TWI730192B - Grinding device - Google Patents
Grinding device Download PDFInfo
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- TWI730192B TWI730192B TW106137924A TW106137924A TWI730192B TW I730192 B TWI730192 B TW I730192B TW 106137924 A TW106137924 A TW 106137924A TW 106137924 A TW106137924 A TW 106137924A TW I730192 B TWI730192 B TW I730192B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0069—Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
[課題]提供一種能夠增加每單位時間之被加工物的磨削加工數量的磨削裝置。 [解決手段]一種具備第1磨削設備和第2磨削設備的磨削裝置,該磨削裝置將保持被加工物的複數個工作夾台在轉台上支撐成可旋動,且對於被加工物的被磨削面,該第1磨削設備一邊使第1磨削輪旋轉一邊施行第1磨削,該第2磨削設備一邊使第2磨削輪旋轉一邊施行第2磨削,且,對應於第1磨削設備及第2磨削設備,各別配設有2個工作夾台,又,在設於第1磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削,且在設於第2磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削。[Problem] To provide a grinding device that can increase the number of grinding processes of the workpiece per unit time. [Solution] A grinding device equipped with a first grinding device and a second grinding device. The grinding device supports a plurality of work chucks that hold the workpiece on a turntable so as to be rotatable. The first grinding device performs the first grinding while rotating the first grinding wheel, and the second grinding device performs the second grinding while rotating the second grinding wheel, and , Corresponding to the first grinding equipment and the second grinding equipment, each is equipped with 2 work clamps, and on the grinding surface of the grinding stone set on the first grinding wheel and 2 work clamps Grinding is performed in the radius area where the two suction surfaces of the table face each other, and the grinding surface of the grinding stone set on the second grinding wheel and the radius area where the two suction surfaces of the two work chucks face each other Grinding in the middle.
Description
發明領域 本發明是有關於一種磨削裝置,是藉由配設於磨削區域的磨削設備來磨削被加工物,該被加工物被保持在工作夾台上,且該工作夾台配設於轉台。FIELD OF THE INVENTION The present invention relates to a grinding device, which is used to grind a workpiece by a grinding device arranged in a grinding area, and the workpiece is held on a work chuck table, and the work chuck table is equipped with Located on the turntable.
發明背景 在半導體元件的製造步驟中,形成有複數個IC、LSI等元件之被加工物的半導體元件,在分割成一個個的元件之前,藉由磨削裝置磨削其背面而形成規定之厚度。將這樣的晶圓之背面予以磨削的磨削裝置具備有:轉台(turn table)、複數個工作夾台、及磨削設備,該轉台能夠沿著被加工物裝卸區域和磨削區域進行旋轉,該等工作夾台配設於轉台且依序移動至磨削區域,該磨削設備配設於磨削區域且將晶圓予以磨削,該晶圓被保持在工作夾台上,且該工作夾台定位於磨削區域(例如,參照專利文獻1)。 先前技術文獻 專利文獻BACKGROUND OF THE INVENTION In the manufacturing process of semiconductor devices, a semiconductor device formed with a plurality of ICs, LSIs, and other devices to be processed, before being divided into individual devices, is ground with a grinding device to form a predetermined thickness on the back surface. . A grinding device that grinds the backside of such a wafer is provided with a turn table, a plurality of work clamp tables, and grinding equipment. The turntable can rotate along the workpiece loading and unloading area and the grinding area. , The work chuck tables are arranged on the turntable and move to the grinding area in sequence, the grinding equipment is arranged in the grinding area and the wafer is ground, the wafer is held on the work chuck table, and the The work chuck is positioned in the grinding area (for example, refer to Patent Document 1). Prior Art Documents Patent Documents
專利文獻1:日本專利特開2002-200545號公報Patent Document 1: Japanese Patent Laid-Open No. 2002-200545
發明概要 發明欲解決之課題 通常,如上述之磨削裝置具備有粗磨削設備和精磨削設備來作為磨削設備,並且藉由粗磨削設備和精磨削設備同時磨削晶圓,且各自一次磨削1片晶圓。然而,為了提升生產效率,想要增加每單位時間內可磨削之晶圓片數的要求相應而生,而現存之磨削裝置難以回應該要求。SUMMARY OF THE INVENTION Problems to be solved by the invention Generally, the above-mentioned grinding device is equipped with rough grinding equipment and fine grinding equipment as grinding equipment, and the rough grinding equipment and the fine grinding equipment simultaneously grind wafers, And each one grinds one wafer at a time. However, in order to improve production efficiency, there is a requirement to increase the number of wafers that can be ground per unit time, and it is difficult for the existing grinding devices to meet the requirements.
