 30 components.

如圖1所示,第1磨削設備20具備有移動基台21、和裝設於移動基台21的主軸單元22。移動基台21是被支撐成能夠沿著設於柱體17之前面的一對導軌18在上下方向移動。主軸單元22具有能夠以朝向上下方向延伸之旋轉軸P2為中心來進行旋轉的主軸23,並且主軸23是藉由設於上端之馬達24而被旋轉驅動。主軸23的下端支撐有圓板狀的第1磨削輪25。第1磨削輪25的中心與旋轉軸P2一致,並且當主軸23旋轉時,第1磨削輪25以旋轉軸P2為中心來進行旋轉。第1磨削輪25的下表面之周緣部上,呈環狀地配設有複數個磨削磨石26。再者,圖1中省略一部分的磨削磨石26的圖示。磨削磨石26為粗磨削用的磨削磨石,並且如圖2及圖3所示,具有朝向下方的磨削面26a。As shown in FIG. 1, the first grinding equipment 20 includes a moving base 21 and a spindle unit 22 installed on the moving base 21. The moving base 21 is supported so as to be movable in the vertical direction along a pair of guide rails 18 provided on the front surface of the column 17. The main shaft unit 22 has a main shaft 23 capable of rotating around a rotating shaft P2 extending in the vertical direction, and the main shaft 23 is rotationally driven by a motor 24 provided at the upper end. A disc-shaped first grinding wheel 25 is supported at the lower end of the main shaft 23. The center of the first grinding wheel 25 coincides with the rotation axis P2, and when the main shaft 23 rotates, the first grinding wheel 25 rotates around the rotation axis P2. A plurality of grinding stones 26 are arranged in a ring shape on the peripheral edge of the lower surface of the first grinding wheel 25. In addition, the illustration of a part of the grinding grindstone 26 is abbreviate|omitted in FIG. The grinding grindstone 26 is a grinding grindstone for rough grinding, and as shown in FIG. 2 and FIG. 3, it has the grinding surface 26a facing downward.

如圖1所示,柱體17的前面側上,配設有旋轉軸在上下方向延伸的滾珠螺桿27,並且滾珠螺桿27是藉由設於上端之馬達28而被旋轉驅動。滾珠螺桿27是與設於移動基台21之貫通螺孔螺合。當滾珠螺桿27旋轉時,移動基台21沿著導軌18在上下方向移動,並且隨著移動基台21的移動,主軸單元22所支撐的第1磨削輪25進行上下移動。As shown in FIG. 1, on the front side of the cylinder 17, a ball screw 27 whose rotating shaft extends in the vertical direction is arranged, and the ball screw 27 is rotationally driven by a motor 28 provided at the upper end. The ball screw 27 is screwed into a through screw hole provided in the movable base 21. When the ball screw 27 rotates, the moving base 21 moves up and down along the guide rail 18, and as the moving base 21 moves, the first grinding wheel 25 supported by the spindle unit 22 moves up and down.

如圖1所示,第2磨削設備30具備有移動基台31、和裝設於移動基台31的主軸單元32。移動基台31是被支撐成能夠沿著設於柱體17之前面的一對導軌19在上下方向移動。主軸單元32具有能夠以朝向上下方向延伸之旋轉軸P3為中心來進行旋轉的主軸33,並且主軸33是藉由設於上端之馬達34而被旋轉驅動。主軸33的下端支撐有圓板狀的第2磨削輪35。第2磨削輪35的中心與旋轉軸P3一致,並且當主軸33旋轉時,第2磨削輪35以旋轉軸P3為中心來進行旋轉。第2磨削輪35的下表面之周緣部上,呈環狀地配設有複數個磨削磨石36。再者,圖1中省略一部分的磨削磨石36的圖示。磨削磨石36為精磨削用的磨削磨石,並且如圖2及圖3所示,具有朝向下方的磨削面36a。As shown in FIG. 1, the second grinding equipment 30 includes a moving base 31 and a spindle unit 32 installed on the moving base 31. The moving base 31 is supported so as to be movable in the vertical direction along a pair of guide rails 19 provided on the front surface of the column 17. The main shaft unit 32 has a main shaft 33 capable of rotating around a rotating shaft P3 extending in the vertical direction, and the main shaft 33 is rotationally driven by a motor 34 provided at the upper end. A disc-shaped second grinding wheel 35 is supported at the lower end of the main shaft 33. The center of the second grinding wheel 35 coincides with the rotation axis P3, and when the main shaft 33 rotates, the second grinding wheel 35 rotates around the rotation axis P3. A plurality of grinding grindstones 36 are arranged in a ring shape on the peripheral edge portion of the lower surface of the second grinding wheel 35. In addition, the illustration of a part of the grinding grindstone 36 is abbreviate|omitted in FIG. The grinding grindstone 36 is a grinding grindstone for finishing grinding, and as shown in FIG. 2 and FIG. 3, it has the grinding surface 36a facing downward.

如圖1所示,柱體17的前面側上,配設有旋轉軸在上下方向延伸的滾珠螺桿37,並且滾珠螺桿37是藉由設於上端之馬達38而被旋轉驅動。滾珠螺桿37是與設於移動基台31之貫通螺孔螺合。當滾珠螺桿37旋轉時,移動基台31沿著導軌19在上下方向移動,並且隨著移動基台31的移動,主軸單元32所支撐的第2磨削輪35進行上下移動。As shown in FIG. 1, on the front side of the cylinder 17, a ball screw 37 whose rotating shaft extends in the vertical direction is arranged, and the ball screw 37 is rotationally driven by a motor 38 provided at the upper end. The ball screw 37 is screwed into the through screw hole provided in the movable base 31. When the ball screw 37 rotates, the moving base 31 moves up and down along the guide rail 19, and as the moving base 31 moves, the second grinding wheel 35 supported by the spindle unit 32 moves up and down.

構成3組工作夾台組14、15及16的共計6個工作夾台TA、TB都具有共通構造和尺寸。如圖2及圖3所示,各工作夾台TA、TB具備圓柱狀的框體40和圓板狀的吸附保持部41,將被加工物W載置於吸附保持部41之上表面即吸附面42上,又,該吸附保持部41是被保持在形成於框體40之上表面的圓形凹部內。被加工物W是將被磨削面Wa(圖2、圖3)朝向上方而被載置。吸附保持部41是由多孔陶瓷等的多孔質構件所構成,並且藉由啟動圖2中概念地表示之吸引設備43,以使吸引力作用於吸附保持部41,就能將被加工物W吸附保持在吸附面42上。各工作夾台TA、TB是藉由省略圖示的旋轉驅動機構,以旋轉軸P4為中心來進行旋轉。A total of six work clamp tables TA, TB constituting the three work clamp table groups 14, 15 and 16 all have a common structure and size. As shown in Figures 2 and 3, each work clamp table TA, TB is equipped with a cylindrical frame 40 and a disc-shaped suction holding portion 41, and the workpiece W is placed on the upper surface of the suction holding portion 41, that is, suction On the surface 42, the suction holding portion 41 is held in a circular recess formed on the upper surface of the frame body 40. The workpiece W is placed with the ground surface Wa (FIG. 2, FIG. 3) facing upward. The adsorption holding portion 41 is composed of a porous member such as porous ceramics, and by activating the suction device 43 conceptually shown in FIG. 2 to cause the suction and holding portion 41 to act on the suction and holding portion 41, the workpiece W can be adsorbed Keep on the adsorption surface 42. Each work chuck table TA, TB is rotated around the rotation axis P4 by a rotation drive mechanism (not shown).