本發明是有鑒於像這樣的問題點而作成的發明,其目的在於提供一種能夠增加每單位時間之被加工物的磨削加工的處理數量,以提升生產性的磨削裝置。 用以解決課題之手段The present invention is an invention made in view of such problems, and its object is to provide a grinding device capable of increasing the number of grinding processes of a workpiece per unit time to improve productivity. Means to solve the problem
本發明是一種磨削裝置,至少是由:工作夾台、轉台、第1磨削設備、及第2磨削設備所構成,該工作夾台為複數個,用來保持被加工物,該轉台能夠旋轉,且將工作夾台支撐成可旋動,該第1磨削設備用來對被保持在工作夾台上之被加工物的被磨削面施行第1磨削,該第2磨削設備用來對被保持在工作夾台上並且已施行過第1磨削之被加工物的被磨削面施行第2磨削,該磨削裝置之特徵在於:第1磨削設備至少是由第1磨削輪、及主軸單元所構成,該第1磨削輪配設了具有磨削面的磨削磨石,該主軸單元具有用來支撐第1磨削輪且可旋轉的主軸,第2磨削設備至少是由第2磨削輪、及主軸單元所構成,該第2磨削輪配設了具有磨削面的磨削磨石,該主軸單元具有用來支撐第2磨削輪且可旋轉的主軸,工作夾台是對應於第1磨削設備及第2磨削設備而各別配設2個,又,在配設於第1磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削,且在配設於第2磨削輪的磨削磨石之磨削面和2個工作夾台之2個吸附面相面對的半徑區域中施行磨削。The present invention is a grinding device, which is at least composed of: a work clamp table, a turntable, a first grinding device, and a second grinding device. The work clamp table is plural and is used to hold the workpiece. The turntable It can rotate and supports the work chuck to be rotatable. The first grinding equipment is used to perform the first grinding and the second grinding on the ground surface of the workpiece held on the work chuck. The equipment is used to perform the second grinding on the ground surface of the workpiece that is held on the work chuck and has been subjected to the first grinding. The grinding device is characterized in that: the first grinding device is at least The first grinding wheel is composed of a first grinding wheel and a spindle unit. The first grinding wheel is equipped with a grinding stone with a grinding surface. The spindle unit has a rotatable spindle for supporting the first grinding wheel. 2 Grinding equipment is composed of at least a second grinding wheel and a spindle unit. The second grinding wheel is equipped with a grinding stone with a grinding surface. The spindle unit is provided to support the second grinding wheel. And the rotatable spindle and work chuck are equipped with two respectively corresponding to the first grinding equipment and the second grinding equipment. In addition, it is used for the grinding of the grinding stone arranged on the first grinding wheel. Grinding is performed in the radius area where the two suction surfaces of the two work chucks face each other, and the grinding surface of the grinding stone arranged on the second grinding wheel and two of the two work chucks Grinding is performed in the radius area where the suction surfaces face each other.
依據該磨削裝置,由於是以第1磨削設備和第2磨削設備各自對被保持在2個工作夾台上的2個被加工物同時地進行磨削加工,所以與現存之磨削裝置相比,能夠對多數的被加工物有效率地施行磨削。 發明效果According to this grinding device, since the first grinding device and the second grinding device are used to simultaneously grind the two workpieces held on the two work chucks, it is consistent with the existing grinding Compared with the device, it can efficiently grind most workpieces. Invention effect