如圖1及圖2所示,第1磨削輪25的直徑比各個工作夾台TA、TB的直徑還要大,能夠使構成各工作夾台組14、15及16的2個工作夾台TA、TB的2個吸附面42同時地面對設於第1磨削輪25之下表面的磨削磨石26。同樣地,第2磨削輪35的直徑比各個工作夾台TA、TB的直徑還要大,能夠使構成各工作夾台組14、15及16的2個工作夾台TA、TB的2個吸附面42同時地面對設於第2磨削輪35之下表面的磨削磨石36。亦即,第1磨削設備20和第2磨削設備30都能夠對2個工作夾台TA、TB上的2個被加工物W同時地施行磨削,並且能夠藉由第1磨削設備20和第2磨削設備30同時地磨削合計4個被加工物W。該磨削加工的詳細內容將在之後敘述。再者,本實施形態中,第1磨削輪25和第2磨削輪35被設定為共通的直徑。As shown in Figures 1 and 2, the diameter of the first grinding wheel 25 is larger than the diameters of the work clamp tables TA and TB, so that the two work clamp tables constituting each work clamp table group 14, 15 and 16 can be used. The two suction surfaces 42 of TA and TB simultaneously face the grinding stone 26 provided on the lower surface of the first grinding wheel 25. Similarly, the diameter of the second grinding wheel 35 is larger than the diameter of each work clamp table TA, TB, which can make two work clamp tables TA, TB constituting each work clamp table group 14, 15 and 16. The suction surface 42 simultaneously faces the grinding stone 36 provided on the lower surface of the second grinding wheel 35. That is, both the first grinding equipment 20 and the second grinding equipment 30 can simultaneously grind the two workpieces W on the two work chuck tables TA and TB, and the first grinding equipment 20 and the second grinding device 30 simultaneously grind a total of four workpieces W. The details of this grinding process will be described later. In addition, in this embodiment, the first grinding wheel 25 and the second grinding wheel 35 are set to have a common diameter.

如圖2誇大地表示,吸附保持部41的吸附面42是形成為以旋轉軸P4為軸的圓錐形。然後,第1工作夾台TA和第2工作夾台TB各自相對於第1磨削輪25之旋轉軸P2和第2磨削輪35之旋轉軸P3來使旋轉軸P4傾斜,並且受到轉台12支撐,又,其傾斜程度相當於與吸附面42的斜度對應的角度。As shown in an exaggerated manner in FIG. 2, the suction surface 42 of the suction holding portion 41 is formed in a conical shape with the rotation axis P4 as an axis. Then, the first work clamp table TA and the second work clamp table TB incline the rotation axis P4 with respect to the rotation axis P2 of the first grinding wheel 25 and the rotation axis P3 of the second grinding wheel 35, and are received by the turntable 12 In addition, the degree of inclination of the support corresponds to an angle corresponding to the inclination of the suction surface 42.

第1工作夾台TA和第2工作夾台TB各自的吸附面42上所吸附保持的被加工物W為沿著吸附面42的圓錐狀。因此,各工作夾台TA、TB上的被加工物W之被磨削面Wa(圖2、圖3),在藉由第1磨削設備20施行粗磨削加工時,相對於設在第1磨削輪25之下表面周緣部的磨削磨石26之磨削面26a(圖2、圖3)成為平行的線狀半徑區域,與磨削磨石26接觸而被磨削。又,各工作夾台TA、TB上的被加工物W之被磨削面Wa,在藉由第2磨削設備30施行精磨削加工時,相對於設在第2磨削輪35之下表面周緣部的磨削磨石36之磨削面36a(圖2、圖3)成為平行的線狀半徑區域,與磨削磨石36接觸而被磨削。The workpiece W sucked and held on the suction surface 42 of each of the first work chuck table TA and the second work chuck table TB has a conical shape along the suction surface 42. Therefore, when the ground surface Wa (FIG. 2, FIG. 3) of the workpiece W on each work chuck table TA, TB is rough grounded by the first grinding device 20, it is relatively 1. The grinding surface 26a (FIG. 2 and FIG. 3) of the grinding stone 26 at the peripheral edge of the lower surface of the grinding wheel 25 becomes a parallel linear radius region, and is ground in contact with the grinding stone 26. In addition, when the grinding surface Wa of the workpiece W on each of the work chucks TA and TB is subjected to finish grinding by the second grinding device 30, it is opposite to that provided under the second grinding wheel 35. The grinding surface 36a (FIG. 2, FIG. 3) of the grinding grindstone 36 at the peripheral edge of the surface becomes a parallel linear radius region, and is ground in contact with the grinding grindstone 36.

圖1中,將第1磨削設備20的磨削磨石26之磨削面26a面對第1工作夾台TA上的被加工物W之被磨削面Wa的區域,表示為加工線S1,且將第1磨削設備20的磨削磨石26之磨削面26a面對第2工作夾台TB上的被加工物W之被磨削面Wa的區域,表示為加工線S2。又,圖1中,將第2磨削設備30的磨削磨石36之磨削面36a面對第1工作夾台TA上的被加工物W之被磨削面Wa的區域,表示為加工線S3,且將第2磨削設備30的磨削磨石36之磨削面36a面對第2工作夾台TB上的被加工物W之被磨削面Wa的區域,表示為加工線S4。像這樣,在第1磨削設備20中,是在配設於第1磨削輪25的磨削磨石26之磨削面26a和2個工作夾台TA、TB之2個吸附面42相面對的半徑區域(加工線S1、S2)中,施行對被加工物W之被磨削面Wa的磨削。又,在第2磨削設備30中,是在配設於第2磨削輪35的磨削磨石36之磨削面36a和2個工作夾台TA、TB之2個吸附面42相面對的半徑區域(加工線S3、S4)中,施行對被加工物W之被磨削面Wa的磨削。In FIG. 1, the area where the grinding surface 26a of the grinding grindstone 26 of the first grinding device 20 faces the ground surface Wa of the workpiece W on the first work chuck TA is represented as a processing line S1 , And the area where the grinding surface 26a of the grinding stone 26 of the first grinding device 20 faces the ground surface Wa of the workpiece W on the second work chuck TB is represented as a processing line S2. In addition, in FIG. 1, the area where the grinding surface 36a of the grinding stone 36 of the second grinding device 30 faces the ground surface Wa of the workpiece W on the first work chuck TA is represented as processing Line S3, and the area where the grinding surface 36a of the grinding stone 36 of the second grinding device 30 faces the ground surface Wa of the workpiece W on the second work chuck table TB is represented as the processing line S4 . In this way, in the first grinding equipment 20, the grinding surface 26a of the grinding stone 26 arranged on the first grinding wheel 25 and the two suction surfaces 42 of the two work chucks TA and TB correspond to each other. In the facing radius area (processing lines S1 and S2), the grinding of the ground surface Wa of the workpiece W is performed. In addition, in the second grinding equipment 30, the grinding surface 36a of the grinding stone 36 arranged on the second grinding wheel 35 and the two suction surfaces 42 of the two work chucks TA and TB face each other. In the opposite radius area (processing lines S3, S4), the grinding of the ground surface Wa of the workpiece W is performed.

各工作夾台TA、TB可藉由微調整設備來調整傾斜方向及傾斜的大小。如圖3所示,微調整設備50具有藉由調整軸機構來將凸緣(flange)52和固定部53之間予以連接的構造,該凸緣52設於支撐框體40的工作夾台基座51之下部,該固定部53相對於轉台12為固定關係。調整軸機構具有:相對於固定部53被固定支撐的筒狀部54、和插入筒狀部54的螺栓軸55,並且藉由使設於螺栓軸55之下端的旋轉操作部56旋轉,來使螺栓軸55相對於筒狀部54在上下方向進行進退移動。螺栓軸55的上端附近與凸緣52連接,當螺栓軸55進行進退移動時,凸緣52中的螺栓軸55的連接部分在上下進行位置變化。Each work clamp table TA, TB can be adjusted by the fine adjustment equipment to adjust the tilt direction and the size of the tilt. As shown in FIG. 3, the fine adjustment device 50 has a structure in which a flange 52 and a fixed portion 53 are connected by an adjustment shaft mechanism. The flange 52 is provided on the work clamp base of the support frame 40 In the lower part of the seat 51, the fixing part 53 is in a fixed relationship with respect to the turntable 12. The adjustment shaft mechanism has: a cylindrical portion 54 fixedly supported with respect to the fixed portion 53, and a bolt shaft 55 inserted into the cylindrical portion 54, and rotates the rotation operation portion 56 provided at the lower end of the bolt shaft 55 to make The bolt shaft 55 moves forward and backward in the vertical direction with respect to the cylindrical portion 54. The vicinity of the upper end of the bolt shaft 55 is connected to the flange 52. When the bolt shaft 55 advances and retreats, the connecting portion of the bolt shaft 55 in the flange 52 changes up and down.

如圖1所示,各工作夾台TA、TB是以3處的支撐部M來受到轉台12支撐,該等支撐部M是在以旋轉軸P4為中心之旋轉方向上,等間隔地位於3處,且,在該3處的支撐部M當中,將上述微調整設備50配置於2 處以上,就能調整各工作夾台TA、TB的傾斜度。例如,各工作夾台TA、TB中,能夠將位於接近圖1所示之加工線S1、S2、S3及S4之端部的1個支撐部M作為固定的支撐部,並且在剩餘2個支撐部M上設置微調整設備50。依據該構成,能夠在圓錐狀的吸附面42當中,以大致沿著加工線S1、S2、S3及S4延伸的稜線為中心,來進行各工作夾台TA、TB的傾斜度調整。As shown in Fig. 1, each work clamp table TA, TB is supported by the turntable 12 by three support parts M. The support parts M are located at equal intervals in the rotation direction centered on the rotation axis P4. In addition, among the three supporting parts M, the above-mentioned fine adjustment device 50 is arranged at two or more places, and the inclination of each work clamp table TA, TB can be adjusted. For example, in each work clamp table TA, TB, one support M located close to the end of the processing lines S1, S2, S3, and S4 shown in Figure 1 can be used as a fixed support, and the remaining two supports The part M is provided with a fine adjustment device 50. According to this structure, in the conical suction surface 42, the inclination of each work clamp TA, TB can be adjusted centering on the ridgeline extending substantially along the processing lines S1, S2, S3, and S4.

針對由以上構成所組成的磨削裝置10的動作進行說明。設於轉台12上的3組工作夾台組14、15及16,藉由以旋轉軸P1為中心之轉台12的旋轉,依序移動至圖1所示之被加工物裝卸區域E1、第1磨削區域E2、第2磨削區域E3。圖1是顯示工作夾台組14位於被加工物裝卸區域E1,工作夾台組15位於第1磨削區域E2,工作夾台組16位於第2磨削區域E3之狀態。The operation of the grinding device 10 composed of the above configuration will be described. The three work clamp groups 14, 15 and 16 set on the turntable 12 are sequentially moved to the workpiece loading and unloading area E1 shown in FIG. 1 by the rotation of the turntable 12 centered on the rotation axis P1. The grinding area E2 and the second grinding area E3. FIG. 1 shows a state in which the work clamp table group 14 is located in the workpiece loading and unloading area E1, the work clamp table group 15 is located in the first grinding area E2, and the work clamp table group 16 is located in the second grinding area E3.

被加工物裝卸區域E1是一種在省略圖示之搬送機構與第1工作夾台TA和第2工作夾台TB之間,進行被加工物W之移送的區域。被加工物W是藉由搬送機構而被搬送至被加工物裝卸區域E1。然後,在被加工物裝卸區域E1等待的工作夾台組14之第1工作夾台TA和第2工作夾台TB各自的吸附面42上,將被磨削面Wa朝向上方來載置被加工物W。第1工作夾台TA和第2工作夾台TB各自是藉由吸引設備43(圖2)之吸引力,來將被加工物W吸附保持在吸附面42上。The workpiece loading and unloading area E1 is an area where the workpiece W is transferred between the transport mechanism (not shown) and the first work chuck table TA and the second work chuck table TB. The to-be-processed object W is conveyed to the to-be-processed object loading and unloading area E1 by a conveyance mechanism. Then, on the suction surfaces 42 of the first work clamp table TA and the second work clamp table TB of the work clamp table group 14 waiting in the work chuck table group 14 waiting in the workpiece loading and unloading area E1, the machined surface Wa is placed on the suction surface 42 upward.物W. Each of the first work clamp table TA and the second work clamp table TB sucks and holds the workpiece W on the suction surface 42 by the suction force of the suction device 43 (FIG. 2 ).