依據本發明,可得到一種能夠增加每單位時間之被加工物的磨削加工的處理數量,以提升生產性的磨削裝置。According to the present invention, it is possible to obtain a grinding device capable of increasing the number of grinding processes of a workpiece per unit time to improve productivity.
用以實施發明之形態 以下,參照附加圖式來說明本實施形態。圖1是顯示本實施形態之磨削裝置的頂視圖。沿著圖1的紙面之方向為水平方向,而垂直於圖1的紙面之方向為上下方向。Mode for Carrying Out the Invention Hereinafter, this embodiment will be described with reference to the attached drawings. Fig. 1 is a top view showing the grinding device of this embodiment. The direction along the paper surface of FIG. 1 is the horizontal direction, and the direction perpendicular to the paper surface of FIG. 1 is the vertical direction.
圖1所示之磨削裝置10是在基台11的上表面具有圓板狀的轉台12。轉台12是藉由省略圖示之旋轉驅動機構,以朝向上下方向延伸之旋轉軸P1為中心來進行旋轉。The
如圖1所示,轉台12上設有6個工作夾台。6個工作夾台是由3個第1工作夾台TA與3個第2工作夾台TB所構成,該等第1工作夾台TA是以等間隔(120°間隔)配置在以旋轉軸P1為中心的轉台12之旋轉方向上,該等第2工作夾台TB是以等間隔(120°間隔)配置在以旋轉軸P1為中心的旋轉方向上。各工作夾台TA、TB是用以將板狀的被加工物W(參照圖2、圖3)予以吸附保持之構件,其詳細內容將在之後敘述。被加工物W除了半導體基板、其他無機材料基板以外,還有像是形成有元件之半導體晶圓或光元件晶圓等,只要是能作為磨削加工的對象物,就能夠適用於任意物。As shown in Figure 1, the
圖1中,通過旋轉軸P1而在轉台12的半徑方向上延伸的虛擬的3條基準線L是以一點鏈線來表示。3條基準線L是以等間隔(120°間隔)配置在以旋轉軸P1為中心的旋轉方向上,並且相對於各基準線L,是以線對稱的關係將第1工作夾台TA和第2工作夾台TB各配置一個。將第1工作夾台TA和第2工作夾台TB作為工作夾台組,且各工作夾台TA、TB是以夾著該基準線L構成一對的成對關係來設置的。亦即,在轉台12上,設有3組工作夾台組14、15及16,且各工作夾台組都包含第1工作夾台TA和第2工作夾台TB。In FIG. 1, three virtual reference lines L extending in the radial direction of the
在從基台11的上表面朝上方突出的柱體17上,支撐有第1磨削設備20和第2磨削設備30,各磨削設備20、30對被保持在各工作夾台TA、TB之被加工物W(參照圖2、圖3)進行磨削加工。第1磨削設備20是對被加工物W施行第1磨削的粗磨削之設備。第2磨削設備30是對已藉由第1磨削設備20進行過粗磨削後之被加工物W,施行第2磨削的精磨削之設備。On the
第1磨削設備20和第2磨削設備30,除了後述之磨削磨石26、36以外,大致具有共通的構造。圖2及圖3是共用在第1磨削設備20和第2磨削設備30雙方之說明的圖,其中以一般符號表示第1磨削設備20的構成要素,且以括弧符號來表示第2磨削設備30的構成要素。又,圖1中,為了容易區分基台11上之轉台12和各工作夾台TA、TB的關係,所以部分地用二點鏈線來虛擬表示第1磨削設備20和第2磨削設備30的構成要素。The
如圖1所示,第1磨削設備20具備有移動基台21、和裝設於移動基台21的主軸單元22。移動基台21是被支撐成能夠沿著設於柱體17之前面的一對導軌18在上下方向移動。主軸單元22具有能夠以朝向上下方向延伸之旋轉軸P2為中心來進行旋轉的主軸23,並且主軸23是藉由設於上端之馬達24而被旋轉驅動。主軸23的下端支撐有圓板狀的第1磨削輪25。第1磨削輪25的中心與旋轉軸P2一致,並且當主軸23旋轉時,第1磨削輪25以旋轉軸P2為中心來進行旋轉。第1磨削輪25的下表面之周緣部上,呈環狀地配設有複數個磨削磨石26。再者,圖1中省略一部分的磨削磨石26的圖示。磨削磨石26為粗磨削用的磨削磨石,並且如圖2及圖3所示,具有朝向下方的磨削面26a。As shown in FIG. 1, the
如圖1所示,柱體17的前面側上,配設有旋轉軸在上下方向延伸的滾珠螺桿27,並且滾珠螺桿27是藉由設於上端之馬達28而被旋轉驅動。滾珠螺桿27是與設於移動基台21之貫通螺孔螺合。當滾珠螺桿27旋轉時,移動基台21沿著導軌18在上下方向移動,並且隨著移動基台21的移動,主軸單元22所支撐的第1磨削輪25進行上下移動。As shown in FIG. 1, on the front side of the
如圖1所示,第2磨削設備30具備有移動基台31、和裝設於移動基台31的主軸單元32。移動基台31是被支撐成能夠沿著設於柱體17之前面的一對導軌19在上下方向移動。主軸單元32具有能夠以朝向上下方向延伸之旋轉軸P3為中心來進行旋轉的主軸33,並且主軸33是藉由設於上端之馬達34而被旋轉驅動。主軸33的下端支撐有圓板狀的第2磨削輪35。第2磨削輪35的中心與旋轉軸P3一致,並且當主軸33旋轉時,第2磨削輪35以旋轉軸P3為中心來進行旋轉。第2磨削輪35的下表面之周緣部上,呈環狀地配設有複數個磨削磨石36。再者,圖1中省略一部分的磨削磨石36的圖示。磨削磨石36為精磨削用的磨削磨石,並且如圖2及圖3所示,具有朝向下方的磨削面36a。As shown in FIG. 1, the
如圖1所示,柱體17的前面側上,配設有旋轉軸在上下方向延伸的滾珠螺桿37,並且滾珠螺桿37是藉由設於上端之馬達38而被旋轉驅動。滾珠螺桿37是與設於移動基台31之貫通螺孔螺合。當滾珠螺桿37旋轉時,移動基台31沿著導軌19在上下方向移動,並且隨著移動基台31的移動,主軸單元32所支撐的第2磨削輪35進行上下移動。As shown in FIG. 1, on the front side of the
構成3組工作夾台組14、15及16的共計6個工作夾台TA、TB都具有共通構造和尺寸。如圖2及圖3所示,各工作夾台TA、TB具備圓柱狀的框體40和圓板狀的吸附保持部41,將被加工物W載置於吸附保持部41之上表面即吸附面42上,又,該吸附保持部41是被保持在形成於框體40之上表面的圓形凹部內。被加工物W是將被磨削面Wa(圖2、圖3)朝向上方而被載置。吸附保持部41是由多孔陶瓷等的多孔質構件所構成,並且藉由啟動圖2中概念地表示之吸引設備43,以使吸引力作用於吸附保持部41,就能將被加工物W吸附保持在吸附面42上。各工作夾台TA、TB是藉由省略圖示的旋轉驅動機構,以旋轉軸P4為中心來進行旋轉。A total of six work clamp tables TA, TB constituting the three work
如圖1及圖2所示,第1磨削輪25的直徑比各個工作夾台TA、TB的直徑還要大,能夠使構成各工作夾台組14、15及16的2個工作夾台TA、TB的2個吸附面42同時地面對設於第1磨削輪25之下表面的磨削磨石26。同樣地,第2磨削輪35的直徑比各個工作夾台TA、TB的直徑還要大,能夠使構成各工作夾台組14、15及16的2個工作夾台TA、TB的2個吸附面42同時地面對設於第2磨削輪35之下表面的磨削磨石36。亦即,第1磨削設備20和第2磨削設備30都能夠對2個工作夾台TA、TB上的2個被加工物W同時地施行磨削,並且能夠藉由第1磨削設備20和第2磨削設備30同時地磨削合計4個被加工物W。該磨削加工的詳細內容將在之後敘述。再者,本實施形態中,第1磨削輪25和第2磨削輪35被設定為共通的直徑。As shown in Figures 1 and 2, the diameter of the
如圖2誇大地表示,吸附保持部41的吸附面42是形成為以旋轉軸P4為軸的圓錐形。然後,第1工作夾台TA和第2工作夾台TB各自相對於第1磨削輪25之旋轉軸P2和第2磨削輪35之旋轉軸P3來使旋轉軸P4傾斜,並且受到轉台12支撐,又,其傾斜程度相當於與吸附面42的斜度對應的角度。As shown in an exaggerated manner in FIG. 2, the
第1工作夾台TA和第2工作夾台TB各自的吸附面42上所吸附保持的被加工物W為沿著吸附面42的圓錐狀。因此,各工作夾台TA、TB上的被加工物W之被磨削面Wa(圖2、圖3),在藉由第1磨削設備20施行粗磨削加工時,相對於設在第1磨削輪25之下表面周緣部的磨削磨石26之磨削面26a(圖2、圖3)成為平行的線狀半徑區域,與磨削磨石26接觸而被磨削。又,各工作夾台TA、TB上的被加工物W之被磨削面Wa,在藉由第2磨削設備30施行精磨削加工時,相對於設在第2磨削輪35之下表面周緣部的磨削磨石36之磨削面36a(圖2、圖3)成為平行的線狀半徑區域,與磨削磨石36接觸而被磨削。The workpiece W sucked and held on the
圖1中,將第1磨削設備20的磨削磨石26之磨削面26a面對第1工作夾台TA上的被加工物W之被磨削面Wa的區域,表示為加工線S1,且將第1磨削設備20的磨削磨石26之磨削面26a面對第2工作夾台TB上的被加工物W之被磨削面Wa的區域,表示為加工線S2。又,圖1中,將第2磨削設備30的磨削磨石36之磨削面36a面對第1工作夾台TA上的被加工物W之被磨削面Wa的區域,表示為加工線S3,且將第2磨削設備30的磨削磨石36之磨削面36a面對第2工作夾台TB上的被加工物W之被磨削面Wa的區域,表示為加工線S4。像這樣,在第1磨削設備20中,是在配設於第1磨削輪25的磨削磨石26之磨削面26a和2個工作夾台TA、TB之2個吸附面42相面對的半徑區域(加工線S1、S2)中,施行對被加工物W之被磨削面Wa的磨削。又,在第2磨削設備30中,是在配設於第2磨削輪35的磨削磨石36之磨削面36a和2個工作夾台TA、TB之2個吸附面42相面對的半徑區域(加工線S3、S4)中,施行對被加工物W之被磨削面Wa的磨削。In FIG. 1, the area where the grinding
各工作夾台TA、TB可藉由微調整設備來調整傾斜方向及傾斜的大小。如圖3所示,微調整設備50具有藉由調整軸機構來將凸緣(flange)52和固定部53之間予以連接的構造,該凸緣52設於支撐框體40的工作夾台基座51之下部,該固定部53相對於轉台12為固定關係。調整軸機構具有:相對於固定部53被固定支撐的筒狀部54、和插入筒狀部54的螺栓軸55,並且藉由使設於螺栓軸55之下端的旋轉操作部56旋轉,來使螺栓軸55相對於筒狀部54在上下方向進行進退移動。螺栓軸55的上端附近與凸緣52連接,當螺栓軸55進行進退移動時,凸緣52中的螺栓軸55的連接部分在上下進行位置變化。Each work clamp table TA, TB can be adjusted by the fine adjustment equipment to adjust the tilt direction and the size of the tilt. As shown in FIG. 3, the
如圖1所示,各工作夾台TA、TB是以3處的支撐部M來受到轉台12支撐,該等支撐部M是在以旋轉軸P4為中心之旋轉方向上,等間隔地位於3處,且,在該3處的支撐部M當中,將上述微調整設備50配置於2 處以上,就能調整各工作夾台TA、TB的傾斜度。例如,各工作夾台TA、TB中,能夠將位於接近圖1所示之加工線S1、S2、S3及S4之端部的1個支撐部M作為固定的支撐部,並且在剩餘2個支撐部M上設置微調整設備50。依據該構成,能夠在圓錐狀的吸附面42當中,以大致沿著加工線S1、S2、S3及S4延伸的稜線為中心,來進行各工作夾台TA、TB的傾斜度調整。As shown in Fig. 1, each work clamp table TA, TB is supported by the
針對由以上構成所組成的磨削裝置10的動作進行說明。設於轉台12上的3組工作夾台組14、15及16,藉由以旋轉軸P1為中心之轉台12的旋轉,依序移動至圖1所示之被加工物裝卸區域E1、第1磨削區域E2、第2磨削區域E3。圖1是顯示工作夾台組14位於被加工物裝卸區域E1,工作夾台組15位於第1磨削區域E2,工作夾台組16位於第2磨削區域E3之狀態。The operation of the grinding