再者,本發明並不限定搬送機構之構成,能夠使用各種形態的搬送機構。作為其中一例,使用能夠對2個工作夾台TA、TB同時地搬送2個被加工物W的搬送機構的話,就能夠提高搬送效率。又,也可以將本實施形態的磨削裝置10,作為自由地組合各種加工裝置而聯合作動的群集模組系統(cluster module system)之一部分來應用,並且使用群集模組系統的搬送機構,進行搬往被加工物裝卸區域E1之被加工物W的搬送。Furthermore, the present invention does not limit the structure of the conveying mechanism, and various types of conveying mechanisms can be used. As an example, if a transport mechanism capable of simultaneously transporting two workpieces W to two work chucking tables TA and TB is used, the transport efficiency can be improved. In addition, the grinding device 10 of this embodiment can also be applied as a part of a cluster module system that freely combines various processing devices and cooperates with each other, and uses the transport mechanism of the cluster module system to perform The conveyance of the workpiece W to the workpiece loading and unloading area E1.

第1磨削區域E2是藉由第1磨削設備20來對第1工作夾台TA和第2工作夾台TB各自所保持的被加工物W之被磨削面Wa進行粗磨削加工的區域。如先前所述,第1磨削輪25的直徑比位在第1磨削區域E2之工作夾台組15的各個工作夾台TA、TB的直徑還要大。而且,能夠使設於第1磨削輪25之下表面的磨削磨石26之磨削面26a,接觸該2個工作夾台TA、TB之2個吸附面42上所保持的2個被加工物W之被磨削面Wa,來同時地進行粗磨削加工(參照圖2)。The first grinding area E2 is used by the first grinding equipment 20 to rough-grind the ground surface Wa of the workpiece W held by the first work chuck TA and the second work chuck TB. area. As described earlier, the diameter of the first grinding wheel 25 is larger than the diameter of each of the work clamp tables TA, TB of the work clamp table group 15 located in the first grinding area E2. Furthermore, the grinding surface 26a of the grinding stone 26 provided on the lower surface of the first grinding wheel 25 can be brought into contact with the two suction surfaces 42 held on the two work clamp tables TA and TB. The ground surface Wa of the workpiece W is simultaneously subjected to rough grinding processing (refer to FIG. 2).

更詳細地,如圖1所示,在第1磨削區域E2中,第1磨削輪25之旋轉中心的旋轉軸P2是位於通過第1工作夾台TA和第2工作夾台TB中間的基準線L上(基準線L和旋轉軸P2是以垂直關係而相交)。又,第1工作夾台TA中的旋轉軸P4、和第2工作夾台TB中的旋轉軸P4各自位於第1磨削輪25的外周上。In more detail, as shown in FIG. 1, in the first grinding area E2, the rotation axis P2 of the rotation center of the first grinding wheel 25 is located between the first work chuck TA and the second work chuck TB On the reference line L (the reference line L and the rotation axis P2 intersect in a vertical relationship). In addition, the rotation axis P4 in the first work chuck TA and the rotation axis P4 in the second work chuck TB are respectively located on the outer circumference of the first grinding wheel 25.

在該狀態下,使構成工作夾台組15的第1工作夾台TA和第2工作夾台TB各自以旋轉軸P4為中心來往圖1的箭頭R1方向(逆時針方向)旋轉,並且使第1磨削設備20中的第1磨削輪25一邊往圖1之箭頭R2方向(逆時針方向)旋轉一邊下降。然後,使設於第1磨削輪25之下表面周緣部的磨削磨石26之磨削面26a沿著加工線S1來對被保持在第1工作夾台TA的被加工物W之被磨削面Wa作接觸,並且沿著加工線S2來對被保持在第2工作夾台TB的被加工物W之被磨削面Wa作接觸,隨著一個第1磨削輪25之旋轉動作而同時地進行2個被加工物W的粗磨削加工。由於沿著加工線S1的粗磨削和沿著加工線S2的粗磨削都是成為從被加工物W之外周部分朝向中心(旋轉軸P4)之方向,所以能夠將針對由工作夾台組15所保持之2個被加工物W的磨削條件設為相同。In this state, the first work clamp table TA and the second work clamp table TB constituting the work clamp table group 15 are each rotated in the direction of arrow R1 (counterclockwise) in FIG. 1 with the rotation axis P4 as the center, and the first work clamp 1 The first grinding wheel 25 in the grinding equipment 20 descends while rotating in the arrow R2 direction (counterclockwise direction) in FIG. 1. Then, the grinding surface 26a of the grinding stone 26 provided on the peripheral portion of the lower surface of the first grinding wheel 25 is applied to the workpiece W held on the first work chuck TA along the processing line S1. The grinding surface Wa is in contact with the ground surface Wa of the workpiece W held on the second work chuck table TB along the processing line S2, following the rotation of a first grinding wheel 25 On the other hand, the rough grinding of the two to-be-processed objects W is performed simultaneously. Since the rough grinding along the processing line S1 and the rough grinding along the processing line S2 are both in the direction from the outer peripheral part of the workpiece W to the center (rotation axis P4), it is possible to set the target by the work clamp The grinding conditions of the two workpieces W held by 15 are set to be the same.

此時,在加工線S1和加工線S2中,由於將磨削磨石26之磨削面26a和2個工作夾台TA、TB各自的吸附面42預先調整成形成平行,所以能夠對2個被加工物W之被磨削面Wa以良好精度進行粗磨削。又,由於磨削磨石26之磨削面26a通過2個工作夾台TA、TB各自的旋轉軸P4,所以能夠對2個被加工物W在沒有殘留的情況下,將被磨削面Wa全體均勻地粗磨削。此外,由於加工線S1 、S2位於用支撐各工作夾台TA、TB的3處支撐部M所圍成的三角形狀的區域內,所以在藉由第1磨削設備20進行粗磨削時,能夠提高被加工物W的穩定性。At this time, in the processing line S1 and the processing line S2, since the grinding surface 26a of the grinding grindstone 26 and the suction surfaces 42 of the two work clamp tables TA and TB are adjusted in advance to be parallel, it is possible to align the two The ground surface Wa of the workpiece W is rough ground with good accuracy. In addition, since the grinding surface 26a of the grinding grindstone 26 passes through the rotation axis P4 of each of the two work chucks TA and TB, it is possible to grind the surface Wa on the two workpieces W without leaving them. The whole is uniformly rough ground. In addition, since the processing lines S1 and S2 are located in the triangle-shaped area surrounded by the three support parts M supporting the work clamp tables TA and TB, when rough grinding is performed by the first grinding equipment 20, The stability of the workpiece W can be improved.

第2磨削區域E3是一種藉由第2磨削設備30來對第1工作夾台TA和第2工作夾台TB各自所保持的被加工物W之被磨削面Wa進行精磨削加工的區域。如先前所述,第2磨削輪35的直徑比位在第2磨削區域E3之工作夾台組16的各個工作夾台TA、TB的直徑還要大。而且,能夠使設於第2磨削輪35之下表面的磨削磨石36之磨削面36a,接觸該2個工作夾台TA、TB之2個吸附面42上所保持的2個被加工物W之被磨削面Wa,來同時地進行精磨削加工(參照圖2)。The second grinding area E3 is a type of grinding surface Wa of the workpiece W held by the first work chuck TA and the second work chuck TB by the second grinding equipment 30. Area. As described above, the diameter of the second grinding wheel 35 is larger than the diameter of each of the work clamp tables TA and TB of the work clamp table group 16 located in the second grinding area E3. Furthermore, the grinding surface 36a of the grinding stone 36 provided on the lower surface of the second grinding wheel 35 can be brought into contact with the two suction surfaces 42 held on the two work clamp tables TA and TB. The ground surface Wa of the workpiece W is simultaneously subjected to finish grinding processing (refer to FIG. 2).

更詳細地,如圖1所示,在第2磨削區域E3中,第2磨削輪35之旋轉中心即旋轉軸P3是位於通過第1工作夾台TA和第2工作夾台TB中間的基準線L上(基準線L和旋轉軸P3是以垂直關係而相交)。又,第1工作夾台TA中的旋轉軸P4、和第2工作夾台TB中的旋轉軸P4各自位於第2磨削輪35的外周上。In more detail, as shown in FIG. 1, in the second grinding area E3, the rotation center of the second grinding wheel 35, that is, the rotation axis P3 is located between the first work chuck TA and the second work chuck TB On the reference line L (the reference line L and the rotation axis P3 intersect in a vertical relationship). In addition, the rotation axis P4 in the first work chuck TA and the rotation axis P4 in the second work chuck TB are respectively located on the outer circumference of the second grinding wheel 35.

在該狀態下,使構成工作夾台組16的第1工作夾台TA和第2工作夾台TB各自以旋轉軸P4為中心來往圖1的箭頭R3方向(逆時針方向)旋轉,並且使第2磨削設備30中的第2磨削輪36一邊往圖1之箭頭R4方向(逆時針方向)旋轉一邊下降。然後,使設於第2磨削輪35之下表面周緣部的磨削磨石36之磨削面36a沿著加工線S3來對被保持在第1工作夾台TA的被加工物W之被磨削面Wa作接觸,並且沿著加工線S4來對被保持在第2工作夾台TB的被加工物W之被磨削面Wa作接觸,隨著一個第2磨削輪35之旋轉動作而同時地進行2個被加工物W的精磨削加工。由於沿著加工線S3的精磨削和沿著加工線S4的精磨削都是成為從被加工物W之外周部分朝向中心(旋轉軸P4)之方向,所以能夠將針對由工作夾台組16所保持之2個被加工物W的磨削條件設為相同。In this state, the first work clamp table TA and the second work clamp table TB constituting the work clamp table group 16 are each rotated in the direction of arrow R3 (counterclockwise) in FIG. 2 The second grinding wheel 36 in the grinding equipment 30 descends while rotating in the direction of arrow R4 (counterclockwise) in FIG. 1. Then, the grinding surface 36a of the grinding stone 36 provided on the peripheral portion of the lower surface of the second grinding wheel 35 is applied to the workpiece W held on the first work chuck TA along the processing line S3. The grinding surface Wa is in contact with the ground surface Wa of the workpiece W held on the second work chuck table TB along the processing line S4, following the rotation of a second grinding wheel 35 At the same time, the finish grinding of the two workpieces W is performed. Since the finish grinding along the processing line S3 and the finish grinding along the processing line S4 both become the direction from the outer peripheral part of the workpiece W to the center (rotation axis P4), it is possible to set the target to the work clamp The grinding conditions of the two workpieces W held by 16 are set to be the same.

此時,於加工線S3和加工線S4中,由於將磨削磨石36之磨削面36a和2個工作夾台TA、TB各自的吸附面42預先調整成形成平行,所以能夠對2個被加工物W之被磨削面Wa以良好精度進行精磨削。又,由於磨削磨石36之磨削面通過2個工作夾台TA、TB各自的旋轉軸P4,所以能夠對2個被加工物W在沒有殘留的情況下,將被磨削面Wa全體均勻地精磨削。此外,由於加工線S3 、S4位於用支撐各工作夾台TA、TB的3處支撐部M所圍成的三角形狀的區域內,所以在藉由第2磨削設備30進行精磨削時,能夠提高被加工物W的穩定性。At this time, in the processing line S3 and the processing line S4, since the grinding surface 36a of the grinding grindstone 36 and the suction surface 42 of the two work clamp tables TA and TB are adjusted to be parallel in advance, it is possible to align the two The ground surface Wa of the workpiece W is finely ground with good accuracy. In addition, since the grinding surface of the grinding grindstone 36 passes through the rotation axis P4 of each of the two work chucks TA and TB, the entire surface Wa can be ground without leaving the two workpieces W. Fine grinding evenly. In addition, since the processing lines S3 and S4 are located in the triangle-shaped area surrounded by the three support parts M that support the work clamp tables TA and TB, when the second grinding equipment 30 performs fine grinding, The stability of the workpiece W can be improved.

在圖1所示的狀態下,對第1磨削區域E2和第2磨削區域E3中的共計4個被加工物W的磨削結束時,作成將第1磨削輪25和第2磨削輪35各自從被加工物W朝上方拉起的狀態,使轉台12往圖1的箭頭R5方向(逆時針方向)旋轉。轉台12從圖1所示的位置旋轉120°時,工作夾台組14從被加工物裝卸區域E1移動至第1磨削區域E2,工作夾台組15從第1磨削區域E2移動至第2磨削區域E3,工作夾台組16從第2磨削區域E3移動至被加工物裝卸區域E1。In the state shown in FIG. 1, when the grinding of a total of four workpieces W in the first grinding area E2 and the second grinding area E3 is completed, the first grinding wheel 25 and the second grinding wheel 25 are created. In a state where each of the cutting wheels 35 is pulled upward from the workpiece W, the turntable 12 is rotated in the arrow R5 direction (counterclockwise direction) in FIG. 1. When the turntable 12 is rotated by 120° from the position shown in FIG. 1, the work chuck group 14 moves from the workpiece loading and unloading area E1 to the first grinding area E2, and the work chuck group 15 moves from the first grinding area E2 to the first grinding area E2. 2 Grinding area E3, the work chuck group 16 moves from the second grinding area E3 to the workpiece loading and unloading area E1.