被加工物裝卸區域E1是一種在省略圖示之搬送機構與第1工作夾台TA和第2工作夾台TB之間,進行被加工物W之移送的區域。被加工物W是藉由搬送機構而被搬送至被加工物裝卸區域E1。然後,在被加工物裝卸區域E1等待的工作夾台組14之第1工作夾台TA和第2工作夾台TB各自的吸附面42上,將被磨削面Wa朝向上方來載置被加工物W。第1工作夾台TA和第2工作夾台TB各自是藉由吸引設備43(圖2)之吸引力,來將被加工物W吸附保持在吸附面42上。The workpiece loading and unloading area E1 is an area where the workpiece W is transferred between the transport mechanism (not shown) and the first work chuck table TA and the second work chuck table TB. The to-be-processed object W is conveyed to the to-be-processed object loading and unloading area E1 by a conveyance mechanism. Then, on the suction surfaces 42 of the first work clamp table TA and the second work clamp table TB of the work
再者,本發明並不限定搬送機構之構成,能夠使用各種形態的搬送機構。作為其中一例,使用能夠對2個工作夾台TA、TB同時地搬送2個被加工物W的搬送機構的話,就能夠提高搬送效率。又,也可以將本實施形態的磨削裝置10,作為自由地組合各種加工裝置而聯合作動的群集模組系統(cluster module system)之一部分來應用,並且使用群集模組系統的搬送機構,進行搬往被加工物裝卸區域E1之被加工物W的搬送。Furthermore, the present invention does not limit the structure of the conveying mechanism, and various types of conveying mechanisms can be used. As an example, if a transport mechanism capable of simultaneously transporting two workpieces W to two work chucking tables TA and TB is used, the transport efficiency can be improved. In addition, the grinding
第1磨削區域E2是藉由第1磨削設備20來對第1工作夾台TA和第2工作夾台TB各自所保持的被加工物W之被磨削面Wa進行粗磨削加工的區域。如先前所述,第1磨削輪25的直徑比位在第1磨削區域E2之工作夾台組15的各個工作夾台TA、TB的直徑還要大。而且,能夠使設於第1磨削輪25之下表面的磨削磨石26之磨削面26a,接觸該2個工作夾台TA、TB之2個吸附面42上所保持的2個被加工物W之被磨削面Wa,來同時地進行粗磨削加工(參照圖2)。The first grinding area E2 is used by the
更詳細地,如圖1所示,在第1磨削區域E2中,第1磨削輪25之旋轉中心的旋轉軸P2是位於通過第1工作夾台TA和第2工作夾台TB中間的基準線L上(基準線L和旋轉軸P2是以垂直關係而相交)。又,第1工作夾台TA中的旋轉軸P4、和第2工作夾台TB中的旋轉軸P4各自位於第1磨削輪25的外周上。In more detail, as shown in FIG. 1, in the first grinding area E2, the rotation axis P2 of the rotation center of the
在該狀態下,使構成工作夾台組15的第1工作夾台TA和第2工作夾台TB各自以旋轉軸P4為中心來往圖1的箭頭R1方向(逆時針方向)旋轉,並且使第1磨削設備20中的第1磨削輪25一邊往圖1之箭頭R2方向(逆時針方向)旋轉一邊下降。然後,使設於第1磨削輪25之下表面周緣部的磨削磨石26之磨削面26a沿著加工線S1來對被保持在第1工作夾台TA的被加工物W之被磨削面Wa作接觸,並且沿著加工線S2來對被保持在第2工作夾台TB的被加工物W之被磨削面Wa作接觸,隨著一個第1磨削輪25之旋轉動作而同時地進行2個被加工物W的粗磨削加工。由於沿著加工線S1的粗磨削和沿著加工線S2的粗磨削都是成為從被加工物W之外周部分朝向中心(旋轉軸P4)之方向,所以能夠將針對由工作夾台組15所保持之2個被加工物W的磨削條件設為相同。In this state, the first work clamp table TA and the second work clamp table TB constituting the work
此時,在加工線S1和加工線S2中,由於將磨削磨石26之磨削面26a和2個工作夾台TA、TB各自的吸附面42預先調整成形成平行,所以能夠對2個被加工物W之被磨削面Wa以良好精度進行粗磨削。又,由於磨削磨石26之磨削面26a通過2個工作夾台TA、TB各自的旋轉軸P4,所以能夠對2個被加工物W在沒有殘留的情況下,將被磨削面Wa全體均勻地粗磨削。此外,由於加工線S1 、S2位於用支撐各工作夾台TA、TB的3處支撐部M所圍成的三角形狀的區域內,所以在藉由第1磨削設備20進行粗磨削時,能夠提高被加工物W的穩定性。At this time, in the processing line S1 and the processing line S2, since the grinding
第2磨削區域E3是一種藉由第2磨削設備30來對第1工作夾台TA和第2工作夾台TB各自所保持的被加工物W之被磨削面Wa進行精磨削加工的區域。如先前所述,第2磨削輪35的直徑比位在第2磨削區域E3之工作夾台組16的各個工作夾台TA、TB的直徑還要大。而且,能夠使設於第2磨削輪35之下表面的磨削磨石36之磨削面36a,接觸該2個工作夾台TA、TB之2個吸附面42上所保持的2個被加工物W之被磨削面Wa,來同時地進行精磨削加工(參照圖2)。The second grinding area E3 is a type of grinding surface Wa of the workpiece W held by the first work chuck TA and the second work chuck TB by the
更詳細地,如圖1所示,在第2磨削區域E3中,第2磨削輪35之旋轉中心即旋轉軸P3是位於通過第1工作夾台TA和第2工作夾台TB中間的基準線L上(基準線L和旋轉軸P3是以垂直關係而相交)。又,第1工作夾台TA中的旋轉軸P4、和第2工作夾台TB中的旋轉軸P4各自位於第2磨削輪35的外周上。In more detail, as shown in FIG. 1, in the second grinding area E3, the rotation center of the
在該狀態下,使構成工作夾台組16的第1工作夾台TA和第2工作夾台TB各自以旋轉軸P4為中心來往圖1的箭頭R3方向(逆時針方向)旋轉,並且使第2磨削設備30中的第2磨削輪36一邊往圖1之箭頭R4方向(逆時針方向)旋轉一邊下降。然後,使設於第2磨削輪35之下表面周緣部的磨削磨石36之磨削面36a沿著加工線S3來對被保持在第1工作夾台TA的被加工物W之被磨削面Wa作接觸,並且沿著加工線S4來對被保持在第2工作夾台TB的被加工物W之被磨削面Wa作接觸,隨著一個第2磨削輪35之旋轉動作而同時地進行2個被加工物W的精磨削加工。由於沿著加工線S3的精磨削和沿著加工線S4的精磨削都是成為從被加工物W之外周部分朝向中心(旋轉軸P4)之方向,所以能夠將針對由工作夾台組16所保持之2個被加工物W的磨削條件設為相同。In this state, the first work clamp table TA and the second work clamp table TB constituting the work
此時,於加工線S3和加工線S4中,由於將磨削磨石36之磨削面36a和2個工作夾台TA、TB各自的吸附面42預先調整成形成平行,所以能夠對2個被加工物W之被磨削面Wa以良好精度進行精磨削。又,由於磨削磨石36之磨削面通過2個工作夾台TA、TB各自的旋轉軸P4,所以能夠對2個被加工物W在沒有殘留的情況下,將被磨削面Wa全體均勻地精磨削。此外,由於加工線S3 、S4位於用支撐各工作夾台TA、TB的3處支撐部M所圍成的三角形狀的區域內,所以在藉由第2磨削設備30進行精磨削時,能夠提高被加工物W的穩定性。At this time, in the processing line S3 and the processing line S4, since the grinding
在圖1所示的狀態下,對第1磨削區域E2和第2磨削區域E3中的共計4個被加工物W的磨削結束時,作成將第1磨削輪25和第2磨削輪35各自從被加工物W朝上方拉起的狀態,使轉台12往圖1的箭頭R5方向(逆時針方向)旋轉。轉台12從圖1所示的位置旋轉120°時,工作夾台組14從被加工物裝卸區域E1移動至第1磨削區域E2,工作夾台組15從第1磨削區域E2移動至第2磨削區域E3,工作夾台組16從第2磨削區域E3移動至被加工物裝卸區域E1。In the state shown in FIG. 1, when the grinding of a total of four workpieces W in the first grinding area E2 and the second grinding area E3 is completed, the
而且,在第1磨削區域E2中,對於被保持在工作夾台組14的2個工作夾台TA、TB上的2個被加工物W之被磨削面Wa(在圖1的狀態下,是位於被加工物裝卸區域E1的未磨削之物),使用第1磨削設備20同時地進行粗磨削加工。又,在第2磨削區域E3中,對於被保持在工作夾台組15的2個工作夾台TA、TB上的2個被加工物W之被磨削面Wa(在圖1的狀態下,是已在第1磨削區域E2中施行過粗磨削之物),使用第2磨削設備30同時地進行精磨削加工。此外,在被加工物裝卸區域E1中,將被保持在工作夾台組16的2個工作夾台TA、TB上的完成精磨削之2個被加工物W移送至圖未示的搬送機構。在繼續進行磨削裝置10之磨削加工的情形下,在被加工物裝卸區域E1中,在工作夾台組16的2個工作夾台TA、TB各自的吸附面42上,被載置新的未磨削狀態之被加工物W。Furthermore, in the first grinding area E2, the ground surface Wa of the two workpieces W held on the two work clamp tables TA and TB of the work clamp table group 14 (in the state of FIG. 1 , Is the ungrounded object located in the workpiece loading and unloading area E1), and the
藉由重複上述動作,就能將第1磨削設備20的粗磨削加工和第2磨削設備30的精磨削加工,各別對2個的被加工物W同時地進行。因此,依據本實施形態的磨削裝置10,相較於藉由粗磨削用的磨削設備和精磨削用的磨削設備各自一次磨削1個被加工物的現存之磨削裝置,能夠增加每單位時間內可磨削加工的被加工物的數量,以提升生產性。By repeating the above-mentioned operation, the rough grinding process of the
又,上述實施形態中,在第1磨削區域E2中,將2個工作夾台TA、TB相對於基準線L配置成線對稱,並且使第1磨削輪25的旋轉軸P3位於基準線L上。而且,2個工作夾台TA、TB的傾斜度和旋轉方向為一致,從而都能使得以磨削磨石26所進行之磨削從被加工物W的外周朝向中心(旋轉軸P4)前進。同樣地,在第2磨削區域E3中,將2個的工作夾台TA、TB相對於基準線L配置成線對稱,並且使第2磨削輪35的旋轉軸P3的旋轉軸P3位於基準線L上。而且,2個工作夾台TA、TB的傾斜度和旋轉方向為一致,從而都能使得以磨削磨石36所進行之磨削從被加工物W的外周朝向中心(旋轉軸P4)前進。藉由這些構成,第1磨削區域E2中的與2個被加工物W有關的磨削條件成為相同,且第2磨削區域E3中的與2個被加工物W有關的磨削條件也成為相同,就能夠一邊增加磨削加工的處理數量,一邊消弭加工的品質不一。In addition, in the above embodiment, in the first grinding area E2, the two work chucks TA and TB are arranged in line symmetry with respect to the reference line L, and the rotation axis P3 of the