而且,在第1磨削區域E2中,對於被保持在工作夾台組14的2個工作夾台TA、TB上的2個被加工物W之被磨削面Wa(在圖1的狀態下,是位於被加工物裝卸區域E1的未磨削之物),使用第1磨削設備20同時地進行粗磨削加工。又,在第2磨削區域E3中,對於被保持在工作夾台組15的2個工作夾台TA、TB上的2個被加工物W之被磨削面Wa(在圖1的狀態下,是已在第1磨削區域E2中施行過粗磨削之物),使用第2磨削設備30同時地進行精磨削加工。此外,在被加工物裝卸區域E1中,將被保持在工作夾台組16的2個工作夾台TA、TB上的完成精磨削之2個被加工物W移送至圖未示的搬送機構。在繼續進行磨削裝置10之磨削加工的情形下,在被加工物裝卸區域E1中,在工作夾台組16的2個工作夾台TA、TB各自的吸附面42上,被載置新的未磨削狀態之被加工物W。Furthermore, in the first grinding area E2, the ground surface Wa of the two workpieces W held on the two work clamp tables TA and TB of the work clamp table group 14 (in the state of FIG. 1 , Is the ungrounded object located in the workpiece loading and unloading area E1), and the first grinding equipment 20 is used for simultaneous rough grinding. Also, in the second grinding area E3, the ground surface Wa of the two workpieces W held on the two work clamp tables TA and TB of the work clamp table group 15 (in the state of FIG. 1 , Which has been rough-ground in the first grinding area E2), and the second grinding device 30 is used to simultaneously perform fine-grinding processing. In addition, in the workpiece loading and unloading area E1, the two workpieces W that have been subjected to finishing grinding, which are held on the two work chucking tables TA and TB of the work chucking table group 16, are transferred to a transport mechanism not shown in the figure. . In the case of continuing the grinding process of the grinding device 10, in the workpiece loading and unloading area E1, a new suction surface 42 is placed on each of the two work clamp tables TA and TB of the work clamp table group 16 The workpiece W in the unground state.

藉由重複上述動作,就能將第1磨削設備20的粗磨削加工和第2磨削設備30的精磨削加工,各別對2個的被加工物W同時地進行。因此,依據本實施形態的磨削裝置10,相較於藉由粗磨削用的磨削設備和精磨削用的磨削設備各自一次磨削1個被加工物的現存之磨削裝置,能夠增加每單位時間內可磨削加工的被加工物的數量,以提升生產性。By repeating the above-mentioned operation, the rough grinding process of the first grinding device 20 and the finish grinding process of the second grinding device 30 can be simultaneously performed on the two workpieces W, respectively. Therefore, according to the grinding device 10 of the present embodiment, compared to the existing grinding device in which the grinding device for rough grinding and the grinding device for fine grinding each grind one workpiece at a time, The number of workpieces that can be ground per unit time can be increased to improve productivity.

又,上述實施形態中,在第1磨削區域E2中,將2個工作夾台TA、TB相對於基準線L配置成線對稱,並且使第1磨削輪25的旋轉軸P3位於基準線L上。而且,2個工作夾台TA、TB的傾斜度和旋轉方向為一致,從而都能使得以磨削磨石26所進行之磨削從被加工物W的外周朝向中心(旋轉軸P4)前進。同樣地,在第2磨削區域E3中,將2個的工作夾台TA、TB相對於基準線L配置成線對稱,並且使第2磨削輪35的旋轉軸P3的旋轉軸P3位於基準線L上。而且,2個工作夾台TA、TB的傾斜度和旋轉方向為一致,從而都能使得以磨削磨石36所進行之磨削從被加工物W的外周朝向中心(旋轉軸P4)前進。藉由這些構成,第1磨削區域E2中的與2個被加工物W有關的磨削條件成為相同,且第2磨削區域E3中的與2個被加工物W有關的磨削條件也成為相同,就能夠一邊增加磨削加工的處理數量,一邊消弭加工的品質不一。In addition, in the above embodiment, in the first grinding area E2, the two work chucks TA and TB are arranged in line symmetry with respect to the reference line L, and the rotation axis P3 of the first grinding wheel 25 is located on the reference line. L up. Moreover, the inclination and rotation direction of the two work chucks TA and TB are the same, so that the grinding by the grinding grindstone 26 can advance from the outer periphery of the workpiece W toward the center (rotation axis P4). Similarly, in the second grinding area E3, the two work chucks TA and TB are arranged in line symmetry with respect to the reference line L, and the rotation axis P3 of the rotation axis P3 of the second grinding wheel 35 is positioned at the reference On line L. Moreover, the inclination and rotation direction of the two work chucks TA and TB are the same, so that the grinding by the grinding stone 36 can advance from the outer periphery of the workpiece W toward the center (rotation axis P4). With these configurations, the grinding conditions related to the two workpieces W in the first grinding area E2 become the same, and the grinding conditions related to the two workpieces W in the second grinding area E3 are also the same. To be the same, it is possible to increase the number of grinding processes while eliminating the difference in processing quality.

又,上述實施形態的磨削裝置10是使用同時地面對2個工作夾台TA、TB的吸附面42且直徑較大的第1磨削輪25或第2磨削輪35,來進行對2個被加工物W的磨削。藉由該構成,就能在磨削第1工作夾台TA上之被加工物W的範圍(加工線S1、S3)與磨削第2工作夾台TB上之被加工物W的範圍(加工線S2、S4)之間,得到各磨削磨石26、36不會接觸到被加工物W的磨削停止範圍。利用該磨削停止範圍,能夠有效率地冷卻各磨削磨石26、36,以謀求各磨削磨石26、36之耐久性的提升。例如,也可以具備像是在磨削停止範圍積極地冷卻各磨削磨石26、36之冷卻水的供給系統。In addition, the grinding device 10 of the above-mentioned embodiment uses the first grinding wheel 25 or the second grinding wheel 35, which faces the suction surface 42 of the two work chucks TA and TB at the same time, and has a larger diameter. Grinding of two workpieces W. With this configuration, it is possible to grind the range of the workpiece W on the first work chuck TA (processing lines S1, S3) and the range of the workpiece W on the second work chuck TB (processing Between the lines S2 and S4), the grinding stop range where the grinding stones 26 and 36 do not touch the workpiece W is obtained. By using this grinding stop range, each grinding stone 26, 36 can be cooled efficiently, and the durability of each grinding stone 26, 36 can be improved. For example, it is also possible to provide a cooling water supply system that actively cools the grinding stones 26 and 36 in the grinding stop range.