又,上述實施形態的磨削裝置10是使用同時地面對2個工作夾台TA、TB的吸附面42且直徑較大的第1磨削輪25或第2磨削輪35,來進行對2個被加工物W的磨削。藉由該構成,就能在磨削第1工作夾台TA上之被加工物W的範圍(加工線S1、S3)與磨削第2工作夾台TB上之被加工物W的範圍(加工線S2、S4)之間,得到各磨削磨石26、36不會接觸到被加工物W的磨削停止範圍。利用該磨削停止範圍,能夠有效率地冷卻各磨削磨石26、36,以謀求各磨削磨石26、36之耐久性的提升。例如,也可以具備像是在磨削停止範圍積極地冷卻各磨削磨石26、36之冷卻水的供給系統。In addition, the grinding
再者,本發明並不受限於上述實施之形態,且可進行各種變更而實施。在上述實施形態中,關於在附圖所圖示的大小或形狀等,並不受限於此,並可在能發揮本發明的效果的範圍內作適當變更。In addition, the present invention is not limited to the embodiment described above, and can be implemented with various modifications. In the above-mentioned embodiment, the size, shape, etc. illustrated in the drawings are not limited to these, and can be appropriately changed within the range in which the effects of the present invention can be exhibited.
例如,在上述實施形態中,雖然是將第1磨削設備20和第2磨削設備30作成大致共通的構成,但是也可以是具備有第1磨削設備和第2磨削設備相異的構成。For example, in the above-mentioned embodiment, although the
又,上述實施形態的磨削裝置10雖然具備有第1磨削區域E2和第2磨削區域E3這2個磨削區域,但是也可以適用於具備3個以上之相異磨削區域的磨削裝置。In addition, although the grinding
又,雖然說明了本發明之實施形態,但是作為本發明的其他實施形態,亦可為將上述實施形態或變形例整體或部分地組合而成的形態。In addition, although the embodiment of the present invention has been described, as another embodiment of the present invention, it is also possible to combine the above-mentioned embodiments or modified examples in whole or in part.
又,本發明之實施形態並不限定於上述之實施形態,且亦可在不脫離本發明之技術思想的主旨的範圍內進行各種變更、置換、變形。此外,若能經由技術之進步或衍生之其他技術而以其他的方式來實現本發明之技術思想的話,亦可使用該方法來實施。因此,申請專利範圍涵蓋了可包含在本發明之技術思想範圍內的所有的實施態樣。 産業上之可利用性In addition, the embodiment of the present invention is not limited to the above-mentioned embodiment, and various changes, substitutions, and modifications may be made within the scope not departing from the technical idea of the present invention. In addition, if the technical idea of the present invention can be realized in other ways through technological progress or other derived technologies, this method can also be used to implement it. Therefore, the scope of patent application covers all implementation aspects that can be included in the scope of the technical idea of the present invention. Industrial availability
如以上所說明,本發明具有能夠增加每單位時間之被加工物的磨削加工的處理數量,以實現生產性之提升的效果,特別是對於一種藉由配設於磨削區域的磨削設備之磨削輪來磨削被加工物的磨削裝置是有用的,其中該被加工物被保持在工作夾台上,且該工作夾台配設於轉台。As explained above, the present invention has the effect of being able to increase the number of grinding processes of the workpiece per unit time to achieve an increase in productivity, especially for a kind of grinding equipment arranged in the grinding area The grinding wheel is useful as a grinding device to grind the workpiece, wherein the workpiece is held on a work clamp table, and the work clamp table is arranged on a turntable.
10‧‧‧磨削裝置11‧‧‧基台12‧‧‧轉台14、15、16‧‧‧工作夾台組17‧‧‧柱體18、19‧‧‧導軌20‧‧‧第1磨削設備21、31‧‧‧移動基台22、32‧‧‧主軸單元23、33‧‧‧主軸24、34‧‧‧馬達25‧‧‧第1磨削輪26、36‧‧‧磨削磨石26a、36a‧‧‧磨削面27、37‧‧‧滾珠螺桿28、38‧‧‧馬達30‧‧‧第2磨削設備35‧‧‧第2磨削輪40‧‧‧框體41‧‧‧吸附保持部42‧‧‧吸附面43‧‧‧吸引設備50‧‧‧微調整設備51‧‧‧工作夾台基座52‧‧‧凸緣53‧‧‧固定部54‧‧‧筒狀部55‧‧‧螺栓軸56‧‧‧旋轉操作部E1‧‧‧被加工物裝卸區域E2‧‧‧第1磨削區域E3‧‧‧第2磨削區域L‧‧‧基準線M‧‧‧支撐部TA‧‧‧第1工作夾台TB‧‧‧第2工作夾台P1、P2、P3、P4‧‧‧旋轉軸R1、R2、R3、R4、R5‧‧‧箭頭S1、S2、S3、S4‧‧‧加工線W‧‧‧被加工物Wa‧‧‧被磨削面10‧‧‧Grinding device 11‧‧‧Abutment 12‧‧‧Turntable 14,15,16‧‧‧Working clamping table group 17‧‧‧Cylinder 18,19‧‧‧Guide 20‧‧‧First grinding Grinding equipment 21, 31‧‧‧Mobile base 22,32‧‧‧Spindle unit 23,33‧‧‧Spindle 24,34‧‧‧Motor 25‧‧‧First grinding wheel 26,36‧‧‧Grinding Grinding stone 26a, 36a‧‧‧Grinding surface 27, 37‧‧‧Ball screw 28, 38‧‧‧Motor 30‧‧‧Second grinding equipment 35‧‧‧Second grinding wheel 40‧‧‧Frame body 41‧‧‧Suction holding part 42‧‧‧Suction surface 43‧‧‧Suction equipment 50‧‧‧Micro adjustment equipment 51‧‧‧Working clamp base 52‧‧‧Flange 53‧‧‧Fixed part 54‧‧ ‧Cylindrical part 55‧‧‧Bolt shaft 56‧‧‧Rotary operation part E1‧‧‧Working object loading and unloading area E2‧‧‧First grinding area E3‧‧‧Second grinding area L‧‧‧Datum line M‧‧‧Support TA‧‧‧The first work clamp TB‧‧‧The second work clamp P1, P2, P3, P4‧‧‧Rotation axis R1, R2, R3, R4, R5‧‧‧Arrow S1 , S2, S3, S4‧‧‧Processing line W‧‧‧Working object Wa‧‧‧Grinding surface
圖1是顯示本實施形態之磨削裝置的頂視圖。 圖2是顯示在本實施形態之磨削裝置上,藉由一個磨削設備來對2個工作夾台上的2個被加工物同時地進行磨削加工之狀態的側視圖。 圖3是顯示工作夾台之微調整設備的側視圖。Fig. 1 is a top view showing the grinding device of this embodiment. Fig. 2 is a side view showing a state in which two workpieces on two work chucks are simultaneously ground by one grinding device in the grinding device of this embodiment. Fig. 3 is a side view showing the fine adjustment equipment of the work clamp table.
10‧‧‧磨削裝置 10‧‧‧Grinding device
11‧‧‧基台 11‧‧‧Abutment
12‧‧‧轉台 12‧‧‧Turntable
14、15、16‧‧‧工作夾台組 14,15,16‧‧‧Work clamp table group
17‧‧‧柱體 17‧‧‧Cylinder
18、19‧‧‧導軌 18、19‧‧‧Guide rail
20‧‧‧第1磨削設備 20‧‧‧First grinding equipment
21、31‧‧‧移動基台 21、31‧‧‧Mobile abutment
22、32‧‧‧主軸單元 22, 32‧‧‧Spindle unit
23、33‧‧‧主軸 23, 33‧‧‧Spindle
24、34‧‧‧馬達 24, 34‧‧‧Motor
25‧‧‧第1磨削輪 25‧‧‧First grinding wheel
26、36‧‧‧磨削磨石 26、36‧‧‧Grinding stone
27、37‧‧‧滾珠螺桿 27、37‧‧‧Ball screw
28、38‧‧‧馬達 28, 38‧‧‧Motor
30‧‧‧第2磨削設備 30‧‧‧Second Grinding Equipment
35‧‧‧第2磨削輪 35‧‧‧2nd grinding wheel
42‧‧‧吸附面 42‧‧‧Adsorption surface
E1‧‧‧被加工物裝卸區域 E1‧‧‧Working object loading and unloading area
E2‧‧‧第1磨削區域 E2‧‧‧First grinding area
E3‧‧‧第2磨削區域 E3‧‧‧Second grinding area
L‧‧‧基準線 L‧‧‧Baseline
M‧‧‧支撐部 M‧‧‧Support
TA‧‧‧第1工作夾台 TA‧‧‧The first work clamp
TB‧‧‧第2工作夾台 TB‧‧‧The second work clamp
P1、P2、P3、P4‧‧‧旋轉軸 P1, P2, P3, P4‧‧‧Rotating axis
R1、R2、R3、R4、R5‧‧‧箭頭 R1, R2, R3, R4, R5‧‧‧Arrow
S1、S2、S3、S4‧‧‧加工線 S1, S2, S3, S4‧‧‧Processing line
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