再者,本發明並不受限於上述實施之形態,且可進行各種變更而實施。在上述實施形態中,關於在附圖所圖示的大小或形狀等,並不受限於此,並可在能發揮本發明的效果的範圍內作適當變更。In addition, the present invention is not limited to the embodiment described above, and can be implemented with various modifications. In the above-mentioned embodiment, the size, shape, etc. illustrated in the drawings are not limited to these, and can be appropriately changed within the range in which the effects of the present invention can be exhibited.

例如,在上述實施形態中,雖然是將第1磨削設備20和第2磨削設備30作成大致共通的構成,但是也可以是具備有第1磨削設備和第2磨削設備相異的構成。For example, in the above-mentioned embodiment, although the first grinding device 20 and the second grinding device 30 have a substantially common structure, they may be equipped with different first grinding devices and second grinding devices. constitute.

又,上述實施形態的磨削裝置10雖然具備有第1磨削區域E2和第2磨削區域E3這2個磨削區域,但是也可以適用於具備3個以上之相異磨削區域的磨削裝置。In addition, although the grinding device 10 of the above-mentioned embodiment has two grinding areas, the first grinding area E2 and the second grinding area E3, it can also be applied to grinding with three or more different grinding areas.切装置。 Cutting device.

又,雖然說明了本發明之實施形態,但是作為本發明的其他實施形態,亦可為將上述實施形態或變形例整體或部分地組合而成的形態。In addition, although the embodiment of the present invention has been described, as another embodiment of the present invention, it is also possible to combine the above-mentioned embodiments or modified examples in whole or in part.

又,本發明之實施形態並不限定於上述之實施形態,且亦可在不脫離本發明之技術思想的主旨的範圍內進行各種變更、置換、變形。此外,若能經由技術之進步或衍生之其他技術而以其他的方式來實現本發明之技術思想的話,亦可使用該方法來實施。因此,申請專利範圍涵蓋了可包含在本發明之技術思想範圍內的所有的實施態樣。 産業上之可利用性In addition, the embodiment of the present invention is not limited to the above-mentioned embodiment, and various changes, substitutions, and modifications may be made within the scope not departing from the technical idea of the present invention. In addition, if the technical idea of the present invention can be realized in other ways through technological progress or other derived technologies, this method can also be used to implement it. Therefore, the scope of patent application covers all implementation aspects that can be included in the scope of the technical idea of the present invention. Industrial availability

如以上所說明,本發明具有能夠增加每單位時間之被加工物的磨削加工的處理數量,以實現生產性之提升的效果,特別是對於一種藉由配設於磨削區域的磨削設備之磨削輪來磨削被加工物的磨削裝置是有用的,其中該被加工物被保持在工作夾台上,且該工作夾台配設於轉台。As explained above, the present invention has the effect of being able to increase the number of grinding processes of the workpiece per unit time to achieve an increase in productivity, especially for a kind of grinding equipment arranged in the grinding area The grinding wheel is useful as a grinding device to grind the workpiece, wherein the workpiece is held on a work clamp table, and the work clamp table is arranged on a turntable.

10‧‧‧磨削裝置11‧‧‧基台12‧‧‧轉台14、15、16‧‧‧工作夾台組17‧‧‧柱體18、19‧‧‧導軌20‧‧‧第1磨削設備21、31‧‧‧移動基台22、32‧‧‧主軸單元23、33‧‧‧主軸24、34‧‧‧馬達25‧‧‧第1磨削輪26、36‧‧‧磨削磨石26a、36a‧‧‧磨削面27、37‧‧‧滾珠螺桿28、38‧‧‧馬達30‧‧‧第2磨削設備35‧‧‧第2磨削輪40‧‧‧框體41‧‧‧吸附保持部42‧‧‧吸附面43‧‧‧吸引設備50‧‧‧微調整設備51‧‧‧工作夾台基座52‧‧‧凸緣53‧‧‧固定部54‧‧‧筒狀部55‧‧‧螺栓軸56‧‧‧旋轉操作部E1‧‧‧被加工物裝卸區域E2‧‧‧第1磨削區域E3‧‧‧第2磨削區域L‧‧‧基準線M‧‧‧支撐部TA‧‧‧第1工作夾台TB‧‧‧第2工作夾台P1、P2、P3、P4‧‧‧旋轉軸R1、R2、R3、R4、R5‧‧‧箭頭S1、S2、S3、S4‧‧‧加工線W‧‧‧被加工物Wa‧‧‧被磨削面10‧‧‧Grinding device 11‧‧‧Abutment 12‧‧‧Turntable 14,15,16‧‧‧Working clamping table group 17‧‧‧Cylinder 18,19‧‧‧Guide 20‧‧‧First grinding Grinding equipment 21, 31‧‧‧Mobile base 22,32‧‧‧Spindle unit 23,33‧‧‧Spindle 24,34‧‧‧Motor 25‧‧‧First grinding wheel 26,36‧‧‧Grinding Grinding stone 26a, 36a‧‧‧Grinding surface 27, 37‧‧‧Ball screw 28, 38‧‧‧Motor 30‧‧‧Second grinding equipment 35‧‧‧Second grinding wheel 40‧‧‧Frame body 41‧‧‧Suction holding part 42‧‧‧Suction surface 43‧‧‧Suction equipment 50‧‧‧Micro adjustment equipment 51‧‧‧Working clamp base 52‧‧‧Flange 53‧‧‧Fixed part 54‧‧ ‧Cylindrical part 55‧‧‧Bolt shaft 56‧‧‧Rotary operation part E1‧‧‧Working object loading and unloading area E2‧‧‧First grinding area E3‧‧‧Second grinding area L‧‧‧Datum line M‧‧‧Support TA‧‧‧The first work clamp TB‧‧‧The second work clamp P1, P2, P3, P4‧‧‧Rotation axis R1, R2, R3, R4, R5‧‧‧Arrow S1 , S2, S3, S4‧‧‧Processing line W‧‧‧Working object Wa‧‧‧Grinding surface

圖1是顯示本實施形態之磨削裝置的頂視圖。 圖2是顯示在本實施形態之磨削裝置上,藉由一個磨削設備來對2個工作夾台上的2個被加工物同時地進行磨削加工之狀態的側視圖。 圖3是顯示工作夾台之微調整設備的側視圖。Fig. 1 is a top view showing the grinding device of this embodiment. Fig. 2 is a side view showing a state in which two workpieces on two work chucks are simultaneously ground by one grinding device in the grinding device of this embodiment. Fig. 3 is a side view showing the fine adjustment equipment of the work clamp table.

10‧‧‧磨削裝置 10‧‧‧Grinding device

11‧‧‧基台 11‧‧‧Abutment

12‧‧‧轉台 12‧‧‧Turntable

14、15、16‧‧‧工作夾台組 14,15,16‧‧‧Work clamp table group

17‧‧‧柱體 17‧‧‧Cylinder

18、19‧‧‧導軌 18、19‧‧‧Guide rail

20‧‧‧第1磨削設備 20‧‧‧First grinding equipment

21、31‧‧‧移動基台 21、31‧‧‧Mobile abutment

22、32‧‧‧主軸單元 22, 32‧‧‧Spindle unit

23、33‧‧‧主軸 23, 33‧‧‧Spindle

24、34‧‧‧馬達 24, 34‧‧‧Motor

25‧‧‧第1磨削輪 25‧‧‧First grinding wheel

26、36‧‧‧磨削磨石 26、36‧‧‧Grinding stone

27、37‧‧‧滾珠螺桿 27、37‧‧‧Ball screw

28、38‧‧‧馬達 28, 38‧‧‧Motor

30‧‧‧第2磨削設備 30‧‧‧Second Grinding Equipment

35‧‧‧第2磨削輪 35‧‧‧2nd grinding wheel

42‧‧‧吸附面 42‧‧‧Adsorption surface

E1‧‧‧被加工物裝卸區域 E1‧‧‧Working object loading and unloading area

E2‧‧‧第1磨削區域 E2‧‧‧First grinding area

E3‧‧‧第2磨削區域 E3‧‧‧Second grinding area

L‧‧‧基準線 L‧‧‧Baseline

M‧‧‧支撐部 M‧‧‧Support

TA‧‧‧第1工作夾台 TA‧‧‧The first work clamp

TB‧‧‧第2工作夾台 TB‧‧‧The second work clamp

P1、P2、P3、P4‧‧‧旋轉軸 P1, P2, P3, P4‧‧‧Rotating axis

R1、R2、R3、R4、R5‧‧‧箭頭 R1, R2, R3, R4, R5‧‧‧Arrow

S1、S2、S3、S4‧‧‧加工線 S1, S2, S3, S4‧‧‧Processing line

Claims (3)

一種磨削裝置,至少是由:工作夾台、轉台、第1磨削設備、及第2磨削設備所構成,該工作夾台為複數個,用來保持被加工物,該轉台能夠旋轉,且將該工作夾台支撐成可旋動,該第1磨削設備用來對被保持在該工作夾台上之被加工物的被磨削面施行第1磨削,該第2磨削設備用來對被保持在該工作夾台上並且已施行過該第1磨削之該被加工物的被磨削面施行第2磨削,該磨削裝置之特徵在於:該第1磨削設備至少是由第1磨削輪、及主軸單元所構成,該第1磨削輪配設了具有磨削面的磨削磨石,該主軸單元具有用來支撐該第1磨削輪且可旋轉的主軸,該第2磨削設備至少是由第2磨削輪、及主軸單元所構成,該第2磨削輪配設了具有磨削面的磨削磨石,該主軸單元具有用來支撐該第2磨削輪且可旋轉的主軸,該工作夾台是對應於該第1磨削設備及該第2磨削設備而各別配設2個,且該工作夾台各別具有圓錐狀的吸附面,在2個該工作夾台之2個該吸附面相對於配設在該第1磨削輪的該磨削磨石之該磨削面成為平行之各工作夾台的半徑區域中施行磨削,2個該工作夾台之旋轉方向和該吸附面的傾斜度為一致,從而在該半徑區域中該磨削磨石對被加工物進行磨削的方向成為相同,在2個該工作夾台之2個該吸附面相對於配設在該第2 磨削輪的該磨削磨石之該磨削面成為平行之各工作夾台的半徑區域中施行磨削,2個該工作夾台之旋轉方向和該吸附面的傾斜度為一致,從而在該半徑區域中該磨削磨石對被加工物進行磨削的方向成為相同。 A grinding device is composed of at least: a work clamp table, a turntable, a first grinding device, and a second grinding device. The work clamp tables are plural and are used to hold the object to be processed. The turntable can rotate. And the work chuck is supported so as to be rotatable. The first grinding equipment is used to perform the first grinding on the ground surface of the workpiece held on the work chuck. The second grinding equipment Used to perform second grinding on the ground surface of the workpiece that is held on the work chuck and has been subjected to the first grinding, and the grinding device is characterized in that: the first grinding device At least it is composed of a first grinding wheel and a spindle unit. The first grinding wheel is equipped with a grinding stone with a grinding surface. The spindle unit has a rotatably supporting the first grinding wheel. The second grinding device is composed of at least a second grinding wheel and a spindle unit, the second grinding wheel is equipped with a grinding stone with a grinding surface, and the spindle unit has a support The second grinding wheel and the rotatable spindle, the work chuck is corresponding to the first grinding equipment and the second grinding equipment and are respectively equipped with two, and the work chuck has a conical shape. The adsorption surfaces of the two work chucks are implemented in the radius regions of the work chucks parallel to the grinding surface of the grinding stone arranged on the first grinding wheel. Grinding, the rotation direction of the two work chucks and the inclination of the suction surface are the same, so in the radius area, the direction in which the grinding stone grinds the workpiece becomes the same. The two suction surfaces of the clamping table are arranged on the second Grinding is performed in the radius area of each work chuck where the grinding surface of the grinding stone of the grinding wheel becomes parallel, and the rotation direction of the two work chucks is consistent with the inclination of the suction surface. In this radius area, the direction in which the grinding stone grinds the workpiece becomes the same. 如請求項1之磨削裝置,其中全部之該工作夾台是藉由在以旋轉軸為中心之旋轉方向上位於等間隔之3處的支撐部可調整傾斜度地被支撐,沿著該旋轉軸看時,該半徑區域之全體位於3處之該支撐部所圍成之三角形狀的區域內。 Such as the grinding device of claim 1, wherein all the work chucks are supported by the support parts at 3 equally spaced positions in the rotating direction centered on the rotating shaft so as to adjust the inclination, and rotate along the When viewed axially, the entire radius area is located within the triangle-shaped area surrounded by the support portion at 3 locations. 如請求項1之磨削裝置,其中全部之該工作夾台是藉由在以旋轉軸為中心之旋轉方向上位於等間隔之3處的支撐部可調整傾斜度地被支撐,3處之該支撐部中的1處是鄰接位於該半徑區域之端部的固定的支撐部,3處之該支撐部中的其他2處是具備可朝上下方向調整該工作夾台之支撐位置的微調整設備。Such as the grinding device of claim 1, wherein all the work chucks are supported by the support parts at 3 equidistant positions in the direction of rotation centered on the rotating shaft so that the inclination can be adjusted. One of the supporting parts is a fixed supporting part adjacent to the end of the radius area, and the other two of the three supporting parts are equipped with fine adjustment equipment that can adjust the supporting position of the work clamp table in the up and down direction. .
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